Patents by Inventor Kazuhiro Otsu
Kazuhiro Otsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11070046Abstract: A short-circuit protection circuit for a self-arc-extinguishing type semiconductor element includes a first protection circuit and a second protection circuit. The first protection circuit is configured to reduce a voltage between a control electrode and a first main electrode of the self-arc-extinguishing type semiconductor element when detecting overcurrent flowing between the first main electrode and a second main electrode. The second protection circuit is configured to: detect current flowing in an interconnection adapted to supply the drive voltage; determine, based on the detected current, whether the first protection circuit is in an operating state; and change the drive voltage to turn off the self-arc-extinguishing type semiconductor element when the first protection circuit is in the operating state.Type: GrantFiled: September 11, 2014Date of Patent: July 20, 2021Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Yoshitaka Naka, Yasushi Nakayama, Yoshiko Tamada, Hiroyuki Takagi, Junichiro Ishikawa, Kazuhiro Otsu, Naohiko Mitomi
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Patent number: 9966947Abstract: A gate driving circuit for an insulated gate-type power semiconductor element includes an Nch MOSFET which turns on the insulated gate-type power semiconductor element, a Pch MOSFET which turns off the insulated gate-type power semiconductor element, a control circuit which turns on the Nch MOSFET by applying a positive voltage to the gate electrode of the Nch MOSFET, and which turns on the Pch MOSFET by applying a negative voltage to the gate electrode of the Pch MOSFET, and a power supply which applies a negative voltage to the drain electrode of the Pch MOSFET and to a negative-side electrode of the control circuit, which applies a positive voltage to the drain electrode of the Nch MOSFET, and which applies to a positive-side electrode of the control circuit a positive voltage whose absolute value is larger than absolute value of the positive voltage applied to the drain electrode of the Nch MOSFET.Type: GrantFiled: July 3, 2014Date of Patent: May 8, 2018Assignee: Mitsubishi Electric CorporationInventors: Kazuhiro Otsu, Junichiro Ishikawa
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Publication number: 20170288385Abstract: A short-circuit protection circuit for a self-arc-extinguishing type semiconductor element includes a first protection circuit and a second protection circuit. The first protection circuit is configured to reduce a voltage between a control electrode and a first main electrode of the self-arc-extinguishing type semiconductor element when detecting overcurrent flowing between the first main electrode and a second main electrode. The second protection circuit is configured to: detect current flowing in an interconnection adapted to supply the drive voltage; determine, based on the detected current, whether the first protection circuit is in an operating state; and change the drive voltage to turn off the self-arc-extinguishing type semiconductor element when the first protection circuit is in the operating state.Type: ApplicationFiled: September 11, 2014Publication date: October 5, 2017Applicant: Mitsubishi Electric CorporationInventors: Yoshitaka NAKA, Yasushi NAKAYAMA, Yoshiko TAMADA, Hiroyuki TAKAGI, Junichiro ISHIKAWA, Kazuhiro OTSU, Naohiko MITOMI
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Publication number: 20170179950Abstract: A gate driving circuit for an insulated gate-type power semiconductor element includes an Nch MOSFET which turns on the insulated gate-type power semiconductor element, a Pch MOSFET which turns off the insulated gate-type power semiconductor element, a control circuit which turns on the Nch MOSFET by applying a positive voltage to the gate electrode of the Nch MOSFET, and which turns on the Pch MOSFET by applying a negative voltage to the gate electrode of the Pch MOSFET, and a power supply which applies a negative voltage to the drain electrode of the Pch MOSFET and to a negative-side electrode of the control circuit, which applies a positive voltage to the drain electrode of the Nch MOSFET, and which applies to a positive-side electrode of the control circuit a positive voltage whose absolute value is larger than absolute value of the positive voltage applied to the drain electrode of the Nch MOSFET.Type: ApplicationFiled: July 3, 2014Publication date: June 22, 2017Applicant: Mitsubishi Electric CorporationInventors: Kazuhiro OTSU, Junichiro ISHIKAWA
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Patent number: 6730578Abstract: A separating machine for separating a thinned semiconductor substrate from a holding substrate after a semiconductor substrate is bonded to the holding substrate with a thermoplastic resin and a back surface treatment including the thinning of the semiconductor substrate is carried out. The separating machine includes a pair of vacuum adsorption heads for adsorbing the holding substrate-bonded thinned semiconductor substrate from the holding substrate side and from the thinned semiconductor substrate side, which is opposite to the holding substrate side. At least one of the vacuum adsorption heads has a moving means for moving the vacuum adsorption head to adsorb and hold the bonded substrates in a predetermined position together with the other vacuum adsorption head. At least one of the vacuum adsorption heads, has a system for moving the vacuum adsorption head in a single swing direction for separating the bonded substrates after the above adsorption and holding operation is performed.Type: GrantFiled: February 7, 2002Date of Patent: May 4, 2004Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Kazuhiro Otsu, Hideki Kobayashi, Tatsuya Sasaki, Kazuhiro Ohya
