Abstract: An object of the present invention is to obtain a secondary battery that allows grasping a position of a mixture layer on an electrode and facilitates adjustment of positions of a positive electrode and a negative electrode. A secondary battery (100) of the present invention includes a negative electrode (32) that includes a strip-shaped copper foil (45) having both surfaces, negative electrode mixture layers (32a) on both the surfaces, a negative electrode foil exposed portion (32b), and insulating layers (31). The negative electrode foil exposed portion (32b) where the copper foil (45) is exposed is formed in an end portion on one side in a width direction of the copper foil (45). The insulating layers (31) are disposed on the negative electrode mixture layers (32a) and on the negative electrode foil exposed portion (32b).

Abstract: An object of the present invention is to obtain a secondary battery that allows grasping a position of a mixture layer on an electrode and facilitates adjustment of positions of a positive electrode and a negative electrode. A secondary battery (100) of the present invention includes a negative electrode (32) that includes a strip-shaped copper foil (45) having both surfaces, negative electrode mixture layers (32a) on both the surfaces, a negative electrode foil exposed portion (32b), and insulating layers (31). The negative electrode foil exposed portion (32b) where the copper foil (45) is exposed is formed in an end portion on one side in a width direction of the copper foil (45). The insulating layers (31) are disposed on the negative electrode mixture layers (32a) and on the negative electrode foil exposed portion (32b).

Abstract: There is described a developing apparatus having function to remove scum occurring in a development process from a developer. The developing apparatus comprises a developing tank and the developing tank includes a developer inflow unit, a bubble accumulation unit, a scum removal unit, and a developer evacuation unit. The bubble accumulation unit makes a production speed of bubbles (including scum) included in a developer after development process inflowed from the developer inflow unit larger than a dissipation speed of the bubbles, thereby accumulating the bubbles. The scum removal unit takes in the bubbles including scum accumulated in the accumulation unit when the bubbles pour over the developing tank and removes the scum from the bubbles. The developer evacuation unit evacuates the scum-free developer from the developing tank for using the same in a development process.

Abstract: A glass mask used for patterning includes a plurality of glass plates superposed on one after another and a pattern formation layer formed on at least one of the glass plates. This structure makes it possible to suppress degradation in patterning precision due to warping of a photomask.