Patents by Inventor Kazuhiro Katayama

Kazuhiro Katayama has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240210830
    Abstract: A resist composition is provided comprising (A) a polymer comprising repeat units having an acid labile group, (B) an organic solvent, and (C) an onium salt having formula: Zq+Xq? wherein Zq+ is a sulfonium, iodonium or ammonium cation, and Xq? is an anion. When processed by high-energy radiation lithography, the resist composition exhibits satisfactory sensitivity. LWR and maximum resolution and is resistant to pattern collapse.
    Type: Application
    Filed: November 10, 2023
    Publication date: June 27, 2024
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Kazuhiro Katayama, Tatsuya Yamahira, Yutaro Otomo, Kousuke Ohyama
  • Patent number: 11953827
    Abstract: A molecular resist composition is provided comprising (A) a betaine type onium compound having a sulfonium cation moiety and a sulfonate anion moiety in a common molecule, the sulfonium cation moiety having a phenyl group substituted with an optionally heteroatom-containing monovalent hydrocarbon group, the phenyl group being attached to the sulfur atom, and (B) an organic solvent, the resist composition being free of a base resin. When processed by lithography using KrF, ArF excimer laser, EB or EUV, the resist composition is improved in dissolution contrast, EL, MEF, and LWR.
    Type: Grant
    Filed: April 24, 2020
    Date of Patent: April 9, 2024
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masaki Ohashi, Kazuhiro Katayama
  • Patent number: 11940728
    Abstract: A molecular resist composition and a pattern forming process. A molecular resist composition comprising a sulfonium salt having a cation of specific structure and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography. The molecular resist composition does not contain a base polymer. The molecular resist composition comprising a sulfonium salt having a cation of specific partial structure has a high sensitivity and forms a resist film with improved resolution and LWR, so that the resist composition is quite useful for precise micropatterning.
    Type: Grant
    Filed: September 24, 2021
    Date of Patent: March 26, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masaki Ohashi, Kazuhiro Katayama, Masahiro Fukushima, Shun Kikuchi
  • Publication number: 20240036466
    Abstract: Provided is a novel onium salt used for a resist composition that has high sensitivity and excellent resolution, improved LWR and CDU, and that can inhibit collapse of a resist pattern for both of positive-type and negative-type resists in lithography: an onium salt represented by the following general formula (1), wherein RALU represents any one of a tertiary ether, tertiary carbonate, or acetal formed together with the adjacent oxygen atom and having a cyclic structure; RF represents any one of a fluorine atom, a fluorine-containing alkyl group having 1 to 6 carbon atoms, and a nitro group; Ra represents a hydrocarbyl group having 1 to 20 carbon atoms; n1 represents an integer of 0 or 1; n2 and n3 represent an integer of 1 or 2; one of RF and one of —O—RALU are bonded to carbon atoms adjacent to each other; n4 represents an integer of 0 to 3; and Z+ represents an onium cation.
    Type: Application
    Filed: July 10, 2023
    Publication date: February 1, 2024
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro FUKUSHIMA, Jun HATAKEYAMA, Tomomi WATANABE, Kazuhiro KATAYAMA
  • Patent number: 11774853
    Abstract: A resist composition comprising an iodized base polymer and an iodized benzene ring-containing quencher has a high sensitivity and improved LWR and CDU.
    Type: Grant
    Filed: December 17, 2019
    Date of Patent: October 3, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masaki Ohashi, Masahiro Fukushima, Takayuki Fujiwara, Kazuhiro Katayama
  • Patent number: 11687000
    Abstract: A novel sulfonium compound of formula (A) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in lithography properties.
    Type: Grant
    Filed: April 3, 2020
    Date of Patent: June 27, 2023
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masaki Ohashi, Kazuhiro Katayama, Yuki Kera
  • Publication number: 20230161254
    Abstract: A chemically amplified resist composition is provided comprising (A) a polymer P comprising repeat units having an acid labile group containing a fluorinated aromatic ring, repeat units having a phenolic hydroxy group, and repeat units adapted to generate an acid upon exposure, (B) an onium salt type quencher, and (C) a solvent. The resist composition exhibits a high sensitivity, low LWR and improved CDU when processed by photolithography.
    Type: Application
    Filed: November 10, 2022
    Publication date: May 25, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masayoshi Sagehashi, Kenji Yamada, Kazuhiro Katayama
  • Publication number: 20230132653
    Abstract: A molecular resist composition comprising a sulfonium salt having formula (1) or (2) and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography.
    Type: Application
    Filed: November 1, 2022
    Publication date: May 4, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Shun Kikuchi, Masaki Ohashi, Kazuhiro Katayama
  • Publication number: 20230137472
    Abstract: A chemically amplified resist composition comprising a base polymer and a quencher in the form of an amine compound of specific structure is provided. The resist composition has a high sensitivity and forms a pattern with a high resolution and improved LWR, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: September 15, 2022
    Publication date: May 4, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Masahiro Fukushima, Kazuhiro Katayama
  • Publication number: 20230134822
    Abstract: A resist composition comprising a quencher in the form of an amine compound having a highly polar lactone or sultone ring and an acid labile group in a common molecule is provided. The resist composition has a high sensitivity and forms a pattern with improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: September 20, 2022
    Publication date: May 4, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Masaki Ohashi, Kazuhiro Katayama
  • Publication number: 20230116120
    Abstract: A chemically amplified resist composition comprising (A) a polymer adapted to increase its solubility in alkaline aqueous solution under the action of acid, (B) a photoacid generator capable of generating an acid upon exposure to KrF excimer laser, ArF excimer laser, EB or EUV, and (C) a quencher in the form of an amine compound of specific structure is provided. The resist composition has a high sensitivity and forms a pattern with a high resolution and improved LWR or CDU, independent of whether it is of positive or negative tone.
