Patents by Inventor Kazufumi Ogawa

Kazufumi Ogawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030104129
    Abstract: A compound represented by a general formula (1) ABXn (where A is a carbon-containing group; B is at least one element selected from Si, Ge, Sn, Ti and Zr; X is a hydrolyzable group; and n is 1, 2 or 3), for example, a chlorosilane compound having a fluorocarbon group, is measured in an amount required for one time application, and dropped from a nozzle on a surface of a substrate having an active hydrogen on the surface, and simultaneously it is rubbed with a coater made of a sponge or a nonwoven fabric, etc. Furthermore, it is rubbed with a coater made of a sponge or a nonwoven fabric, etc. while blowing a dry warm air, and an elimination reaction is caused between the active hydrogen on the surface of the substrate and the hydrolyzable group of the compound. Thus, the compound is covalently bonded to the substrate. The molecules of the is silane compound also are polymerized with one another to be fixed.
    Type: Application
    Filed: September 24, 2002
    Publication date: June 5, 2003
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Norihisa Mino, Mitsuo Ebisawa, Yoshiaki Oono, Kazufumi Ogawa
  • Publication number: 20030104145
    Abstract: The present invention provides a new chemical adsorbent which can form an extremely thin and transparent film in nanometer order which is fixed uniformly and firmly on a substrate, and give an alignment characteristic of high thermal stability to the thin film; as well as a liquid crystal alignment layer and a liquid crystal display device having a desirable alignment characteristic, a superior alignment control force over a liquid crystal molecule, and a superior thermal stability by using the above-mentioned chemical adsorbent. This purpose can be actualized by developing a new compound which is transparent and stable in a range of a visible ray (a wavelength from 400 nm to 700 nm), and has a photosensitivity in a range of an ultraviolet ray and a far-ultraviolet ray (a wavelength from 200 nm to 400 nm), and can form a thin film in a monolayer through a chemisorption on a substrate.
    Type: Application
    Filed: October 21, 2002
    Publication date: June 5, 2003
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Tadashi Ohtake, Takaiki Nomura
  • Publication number: 20030099845
    Abstract: A conductive organic thin film is made of organic molecules including a terminal bond group that is covalently bonded to a surface of a substrate material (1) or a surface of a primer layer (2) formed on the substrate material, a conjugated bond group, and an alkyl group between the terminal bond group and the conjugated bond group, wherein the organic molecules are oriented, and the conjugated bond group is polymerized with the conjugated bond groups of other molecules, thus forming a conductive network (34). The conductive network (34) is formed of polypyrrole, polythienylene, polyacetylene, polydiacetylene and polyacene. For the polymerization of the conjugated bond groups, polymerization through electrolytic oxidation, catalytic polymerization or polymerization through energy beam irradiation is used.
    Type: Application
    Filed: December 17, 2002
    Publication date: May 29, 2003
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Shinichi Yamamoto
  • Patent number: 6548116
    Abstract: The methods of forming a chemically adsorbed film by contacting a substrate with a solution mixture containing an alkoxysilane surface active agent, a non-aqueous solvent and a silanol-condensing catalyst to form a film covalently bonded to the substrate via siloxane bonds. These methods do not generate hydrochloric acid gas in forming the films and allow practical reaction rates.
    Type: Grant
    Filed: January 29, 2001
    Date of Patent: April 15, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventor: Kazufumi Ogawa
  • Patent number: 6524715
    Abstract: A thin film forming chemical absorption material including at least a functional group of the formula CF3—CF2—CH2—O—(benzene)—CH=CH—C(O)—(benzene)— and a —SiX group (X represents halogen) as an end group bonded by siloxane bond. The chemical absorption material can form a monomolecular thin-film having photosensitive groups that are transparent and stable in a visible light region and cause photochemical reaction in an ultraviolet region. A liquid crystal alignment film includes an aggregation of adsorption molecules chemically absorbed directly on a surface with electrodes or chemically adsorbed indirectly thereon through another material layer having a characteristic group the formula above and a —O—Si bond group at a molecular end group.
    Type: Grant
    Filed: March 1, 2001
    Date of Patent: February 25, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tadashi Ootake, Kazufumi Ogawa, Takaiki Nomura, Takako Takebe
  • Patent number: 6521334
    Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film. The monomolecule film is formed with chemical coupling of chlorosilane surface active compound, for example, of the formula: F(CF2)m(CH2)nSiRqX3−q where m is an integer of from 1 to 15, n is an integer of from 0 to 15 provided that the total of m and n is an integer of from 10 to 30 and R is an alkyl or an alkoxyl group, or F(CF2)m′(CH2)n′A(CH2)pSiRqX3−q where m represents an integer ranging from 1 to 8, n′ represents an integer ranging from 0 to 2, p represents an integer ranging from 5 to 25, q represents an integer ranging from 0 to 2, X represents a halogen atom or an alkoxyl group, R represents an alkyl or an alkoxyl group, and A represents O, a —COO— or —Si(CH3)2—. The transparent substrate such as glass is made hydrophobic and free of contamination.
