Patents by Inventor Kazuhiko Haba

Kazuhiko Haba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240092724
    Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).
    Type: Application
    Filed: October 13, 2023
    Publication date: March 21, 2024
    Applicant: Maruzen Petrochemical Co., Ltd.
    Inventors: Satoshi KAKUTA, Hiromitsu BABA, Teruyo IKEDA, Ryo FUJISAWA, Kazuhiko HABA
  • Patent number: 11919850
    Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).
    Type: Grant
    Filed: February 20, 2019
    Date of Patent: March 5, 2024
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Satoshi Kakuta, Hiromitsu Baba, Teruyo Ikeda, Ryo Fujisawa, Kazuhiko Haba
  • Patent number: 11814351
    Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).
    Type: Grant
    Filed: February 20, 2019
    Date of Patent: November 14, 2023
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Satoshi Kakuta, Hiromitsu Baba, Teruyo Ikeda, Ryo Fujisawa, Kazuhiko Haba
  • Publication number: 20230242467
    Abstract: Provided are a 4-hydroxystyrene solution with high purity and good storage stability that is suitable as a source for producing a 4-hydroxystyrene polymer on a commercial scale, and a method of producing the solution. The method of producing a 4-hydroxystyrene solution of the present invention includes the following steps (i) to (iv): (i) deprotection step for contacting 4-acetoxystyrene with a base in a solvent to produce 4-hydroxystyrene; (ii) neutralization step for adding an acid to the solution containing 4-hydroxystyrene after deprotection to neutralize the solution; (iii) step for washing the solution containing 4-hydroxystyrene after neutralization with water; and (iv) solvent replacement step for adding a solvent that can dissolve 4-hydroxystyrene to the solution containing 4-hydroxystyrene followed by distillation at 40° C. or lower to remove other components than 4-hydroxystyrene and excess solvent.
    Type: Application
    Filed: June 18, 2021
    Publication date: August 3, 2023
    Applicant: MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Yuma HAKODA, Ryo FUJISAWA, Kazuhiko HABA, Daisuke TABATA, Yoshiyuki FURUYA, Ryo SATO, Tomo OIKAWA
  • Publication number: 20200392065
    Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).
    Type: Application
    Filed: February 20, 2019
    Publication date: December 17, 2020
    Applicant: Maruzen Petrochemical Co., Ltd.
    Inventors: Satoshi KAKUTA, Hiromitsu BABA, Teruyo IKEDA, Rto FUJISAWA, Kazuhiko HABA
  • Publication number: 20200392066
    Abstract: Provided is a compound that can be used for a resin for a resist having excellent sensitivity, resolution, and etching resistance, or the like, by a compound represented by the following formula (1): (wherein R1 represents a hydrogen atom or a methyl group, R2 represents an aliphatic hydrocarbon group having 1 to 6 carbon atoms, m represents an integer of 0 to 5, and n represents an integer of 0 to 4).
    Type: Application
    Filed: February 20, 2019
    Publication date: December 17, 2020
    Applicant: Maruzen Petrochrmical Co., Ltd.
    Inventors: Satoshi KAKUTA, Hiromitsu BABA, Teruyo IKEDA, Ryo FUJISAWA, Kazuhiko HABA
  • Patent number: 10766973
    Abstract: Provided is a method for producing a polymer for an electronic material having a low content of metal ion impurities and a polymer for an electronic material obtained by such method. The method for producing a polymer for an electronic material according to the present invention comprises a polymerization step of obtaining a polymer by polymerizing a monomer(s) and a purification step of adding a strong acid having 0 or less pKa to the polymer solution and subsequently performing an ion exchange treatment to reduce the concentration of the metal ion impurities.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: September 8, 2020
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Tomohiro Masukawa, Ryo Fujisawa, Kazuhiko Haba, Satoshi Kakuta
  • Publication number: 20180134819
    Abstract: Provided is a method for producing a polymer for an electronic material having a low content of metal ion impurities and a polymer for an electronic material obtained by such method. The method for producing a polymer for an electronic material according to the present invention comprises a polymerization step of obtaining a polymer by polymerizing a monomer(s) and a purification step of adding a strong acid having 0 or less pKa to the polymer solution and subsequently performing an ion exchange treatment to reduce the concentration of the metal ion impurities.
    Type: Application
    Filed: April 15, 2016
    Publication date: May 17, 2018
    Applicant: MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Tomohiro MASUKAWA, Ryo FUJISAWA, Kazuhiko HABA, Satoshi KAKUTA
  • Patent number: 8492483
    Abstract: To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.
    Type: Grant
    Filed: June 19, 2008
    Date of Patent: July 23, 2013
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Norihiro Yoshida, Hijiri Aoki, Takahito Mita, Ami Yamaguchi, Kazuhiko Haba, Goro Sawada
  • Publication number: 20100286351
    Abstract: To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.