    Type: Application
    Filed: September 14, 2022
    Publication date: April 13, 2023
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Masahiro Fukushima, Kazuhiro Katayama
  • Patent number: 11560355
    Abstract: A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR.
    Type: Grant
    Filed: January 15, 2020
    Date of Patent: January 24, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Masaki Ohashi, Kazuhiro Katayama
  • Patent number: 11448961
    Abstract: A novel carboxylic acid iodonium salt and a resist composition comprising the same as a quencher are provided. When resist composition is processed by photolithography using KrF or ArF excimer laser, EB or EUV, there is formed a resist pattern which is improved in rectangularity, MEF, LWR, and CDU.
    Type: Grant
    Filed: September 5, 2019
    Date of Patent: September 20, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takayuki Fujiwara, Masaki Ohashi, Kazuhiro Katayama, Kenji Yamada
  • Publication number: 20220107560
    Abstract: A sulfonium salt having formula (1) is novel. A chemically amplified resist composition comprising the sulfonium salt as a PAG has advantages including solvent solubility and improved lithography properties such as EL and LWR when processed by photolithography using high-energy radiation such as KrF or ArF excimer laser, EB or EUV.
    Type: Application
    Filed: September 28, 2021
    Publication date: April 7, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masahiro Fukushima, Kazuhiro Katayama
  • Publication number: 20220100089
    Abstract: A molecular resist composition comprising a sulfonium salt having a cation of specific structure and an organic solvent has a high sensitivity and forms a resist film with improved resolution and LWR, when processed by EB or EUV lithography.
    Type: Application
    Filed: September 24, 2021
    Publication date: March 31, 2022
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Kazuhiro Katayama, Masahiro Fukushima, Shun Kikuchi
  • Publication number: 20210287802
    Abstract: A method of evaluating pancreatic cancer includes (I) an obtaining step of obtaining amino acid concentration data on a concentration value of an amino acid in blood collected from a subject to be evaluated, and (II) an evaluating step of evaluating a state of pancreatic cancer in the subject by calculating a value of a formula using the amino acid concentration data of the subject obtained at the obtaining step and the formula previously established for evaluating the state of pancreatic cancer, including an explanatory variable to be substituted with the concentration value of the amino acid.
    Type: Application
    Filed: May 4, 2021
    Publication date: September 16, 2021
    Applicant: Ajinomoto Co., Inc.
    Inventors: Nobukazu ONO, Atsuko SHINHARA, Takahiko MURAMATSU, Shinya KIKUCHI, Hiroshi YAMAMOTO, Koichi SHIRAISHI, Kazuhiro KATAYAMA, Nobuyasu FUKUTAKE, Masahiko HIGASHIYAMA, Shinichi OHKAWA, Makoto UENO, Yohei MIYAGI, Naoyuki OKAMOTO
  • Publication number: 20210179554
    Abstract: An onium salt having formula (1) serving as an acid diffusion inhibitor and a chemically amplified resist composition comprising the acid diffusion inhibitor are provided. When processed by lithography, the resist composition exhibits a high sensitivity, and excellent lithography performance factors such as CDU and LWR.
    Type: Application
    Filed: December 4, 2020
    Publication date: June 17, 2021
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takayuki Fujiwara, Tomomi Watanabe, Kazuhiro Katayama
  • Patent number: 11022881
    Abstract: A photoacid generator having formula (1a) is provided. A chemically amplified resist composition comprising the PAG forms a pattern of rectangular profile with a good balance of sensitivity and LWR when processed by photolithography using ArF excimer laser, EB or EUV.
    Type: Grant
    Filed: April 9, 2019
    Date of Patent: June 1, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Kazuya Honda, Takayuki Fujiwara, Masaki Ohashi, Kazuhiro Katayama
  • Patent number: 11009793
    Abstract: A monomer and polymer having a substituent group capable of polarity switch under the action of acid are provided. A resist composition comprising the polymer forms at a high resolution a negative pattern insoluble in alkaline developer and having high etch resistance.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: May 18, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Masayoshi Sagehashi, Koji Hasegawa, Teppei Adachi, Kazuhiro Katayama
  • Patent number: 10921710
    Abstract: A polymer comprising units having a highly fused homoadamantane skeleton at side chain end bonded to the polymer backbone via a linking group has an appropriate solvent solubility and is capable of suppressing acid diffusion. A resist composition comprising the polymer and a specific photoacid generator exhibits a good DOF margin, CD uniformity, and a minimal CD change during PPD, and is quite effective in precise micropatterning.
    Type: Grant
    Filed: July 27, 2018
    Date of Patent: February 16, 2021
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei Adachi, Ryosuke Taniguchi, Kazuhiro Katayama