Abstract: The catadioptric system includes a first optical imaging system (catadioptric part) causing a light flux from an object to form an intermediate image and a second optical imaging system (dioptric part) causing the light flux from the intermediate image to form an image. In the first optical imaging system, the light flux sequentially passes a first transmissive portion, a second reflective portion, a first reflective portion and a second transmissive portion. In the second optical imaging system, consecutive four lens surfaces among plural lens surfaces placed between an aperture stop and an image surface have a negative combined refractive power, and a condition of ?0.52<?4n—max·Ymax<?0.14 is satisfied, ?4n—max represents a maximum value of the negative combined refractive power, and Ymax represents a maximum object height in a field-of-view of the catadioptric system at the object.

Abstract: A catadioptric system includes: a catadioptric unit configured to form an intermediate image of an object; a refracting portion configured to form an image of the intermediate image; a first field lens configured to guide optical flux from the catadioptric unit to the refracting portion; and a second field lens configured to guide the optical flux from the refracting portion toward an image side. The first and the second field lenses each include a positive lens and a negative lens adjacent to each other, and wherein where ?IFLp1 and ?IFLn1 are respectively Abbe numbers of materials of the positive lens and the negative lens of the first field lens, and ?FLp1 and ?FLn1 are respectively Abbe numbers of materials of the positive lens and the negative lens of the second field lens, conditions 20<?IFLp1??IFLn1 and 20<?FLp1??FLn1 are satisfied.

Abstract: A microscope includes an objective optical system including an imaging optical system configured to form an image of an object, a re-imaging optical system configured to re-form an image of the object image formed by the imaging optical system, and a reflection unit arranged on an optical path between the imaging optical system and the re-imaging optical system and configured to be locally changeable in at least one of a position thereof in an optical axis direction and an inclination thereof relative to an optical axis, and an image sensor configured to capture the image re-formed by the objective optical system.

Abstract: An image pickup apparatus includes a measuring section configured to measure a surface shape of an object, an image pickup section configured to obtain images of different areas of the object on an image plane of an image pickup optical system by image pickup elements, a focal-position detecting unit configured to detect a focal position of the object where a focal-position detecting point is focused on the image plane, and a focal-position determining unit configured to determine a focal position of the object at a point different from the focal-position detecting point on the basis of detection of the focal-position detecting unit and measurement of the measuring section. The image pickup section takes the images of the different areas on the basis of determination of the focal-position determining unit while the images are focused on the image pickup elements.

Abstract: An image acquisition apparatus includes an imaging optical system configured to image an object, a reimaging optical system configured to reimage the object imaged by the imaging optical system, a reflecting member disposed in an optical path between the imaging optical system and the reimaging optical system, an image sensor configured to capture an image of the object reimaged by the reimaging optical system, and to output the image, a first driving unit configured to change a tilt of the reflecting member relative to an optical axis of the imaging optical system, and a correction unit configured to correct a positional deviation of the image in a rotational direction, wherein the positional deviation of the image is generated according to a change in the tilt of the reflecting member.

Abstract: A catadioptric unit includes, in order from an object side to an image side, a first optical element including a first transmissive unit having positive refractive power disposed in the vicinity of an optical axis and, on the object side thereof, a first reflective unit disposed at an outer circumference relative to the first transmissive unit and having a reflective surface; and a second optical element including a second transmissive unit having negative refractive power in the vicinity of the optical axis and, on the image side thereof, a second reflective unit disposed at an outer circumference relative to the second transmissive unit and having a reflective surface. Radii of curvature of object-side and image-side surfaces of the second optical element, a thickness along the optical axis and a refractive index of a material of the second optical element are set to satisfy predetermined conditions.

Abstract: The catadioptric system includes a first optical imaging system (catadioptric part) causing a light flux from an object to form an intermediate image and a second optical imaging system (dioptric part) causing the light flux from the intermediate image to form an image. In the first optical imaging system, the light flux sequentially passes a first transmissive portion, a second reflective portion, a first reflective portion and a second transmissive portion. In the second optical imaging system, consecutive four lens surfaces among plural lens surfaces placed between an aperture stop and an image surface have a negative combined refractive power, and a condition of ?0.52<?4n—max·Ymax<?0.14 is satisfied, ?4n—max represents a maximum value of the negative combined refractive power, and Ymax represents a maximum object height in a field-of-view of the catadioptric system at the object.

Abstract: A catadioptric optical system of the present invention includes a catadioptric unit configured to condense light fluxes from an object and to form an intermediate image of the object, a field lens disposed at a position where the intermediate image are formed, and a dioptric unit configured to form the intermediate image on an image surface, and when ?cat denotes a smallest Abbe number in Abbe numbers of materials of the first and second optical elements configuring the catadioptric unit and ?dio denotes a smallest Abbe number in Abbe numbers of materials of a plurality of dioptric optical elements configuring the dioptric unit, ?dio<?cat is satisfied.

