Abstract: Provided is a microwave heating apparatus capable of effectively preventing the generation of sparks when an object containing a conductor (including a metal precursor such as a metal oxide) or a semiconductor is subjected to microwave heating. A microwave heating apparatus supplies a microwave so that the direction of the electrical flux line of the microwave is identical with the direction substantially parallel with a surface of a plate-like substrate and having thereon a pattern containing a conductor, a metal oxide, or a semiconductor, the substrate being arranged in the waveguide. The microwave heating apparatus also controls a pulse width of the microwave so that pulsed microwaves are supplied to the surface having the pattern thereon.

Abstract: Provided is a microwave heating apparatus capable of effectively preventing the generation of sparks when an object containing a conductor (including a metal precursor such as a metal oxide) or a semiconductor is subjected to microwave heating. A microwave heating apparatus supplies a microwave so that the direction of the electrical flux line of the microwave is identical with the direction substantially parallel with a surface of a plate-like substrate and having thereon a pattern containing a conductor, a metal oxide, or a semiconductor, the substrate being arranged in the waveguide. The microwave heating apparatus also controls a pulse width of the microwave so that pulsed microwaves are supplied to the surface having the pattern thereon.

Abstract: Here is disclosed a plasma generator using microwave wherein a plasma generating chamber is provided with a plurality of wave guide tubes extending in parallel one to another at regular intervals, each of the wave guide tubes being formed with a plurality of coupling ports arranged intermittently in an axial direction of the wave guide tube and dimensioned so that coupling coefficient thereof become gradually higher toward a distal end of the wave guide tube, and a plurality of dielectric windows provided through the plasma generating chamber in association with the respective coupling ports so that microwave electric power radiated through the coupling ports into the plasma generating chamber may be uniformized and thereby plasma of a large area may be generated with high and uniform density.

Abstract: Here is disclosed a plasma generator using microwave wherein a plasma generating chamber is provided with a plurality of wave guide tubes extending in parallel one to another at regular intervals, each of the wave guide tubes being formed with a plurality of coupling ports arranged intermittently in an axial direction of the wave guide tube and dimensioned so that coupling coefficient thereof become gradually higher toward a distal end of the wave guide tube, and a plurality of dielectric windows provided through the plasma generating chamber in association with the respective coupling ports so that microwave electric power radiated through the coupling ports into the plasma generating chamber may be uniformized and thereby plasma of a large area may be generated with high and uniform density.