Patents by Inventor Kazuhiro Fujita

Kazuhiro Fujita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190091640
    Abstract: A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.
    Type: Application
    Filed: August 28, 2018
    Publication date: March 28, 2019
    Applicant: SCREEN Holdings Co., Ltd.
    Inventors: Hajime NISHIDE, Takashi IZUTA, Takatoshi HAYASHI, Katsuhiro FUKUI, Koichi OKAMOTO, Kazuhiro FUJITA, Atsuyasu MIURA, Kenji KOBAYASHI, Sei NEGORO, Hiroki TSUJIKAWA
  • Publication number: 20190084419
    Abstract: An information display apparatus emits an image forming light beam to a transmissive reflection member and makes a virtual image visible through the reflection member. The information display apparatus is configured to display the virtual image so that a difference between a convergence angle when viewing the virtual image through the reflection member and a convergence angle when viewing a real object through the reflection member is less than or equal to 1 degree.
    Type: Application
    Filed: September 13, 2016
    Publication date: March 21, 2019
    Inventors: Yuuki SUZUKI, Kenichiroh SAISHO, Masato KUSANAGI, Takuro YASUDA, Kazuhiro FUJITA
  • Patent number: 10199243
    Abstract: A substrate processing method is a substrate processing method which applies sequentially common etching processing which is common to each of a plurality of substrates. The common etching processing has an etching step and a high-temperature liquid discharge step. The substrate processing method further includes a piping heating step in which, of the plurality of common etching processings applied to the plurality of substrates, before the initial common etching processing, the pipe wall of the common piping is raised in temperature up to a predetermined second liquid temperature higher than a first liquid temperature and in each of the common etching processings, after each of high-temperature liquid discharge steps and before each of next etching steps, there is not performed a step in which the pipe wall of the common piping is lowered in temperature.
    Type: Grant
    Filed: December 5, 2017
    Date of Patent: February 5, 2019
    Assignee: SCREEN Holdings Co., Ltd.
    Inventors: Kazuhiro Fujita, Atsuyasu Miura, Hiroki Tsujikawa, Yuya Tsuchihashi, Akihiko Taki
  • Patent number: 10191361
    Abstract: A light source device comprising: a light source section which generates any one of blue light, red light, and green light; a phosphor which generates a fluorescence including the two colors other than the color of the light emitted from the light source section; a color-changing section which changes one of the two colors of the fluorescence emitted from the phosphor to another color regularly and irradiates it to the image-forming element; and a light path-switching section which switches a light path in which a fluorescence excited by the color light emitted from the light source section passes towards the color-changing section and a light path in which the color light emitted from the light source section passes towards the image-forming element regularly.
    Type: Grant
    Filed: June 29, 2017
    Date of Patent: January 29, 2019
    Assignee: RICOH COMPANY, LTD.
    Inventors: Ikuo Maeda, Kazuhiro Fujita, Toshiharu Murai, Tatsuya Takahashi, Takehiro Nishimori
  • Patent number: 10175567
    Abstract: A light source device includes a light source section that emits laser beam, a member reducing light quantity unevenness of the laser beam, a diffusion member that is provided in a traveling optical path of the laser beam between the light source section and the member reducing light quantity unevenness and diffuses the laser beam, a detection element that detects a physical characteristic of the diffusion member and outputs a state detecting signal, and an abnormal state determiner that determines an abnormal state of the diffusion member based on the state detecting signal.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: January 8, 2019
    Assignee: RICOH COMPANY, LTD.
    Inventors: Takehiro Nishimori, Kazuhiro Fujita, Toshiharu Murai, Tatsuya Takahashi
  • Publication number: 20180374735
    Abstract: A substrate fixing device includes a baseplate, an adhesive layer on the baseplate, and an electrostatic chuck on the adhesive layer. The adhesive layer includes a first layer and a second layer. The second layer is between the first layer and the electrostatic chuck. The thermal conductivity of the first layer is higher in a stacking direction in which the baseplate, the adhesive layer, and the electrostatic chuck are stacked than in a plane direction perpendicular to the stacking direction. The thermal conductivity of the second layer is higher in the plane direction than in the stacking direction.
