Abstract: An LPP EUV light source includes a vacuum chamber 12 that is maintained in a vacuum environment; a gas jet device 14 that forms a hypersonic steady gas jet 1 of the target substance inside the vacuum chamber so as to be collected; and a laser device 16 that collects and radiates a laser beam 3 to the hypersonic steady gas jet, wherein plasma is produced by exciting the target substance at the light collecting point 2 of the laser beam and EUV light 4 is emitted therefrom.

Abstract: A plasma light source includes a pair of coaxial electrodes 10 facing each other, a radiation environment sustaining device 20 that supplies a plasma medium into the insides of the coaxial electrodes and holds the coaxial electrodes at a temperature and a pressure suitable for plasma generation, and a voltage application device 30 that applies a discharge voltage of an inverted polarity to each of the coaxial electrodes. Tubular discharge 4 is formed between the pair of coaxial electrodes and plasma 3 is confined in an axial direction of the coaxial electrodes.

Abstract: An LPP EUV light source includes a vacuum chamber 12 that is maintained in a vacuum environment; a gas jet device 14 that forms a hypersonic steady gas jet 1 of the target substance inside the vacuum chamber so as to be collected; and a laser device 16 that collects and radiates a laser beam 3 to the hypersonic steady gas jet, wherein plasma is produced by exciting the target substance at the light collecting point 2 of the laser beam and EUV light 4 is emitted therefrom.

Abstract: A plasma light source includes a pair of coaxial electrodes 10 facing each other, a radiation environment sustaining device 20 that supplies a plasma medium into the insides of the coaxial electrodes and holds the coaxial electrodes at a temperature and a pressure suitable for plasma generation, and a voltage application device 30 that applies a discharge voltage of an inverted polarity to each of the coaxial electrodes. Tubular discharge 4 is formed between the pair of coaxial electrodes and plasma 3 is confined in an axial direction of the coaxial electrodes.

Abstract: High temperature plasma raw material is added drop-wise, for example, and evaporated by irradiation with a laser beam. The laser beam passes through a discharge area between a pair of electrodes and irradiates the high temperature plasma raw material. Pulsed power is applied to the space between the electrodes in such a way that discharge current reaches a specified threshold value at a time when at least part of the evaporated material reaches the discharge channel. As a result, discharge starts between the electrodes, plasma is heated and excited and then EUV radiation is generated. The EUV radiation thus generated passes through a foil trap, is collected by EUV radiation collector optics and then extracted. The irradiation of the laser beam allows setting of the space density of the high temperature plasma raw material to a specified distribution and defining of the position of a discharge channel.

Abstract: A plasma generation apparatus for generating a plasma within a discharge chamber is disclosed, which includes a plurality of electrodes disposed within the discharge chamber, a power supply device operative to flow a discharge current between electrodes for performing self-heating of a plasma between the electrodes and for applying a self-magnetic field to the plasma, and a control unit for control of the power supply device, wherein the control unit controls the power supply device in such a way as to confine the plasma in a space, thereby improving the conversion efficiency of extreme ultraviolet (EUV) light. A plasma generation method is also disclosed.

Abstract: To achieve pulse-stretched EUV radiation without putting a large heat load on electrodes or requiring sophisticated control, a pulsed power is supplied between a first electrode and a second electrode provided inside a chamber to form a narrow discharge channel therebetween. A laser beam from a laser source irradiates high temperature plasma material to form low temperature plasma gas having an ion density of approximately 1017 to 1020 cm?3 which is supplied to a narrow discharge channel formed between the electrodes. Electric discharge acts on the low temperature plasma gas to raise the electron temperature, resulting in high temperature plasma. As a result, EUV radiation is produced. Since the low temperature plasma gas is continuously supplied to the discharge channel, the pinch effect or confining effect of its self-magnetic field is repeated, resulting in the continuation of EUV radiation.

Abstract: High temperature plasma raw material (21) is gasified by irradiation with a first energy beam (23). When the gasified raw material reaches the discharge region, pulsed power is applied between the electrodes (11, 12) and a second energy beam (24) irradiates. In this manner, the plasma is heated and excited and an EUV emission occurs. The emitted EUV emission is collected and extracted by EUV collector optics. Because of irradiation by the first and second energy beams (23, 24), a special distribution of high temperature plasma raw material density can be set to a specified distribution and demarcation of the position of the discharge channel can be set. Moreover, it is possible to lengthen pulses of extreme ultraviolet emission by supplying raw material gas of which the ion density in the discharge path is nearly the same as the ion density under EUV radiation emission conditions.