Patents by Inventor Kazufumi Kubota
Kazufumi Kubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11034737Abstract: The present disclosure provides hNGAL muteins that bind CGRP and can be used in various application including pharmaceutical applications, for example, migraine. The present disclosure also concerns methods of making one or more muteins described herein as well as compositions and combinations comprising one or more of such muteins. The present disclosure further relates to nucleic acid molecules encoding such muteins and to methods for generation of such muteins and nucleic acid molecules. In addition, the application discloses therapeutic and/or diagnostic uses of these muteins as well as compositions and combinations comprising one or more of such muteins.Type: GrantFiled: July 8, 2019Date of Patent: June 15, 2021Assignee: Pieris Pharmaceuticals GmbHInventors: Gabriele Matschiner, Christine Rothe, Alexander Wiedenmann, Rachida Siham Bel Aiba, Marlon Hinner, Andrea Allersdorfer, Bradley Lunde, Kazufumi Kubota, Mitsuhiro Makino, Sakiko Takahashi, Ryuji Hashimoto, Tohru Takahashi, Mamoru Otoyo
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Patent number: 10515778Abstract: A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam.Type: GrantFiled: March 16, 2016Date of Patent: December 24, 2019Assignee: NGR INC.Inventors: Sumio Sasaki, Susumu Takashima, Makoto Kato, Kazufumi Kubota, Yukihiro Tanaka, Yuichiro Yamazaki
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Publication number: 20190338002Abstract: The present disclosure provides hNGAL muteins that bind CGRP and can be used in various application including pharmaceutical applications, for example, migraine. The present disclosure also concerns methods of making one or more muteins described herein as well as compositions and combinations comprising one or more of such muteins. The present disclosure further relates to nucleic acid molecules encoding such muteins and to methods for generation of such muteins and nucleic acid molecules.Type: ApplicationFiled: July 8, 2019Publication date: November 7, 2019Inventors: Gabriele Matschiner, Christine Rothe, Alexander Wiedenmann, Rachida Siham Bel Aiba, Marlon Hinner, Andrea Allersdorfer, Bradley Lunde, Kazufumi Kubota, Mitsuhiro Makino, Sakiko Takahashi, Ryuji Hashimoto, Tohru Takahashi, Mamoru Otoyo
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Patent number: 10400016Abstract: The present disclosure provides hNGAL muteins that bind CGRP and can be used in various application including pharmaceutical applications, for example, migraine. The present disclosure also concerns methods of making one or more muteins described herein as well as compositions and combinations comprising one or more of such muteins. The present disclosure further relates to nucleic acid molecules encoding such muteins and to methods for generation of such muteins and nucleic acid molecules. In addition, the application discloses therapeutic and/or diagnostic uses of these muteins as well as compositions and combinations comprising one or more of such muteins.Type: GrantFiled: December 7, 2016Date of Patent: September 3, 2019Assignee: PIERIS PHARMACEUTICALS GMBHInventors: Gabriele Matschiner, Christine Rothe, Alexander Wiedenmann, Rachida Siham Bel Aiba, Marlon Hinner, Andrea Allersdorfer, Bradley Lunde, Kazufumi Kubota, Mitsuhiro Makino, Sakiko Takahashi, Ryuji Hashimoto, Tohru Takahashi, Mamoru Otoyo
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Publication number: 20180005797Abstract: A scanning electron microscope including: an electron beam source for generating a primary electron beam; an electron optical system configured to direct the primary electron beam to a specimen while focusing and deflecting the primary electron beam; and an energy analyzing system capable of performing parallel detection of an energy spectrum of back-scattered electrons emitted from the specimen is disclosed. The energy analyzing system includes: a Wien filter configured to separate the back-scattered electrons from a beam axis and analyze energies of the back-scattered electrons; and an array detector configured to detect the back-scattered electrons that have passed through the Wien filter. The Wien filter includes a plurality of electromagnetic poles, center-side ends of the plurality of electromagnetic poles have tapered surfaces, respectively, and the tapered surfaces form an exit of the Wien filter through which the back-scattered electrons pass out.Type: ApplicationFiled: June 29, 2016Publication date: January 4, 2018Inventors: Makoto KATO, Susumu TAKASHIMA, Kazufumi KUBOTA, Kaoru ZENYOUJI, Yuichiro YAMAZAKI
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Patent number: 9793091Abstract: There is disclosed an image generation apparatus which is capable of generating a clear image by reducing vibration of the image. The image generation apparatus includes an electron-optics column having an electron gun, a deflector, a condenser lens, and an objective lens, a displacement detector for detecting a displacement of an XY stage, a stage-position measuring device for specifying a position of the XY stage based on an output signal of the displacement detector, an accelerometer for detecting vibration of the electron-optics column, an acceleration-signal processing device for processing an output signal of the accelerometer, and a deflection-controlling device for controlling operation of the deflector.Type: GrantFiled: June 28, 2016Date of Patent: October 17, 2017Assignee: NGR Inc.Inventors: Hideaki Teshima, Kazufumi Kubota, Eiji Sato, Shigeyuki Sato, Kenichiro Kashiwazaki, Yuta Uraike
