Patents by Inventor Kazuhiro Enomoto
Kazuhiro Enomoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20080003924Abstract: A polishing slurry including an oxidant, a metal oxide dissolver, a metal inhibitor and water and having a pH from 2 to 5. The metal oxide dissolver contains one or more compounds selected from one or more acids (A-group) selected from acids of which the negative value of the logarithm of the dissociation constant Ka (pKa) of a first dissociable acid group is less than 3.7 and from which five acids of lactic acid, phthalic acid, fumaric acid, maleic acid and aminoacetic acid are excluded, ammonium salts of the A-group and esters of the A-group, and one or more compounds selected from one or more acids (B-group) selected from acids of which the negative value of the logarithm of the dissociation constant Ka (pKa) of a first dissociable acid group is 3.7 or more and the five acids, ammonium salts of the B-group and esters of the B-group.Type: ApplicationFiled: June 6, 2007Publication date: January 3, 2008Applicant: HITACHI CHEMICAL CO., LTD.Inventors: Yasushi Kurata, Katsuyuki Masuda, Hiroshi Ono, Yasuo Kamigata, Kazuhiro Enomoto
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Publication number: 20070295934Abstract: A polishing slurry including an oxidant, a metal oxide dissolver, a metal inhibitor and water and having a pH from 2 to 5. The metal oxide dissolver contains one or more compounds selected from one or more acids (A-group) selected from acids of which the negative value of the logarithm of the dissociation constant Ka (pKa) of a first dissociable acid group is less than 3.7 and from which five acids of lactic acid, phthalic acid, fumaric acid, maleic acid and aminoacetic acid are excluded, ammonium salts of the A-group and esters of the A-group, and one or more compounds selected from one or more acids (B-group) selected from acids of which the negative value of the logarithm of the dissociation constant Ka (pKa) of a first dissociable acid group is 3.7 or more and the five acids, ammonium salts of the B-group and esters of the B-group.Type: ApplicationFiled: June 6, 2007Publication date: December 27, 2007Applicant: HITACHI CHEMICAL CO., LTD.Inventors: Yasushi Kurata, Katsuyuki Masuda, Hiroshi Ono, Yasuo Kamigata, Kazuhiro Enomoto
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Patent number: 7311855Abstract: The present invention is directed to a CMP polishing slurry comprising cerium oxide particles, an organic compound having an acetylene bond (triple bond between carbon and carbon) and water, and a method for polishing a substrate which comprises a step of polishing a film to be polished of the substrate with the polishing slurry. In a CMP (chemical mechanical polishing) technique for flattening inter layer dielectrics, insulating films for shallow trench isolation and the like in a manufacturing process of semiconductor devices, the present invention enables the effective and high-speed polishing.Type: GrantFiled: August 6, 2003Date of Patent: December 25, 2007Assignee: Hitachi Chemical Co., Ltd.Inventors: Kouji Haga, Yuto Ootsuki, Yasushi Kurata, Kazuhiro Enomoto
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Publication number: 20070218811Abstract: A CMP polishing slurry of the present invention, contains cerium oxide particles, a dispersant, a polycarboxylic acid, a strong acid having a pKa of its first dissociable acidic group at 3.2 or less, and water, the pH of the polishing slurry is 4.0 or more and 7.5 or less, wherein the strong acid is contained 100 to 1,000 ppm or 50 to 1,000 ppm, or the strong acid is a monovalent strong acid contained 50 to 500 ppm or is a bivalent strong acid contained 100 to 1,000 ppm. The preferable polycarboxylic acid is a polyacrylic acid. The present invention allows polishing in the CMP methods of surface-smoothening an interlayer dielectric film, a BPSG film and a shallow-trench-isolation insulation film with high speed operation efficiently and easier process management and cause smaller fluctuation in film thickness due to difference in pattern density.Type: ApplicationFiled: September 25, 2005Publication date: September 20, 2007Applicant: HITACHI CHEMICAL CO., LTD.Inventors: Yasushi Kurata, Kazuhiro Enomoto, Naoyuki Koyama, Masato Fukasawa
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Publication number: 20070175104Abstract: The polishing slurry of the invention is a polishing slurry for polishing a silicon oxide film on polysilicon, which contains an abrasive, polysilicon polishing inhibitor, and water. As the polishing inhibitor, it is preferable to use (1) a water-soluble polymer having a N-monosubstituted or N,N-disubstituted skeleton substituted by any member selected from the group consisting of acrylamide, methacrylamide, and ?-substituted derivatives thereof, (2) polyethylene glycol, (3) an oxyethylene adduct of an acetylene-based diol, (4) a water-soluble organic compound having an acetylene bond, (5) an alkoxylated linear aliphatic alcohol, or (6) a copolymer containing polyvinyl pyrrolidone or vinyl pyrrolidone. There is provided a polishing method which is capable of polishing a silicon oxide film on a polysilicon film at a high speed, and inhibiting the progress of polishing of a polysilicon film in exposed parts in the manufacturing method for a semiconductor.Type: ApplicationFiled: November 9, 2006Publication date: August 2, 2007Applicant: HITACHI CHEMICAL CO., LTD.Inventors: Masaya Nishiyama, Kazuhiro Enomoto, Masato Fukasawa, Toshiaki Akutsu, Yuuto Otsuki, Toranosuke Ashizawa
