Patents by Inventor Kazuhiro Yamanaka

Kazuhiro Yamanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8981163
    Abstract: Disclosed is a fluorine-containing aromatic compound represented by the following general formula (1) and its production method. In the formula (1), R1 is a hydroxyl group or amino group, each of R2 to R5 is independently a hydrogen atom, or a C1-4 straight chain or a C3 or C4 branched chain alkyl group, hydrogen atoms of the alkyl group may partially or totally be replaced with fluorine atoms, n is an integer of 0 to 2, and each of m and l is independently 0 or 1. A polymer derived from this fluorine-containing aromatic compound contains —C(CF3)2OH group at a position away from the polymer main chain. Therefore, it is useful for resist use.
    Type: Grant
    Filed: August 8, 2012
    Date of Patent: March 17, 2015
    Assignee: Centrall Glass Company, Limited
    Inventors: Junya Nakatsuji, Makoto Matsuura, Kazuhiro Yamanaka
  • Publication number: 20140275445
    Abstract: A composition containing a metal compound and a siloxane compound (A) represented by general formula (1): wherein X is represented by general formula X1 or X2: wherein the number of X1 is 1-8; the number of X2 is 0-7; the sum of the number of X1 and the number of X2 is 8; R1 to R4 represent a hydrogen atom, a C1-8 alkyl group, alkenyl group, alkynyl group, or a C6-8 aryl group, a hydrogen atom thereof optionally being substituted by a fluorine atom; R5 represents a C1-18 alkyl group, alkenyl group, alkynyl group or aryl group, a hydrogen atom thereof being optionally substituted by a fluorine atom, a carbon atom being optionally substituted by an oxygen atom or a nitrogen atom; R6 represents a hydrogen atom, a vinyl group or an allyl group; m and n represent an integer of 1-4; and 3?m+n.
    Type: Application
    Filed: October 16, 2012
    Publication date: September 18, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Kazuhiro Yamanaka, Hiroshi Eguchi, Junya Nakatsuji, Takeshi Suda, Katsuhiro Akiyama
  • Publication number: 20140242516
    Abstract: A composition provided to contain: an alkoxysilane condensate obtained by the condensation of alkoxysilane A represented by general formula (1): (CH3)Si(OR1)3 (In the general formula (1), R1 mutually independently represents methyl group or ethyl group.), alkoxysilane B represented by general formula (2): (Ph)Si(OR1)3 (In the general formula (2), R1 mutually independently represents methyl group or ethyl group.), and alkoxysilane C represented by general formula (3): (CH3)2Si(OR1)2 (In the general formula (3), R1 mutually independently represents methyl group or ethyl group.) at an A:B:C mole ratio within the range of 30-70:10-50:20-60; and a polyether-modified polydimethylsiloxane.
    Type: Application
    Filed: October 5, 2012
    Publication date: August 28, 2014
    Inventors: Tsuyoshi Ogawa, Junya Nakatsuji, Kazuhiro Yamanaka
  • Patent number: 8809451
    Abstract: According to the present invention, a polymer is obtained by polycondensation of a fluorinated dicarboxylic acid derivative of the general formula (M-1) or an acid anhydride of the fluorinated dicarboxylic acid with a polyfunctional compound having two to four reactive groups corresponding in reactivity to carbonyl moieties of the fluorinated dicarboxylic acid derivative or acid anhydride. [Chem. 134] AOCF2C-Q-CF2COA???(M-1) In the above formula, Q represents a divalent organic group having a substituted or unsubstituted aromatic ring; and A and A? each independently represent an organic group. This polymer exhibits a sufficiently low dielectric constant for use as a semiconductor protection film and has the capability of forming a film at a relatively low temperature of 250° C. or lower.
    Type: Grant
    Filed: February 18, 2010
    Date of Patent: August 19, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Yoshimi Isono, Satoru Narizuka, Hidehisa Nanai, Kazuhiro Yamanaka
  • Publication number: 20140194655
    Abstract: Disclosed is a fluorine-containing aromatic compound represented by the following general formula (1) and its production method. In the formula (1), R1 is a hydroxyl group or amino group, each of R2 to R5 is independently a hydrogen atom, or a C1-4 straight chain or a C3 or C4 branched chain alkyl group, hydrogen atoms of the alkyl group may partially or totally be replaced with fluorine atoms, n is an integer of 0 to 2, and each of m and l is independently 0 or 1. A polymer derived from this fluorine-containing aromatic compound contains —C(CF3)2OH group at a position away from the polymer main chain. Therefore, it is useful for resist use.