    Type: Application
    Filed: April 19, 2018
    Publication date: December 27, 2018
    Inventor: Kazuhiro FUJITA
  • Publication number: 20180272538
    Abstract: A system includes: an illumination device; and an imaging device configured to capture an image of a target which is irradiated with light by the illumination device. The illumination device includes: a light emitting unit configured to emit first polarized light; a condensing unit configured to focus light emitted from the light emitting unit; a diffusion unit configured to diffuse the light focused by the condensing unit; and a uniformization optical system configured to receive the light diffused by the diffusion unit, uniformize an illuminance distribution of the light, and emit the light. The system further comprising including a selective transmission unit provided on an optical path from the target to an imaging element of the imaging device and configured to block the first polarized light at a predetermined blocking ratio.
    Type: Application
    Filed: September 26, 2016
    Publication date: September 27, 2018
    Inventors: Tatsuya TAKAHASHI, Kazuhiro FUJITA, Go MARUYAMA
  • Patent number: 10073333
    Abstract: A light irradiation device for emitting light of two or more components by laser light, which a laser light source emits, to an outside, includes a diffusion optical path change member configured to convert a first color component of the laser light into diffusion light and change an optical path of the first color component; a phosphor configured to generate fluorescence of a second color component different from the first color component based on the laser light, and change an optical path of the second color component; and an optical path switch member configured to switch between a first optical path for emitting the first color component to the outside and a second optical path for emitting the second color component to the outside. Light going straight at a light diffusion position of the diffusion optical path change member is not emitted to the outside.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: September 11, 2018
    Assignee: RICOH COMPANY, LTD.
    Inventors: Takehiro Nishimori, Kazuhiro Fujita, Toshiharu Murai, Tatsuya Takahashi, Junichi Kitabayashi, Kaoru Itoh, Makoto Hirakawa
  • Publication number: 20180252916
    Abstract: A display device includes a screen to form an intermediate image with light; a concave mirror, and a first mirror disposed between the screen and the concave mirror. The first mirror includes a first reflective area to reflect the light emitted from the screen to the concave mirror; a second reflective area to reflect the light emitted from the concave mirror to an area where a virtual image is formed; and a common reflective area in which the first reflective area and the second reflective area at least partly overlap on each other.
    Type: Application
    Filed: February 1, 2018
    Publication date: September 6, 2018
    Inventors: Kento NAKAMURA, Takehide OHNO, Hiromichi ATSUUMI, Naoki MIYATAKE, Kazuhiro FUJITA, Yuki HAYASHI
  • Publication number: 20180218711
    Abstract: Disclosed is a display device for displaying a virtual image in front of an occupant of a vehicle. The display device includes an imaging unit configured to capture an image, a luminance adjusting unit configured to adjust luminance of an image to be displayed based on a luminance value of a target area that is a part of the image captured by the imaging unit, and an image display unit configured to display the image having the luminance adjusted by the luminance adjustment unit as a virtual image in a field of view of the occupant, where the target area includes at least a part of a virtual image displayable area.
    Type: Application
    Filed: March 28, 2018
    Publication date: August 2, 2018
    Inventors: Yuuki SUZUKI, Kazuhiro FUJITA, Daiju CHIBA
  • Publication number: 20180158698
    Abstract: A substrate processing method is a substrate processing method which applies sequentially common etching processing which is common to each of a plurality of substrates. The common etching processing has an etching step and a high-temperature liquid discharge step. The substrate processing method further includes a piping heating step in which, of the plurality of common etching processings applied to the plurality of substrates, before the initial common etching processing, the pipe wall of the common piping is raised in temperature up to a predetermined second liquid temperature higher than a first liquid temperature and in each of the common etching processings, after each of high-temperature liquid discharge steps and before each of next etching steps, there is not performed a step in which the pipe wall of the common piping is lowered in temperature.
