Abstract: The present invention suppresses reductions in inspection precision caused by reflected and scattered light produced by wafer holders. In a wafer holder (10) that has protruding support parts (11) that contact and support a wafer and groove parts (12) that are separated from the wafer, the protruding support parts (11) are extended continuously from a part that supports one edge of the wafer to a part that supports the other edge of the wafer. Connecting parts (13) that connect adjacent protruding support parts (11) are provided in each of the vicinity of the parts supporting the one edge and the vicinity of the parts supporting the other edge.

Abstract: A surface inspection device (1) includes: a stage (10) for supporting a wafer (W); an illumination system (20) for illuminating with ultraviolet light a surface of the wafer (W) supported by the stage (10); a light reception system (30) for forming an image on a predetermined imaging surface with the light from the surface of the wafer (W); a camera unit (34) for capturing an image of the wafer (W) formed on the imaging surface by the light reception system (30); a pixel compensation drive unit (35) for performing pixel compensation; a control unit (40) for controlling the operation of the pixel compensation drive unit (35) and the camera unit (34) so that the camera unit (34) captures images of a plurality of wafers (W) while performing pixel compensation using the pixel compensation drive unit (35); and an image processing unit (45) for generating a synthesized image of the wafer (W) by successively arranging the pixels in the plurality of images captured by the camera unit (34) in the order based on the pi