    Type: Grant
    Filed: May 12, 2000
    Date of Patent: February 18, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Patent number: 6517401
    Abstract: The invention provides methods of forming a monomolecular chemisorption film having an excellent uniformity and liquid crystal alignment performance with a high production efficiency. The monomolecular chemisorption film of the invention can be suitably used for liquid crystal alignment layers.
    Type: Grant
    Filed: May 18, 2000
    Date of Patent: February 11, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Tadashi Ohtake, Takaiki Nomura
  • Patent number: 6503567
    Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film. The monomolecule film is formed with chemical coupling of chlorosilane surface active compound, for example, of the formula: F(CF2)m(CH2)nSiRqX3—q where m is an integer of from 1 to 15, n is an integer of from 0 to 15 provided that the total of m and n is an integer of from 10 to 30 and R is an alkyl or an alkoxyl group, or F(CF2)m′(CH2)n′A(CH2)pSiRqX3−q where m represents an integer ranging from 1 to 8, n′ represents an integer ranging from 0 to 2, p represents an integer ranging from 5 to 25, q represents an integer ranging from 0 to 2, X represents a halogen atom or an alkoxyl group, R represents an alkyl or an alkoxyl group, and A represents —O—, a —COO— or —Si(CH3)2—. The transparent substrate such as glass is made hydrophobic and free of contamination.
    Type: Grant
    Filed: March 13, 2001
    Date of Patent: January 7, 2003
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Publication number: 20030003381
    Abstract: An optical recording film in the form of a monomolecular layer, includes chemisorptive molecules that are chemically bonded by covalent bonding to a surface of a substrate. The optical recording film has the property that, when irradiated with polarized light, a long axis orientation of the chemisorptive molecules is changed to a direction in which the polarized light is irradiated. A reflective film may be formed on the substrate surface. For the chemisorptive molecules it is possible to use CH3—COO—C6H4—(CH2)6—SiCl3, for example. The molecules undergo a dehydrochlorination with active hydrogen in the base material surface, and are chemically bonded to the base material surface by covalent bonding. Thus, an erasable or a write-once optical recording medium of high density can be provided by chemisorption without necessitating vacuum vapor deposition to form the recording layer.
    Type: Application
    Filed: May 22, 2002
    Publication date: January 2, 2003
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventor: Kazufumi Ogawa
  • Patent number: 6495221
    Abstract: The present invention provides a new chemical adsorbent which can form an extremely thin and transparent film in nanometer order which is fixed uniformly and firmly on a substrate, and give an alignment characteristic of high thermal stability to the thin film; as well as a liquid crystal alignment layer and a liquid crystal display device having a desirable alignment characteristic, a superior alignment control force over a liquid crystal molecule, and a superior thermal stability by using the above-mentioned chemical adsorbent. This purpose can be actualized by developing a new compound which is transparent and stable in a range of a visible ray (a wavelength from 400 nm to 700 nm), and has a photosensitivity in a range of an ultraviolet ray and a far-ultraviolet ray (a wavelength from 200 nm to 400 nm), and can form a thin film in a monolayer through a chemisorption on a substrate.
    Type: Grant
    Filed: May 18, 1999
    Date of Patent: December 17, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Tadashi Ohtake, Takaiki Nomura
  • Patent number: 6485785
    Abstract: A compound represented by a general formula (1) ABXn (where A is a carbon-containing group; B is at least one element selected from Si, Ge, Sn, Ti and Zr; X is a hydrolyzable group; and n is 1, 2 or 3), for example, a chlorosilane compound having a fluorocarbon group, is measured in an amount required for one time application, and dropped from a nozzle on a surface of a substrate having an active hydrogen on the surface, and simultaneously it is rubbed with a coater made of a sponge or a nonwoven fabric, etc. Furthermore, it is rubbed with a coater made of a sponge or a nonwoven fabric, etc. while blowing a dry warm air, and an elimination reaction is caused between the active hydrogen on the surface of the substrate and the hydrolyzable group of the compound. Thus, the compound is covalently bonded to the substrate. The molecules of the silane compound also are polymerized with one another to be fixed.
    Type: Grant
    Filed: August 10, 2000
    Date of Patent: November 26, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Norihisa Mino, Mitsuo Ebisawa, Yoshiaki Oono, Kazufumi Ogawa
  • Patent number: 6479837
    Abstract: A bottom-gate type thin-film transistor free from alignment shift of the gate electrode and from damage caused by injection of impurities. The crystal grains of a polycrystalline silicon thin-film are anisotropically grown to form a prescribed angle relative to the gate length direction. The angle between the gate length direction and the longitudinal direction of the grains is adjusted according to use of the liquid crystal display unit. The bottom-gate transistor includes an undercoat insulating layer containing impurities on the substrate. Impurities are diffused from the undercoat layer to the semiconductor layer by laser-annealing the amorphous silicon.