    Type: Application
    Filed: December 5, 2017
    Publication date: June 7, 2018
    Inventors: Kazuhiro Fujita, Atsuyasu Miura, Hiroki Tsujikawa, Yuya Tsuchihashi, Akihiko Taki
  • Patent number: 9946144
    Abstract: A projection optical system is disclosed. The projection optical system includes a first optical system configured to form a first image conjugated with an object and a second optical system configured to project a second image conjugated with the first image toward a projection surface. At least one of the first optical system and second optical system includes at least one optical element(s) movable relative to the object is provided. An image distance of the projection optical system is changed and a size of the second image is changed, by moving at least one of the optical element(s) relative to the object.
    Type: Grant
    Filed: November 28, 2007
    Date of Patent: April 17, 2018
    Assignee: RICOH COMPANY, LTD.
    Inventors: Issei Abe, Kazuhiro Fujita, Atsushi Takaura
  • Publication number: 20180090308
    Abstract: There are provided a first supplying step including at least one first treatment process of supplying treatment liquid toward an upper surface of a rotated substrate, and a second supplying step including at least one second treatment process of supplying rinse liquid toward a lower surface of a rotated blocking portion. The first supplying step is executed during a first period and the second supplying step is executed during a second period. The first period and the second period are overlapped with each other during an overlapped period. Rinsing the blocking portion thus achieves improvement in throughput.
    Type: Application
    Filed: September 6, 2017
    Publication date: March 29, 2018
    Inventors: Noriyuki KIKUMOTO, Shuichi YASUDA, Kazuhiro FUJITA, Michinori IWAO
  • Publication number: 20180085795
    Abstract: A recover piping cleaning method is a method of cleaning a recovery piping into which a chemical liquid used for processing of a substrate is led via a processing cup, the recovery piping being arranged to lead the led chemical liquid into a predetermined chemical liquid recovery piping, the method including a piping cleaning step of cleaning the interior of the recovery piping by using a cleaning liquid by, while supplying the cleaning liquid to the recovery piping, leading the liquid led into the recovery piping into a drain piping which is different from the chemical liquid recovery piping, and a cleaning chemical liquid supplying step of, supplying the cleaning chemical liquid from a cleaning chemical liquid supply piping connected to the recovery piping to the recovery piping while leading the liquid led into the recovery piping into the drain piping.
    Type: Application
    Filed: September 20, 2017
    Publication date: March 29, 2018
    Inventors: Yuya TSUCHIHASHI, Atsuyasu MIURA, Hiroki TSUJIKAWA, Kazuhiro FUJITA, Masahide IKEDA
  • Publication number: 20180061678
    Abstract: The controller of a substrate processing apparatus carries out a liquid column forming step in which cleaning liquid is discharged through a lower surface nozzle when a spin chuck is not holding a substrate, to form a liquid column extending upward from the lower surface nozzle, and, in parallel with the liquid column forming step, a first dropping portion cleaning step in which an upper surface nozzle is reciprocated horizontally between a first position where a dropping portion of the upper surface nozzle does not contact the liquid column and a second position where the dropping portion of the upper surface nozzle does not contact the liquid column, so as to cause the upper surface nozzle to pass through a first middle position where the upper discharge port of the upper surface nozzle overlaps with the liquid column in a plan view.
    Type: Application
    Filed: August 7, 2017
    Publication date: March 1, 2018
    Inventors: Atsuyasu MIURA, Masahide IKEDA, Hiroki TSUJIKAWA, Kazuhiro FUJITA, Yuya TSUCHIHASHI
  • Publication number: 20180029089
    Abstract: A substrate processing method includes a chemical liquid supplying step of supplying a chemical liquid to a substrate, an elapsed period measuring step of measuring an after-the-end elapsed period, a recovery step of controlling the switching unit to be in a recovery guiding state, when, at a start of the chemical liquid supplying step, the after-the-end elapsed period is less than a predetermined first period, and a draining step of controlling the switching unit to be in a drain guiding state, in which the liquid led to the recovery space is led to the drain line, when, at the start of the chemical liquid supplying step, the after-the-end elapsed period is not less than the predetermined first period and then switching to the recovery guiding state based on establishment of a predetermined draining ending condition.