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Patent number: 6653207Abstract: A process for the production of an electric part, comprising performing a circuit-parts-forming step including the introduction of impurities on one surface (surface A) of a semiconductor substrate, then bonding the surface A to a holding substrate, performing a back surface treatment step essentially including a polishing of an exposed surface (surface B) of the semiconductor substrate to a thickness of 100 &mgr;m or less to obtain an electric-part-formed thinned substrate and separating the thinned substrate from the holding substrate, wherein a resin composition containing a swelling inorganic compound (WC) is used for an adhesion layer and in the separating step the thinned substrate is separated from the holding substrate after decreasing the adhesive strength of the thinned substrate and the holding substrate by swelling the swelling inorganic compound (WC).Type: GrantFiled: March 11, 2002Date of Patent: November 25, 2003Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Kazuyuki Ohya, Kazuhiro Otsu, Takeshi Nobukuni
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Publication number: 20020173121Abstract: A process for the production of electric parts, comprisingType: ApplicationFiled: May 14, 2002Publication date: November 21, 2002Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.Inventors: Kazuyuki Ohya, Norio Sayama, Kazuhiro Otsu
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Publication number: 20020132447Abstract: A process for the production of an electric part, comprising performing a circuit-parts-forming step including the introduction of impurities on one surface (surface A) of a semiconductor substrate, then bonding the surface A to a holding substrate, performing a back surface treatment step essentially including a polishing of an exposed surface (surface B) of the semiconductor substrate to a thickness of 100 &mgr;m or less to obtain an electric-part-formed thinned substrate and separating the thinned substrate from the holding substrate,Type: ApplicationFiled: March 11, 2002Publication date: September 19, 2002Inventors: Kazuyuki Ohya, Kazuhiro Otsu, Takeshi Nobukuni
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Publication number: 20020106869Abstract: A separating machine for a thinned semiconductor substrate, which separating machine separates a thinned semiconductor substrate from a holding substrate after a semiconductor substrate is bonded to the holding substrate with a thermoplastic resin and a back surface treatment including the thinning of the semiconductor substrate is carried out and which separating machine comprises a pair of vacuum adsorption heads for adsorbing the holding substrate-bonded thinned semiconductor substrate respectively from the holding substrate side and from the thinned semiconductor substrate side opposite to the holding substrate side, wherein at least one of the vacuum adsorption heads has a moving means for adsorbing and holding the holding substrate-bonded thinned semiconductor substrate in a predetermined position together with the other vacuum adsorption head and at least one of the vacuum adsorption heads has a system for moving in a single swing direction for separation after the above adsorption and holding, and a sType: ApplicationFiled: February 7, 2002Publication date: August 8, 2002Inventors: Kazuhiro Otsu, Hideki Kobayashi, Tatsuya Sasaki, Kazuyuki Ohya
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Patent number: 6337288Abstract: A method of supporting a semiconductor substrate according to the present invention can be applied to the step of processing the semiconductor substrate at a high temperature of 350° C. or higher, and there is provided a process for the production of electronic parts, comprising the steps of forming semiconductor circuits on one surface (surface A) of a semiconductor substrate (SEC) having a thickness of at least 0.2 mm, supporting the semiconductor substrate on a supporting substrate (BP) by bonding (AS) of said surface A to the supporting substrate (BP), grinding and polishing the exposed other surface (surface B) of the semiconductor substrate (SEC) by a physical method, a chemical method or a method of combination of these methods, to decrease the thickness of the semiconductor substrate (SEC) to less than 0.Type: GrantFiled: June 28, 2000Date of Patent: January 8, 2002Assignee: Mitsubishi Gas Chemical Co., Inc.Inventors: Kazuyuki Ohya, Masaki Fujihira, Kazuhiro Otsu, Hideki Kobayashi
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Patent number: 6254946Abstract: An oxygen-absorbing composition comprising (a) a powdery or particulate crosslinked polymer containing carbon-carbon unsaturated bonds and having a high heat resistance and being easy to grind due to crosslinked structure, and (b) a catalyst. The oxygen-absorbing composition can be used in a dry state and can be utilized in an oxygen absorbent package. An oxygen-absorbing multilayered body can be formed from the oxygen-absorbing composition. A sheet or a film oxygen-absorbing multilayered body can be made from the oxygen-absorbing composition.Type: GrantFiled: June 24, 1998Date of Patent: July 3, 2001Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masukazu Hirata, Kazuhiro Otsu, Yoshinori Mabuchi, Noriyuki Kimura, Takahiro Seki