    Type: Grant
    Filed: January 5, 2001
    Date of Patent: November 12, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Kazuyasu Adachi
  • Patent number: 6472297
    Abstract: There is suggested a method for forming a good-quality polysilicon layer having a large area through a low temperature process even if laser annealing is not conducted. An object of the present invention is therefore to provide a poly-Si TFT array substrate exhibiting little display unevenness and having a high exactitude even if it has a large screen. This object can be attained by a method for producing a TFT array substrate for a liquid crystal display device, comprising a process of forming, on a substrate, a poly-Si TFT in which a polysilicon semiconductor layer is used in a channel area, comprising a polysilicon layer forming step of depositing silicon particles excited by adding energy beforehand onto the substrate so that the polysilicon layer is formed at the stage when the silicon particles are deposited on the substrate.
    Type: Grant
    Filed: September 29, 2000
    Date of Patent: October 29, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kazufumi Ogawa, Kazuyasu Adachi
  • Patent number: 6451392
    Abstract: A novel chemical adsorbate compound capable of forming a monomolecular thin film is provided. The chemical adsorbate compound is transparent and stable in the visible light range, and has a photosensitive group which causes a photochemical reaction in the ultraviolet light range. Utilizing the chemical adsorbate compound, a liquid crystal alignment film is also provided. The liquid crystal alignment film has an excellent thermal stability and alignment control performance. Utilizing liquid crystal alignment film, a liquid crystal display device is further provided. The liquid crystal display device achieves wide viewing angles and clear display images at small driving voltages. These are achieved by, as one example, providing a chemical adsorbate compound including a chalcone derivative having a COO group at the 4′ position in the chalcone skeleton and an —SiX3 group, where X is a halogen, at the molecular end adjacent to the COO group.
    Type: Grant
    Filed: July 5, 2000
    Date of Patent: September 17, 2002
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Tadashi Ootake, Kazufumi Ogawa, Takaiki Nomura, Takako Takebe
  • Publication number: 20020127331
    Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film.
    Type: Application
    Filed: April 19, 2002
    Publication date: September 12, 2002
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Publication number: 20020127499
    Abstract: A mold body included in a mold of the invention has a pressing face. A surface treated layer including a compound represented by a general formula, CF3(CZ)nSiXaY3-a, wherein n is an integer of 8 or more; a is 1, 2 or 3; Z are the same or different and selected from the group consisting of a hydrogen atom, a halogen atom, a substituted or non-substituted saturated or unsaturated alkyl group and a substituted or non-substituted aromatic group; X is a halogen atom; and Y is a hydrogen atom or a saturated alkyl group, is formed at least on the pressing face of the mold body.
    Type: Application
    Filed: January 31, 2002
    Publication date: September 12, 2002
    Inventors: Masayuki Endo, Masaru Sasago, Norihisa Mino, Kazufumi Ogawa, Yoshihiko Hirai
  • Publication number: 20020119279
    Abstract: An optical recording film includes a chemisorptive thin film with orienting properties fixed directly or through a primer layer to a substrate surface, and a coating formed on a surface of the chemisorptive thin film. The coating has an initial molecule orientation attained by aligning a group of polymerizable molecules in a predetermined direction on the surface of the chemisorptive thin film, and polymerizing the polymerizable molecules to one another. Regions with changed initial molecule orientation and regions with unchanged initial molecule orientation of the coating are formed when selectively irradiating the coating with light that changes the initial molecule orientation, thus making optical information recording possible. It is also possible to introduce photodegrading functional groups into the coating.
    Type: Application
    Filed: February 25, 2002
    Publication date: August 29, 2002
    Applicant: Matsushita Electric Industrial Co., Ltd.
    Inventor: Kazufumi Ogawa
  • Publication number: 20020094375
    Abstract: At least one monomolecule film is formed on a transparent substrate surface directly or via a protective film.
    Type: Application
    Filed: February 26, 2002
    Publication date: July 18, 2002
    Inventors: Kazufumi Ogawa, Norihisa Mino, Mamoru Soga
  • Publication number: 20020094436
    Abstract: A highly dense chemically adsorbed film is formed by repeating the alternate process of adsorption reaction and washing. Adsorption reaction is directed by contacting the substrate surface, which has or is given an alkali metal or a functional group, with a chemical adsorbent, having halosilyl or alkoxysilyl groups at the end of molecules. An unreacted chemical adsorbent is then washed away from the substrate surface. The alternate treatment of adsorption reaction and washing is repeated, thereby covalently bonding a chemically adsorbed film to the substrate surface.
    Type: Application
    Filed: January 29, 2002
    Publication date: July 18, 2002
    Inventors: Tadashi Ohtake, Norihisa Mino, Kazufumi Ogawa
  • Patent number: 6410152
    Abstract: A highly dense chemically adsorbed film is formed by repeating the alternate process of adsorption reaction and washing. Adsorption reaction is directed by contacting the substrate surface, which has or is given an alkali metal or a functional group, with a chemical adsorbent, having halosilyl or alkoxysilyl groups at the end of molecules. An unreacted chemical adsorbent is then washed away from the substrate surface. The alternate treatment of adsorption reaction and washing is repeated, thereby covalently bonding a chemically adsorbed film to the substrate surface.
    Type: Grant
    Filed: June 28, 2001
    Date of Patent: June 25, 2002
    Assignee: Matsushita Electric Industrial., Co., Ltd.
    Inventors: Tadashi Ohtake, Norihisa Mino, Kazufumi Ogawa