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Publication number: 20170271124Abstract: A scanning electron microscope includes: a retarding power source configured to apply a retarding voltage to a specimen; a combined objective lens configured to focus the primary beam on a surface of the specimen; an electrostatic deflection system configured to deflect the primary beam to direct the primary beam to each point in a field of view on the surface of the specimen; a first scintillation detector having a first scintillator configured to emit light upon incidence of secondary electrons which have been emitted from the specimen; a Wien filter configured to deflect the secondary electrons in one direction without deflecting the primary beam; and a second scintillation detector having a second scintillator configured to detect the secondary electrons deflected by the Wien filter. The second scintillator has a distal end located away from the axis of the primary beam.Type: ApplicationFiled: March 16, 2016Publication date: September 21, 2017Inventors: Sumio SASAKI, Susumu TAKASHIMA, Makoto KATO, Kazufumi KUBOTA, Yukihiro TANAKA, Yuichiro YAMAZAKI
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Publication number: 20170166615Abstract: The present disclosure provides hNGAL muteins that bind CGRP and can be used in various application including pharmaceutical applications, for example, migraine. The present disclosure also concerns methods of making one or more muteins described herein as well as compositions and combinations comprising one or more of such muteins. The present disclosure further relates to nucleic acid molecules encoding such muteins and to methods for generation of such muteins and nucleic acid molecules.Type: ApplicationFiled: December 7, 2016Publication date: June 15, 2017Applicant: Daiichi Sankyo Co., Ltd.Inventors: GABRIELE MATSCHINER, Christine ROTHE, Alexander WIEDENMANN, Rachida Siham BEL AIBA, Marlon HINNER, Andrea ALLERSDORFER, Bradley LUNDE, Kazufumi KUBOTA, Mitsuhiro MAKINO, Sakiko TAKAHASHI, Ryuji HASHIMOTO, Tohru TAKAHASHI, Mamoru OTOYO
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Patent number: 8045785Abstract: A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing edges of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.Type: GrantFiled: August 6, 2010Date of Patent: October 25, 2011Assignee: NGR Inc.Inventors: Tadashi Kitamura, Kazufumi Kubota, Shinichi Nakazawa, Neeti Vohra, Masahiro Yamamoto, Toshiaki Hasebe
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Publication number: 20100303334Abstract: A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device configured to generate a reference pattern represented by one or more lines from the data, an image generation device configured to generate the image of the pattern to-be-inspected, a detecting device configured to detect an edge of the image of the pattern to-be-inspected, and an inspection device configured to inspect the pattern to-be-inspected by comparing edges of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.Type: ApplicationFiled: August 6, 2010Publication date: December 2, 2010Inventors: Tadashi KITAMURA, Kazufumi KUBOTA, Shinichi NAKAZAWA, Neeti VOHRA, Masahiro YAMAMOTO, Toshiaki HASEBE
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Patent number: 7817844Abstract: A pattern inspection apparatus is used for inspecting a pattern, such as semiconductor integrated circuit (LSI), liquid crystal panel, and a photomask by using an image of the pattern to-be-inspected and design data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device for generating a reference pattern represented by one or more lines from design data, an image generation device for generating the image of the pattern to-be-inspected, a detecting device for detecting an edge of the image of the pattern to-be-inspected, and an inspection device for inspecting the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.Type: GrantFiled: February 16, 2005Date of Patent: October 19, 2010Assignee: NanoGeometry Research Inc.Inventors: Tadashi Kitamura, Kazufumi Kubota, Shinichi Nakazawa, Neeti Vohra, Masahiro Yamamoto
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Patent number: 7796801Abstract: A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected.Type: GrantFiled: May 17, 2006Date of Patent: September 14, 2010Assignee: NanoGeometry Research Inc.Inventors: Tadashi Kitamura, Kazufumi Kubota, Shinichi Nakazawa, Neeti Vohra, Masahiro Yamamoto, Toshiaki Hasebe
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Publication number: 20060245636Abstract: A fine pattern, such as a semiconductor integrated circuit (LSI), a liquid crystal panel, and a photomask (reticle) for the semiconductor or the liquid crystal panel, which are fabricated based on data for fabricating the fine pattern such as design data is inspected by a pattern inspection apparatus. The pattern inspection apparatus for inspecting a pattern to-be-inspected uses an image of the pattern to-be-inspected and data for fabricating the pattern to-be-inspected.Type: ApplicationFiled: May 17, 2006Publication date: November 2, 2006Inventors: Tadashi Kitamura, Kazufumi Kubota, Shinichi Nakazawa, Neeti Vohra, Masahiro Yamamoto, Toshiaki Hasebe
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Publication number: 20050146714Abstract: A pattern inspection apparatus is used for inspecting a pattern, such as semiconductor integrated circuit (LSI), liquid crystal panel, and a photomask by using an image of the pattern to-be-inspected and design data for fabricating the pattern to-be-inspected. The pattern inspection apparatus includes a reference pattern generation device for generating a reference pattern represented by one or more lines from design data, an image generation device for generating the image of the pattern to-be-inspected, a detecting device for detecting an edge of the image of the pattern to-be-inspected, and an inspection device for inspecting the pattern to-be-inspected by comparing the edge of the image of the pattern to-be-inspected with the one or more lines of the reference pattern.Type: ApplicationFiled: February 16, 2005Publication date: July 7, 2005Inventors: Tadashi Kitamura, Kazufumi Kubota, Shinichi Nakazawa, Neeti Vohra, Masahiro Yamamoto