    Type: Application
    Filed: August 8, 2012
    Publication date: July 10, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Junya Nakatsuji, Makoto Matsuura, Kazuhiro Yamanaka
  • Publication number: 20140174293
    Abstract: [Problem] Diamine and carboxylic dianhydride for polymerizing a hexafluoroisopropylidene group-containing polyimide are limited in chemical structure when developed into a polyimide membrane, so that it is difficult to design a chemical structure with consideration paid to the strength and separation performance of a gas separation membrane. A gas separation membrane easily soluble in an organic solvent, excellent in formability so as to be readily usable for a gas separation membrane, and excellent in gas separation performance is obtained. [Solution] A gas separation membrane, including: a polyimide that contains a repeating unit represented by general formula (1). [In the formula (1), R1 is a divalent organic group and R2 is a tetravalent organic group, R1 containing a 2-hydroxy-1,1,1,3,3,3-hexafluoroisopropyl group (—C(CF3)2OH).
    Type: Application
    Filed: May 30, 2012
    Publication date: June 26, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Kazuhiro Yamanaka, Tsuyoshi Ogawa, Takeshi Suda, Hiroki Uoyama
  • Patent number: 8754139
    Abstract: A polymeric membrane includes an active layer on a support. The active layer includes a polymer with a backbone, and the backbone has attached thereto at least one fluoroalcohol moiety.
    Type: Grant
    Filed: February 20, 2009
    Date of Patent: June 17, 2014
    Assignees: International Business Machines Corporation, Central Glass Co., Ltd.
    Inventors: Robert David Allen, Na Young-Hye, Ratnam Sooriyakumaran, Masaki Fujiwara, Kazuhiro Yamanaka
  • Publication number: 20140148548
    Abstract: The present invention provides a fluorine-containing fluorenediamine of the formula (2): where R1 represents one kind of substituent group selected from the group consisting of a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, a C1-C4 alkyl group, a C1-C4 fluoroalkyl group in which any number of hydrogen atoms can be substituted by a fluorine atom, a phenyl group, a methoxy group and a nitro group; R2 represents one kind of substituent group selected from the group consisting of a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a phenyl group, a naphthyl group, a biphenyl group, a sulfonic acid group, a —C?C—C(CH3)2OH group, a —C?C—C6H5 group and a —C?C—Si(CH3)3 group; HFIP represents a —C(CF3)2OH group; and m and n each independently represent an integer of 0 to 2 and satisfy a condition of 1?m+n?4.
    Type: Application
    Filed: April 23, 2013
    Publication date: May 29, 2014
    Inventors: Kazuhiro YAMANAKA, Takeshi SUDA, Hiroki UOYAMA
  • Publication number: 20140144324
    Abstract: A gas separation membrane having a polyimide structure. The polyimide structure is provided to contain a repeating unit represented by general formula (1): (In the formula, R1 is a divalent organic group and R2 is a tetravalent organic group), wherein R1 is a divalent organic group represented by general formula (2): (In the formula, Raa is a single bond, an oxygen atom, a sulfur atom, —SO2— group, —CH2— group, —C(?O)— group, —C(CH3)2— group, —C(CH3)(CH2CH3)— group, —C(CF3)2— group or a divalent organic group formed by removing any two hydrogen atoms from a C3-C12 alicyclic hydrocarbon or C6-C25 aromatic hydrocarbon. Rab is a C1-C6 alkyl group. “ac” and “ad” mutually independently represent an integer of 0 to 2 such that 1?ac+ad?4. HFIP represents a —C(CF3)2OH group. A straight line that intersects with a wiggly line represents a bonding moiety).
    Type: Application
    Filed: April 23, 2013
    Publication date: May 29, 2014
    Inventors: Kazuhiro YAMANAKA, Takeshi SUDA, Hiroki UOYAMA
  • Publication number: 20140116615
    Abstract: An adhesive composition according to the present invention contains a polymerizable group-containing siloxane compound, a polymerization initiator and an ultraviolet-absorbing blowing agent. This adhesive composition enables quick bonding of substrates etc. by light irradiation or by heating such that the bonded substrates can secure adhesion and heat resistance to withstand grinding etc. and, when no longer needed to be bonded, can be easily separated from each other by ultraviolet light irradiation and is thus suitable for use as an adhesive composition for manufacturing of semiconductor devices (particularly for manufacturing of semiconductor devices with through-silicon vias).