    Type: Application
    Filed: June 19, 2008
    Publication date: November 11, 2010
    Applicant: MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Norihiro Yoshida, Hijiri Aoki, Takahito Mita, Ami Yamaguchi, Kazuhiko Haba, Goro Sawada
  • Patent number: 6911563
    Abstract: A method for carrying out a reaction of one substance capable of being activated by a catalyst with another substance capable of reacting with said one substance activated, characterized in that the substance capable of being activated is activated by passing the substance through a diaphragm type catalyst and the reaction is thus performed in one reaction step; a method for producing an aromatic alcohol utilizing the above method; and a reaction apparatus suitable for these reactions. In the method, one substance is activated by passing through a diaphragm type catalyst and an objective reaction is carried out by using the activated substance, and the reaction can be performed in one reaction step and with safety. Moreover, the contact of the above activated substance with a compound to be reacted therewith can be freely controlled, and therefore, over-reaction can be prevented and an objective product can be produced in high yield.
    Type: Grant
    Filed: December 27, 2001
    Date of Patent: June 28, 2005
    Assignees: National Institute of Advanced Industrial Science, NOK Corporation
    Inventors: Fujio Mizukami, Shuichi Niwa, Makoto Toba, Naotsugu Itoh, Tomonari Saito, Takemi Nanba, Hiroshi Shoji, Kazuhiko Haba
  • Publication number: 20040110995
    Abstract: A method for carrying out a reaction of one substance capable of being activated by a catalyst with another substance capable of reacting with said one substance activated, characterized in that the substance capable of being activated is activated by passing the substance through a diaphragm type catalyst and the reaction is thus performed in one reaction step; a method for producing an aromatic alcohol utilizing the above method; and a reaction apparatus suitable for these reactions. In the method, one substance is activated by passing through a diaphragm type catalyst and an objective reaction is carried out by using the activated substance, and the reaction can be performed in one reaction step and with safety. Moreover, the contact of the above activated substance with a compound to be reacted therewith can be freely controlled, and therefore, over-reaction can be prevented and an objective product can be produced in high yield.
    Type: Application
    Filed: December 10, 2003
    Publication date: June 10, 2004
    Inventors: Fujio Mizukami, Shuichi Niwa, Makoto Toba, Naotsugu Itoh, Tomonari Saito, Takemi Nanba, Hiroshi Shoji, Kazuhiko Haba
  • Patent number: 6605733
    Abstract: Provided are a titanium-containing solid catalyst useful for producing an epoxy compound from an olefin compound and a peroxide, and a process for producing an epoxy compound using said catalyst. The titanium-containing solid catalyst is obtainable by calcination of a titanium alkynyl alkoxide supported on a silica gel.
    Type: Grant
    Filed: December 28, 2001
    Date of Patent: August 12, 2003
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Hideki Omori, Hiroko Ahara, Kazuhiko Haba, Yoshiaki Takaya, Shin Irie
  • Patent number: 6479707
    Abstract: The present invention provides a process for producing 2-butanone and 2-butanol under comparatively mild conditions with a decreased number of steps by direct oxidization of a hydrocarbon, which is cheaper than butenes, as a raw material using molecular oxygen such as air. The process for producing 2-butanone and 2-butanol comprises directly oxidizing n-butane using molecular oxygen in the presence of aluminum phosphate containing transition metal atoms and a selectivity-improving agent, as required.
    Type: Grant
    Filed: December 12, 2001
    Date of Patent: November 12, 2002
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Hideki Omori, Kazuhiko Haba
  • Publication number: 20020137956
    Abstract: Provided are a titanium-containing solid catalyst useful for producing an epoxy compound from an olefin compound and a peroxide, and a process for producing an epoxy compound using said catalyst.
    Type: Application
    Filed: December 28, 2001
    Publication date: September 26, 2002
    Applicant: MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Hideki Omori, Hiroko Ahara, Kazuhiko Haba, Yoshiaki Takaya, Shin Irie
  • Publication number: 20020123654
    Abstract: The present invention provides a process for producing 2-butanone and 2-butanol under comparatively mild conditions with a decreased number of steps by direct oxidization of a hydrocarbon, which is cheaper than butenes, as a raw material using molecular oxygen such as air. The process for producing 2-butanone and 2-butanol comprises directly oxidizing n-butane using molecular oxygen in the presence of aluminum phosphate containing transition metal atoms and a selectivity-improving agent, as required.
    Type: Application
    Filed: December 12, 2001
    Publication date: September 5, 2002
    Applicant: MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Hideki Omori, Kazuhiko Haba