    Type: Application
    Filed: July 21, 2017
    Publication date: February 1, 2018
    Inventors: Atsuyasu MIURA, Kazuhiro FUJITA, Hiroki TSUJIKAWA, Yuya TSUCHIHASHI, Kenji TAKEMOTO
  • Patent number: 9880454
    Abstract: A light source device is disclosed. An embodiment of the light source device includes: an excitation light source configured to emit irradiation light of a color component to be used as excitation light and projection light; a fluorescent member disposed in an excitation light path and configured to generate fluorescence of a color component different from the color component of the irradiation light when being irradiated with the irradiation light; a light path merger unit configured to merge a fluorescence light path through which the fluorescence generated with irradiation of the irradiation light is delivered, and a projection light path through which the projection light is delivered; and a light path switch disk configured to switch the irradiation light between the excitation light path and the projection light path.
    Type: Grant
    Filed: October 23, 2014
    Date of Patent: January 30, 2018
    Assignee: RICOH COMPANY, LTD.
    Inventors: Tatsuya Takahashi, Kazuhiro Fujita, Toshiharu Murai, Takehiro Nishimori
  • Publication number: 20180025922
    Abstract: A substrate processing apparatus includes a guard that catches liquid scattered outward from a spin chuck, a cup defining a liquid receiving groove to catch liquid that is guided downward by the guard, a guard elevating/lowering unit that moves the guard in an up/down direction, a cleaning liquid supplying unit that supplies cleaning liquid, discharged from a cleaning liquid nozzle, to the liquid receiving groove via the spin chuck and the guard, a cleaning liquid draining unit that drains the cleaning liquid in the liquid receiving groove, and a controller that controls the cleaning liquid supplying unit and the cleaning liquid draining unit to accumulate cleaning liquid in the liquid receiving groove and controls the guard elevating/lowering unit to cause a lower end portion of the cylindrical portion to be immersed in the cleaning liquid in the liquid receiving groove.
    Type: Application
    Filed: July 13, 2017
    Publication date: January 25, 2018
    Inventors: Hiroki TSUJIKAWA, Masahide IKEDA, Atsuyasu MIURA, Kazuhiro FUJITA, Yuya TSUCHIHASHI
  • Publication number: 20180024425
    Abstract: This invention is concerning an illumination device that can obtain illumination light efficiently. An illumination device 1 used in, for example, a projection display apparatus includes a light source and a light tunnel 14. The light tunnel 14 includes a light incident port 15, a light emission port 16, a light guide path 17, a reflection surface 20 surrounding the light guide path 17, a phosphor layer 19 that generates fluorescent light LF having a different wavelength range from that of excitation light LE when being excited by the excitation light LE, a condensing optical system 13 that diverges the excitation light LE in the vicinity of the light incident port 15 and guides the diverged light into the light tunnel 14 to irradiate the phosphor layer 19, and a wavelength selection element that reflects the fluorescent light LF toward the light emission port 16.
    Type: Application
    Filed: February 9, 2016
    Publication date: January 25, 2018
    Applicant: Ricoh Company, Ltd.
    Inventors: Kazuhiro FUJITA, Takahiro KADO
  • Patent number: 9863759
    Abstract: An illumination apparatus includes: a light emitting unit that outputs light; a light condensing unit that condenses the light output from the light emitting unit; a diffusion unit that diffuses the light condensed by the light condensing unit; and a uniformizing optical system that receives the light diffused by the diffusion unit, uniformizes a brightness distribution thereof compared with that of the light being received, and outputs the resulting light.
    Type: Grant
    Filed: October 9, 2015
    Date of Patent: January 9, 2018
    Assignee: RICOH COMPANY, LTD.
    Inventors: Tatsuya Takahashi, Kazuhiro Fujita, Toshiharu Murai, Takehiro Nishimori, Takahiro Kado, Jun Kishiwada