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CERIUM OXIDE SLURRY, CERIUM OXIDE POLISHING SLURRY AND METHOD FOR POLISHING SUBSTRATE USING THE SAME
Publication number: 20070093183Abstract: The present invention provides a cerium oxide slurry, a cerium oxide polishing slurry, and a method of polishing a substrate by using the same, wherein decrease of scratches and polish at high speed can be realized by reducing the content of coarse grains by improving in the disperse state of cerium oxide particles. The invention relates to a cerium oxide slurry containing cerium oxide particles, dispersant and water, in which the ratio of weight of cerium oxide/weight of dispersant is in a range of 20 to 80 and relates a cerium oxide polishing slurry comprising the cerium oxide slurry and additives such as a water-soluble polymer.Type: ApplicationFiled: October 19, 2006Publication date: April 26, 2007Applicant: HITACHI CHEMICAL CO., LTD.Inventors: Shigeru Yoshikawa, Kazuhiro Enomoto -
Publication number: 20060199021Abstract: The present invention provides a composition comprising (a) a thermally decomposable polymer and (b) a siloxane oligomer evenly dissolved in (c) an organic solvent; a composition comprising (a) a thermally decomposable polymer, (b) a siloxane oligomer, and (c) an organic solvent in which both of the ingredients (a) and (b) are soluble; a method for forming a low-permittivity film characterized by applying the composition to a substrate to form a composite film comprising the thermally decomposable polymer and the siloxane oligomer evenly compatibilized therewith and then heating the resulting film to condense the siloxane oligomer and remove the thermally decomposable polymer; a method for forming a low-permittivity film characterized by applying the composition to a substrate to form a composite film comprising the thermally decomposable polymer and the siloxane oligomer evenly compatibilized therewith, subsequently conducting a first heating step in which the siloxane oligomer is crosslinked while keeping tType: ApplicationFiled: May 10, 2006Publication date: September 7, 2006Inventors: Takenori Narita, Hiroyuki Morisima, Shigeru Nobe, Kazuhiro Enomoto, Haruaki Sakurai, Nobuko Terada
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Patent number: 7102264Abstract: A synchronous induction motor features improved assemblability of a rotor, significantly reduced production cost, and improved operation performance of the motor. A plurality of die-cast secondary conductors is provided around a rotor yoke constituting the rotor of the synchronous induction motor. End rings are die-cast integrally with the secondary conductors on the peripheral portions of both end surfaces of the rotor yoke. Permanent magnets are inserted into slots formed such that they penetrate the rotor yoke. The openings of both ends of the slots are closed by a pair of end surface members formed of a non-magnetic constituent. One of the end surface members is secured to the rotor yoke by one of the end rings when the secondary conductors and the end rings are formed. The other end surface member is secured to the rotor yoke by a fixture.Type: GrantFiled: July 29, 2004Date of Patent: September 5, 2006Assignee: Sanyo Electric Co., Ltd.Inventors: Toshihito Yanashima, Keijiro Igarashi, Masaaki Takezawa, Kazuhiko Arai, Eiichi Murata, Noboru Onodera, Shigemi Koiso, Kazuhiro Enomoto, Yoshitomo Nakayama
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Publication number: 20060148667Abstract: The present invention relates to a CMP polishing slurry, comprising cerium oxide particles, a dispersing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a compound having a skeleton of any one of an N-mono-substituted product and an N,N-di-substituted product of any one selected from the group consisting of acrylamide, methacrylamide and ?-substituted products thereof. The amount of the water-soluble polymer is preferably in the range of 0.01 part or more by weight and 10 parts or less by weight for 100 parts by weight of the polishing slurry. Thus it is possible to provide a polishing slurry and a polishing method which make it possible to polish a film made of silicon oxide or the like effectively and rapidly and further control the process therefor easily in CMP technique for flattening an interlayer insulating film, a BPSG film, an insulator film for shallow trench isolation, and other films.Type: ApplicationFiled: January 30, 2004Publication date: July 6, 2006Applicant: Hitachi Chemical Co., Ltd.Inventors: Masato Fukasawa, Masato Yoshida, Naoyuki Koyama, Yuto Ootsuki, Chiaki Yamagishi, Kazuhiro Enomoto, Kouji Haga, Yasushi Kurata
