Abstract: A measuring method that includes holding a specimen to be measured on a flat-plate periodic structure, applying a linearly-polarized electromagnetic wave to the flat-plate periodic structure, detecting the electromagnetic wave scattered forward or backward by the flat-plate periodic structure, and measuring characteristics of the specimen on the basis of a phenomenon that a dip waveform appearing in a frequency characteristic of the forward-scattered electromagnetic wave or a peak waveform appearing in a frequency characteristic of the backward-scattered electromagnetic wave is changed with the presence of the specimen.

Abstract: A measuring method for measuring characteristics of an object to be measured, the measuring method including holding the object on a void-arranged structure having at least two void portions that pass therethrough in a direction perpendicular to a principal surface thereof, and applying electromagnetic waves to the void-arranged structure on which the object is held to detect frequency characteristics of the electromagnetic waves transmitted through the void-arranged structure. The void-arranged structure has a grid structure in which the void portions are periodically arranged in at least one direction on the principal surface of the void-arranged structure. The characteristics of the object are measured on the basis of a relationship between a first frequency characteristic and a second frequency characteristic.

Abstract: A method of attaching an object to be measured to a structure causing a diffraction phenomenon; irradiating the structure to which the object to be measured is attached and which causes the diffraction phenomenon with an electromagnetic wave; detecting the electromagnetic wave scattered by the structure causing the diffraction phenomenon; and measuring a characteristic of the object to be measured from the frequency characteristic of the detected electromagnetic wave. The object to be measured is attached directly to the surface of the structure causing the diffraction phenomenon. Thus, the method for measuring the characteristic of an object to be measured exhibits an improved measurement sensitivity and high reproducibility. A structure causing a diffraction phenomenon and used for the method, and a measuring device are provided.

Abstract: A measuring method that includes holding a specimen to be measured on a flat-plate periodic structure, applying a linearly-polarized electromagnetic wave to the flat-plate periodic structure, detecting the electromagnetic wave scattered forward or backward by the flat-plate periodic structure, and measuring characteristics of the specimen on the basis of a phenomenon that a dip waveform appearing in a frequency characteristic of the forward-scattered electromagnetic wave or a peak waveform appearing in a frequency characteristic of the backward-scattered electromagnetic wave is changed with the presence of the specimen.

Abstract: A measurement method that includes irradiating a void-arranged structure on which an analyte has been held with an electromagnetic wave, detecting an electromagnetic wave scattered on the void-arranged structure, and determining a property of the analyte on the basis of at least one parameter, the parameter including the amount of change in the ratio of the detected electromagnetic wave to the irradiated electromagnetic wave at a specific frequency between the presence and the absence of the analyte.

Abstract: A method of measuring specimen characteristics that includes holding a specimen on a gap array structure that includes gaps regularly arrayed in at least one array direction, applying a linearly-polarized electromagnetic wave to the gap array structure on which the specimen is held, detecting the electromagnetic wave scattered by the gap array structure, and measuring characteristics of the specimen based on a frequency characteristic of the detected scattered electromagnetic wave, wherein a polarizing direction of the linearly-polarized electromagnetic wave and a principal surface of the gap array structure are not parallel to each other.

Abstract: A method of attaching an object to be measured to a structure causing a diffraction phenomenon; irradiating the structure to which the object to be measured is attached and which causes the diffraction phenomenon with an electromagnetic wave; detecting the electromagnetic wave scattered by the structure causing the diffraction phenomenon; and measuring a characteristic of the object to be measured from the frequency characteristic of the detected electromagnetic wave. The object to be measured is attached directly to the surface of the structure causing the diffraction phenomenon. Thus, the method for measuring the characteristic of an object to be measured exhibits an improved measurement sensitivity and high reproducibility. A structure causing a diffraction phenomenon and used for the method, and a measuring device are provided.