Abstract: An illumination optical system includes first and second reflection integrators. The second reflection integrator forms a plurality of linear light sources using light from the first reflection integrator. The illumination optical system further includes a pair of flat plane mirrors that are arranged parallel to the meridional line direction on the second reflection integrator and opposite to each other so as to sandwich the plurality of linear light sources in between, a unit for changing an aperture shape of an aperture stop arranged at an exit side of the second reflection integrator in a direction perpendicular to the meridional line direction so that the aperture stop has an optical Fourier transformation relationship with the surface to be illuminated, and an adjustment unit configured to adjust an interval between the pair of flat plane mirrors as the aperture shape of the aperture stop is changed.

Abstract: An illumination optical system includes a pair of fly-eye mirrors configured to receive light from a light source, a first condenser configured to condense light from the pair of fly-eye mirrors, a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions, an aperture stop arranged perpendicular to the generating line direction, and a second condenser configured to superpose on an illuminated surface luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator.

Abstract: An exposure apparatus includes a first optical unit configured to condense light from a light source, a catoptric integrator configured to form plural secondary light sources using light from the first optical unit, the catoptric integrator including plural cylindrical reflection surfaces having the same generatrix direction, an aperture stop arranged perpendicular to the generatrix direction, and a second optical unit configured to superpose light from each secondary light source onto an illumination surface, wherein the catoptric integrator includes plural integrator parts each having plural cylindrical reflection surfaces, and the plural integrator parts are arranged in a direction perpendicular to the generatrix direction and to an arrangement direction of the cylindrical reflection surfaces and located at an incident side of the aperture stop.

Abstract: An illumination optical system includes first and second reflection integrators. The second reflection integrator forms a plurality of linear light sources using light from the first reflection integrator. The illumination optical system further includes a pair of flat plane mirrors that are arranged parallel to the meridional line direction on the second reflection integrator and opposite to each other so as to sandwich the plurality of linear light sources in between, a unit for changing an aperture shape of an aperture stop arranged at an exit side of the second reflection integrator in a direction perpendicular to the meridional line direction so that the aperture stop has an optical Fourier transformation relationship with the surface to be illuminated, and an adjustment unit configured to adjust an interval between the pair of flat plane mirrors as the aperture shape of the aperture stop is changed.

Abstract: An illumination optical system includes a pair of fly-eye mirrors configured to receive light from a light source, a first condenser configured to condense light from the pair of fly-eye mirrors, a reflection type integrator configured to receive light from the first condenser, the reflection type integrator including a plurality of cylindrical reflective surfaces having parallel generating line directions, an aperture stop arranged perpendicular to the generating line direction, and a second condenser configured to superpose on an illuminated surface luminous fluxes from a plurality of cylindrical reflective surfaces of the reflection type integrator.

Abstract: An illumination optical system includes a first optical unit that collects light emitted from a light source; a reflective integrator that has a plurality of cylindrical reflection surfaces, whose generating lines are oriented in a uniform direction, and forms a plurality of linear light sources by using the light emitted from the first optical unit; a pair of flat mirrors that are disposed parallel to the generating lines so as to face each other with the plurality of linear light sources residing therebetween; an aperture stop that is disposed perpendicular to the generating lines and has an opening for allowing the light emitted from the plurality of linear light sources to pass therethrough; and a second optical unit that integrates beams of the light emitted from the plurality of linear light sources that have passed through the opening one on top of another in an illumination target plane.

Abstract: An illumination optical system includes a first optical unit that collects light emitted from a light source; a reflective integrator that has a plurality of cylindrical reflection surfaces, whose generating lines are oriented in a uniform direction, and forms a plurality of linear light sources by using the light emitted from the first optical unit; a pair of flat mirrors that are disposed parallel to the generating lines so as to face each other with the plurality of linear light sources residing therebetween; an aperture stop that is disposed perpendicular to the generating lines and has an opening for allowing the light emitted from the plurality of linear light sources to pass therethrough; and a second optical unit that integrates beams of the light emitted from the plurality of linear light sources that have passed through the opening one on top of another in an illumination target plane.

Abstract: An exposure apparatus includes a first optical unit configured to condense light from a light source, a catoptric integrator configured to form plural secondary light sources using light from the first optical unit, the catoptric integrator including plural cylindrical reflection surfaces having the same generatrix direction, an aperture stop arranged perpendicular to the generatrix direction, and a second optical unit configured to superpose light from each secondary light source onto an illumination surface, wherein the catoptric integrator includes plural integrator parts each having plural cylindrical reflection surfaces, and the plural integrator parts are arranged in a direction perpendicular to the generatrix direction and to an arrangement direction of the cylindrical reflection surfaces and located at an incident side of the aperture stop.

Abstract: A semiconductor memory which includes a plurality of memory cells each having first and second capacitors connected in series and a field-effect transistor whose source or drain is connected to a node between the first and second capacitors. The memory cells are arranged at intersections of bit lines and word lines thereby forming a matrix. The first capacitor of each memory cell is a ferroelectric capacitor using a ferroelectric material as an insulating film. A plate electrode of the first capacitor of each memory cell is held at a first potential when the memory is operated in a first mode and the plate electrode of the first capacitor is held at a second potential when the memory is operated in a second mode. The first potential is different from the second potential.