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Publication number: 20040081350Abstract: A pattern inspection apparatus inspects fine patterns such as semiconductors (LSI), liquid crystal panels, and masks (reticles) for those. The pattern inspection apparatus includes a storage device for storing said reference pattern, an image generator for scanning the pattern to-be-inspected with a charged particle beam to produce an image of the pattern to-be-inspected, an input device for inputting the image of the pattern to-be-inspected, an inspection device for inspecting the pattern to-be-inspected by comparing an edge of the inputted image of the pattern to-be-inspected and an edge of the stored reference pattern with each other, and an output device for outputting a result of the inspection of the pattern to-be-inspected.Type: ApplicationFiled: October 21, 2003Publication date: April 29, 2004Inventors: Tadashi Kitamura, Kazufumi Kubota, Masahiro Yamamoto
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Patent number: 5053879Abstract: A method and device for shading correction used in a video printer comprises a TV camera for providing image data of a subject to be printed and an exposure display means such as an exposure CRT for displaying the image data thereon and to which photographic paper is exposed to make a video print of the subject. The method of shading correction comprises the steps of making a video print of a reference subject with an uniform density using the video printer, obtaining the difference between image data of the video print and the image data of the reference subject as shading correction data, and adding the shading correction data and the image data of a subject to be printed, thereby effecting shading correction for a video print of the subject made by the video printer.Type: GrantFiled: June 3, 1988Date of Patent: October 1, 1991Assignee: Fuji Photo Film Co., Ltd.Inventor: Kazufumi Kubota
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Patent number: 5018023Abstract: A method of inputting an image of an original by inputting images of a plurality of divisions into which the original is divided, by the use of an image input device. By dividing the original and inputting the divisions separately, an image input device having relatively few pixels may be used. An image of a division of the original input by the image input device is displayed in an image scrolling area of a screen of a monitor and an image of part of another division adjacent to the division is displayed in an image fixing area of the screen adjacent to one side of the image scrolling area. The image displayed in the image scrolling area is scrolled so as to avoid discontinuity between the images displayed in both image areas by shifting one of the original and the image input device relative to the other. The data of the image displayed in the image scrolling area is stored in an image memory. The entire image of the original thus may be stored, and may be printed subsequently on photograhic paper.Type: GrantFiled: September 14, 1989Date of Patent: May 21, 1991Assignee: Fuji Photo Film Co., Ltd.Inventor: Kazufumi Kubota
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Patent number: 5001512Abstract: In a method of setting exposure conditions for three colors in a photographic printer, a difference in density between a previously provided reference print and a test print made from a control negative without exposure correction is corrected, one color at a time, by making an exposure corrected by the use of an exposure correction value which is obtained one color at a time by multiplying the difference in density between the test print and the previously provided reference print by a predetermined correction coefficient. First to fifth test prints are made from a control negative in first to fifth different exposure conditions where corrections are effected for density in the first exposure condition, for density and all of yellow, magenta and cyan, in the second exposure condition, for density and each one of yellow, magenta and cyan in each of the third to fifth exposure conditions.Type: GrantFiled: December 18, 1989Date of Patent: March 19, 1991Assignee: Fuji Photo Film Co.Inventor: Kazufumi Kubota
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Patent number: 4958237Abstract: A method of making a large size print from an original by dividing an image of an original into smaller divisions in the form of a matrix is provided. Video signals of the original image are read from divided memory areas of a memory, respectively. The information in each of the smaller divisions are enlarged by interpolating the video signals read out from each divided memory area. The interpolated video signals of each smaller division are displayed on an image display device such as CRT and projected onto a photographic paper for exposure, thereby making enlarged prints of the smaller divisions which in turn are arranged to form an enlarged picture of the original.Type: GrantFiled: November 9, 1988Date of Patent: September 18, 1990Assignee: Fuji Photo Film Co., Ltd.Inventor: Kazufumi Kubota
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Patent number: 4639118Abstract: A photographic paper accommodating apparatus is disposed between a photographic paper printing section and a developing section so as to absorb or retain the slack in a continuous photographic paper fed from the former to the latter which occurs due to a difference between the respective processing speeds at these sections. First clamping and transporting rollers are provided on the downstream side of the printing section so as to define a first photographic paper looping area between the printing section and the first clamping and transporting rollers. Second clamping and transporting rollers are provided on the downstream side of the first clamping and transporting rollers so as to define a second photographic paper looping area between the first and second clamping and transporting rollers.Type: GrantFiled: November 1, 1985Date of Patent: January 27, 1987Assignee: Fuji Photo Film Co., Ltd.Inventors: Mikio Kogane, Kenji Suzuki, Eiichi Kito, Kazufumi Kubota, Kanji Tokuda