Patents by Inventor Kazuhiro Ishikawa

Kazuhiro Ishikawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12203161
    Abstract: A component for a plasma processing apparatus includes a substrate and a film on at least a part of the substrate. The film includes an oxide, a fluoride, an oxyfluoride, or a nitride of a rare earth element. A ratio ?22/?11 of a compressive stress ?11 to occur across a surface of the film to be exposed to plasma and a compressive stress ?22 to occur across the surface in a direction perpendicular to the compressive stress ?11 is 5 or less. A plasma processing apparatus includes the above component.
    Type: Grant
    Filed: September 29, 2020
    Date of Patent: January 21, 2025
    Assignee: Kyocera Corporation
    Inventors: Kazuhiro Ishikawa, Takashi Hino, Shuichi Saito
  • Publication number: 20250006468
    Abstract: A plasma-resistant laminate of the present disclosure includes a substrate, a membrane electrode formed on the substrate, and a dielectric layer formed on the membrane electrode, the substrate includes sapphire, the dielectric layer includes an oxide including yttrium, and the membrane electrode is made of an active metal, a constituent element of the substrate or the dielectric layer, or a laminate thereof.
    Type: Application
    Filed: August 31, 2022
    Publication date: January 2, 2025
    Inventors: Motohiro UMEHARA, Wataru FUJITA, Kazuhiro ISHIKAWA
  • Publication number: 20240343657
    Abstract: A film-coated member includes a substrate, and a film of an oxide, a fluoride, an oxyfluoride, or a nitride of a rare earth element on at least a part of the substrate. The film has a reflectance greater than 50% at a wavelength of 700 nm and less than 50% at a wavelength of 400 nm.
    Type: Application
    Filed: March 28, 2022
    Publication date: October 17, 2024
    Inventor: Kazuhiro ISHIKAWA
  • Patent number: 12103570
    Abstract: A traveling vehicle system includes a track and a ceiling traveling vehicle. The track includes a first track, a second track, and a connection track. The ceiling traveling vehicle includes a direction changer that turns a coupler, which couples a traveling wheel and a main body to each other and passes through a gap between the first track or the second track and the connection track. A guider is provided in the coupler, moves along a first guide surface in a first state in which the traveling wheel rolls on the first track, and moves along a second guide surface in a second state in which the traveling wheel rolls on the second track.
    Type: Grant
    Filed: October 23, 2019
    Date of Patent: October 1, 2024
    Assignee: MURATA MACHINERY, LTD.
    Inventors: Haruki Ogo, Kazuhiro Ishikawa, Yasuhisa Ito, Masayoshi Torazawa
  • Patent number: 12103836
    Abstract: A coupling structure includes an outer member attached over first and second column members, a first inner member between the first column member and the outer member, a second inner member between the second column member and the outer member, a first fixing member to fix the outer member to the first column member along with the first inner member, a second fixing member to fix the outer member to the second column member along with the second inner member, a third fixing member to fix the first inner member to the first column member, and a fourth fixing member to fix the second inner member to the second column member. The outer member and the first inner member are provided with a first positioner, and the outer member and the second inner member are provided with a second positioner.
    Type: Grant
    Filed: September 24, 2020
    Date of Patent: October 1, 2024
    Assignee: MURATA MACHINERY, LTD.
    Inventors: Jun Sai, Kazuhiro Ishikawa
  • Publication number: 20240279131
    Abstract: A film-attached member according to the present disclosure includes a base member made of a ceramic, and a film of an oxide, a fluoride, an acid fluoride, or a nitride of a rare earth element on at least a portion of one surface of the base member. An exposed portion of the surface of the base member has hydrophilicity, and a surface of the film has water repellency. Another film-attached member according to the present disclosure includes a base member made of quartz, and a film of an oxide, a fluoride, an acid fluoride, or a nitride of a rare earth element on at least a portion of one surface of the base member. An exposed portion of the surface of the base member has hydrophilicity, and a surface of the film has water repellency.
    Type: Application
    Filed: May 26, 2022
    Publication date: August 22, 2024
    Inventors: Katsuya NAKAMOTO, Kazuhiro ISHIKAWA
  • Patent number: 12065727
    Abstract: Provided are a member for plasma processing device which has an excellent plasma resistance and improved adhesion strength of a film to a base material, and a plasma processing device provided with the same. A member for plasma processing device includes: a base material containing a first element which is a metal element or a metalloid element; a film containing a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride as a major constituent, the film being located on the base material; and an amorphous portion containing the first element, a rare earth element, and at least one of oxygen and fluorine, the amorphous portion being interposed between the base material and the film.
