Patents by Inventor Kazuhiro Otsu

Kazuhiro Otsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11070046
    Abstract: A short-circuit protection circuit for a self-arc-extinguishing type semiconductor element includes a first protection circuit and a second protection circuit. The first protection circuit is configured to reduce a voltage between a control electrode and a first main electrode of the self-arc-extinguishing type semiconductor element when detecting overcurrent flowing between the first main electrode and a second main electrode. The second protection circuit is configured to: detect current flowing in an interconnection adapted to supply the drive voltage; determine, based on the detected current, whether the first protection circuit is in an operating state; and change the drive voltage to turn off the self-arc-extinguishing type semiconductor element when the first protection circuit is in the operating state.
    Type: Grant
    Filed: September 11, 2014
    Date of Patent: July 20, 2021
    Assignee: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Yoshitaka Naka, Yasushi Nakayama, Yoshiko Tamada, Hiroyuki Takagi, Junichiro Ishikawa, Kazuhiro Otsu, Naohiko Mitomi
  • Patent number: 9966947
    Abstract: A gate driving circuit for an insulated gate-type power semiconductor element includes an Nch MOSFET which turns on the insulated gate-type power semiconductor element, a Pch MOSFET which turns off the insulated gate-type power semiconductor element, a control circuit which turns on the Nch MOSFET by applying a positive voltage to the gate electrode of the Nch MOSFET, and which turns on the Pch MOSFET by applying a negative voltage to the gate electrode of the Pch MOSFET, and a power supply which applies a negative voltage to the drain electrode of the Pch MOSFET and to a negative-side electrode of the control circuit, which applies a positive voltage to the drain electrode of the Nch MOSFET, and which applies to a positive-side electrode of the control circuit a positive voltage whose absolute value is larger than absolute value of the positive voltage applied to the drain electrode of the Nch MOSFET.
    Type: Grant
    Filed: July 3, 2014
    Date of Patent: May 8, 2018
    Assignee: Mitsubishi Electric Corporation
    Inventors: Kazuhiro Otsu, Junichiro Ishikawa
  • Publication number: 20170288385
    Abstract: A short-circuit protection circuit for a self-arc-extinguishing type semiconductor element includes a first protection circuit and a second protection circuit. The first protection circuit is configured to reduce a voltage between a control electrode and a first main electrode of the self-arc-extinguishing type semiconductor element when detecting overcurrent flowing between the first main electrode and a second main electrode. The second protection circuit is configured to: detect current flowing in an interconnection adapted to supply the drive voltage; determine, based on the detected current, whether the first protection circuit is in an operating state; and change the drive voltage to turn off the self-arc-extinguishing type semiconductor element when the first protection circuit is in the operating state.
    Type: Application
    Filed: September 11, 2014
    Publication date: October 5, 2017
    Applicant: Mitsubishi Electric Corporation
    Inventors: Yoshitaka NAKA, Yasushi NAKAYAMA, Yoshiko TAMADA, Hiroyuki TAKAGI, Junichiro ISHIKAWA, Kazuhiro OTSU, Naohiko MITOMI
  • Publication number: 20170179950
    Abstract: A gate driving circuit for an insulated gate-type power semiconductor element includes an Nch MOSFET which turns on the insulated gate-type power semiconductor element, a Pch MOSFET which turns off the insulated gate-type power semiconductor element, a control circuit which turns on the Nch MOSFET by applying a positive voltage to the gate electrode of the Nch MOSFET, and which turns on the Pch MOSFET by applying a negative voltage to the gate electrode of the Pch MOSFET, and a power supply which applies a negative voltage to the drain electrode of the Pch MOSFET and to a negative-side electrode of the control circuit, which applies a positive voltage to the drain electrode of the Nch MOSFET, and which applies to a positive-side electrode of the control circuit a positive voltage whose absolute value is larger than absolute value of the positive voltage applied to the drain electrode of the Nch MOSFET.
    Type: Application
    Filed: July 3, 2014
    Publication date: June 22, 2017
    Applicant: Mitsubishi Electric Corporation
    Inventors: Kazuhiro OTSU, Junichiro ISHIKAWA
  • Patent number: 6730578
    Abstract: A separating machine for separating a thinned semiconductor substrate from a holding substrate after a semiconductor substrate is bonded to the holding substrate with a thermoplastic resin and a back surface treatment including the thinning of the semiconductor substrate is carried out. The separating machine includes a pair of vacuum adsorption heads for adsorbing the holding substrate-bonded thinned semiconductor substrate from the holding substrate side and from the thinned semiconductor substrate side, which is opposite to the holding substrate side. At least one of the vacuum adsorption heads has a moving means for moving the vacuum adsorption head to adsorb and hold the bonded substrates in a predetermined position together with the other vacuum adsorption head. At least one of the vacuum adsorption heads, has a system for moving the vacuum adsorption head in a single swing direction for separating the bonded substrates after the above adsorption and holding operation is performed.