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Publication number: 20060124591Abstract: The present invention is directed to a CMP polishing slurry comprising cerium oxide particles, an organic compound having an acetylene bond (triple bond between carbon and carbon) and water, and a method for polishing a substrate which comprises a step of polishing a film to be polished of the substrate with the polishing slurry. In a CMP (chemical mechanical polishing) technique for flattening inter layer dielectrics, insulating films for shallow trench isolation and the like in a manufacturing process of semiconductor devices, the present invention enables the effective and high-speed polishing.Type: ApplicationFiled: August 6, 2003Publication date: June 15, 2006Inventors: Kouji Haga, Yuto Ootsuki, Yasushi Kurata, Kazuhiro Enomoto
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Publication number: 20060052566Abstract: The composition for forming silica based coating of the invention comprises siloxane resin such as an alkoxysilane as component (a), a solvent such as an alcohol capable of dissolving the siloxane resin as component (b), an ammonium salt, etc. as component (c) and a thermal decomposing/volatile compound as component (d), wherein the stress of the coating obtained by heat treatment at 150° C./3 min is 10 MPa and the specific permittivity of the silica based coating obtained by final curing is less than 3.0. The composition for forming silica based coating according to the invention can form a silica based coating having low permittivity, excellent adhesion and sufficient mechanical strength.Type: ApplicationFiled: August 19, 2005Publication date: March 9, 2006Applicant: HITACHI CHEMICAL CO., LTD.Inventors: Haruaki Sakurai, Koichi Abe, Kazuhiro Enomoto, Shigeru Nobe
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Publication number: 20050253474Abstract: A synchronous induction motor features improved assemblability of a rotor, significantly reduced production cost, and improved operation performance of the motor. A plurality of die-cast secondary conductors is provided around a rotor yoke constituting the rotor of the synchronous induction motor. End rings are die-cast integrally with the secondary conductors on the peripheral portions of both end surfaces of the rotor yoke. Permanent magnets are inserted into slots formed such that they penetrate the rotor yoke. The openings of both ends of the slots are closed by a pair of end surface members formed of a non-magnetic constituent. One of the end surface members is secured to the rotor yoke by one of the end rings when the secondary conductors and the end rings are formed. The other end surface member is secured to the rotor yoke by a fixture.Type: ApplicationFiled: July 29, 2004Publication date: November 17, 2005Inventors: Toshihito Yanashima, Keijiro Igarashi, Masaaki Takezawa, Kazuhiko Arai, Eiichi Murata, Noboru Onodera, Shigemi Koiso, Kazuhiro Enomoto, Yoshitomo Nakayama
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Publication number: 20050255326Abstract: The composition for forming silica based coating of the invention comprises siloxane resin such as an alkoxysilane as component (a), a solvent such as an alcohol capable of dissolving the siloxane resin as component (b), an ammonium salt, etc. as component (c) and a thermal decomposing/volatile compound as component (d), wherein the stress of the coating obtained by heat treatment at 150° C./3 min is 10 MPa and the specific permittivity of the silica based coating obtained by final curing is less than 3.0. The composition for forming silica based coating according to the invention can form a silica based coating having low permittivity, excellent adhesion and sufficient mechanical strength.Type: ApplicationFiled: January 24, 2005Publication date: November 17, 2005Applicant: HITACHI CHEMICAL CO., LTD.Inventors: Haruaki Sakurai, Koichi Abe, Kazuhiro Enomoto, Shigeru Nobe
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Publication number: 20050181609Abstract: A polishing slurry including an oxidant, a metal oxide dissolver, a metal inhibitor and water and having a pH from 2 to 5. The metal oxide dissolver contains one or more types selected from one or more acids (A-group) selected from acids of which the dissociation constant (pKa) of a first dissociable acid group is less than 3.7 and from which five acids of lactic acid, phthalic acid, fumaric acid, maleic acid and aminoacetic acid are excluded, ammonium salts of the A-group and esters of the A-group, and one or more types selected from one or more acids (B-group) selected from acids of which the dissociation constant (pKa) of a first dissociable acid group is 3.7 or more and the five acids, ammonium salts of the B-group and esters of the B-group.Type: ApplicationFiled: April 28, 2003Publication date: August 18, 2005Inventors: Yasushi Kurata, Katsuyuki Masuda, Hiroshi Ono, Yasuo Kamigata, Kazuhiro Enomoto