    Type: Grant
    Filed: December 2, 2019
    Date of Patent: August 20, 2024
    Assignee: Kyocera Corporation
    Inventors: Kazuhiro Ishikawa, Takashi Hino, Shuichi Saito
  • Patent number: 12030759
    Abstract: In a stacker crane, a cover to cover an elevation area of an elevation portion is integrally attachable to side surface portions of a mast, which includes a reinforcement portion and an adjuster. The reinforcement portion between a pair of the side surface portions in a Y direction extends toward an opposite direction to an elevation surface of an elevation surface defining portion and has a higher stiffness than that of each of the pair of side surface portions. The adjuster is spaced from the elevation surface defining portion in an X direction perpendicular to a Z direction and the Y direction, and both edges thereof extendible in the Y direction are contactable with the reinforcement portion and each of the pair of side surface portions.
    Type: Grant
    Filed: October 2, 2020
    Date of Patent: July 9, 2024
    Assignee: MURATA MACHINERY, LTD.
    Inventors: Jun Sai, Kazuhiro Ishikawa
  • Patent number: 11948779
    Abstract: A component for a plasma processing apparatus, and a plasma processing apparatus are highly resistant to plasma and are highly durable. The component includes a substrate containing a first element that is a metal element or a semimetal element, and a film located on the substrate and containing yttrium oxide as a main constituent. The film contains yttrium oxide crystal grains oriented with a deviation angle of ±10° from a {111} direction of a crystal lattice plane of yttrium oxide. The yttrium oxide crystal grains oriented with the deviation angle have an area ratio of 45% or greater.
    Type: Grant
    Filed: April 20, 2020
    Date of Patent: April 2, 2024
    Assignee: KYOCERA Corporation
    Inventors: Kazuhiro Ishikawa, Takashi Hino, Shuichi Saito
  • Patent number: 11926246
    Abstract: In a local cart traveling system, a frame track includes first and second metal rails each with an L-shaped cross section and facing each other. A local cart is within the frame track, and includes a first electricity receiving tire and a second electricity receiving tire to travel on horizontal travel surfaces of the rails. A voltage supplier supplies an AC voltage to the travel surfaces, so that the first metal rail and a first electricity receiving tire define a first capacitor and the second metal rail and the second electricity receiving tire define a second capacitor. The local cart includes a power receiver to receive AC power, and a travel motor that receives power after the AC power is rectified. The frame track includes a connecting plate as an electrical insulator covering portions of the surfaces of vertical walls of the first metal rail and the second metal rail.
    Type: Grant
    Filed: June 1, 2018
    Date of Patent: March 12, 2024
    Assignees: MURATA MACHINERY, LTD., NATIONAL UNIVERSITY CORPORATION TOYOHASHI UNIVERSITY OF TECHNOLOGY
    Inventors: Minoru Mizutani, Kazuhiro Ishikawa, Masafumi Hayakawa, Takashi Ohira, Naoki Sakai, Hiroki Kuniyoshi, Makoto Teramoto
  • Patent number: 11878867
    Abstract: A lifting and lowering transportation device is capable of transporting articles between different delivery positions using transportation units, each including a lifting and lowering platform, a linear motor, and a chain. The lifting and lowering platform can pass through the delivery positions by moving along the circumferential track that is common to the transportation units. The linear motor generates the driving force to move the lifting and lowering platform along the circumferential track. The chain is loop-shaped and can circulate along the circulation track corresponding to the circumference path, and the linear motor moves the lifting and lowering platform by circulating the chain by the driving force generated by the linear motor. The circulation of the chain in each transportation unit is controlled independently of the other transportation units.
    Type: Grant
    Filed: September 2, 2020
    Date of Patent: January 23, 2024
    Assignee: MURATA MACHINERY, LTD.
    Inventor: Kazuhiro Ishikawa
  • Publication number: 20230294916
    Abstract: A traveling vehicle system (10) is configured such that, in a shared area (12B), a first detectable part (35A, 35B) is disposed at a position detectable by a first detector (85A, 85B) and a second detectable part (36A, 36B) is disposed at a position undetectable by the first detector (85A, 85B) when a first traveling vehicle (7A) is located in a first position (P1), and the second detectable part (36A, 36B) is disposed at a position detectable by a second detector (87A, 87B) and the first detectable part (35A, 35B) is disposed at a position undetectable by the second detector (87A, 87B) when a second traveling vehicle (7B) is located in a second position (P2).
    Type: Application
    Filed: February 9, 2021
    Publication date: September 21, 2023
    Inventors: Kazuma YAGAWA, Kazuhiro ISHIKAWA
  • Patent number: 11715629
    Abstract: A plasma processing device member according to the disclosure includes a base material and a film formed of an oxide, or fluoride, or oxyfluoride, or nitride of a rare-earth element, the film being disposed on at least part of the base material, the film including a surface to be exposed to plasma, the surface having an area occupancy of open pores of 8% by area or more, and an average diameter of open pores of 8 ?m or less.
    Type: Grant
    Filed: April 3, 2019
    Date of Patent: August 1, 2023
    Assignee: KYOCERA CORPORATION
    Inventors: Kazuhiro Ishikawa, Takashi Hino, Shuichi Saito
  • Publication number: 20230106446
    Abstract: A transport system includes a transport device to transport an article, a cable unit, one end of which is connected to the transport device, the other end of which is fixed to ground side, the cable unit configured to move in accordance with movement of the transport device, and a placement section capable of placing the cable unit. The placement section has a base, and a first damping member provided on the base and having damping properties higher than that of the base. The first damping member does not support the cable unit thereon.
