Abstract: An antenna device (60) is provided that is used in a recorder and/or writer destined for writing and reading data to and from a contactless IC card (1). The antenna device (60) includes a loop coil (61) that radiates a magnetic field, magnetically couples with a loop coil (4) provided in the IC card (1), and sends and receives data to and from the IC card (1). The loop coil (61) is formed asymmetric for the winding sections thereof opposite to each other across the center of the loop coil (61) to be different in interval from each other.

Abstract: An antenna device (60) is provided that is used in a recorder and/or writer destined for writing and reading data to and from a contactless IC card (1). The antenna device (60) includes a loop coil (61) that radiates a magnetic field, magnetically couples with a loop coil (4) provided in the IC card (1), and sends and receives data to and from the IC card (1). The loop coil (61) is formed asymmetric for the winding sections thereof opposite to each other across the center of the loop coil (61) to be different in interval from each other.

Abstract: There is disclosed an alignment method comprising the steps of irradiating an alignment light toward an alignment mark whose surface has a high reflectance, the alignment mark being coated by a resist film, and performing alignment on the basis of the resultant intensity of reflected light from the surface of the resist and reflected light from an interface between the resist and the mark portion. The resist comprises a chemical material having a light absorption characteristic in a wavelength band of the alignment light, and is irrespective of that of an exposure light used to expose the resist.

Abstract: A method for patterning a photo resist film including the steps of coating a photo resist onto a semiconductor substrate exposing the photo resist coated and thereafter developing it, to thereby form a pattern on the photo resist film, wherein after exposure the semiconductor substrate on which the photo resist is coated is left in an atmosphere of a higher relative humidity than that at which the patterning exposure has been conducted for a time period until development.