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Publication number: 20050119394Abstract: The composition for forming silica based coating of the invention comprises siloxane resin such as an alkoxysilane as component (a), a solvent such as an alcohol capable of dissolving the siloxane resin as component (b), an ammonium salt, etc. as component (c) and a thermal decomposing/volatile compound as component (d), wherein the stress of the coating obtained by heat treatment at 150° C./3 min is 10 MPa and the specific permittivity of the silica based coating obtained by final curing is less than 3.0. The composition for forming silica based coating according to the invention can form a silica based coating having low permittivity, excellent adhesion and sufficient mechanical strength.Type: ApplicationFiled: August 26, 2004Publication date: June 2, 2005Inventors: Haruaki Sakurai, Koichi Abe, Kazuhiro Enomoto, Shigeru Nobe
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Publication number: 20040253462Abstract: The present invention provides a composition comprising (a) a thermally decomposable polymer and (b) a siloxane oligomer evenly dissolved in (c) an organic solvent; a composition comprising (a) a thermally decomposable polymer, (b) a siloxane oligomer, and (c)′ an organic solvent in which both of the ingredients (a) and (b) are soluble; a method for forming a low-permittivity film characterized by applying the composition to a substrate to form a composite film comprising the thermally decomposable polymer and the siloxane oligomer evenly compatibilized therewith and then heating the resulting film to condense the siloxane oligomer and remove the thermally decomposable polymer; a method for forming a low-permittivity film characterized by applying the composition to a substrate to form a composite film comprising the thermally decomposable polymer and the siloxane oligomer evenly compatibilized therewith, subsequently conducting a first heating step in which the siloxane oligomer is crosslinked while keType: ApplicationFiled: July 13, 2004Publication date: December 16, 2004Applicant: Hitachi Chemical Co., Ltd.Inventors: Takenori Narita, Hiroyuki Morisima, Shigeru Nobe, Kazuhiro Enomoto, Haruaki Sakurai, Nobuko Terada
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Publication number: 20040084984Abstract: A synchronous induction motor features improved assemblability of a rotor, significantly reduced production cost, and improved operation performance of the motor. A plurality of die-cast secondary conductors is provided around a rotor yoke constituting the rotor of the synchronous induction motor. End rings are die-cast integrally with the secondary conductors on the peripheral portions of both end surfaces of the rotor yoke. Permanent magnets are inserted into slots formed such that they penetrate the rotor yoke. The openings of both ends of the slots are closed by a pair of end surface members formed of a non-magnetic constituent. One of the end surface members is secured to the rotor yoke by one of the end rings when the secondary conductors and the end rings are formed. The other end surface member is secured to the rotor yoke by a fixture.Type: ApplicationFiled: October 27, 2003Publication date: May 6, 2004Applicant: SANYO ELECTRIC CO., LTD.Inventors: Toshihito Yanashima, Keijiro Igarashi, Masaaki Takezawa, Kazuhiko Arai, Eiichi Murata, Noboru Onodera, Shigemi Koiso, Kazuhiro Enomoto, Yoshitomo Nakayama
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Publication number: 20020140309Abstract: A synchronous induction motor features improved assemblability of a rotor, significantly reduced production cost, and improved operation performance of the motor. A plurality of die-cast secondary conductors is provided around a rotor yoke constituting the rotor of the synchronous induction motor. End rings are die-cast integrally with the secondary conductors on the peripheral portions of both end surfaces of the rotor yoke. Permanent magnets are inserted into slots formed such that they penetrate the rotor yoke. The openings of both ends of the slots are closed by a pair of end surface members formed of a non-magnetic constituent. One of the end surface members is secured to the rotor yoke by one of the end rings when the secondary conductors and the end rings are formed. The other end surface member is secured to the rotor yoke by a fixture.Type: ApplicationFiled: March 28, 2002Publication date: October 3, 2002Applicant: SANYO ELECTRIC CO., LTD.Inventors: Toshihito Yanashima, Keijiro Igarashi, Masaaki Takezawa, Kazuhiko Arai, Eiichi Murata, Noboru Onodera, Shigemi Koiso, Kazuhiro Enomoto, Yoshitomo Nakayama