    Type: Grant
    Filed: February 7, 2002
    Date of Patent: May 4, 2004
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kazuhiro Otsu, Hideki Kobayashi, Tatsuya Sasaki, Kazuhiro Ohya
  • Patent number: 6653207
    Abstract: A process for the production of an electric part, comprising performing a circuit-parts-forming step including the introduction of impurities on one surface (surface A) of a semiconductor substrate, then bonding the surface A to a holding substrate, performing a back surface treatment step essentially including a polishing of an exposed surface (surface B) of the semiconductor substrate to a thickness of 100 &mgr;m or less to obtain an electric-part-formed thinned substrate and separating the thinned substrate from the holding substrate, wherein a resin composition containing a swelling inorganic compound (WC) is used for an adhesion layer and in the separating step the thinned substrate is separated from the holding substrate after decreasing the adhesive strength of the thinned substrate and the holding substrate by swelling the swelling inorganic compound (WC).
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: November 25, 2003
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kazuyuki Ohya, Kazuhiro Otsu, Takeshi Nobukuni
  • Publication number: 20020173121
    Abstract: A process for the production of electric parts, comprising
    Type: Application
    Filed: May 14, 2002
    Publication date: November 21, 2002
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Kazuyuki Ohya, Norio Sayama, Kazuhiro Otsu
  • Publication number: 20020132447
    Abstract: A process for the production of an electric part, comprising performing a circuit-parts-forming step including the introduction of impurities on one surface (surface A) of a semiconductor substrate, then bonding the surface A to a holding substrate, performing a back surface treatment step essentially including a polishing of an exposed surface (surface B) of the semiconductor substrate to a thickness of 100 &mgr;m or less to obtain an electric-part-formed thinned substrate and separating the thinned substrate from the holding substrate,
    Type: Application
    Filed: March 11, 2002
    Publication date: September 19, 2002
    Inventors: Kazuyuki Ohya, Kazuhiro Otsu, Takeshi Nobukuni
  • Publication number: 20020106869
    Abstract: A separating machine for a thinned semiconductor substrate, which separating machine separates a thinned semiconductor substrate from a holding substrate after a semiconductor substrate is bonded to the holding substrate with a thermoplastic resin and a back surface treatment including the thinning of the semiconductor substrate is carried out and which separating machine comprises a pair of vacuum adsorption heads for adsorbing the holding substrate-bonded thinned semiconductor substrate respectively from the holding substrate side and from the thinned semiconductor substrate side opposite to the holding substrate side, wherein at least one of the vacuum adsorption heads has a moving means for adsorbing and holding the holding substrate-bonded thinned semiconductor substrate in a predetermined position together with the other vacuum adsorption head and at least one of the vacuum adsorption heads has a system for moving in a single swing direction for separation after the above adsorption and holding, and a s
    Type: Application
    Filed: February 7, 2002
    Publication date: August 8, 2002
    Inventors: Kazuhiro Otsu, Hideki Kobayashi, Tatsuya Sasaki, Kazuyuki Ohya
  • Patent number: 6337288
    Abstract: A method of supporting a semiconductor substrate according to the present invention can be applied to the step of processing the semiconductor substrate at a high temperature of 350° C. or higher, and there is provided a process for the production of electronic parts, comprising the steps of forming semiconductor circuits on one surface (surface A) of a semiconductor substrate (SEC) having a thickness of at least 0.2 mm, supporting the semiconductor substrate on a supporting substrate (BP) by bonding (AS) of said surface A to the supporting substrate (BP), grinding and polishing the exposed other surface (surface B) of the semiconductor substrate (SEC) by a physical method, a chemical method or a method of combination of these methods, to decrease the thickness of the semiconductor substrate (SEC) to less than 0.
    Type: Grant
    Filed: June 28, 2000
    Date of Patent: January 8, 2002
    Assignee: Mitsubishi Gas Chemical Co., Inc.
    Inventors: Kazuyuki Ohya, Masaki Fujihira, Kazuhiro Otsu, Hideki Kobayashi
  • Patent number: 6254946
    Abstract: An oxygen-absorbing composition comprising (a) a powdery or particulate crosslinked polymer containing carbon-carbon unsaturated bonds and having a high heat resistance and being easy to grind due to crosslinked structure, and (b) a catalyst. The oxygen-absorbing composition can be used in a dry state and can be utilized in an oxygen absorbent package. An oxygen-absorbing multilayered body can be formed from the oxygen-absorbing composition. A sheet or a film oxygen-absorbing multilayered body can be made from the oxygen-absorbing composition.
    Type: Grant
    Filed: June 24, 1998
    Date of Patent: July 3, 2001
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masukazu Hirata, Kazuhiro Otsu, Yoshinori Mabuchi, Noriyuki Kimura, Takahiro Seki