    Type: Application
    Filed: January 26, 2021
    Publication date: April 6, 2023
    Inventors: Kazuma Yagawa, Kazuhiro Ishikawa
  • Publication number: 20230002206
    Abstract: In a stacker crane, a cover to cover an elevation area of an elevation portion is integrally attachable to side surface portions of a mast, which includes a reinforcement portion and an adjuster. The reinforcement portion between a pair of the side surface portions in a Y direction extends toward an opposite direction to an elevation surface of an elevation surface defining portion and has a higher stiffness than that of each of the pair of side surface portions. The adjuster is spaced from the elevation surface defining portion in an X direction perpendicular to a Z direction and the Y direction, and both edges thereof extendible in the Y direction are contactable with the reinforcement portion and each of the pair of side surface portions.
    Type: Application
    Filed: October 2, 2020
    Publication date: January 5, 2023
    Inventors: Jun SAI, Kazuhiro ISHIKAWA
  • Publication number: 20220402737
    Abstract: A coupling structure includes an outer member attached over first and second column members, a first inner member between the first column member and the outer member, a second inner member between the second column member and the outer member, a first fixing member to fix the outer member to the first column member along with the first inner member, a second fixing member to fix the outer member to the second column member along with the second inner member, a third fixing member to fix the first inner member to the first column member, and a fourth fixing member to fix the second inner member to the second column member. The outer member and the first inner member are provided with a first positioner, and the outer member and the second inner member are provided with a second positioner.
    Type: Application
    Filed: September 24, 2020
    Publication date: December 22, 2022
    Inventors: Jun SAI, Kazuhiro ISHIKAWA
  • Patent number: 11521835
    Abstract: A plasma processing device member according to the disclosure includes a base material and a film formed of a rare-earth element oxide, or a rare-earth element fluoride, or a rare-earth element oxyfluoride, or a rare-earth element nitride, the film being disposed on at least part of the base material. The film includes a surface to be exposed to plasma, the surface having an arithmetic mean roughness Ra of 0.01 ?m or more and 0.1 ?m or less, the surface being provided with a plurality of pores, and a value obtained by subtracting an average equivalent circle diameter of the pores from an average distance between centroids of adjacent pores is 28 ?m or more and 48 ?m or less. A plasma processing device according to the disclosure includes the plasma processing device member described above.
    Type: Grant
    Filed: April 3, 2019
    Date of Patent: December 6, 2022
    Assignee: KYOCERA Corporation
    Inventors: Kazuhiro Ishikawa, Takashi Hino, Shuichi Saito
  • Publication number: 20220348411
    Abstract: A lifting and lowering transportation device is capable of transporting articles between different delivery positions using transportation units, each including a lifting and lowering platform, a linear motor, and a chain. The lifting and lowering platform can pass through the delivery positions by moving along the circumferential track that is common to the transportation units. The linear motor generates the driving force to move the lifting and lowering platform along the circumferential track. The chain is loop-shaped and can circulate along the circulation track corresponding to the circumference path, and the linear motor moves the lifting and lowering platform by circulating the chain by the driving force generated by the linear motor. The circulation of the chain in each transportation unit is controlled independently of the other transportation units.
    Type: Application
    Filed: September 2, 2020
    Publication date: November 3, 2022
    Inventor: Kazuhiro ISHIKAWA
  • Publication number: 20220325399
    Abstract: A component for a plasma processing apparatus includes a substrate and a film on at least a part of the substrate. The film includes an oxide, a fluoride, an oxyfluoride, or a nitride of a rare earth element. A ratio ?22/?11 of a compressive stress ?11 to occur across a surface of the film to be exposed to plasma and a compressive stress ?22 to occur across the surface in a direction perpendicular to the compressive stress ?11 is 5 or less. A plasma processing apparatus includes the above component.
    Type: Application
    Filed: September 29, 2020
    Publication date: October 13, 2022
    Inventors: Kazuhiro ISHIKAWA, Takashi HINO, Shuichi SAITO
  • Patent number: 11458847
    Abstract: An article transferring device that transfers articles includes: a traveling rail; primary-side stators; a power source; a first transporting carriage and a second transporting carriage each of which includes a secondary-side movable element and transports an article by the secondary-side movable element receiving a magnetic action from the primary-side stators. Each of the first transporting carriage and the second transporting carriage is caused to travel so as to be stopped or change a traveling speed individually by a ground primary-side linear motor system including the primary-side stators and the secondary-side movable element, and further includes a transferring unit that transfers the article in an intersecting direction intersecting with the predetermined path by receiving force from the power source.
    Type: Grant
    Filed: December 14, 2017
    Date of Patent: October 4, 2022
    Assignee: Murata Machinery, Ltd.
    Inventors: Isao Fukuda, Kazuhiro Ishikawa, Kenji Kadoguchi, Masataka Hayashi