Abstract: There is disclosed an improved semiconductor memory device having a regular memory cell array and a spare memory cell array. Each spare memory cell constituting the spare memory cell array includes a first transistor selected by a read word line, whose drain is connected to a spare bit line and source is connected via a fuse to a power supply, and a second transistor connected between the interconnection between the first transistor and fuse and a ground. The fuse is selectively blown by flowing a blowing current through the fuse by selecting the second transistor through a write line to thereby disconnect a discharge current path of the spare bit line. The threshold voltage of the second transistor of the spare memory cell which is made conductive upon selection by the write line when the blowing current flows through the fuse is higher than a potential difference between a potential generated at the write line connected with another spare memory cell and a ground potential.

Abstract: In an electrically programmable ROM, each cell 13 includes a series-connected element composed of a combination writing and reading transistor 17 and a fuse 15. One end of this series-connected element is connected to a corresponding bit line 19, and the other end thereof is grounded. A gate of the transistor 17 of the series-connected element is connected to a corresponding word line 23. Each bit line 19 is connected to a high-voltage applying pad 21 via an element such as diode or transistor provided with electrically connecting/isolating functions. When a data is written in the memory cell 13, the high-voltage applying pad 21 is electrically connected to the bit line 19. Under these conditions, if a high voltage is applied to the high-voltage applying pad 21, the transistor 17 performs snap-back action (i.e. secondary breakdown) to blow out the fuse 15. When the data is read, the high-voltage applying pad 21 is isolated from the bit line 19 without exerting influence upon the read out operation.