    Type: Application
    Filed: October 24, 2013
    Publication date: May 1, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Tsuyoshi OGAWA, Kiminori SATO, Hiroki UOYAMA, Kazuhiro YAMANAKA
  • Publication number: 20140100342
    Abstract: Disclosed in the present invention are a fluorine-containing polymerizable compound of the general formula (1) and a polymer compound obtained therefrom: where A represents a single bond, an oxygen atom, a sulfur atom, SO2, CH2, CO, C(CH3)2, C(CH3)(CH2CH3), C(CF3)2, C(CH3)(C6H5), CH2—C6H4—CH2 or a divalent organic group obtained by elimination of two hydrogen atoms from benzene, biphenyl, naphthalene, cyclohexene or fluorene; and a and b each independently represent an integer of 0 to 2 and satisfy a relationship of 1?a+b?4. The thus-obtained polymer compound combines adequate hydrophilicity and high transparency with low water adsorption of fluorine-containing compound.
    Type: Application
    Filed: May 29, 2012
    Publication date: April 10, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Junya Nakatsuji, Makoto Matsuura, Kazuhiro Yamanaka
  • Publication number: 20140100341
    Abstract: Disclosed in the present invention is a fluorine-containing polymerizable compound of the general formula (1): where a and b each independently represent an integer of 0 to 2 and satisfy a relationship of a+b=2; c represents an integer of 0 to 3; d and e each independently represents an integer of 0 to 2 and satisfy a relationship of 1?d+e?4; and the moiety of the following formula may have a carbon atom replaced by a heteroatom (a nitrogen atom, an oxygen atom or a sulfur atom) and may have a hydrogen atom substituted with a substituent that may contain a nitrogen atom, an oxygen atom or a sulfur atom
    Type: Application
    Filed: May 29, 2012
    Publication date: April 10, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Junya Nakatsuji, Makoto Matsuura, Kazuhiro Yamanaka
  • Publication number: 20140046084
    Abstract: A siloxane compound according to the present invention is represented by the general formula (1). wherein X are each independently either X1 or X2 with the proviso that at least one of X is X2; R1 to R5 are each independently a hydrogen atom, a C1-C8 alkyl, alkenyl or alkynyl group, a phenyl group or a pyridyl group; each of R1 to R5 may have a carbon atom replaced by an oxygen atom and may have an ether bond, a carbonyl group or an ester bond in its structure; m and n are each independently an integer of 1 to 10; and Y are each independently a specific cross-linking group. The siloxane compound according to the present invention has flowability and easy formability at lower temperatures as compared to conventional silsesquioxanes.
    Type: Application
    Filed: April 17, 2012
    Publication date: February 13, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Hiroshi Honjo, Toshihisa Ide, Yoshinori Akamatsu, Hiroshi Eguchi, Junya Nakatsuji, Makoto Matsuura, Tsuyoshi Ogawa, Kazuhiro Yamanaka
  • Publication number: 20140046014
    Abstract: A siloxane compound according to the present invention is represented by the general formula (1): where X are each independently either X1 or X2 with the proviso that at least one of X is X1; R1 to R8 are each independently a hydrogen atom, a C1-C8 alkyl, alkenyl or alkynyl group, a phenyl group or a pyridyl group; each of R1 to R5 may have a carbon atom replaced by an oxygen atom and may have an ether bond, a carbonyl group or an ester bond in its structure; m is an integer of 3 to 8; n is an integer of 0 to 9; p is 0 or 1; and Y are each independently a cross-linking group. This siloxane compound according to the present invention has higher heat resistance and flowability and easy formability at lower temperatures as compared to conventional silsesquioxanes.
    Type: Application
    Filed: April 17, 2012
    Publication date: February 13, 2014
    Applicant: Central Glass Company, Limited
    Inventors: Hiroshi Honjo, Hiroshi Eguchi, Kazuhiro Yamanaka
  • Patent number: 8513457
    Abstract: A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
    Type: Grant
    Filed: May 17, 2012
    Date of Patent: August 20, 2013
    Assignee: Central Glass Company, Limited
    Inventors: Yoshimi Isono, Jonathan Joachim Jodry, Satoru Narizuka, Kazuhiro Yamanaka
  • Patent number: 8304508
    Abstract: A fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.
    Type: Grant
    Filed: August 1, 2011
    Date of Patent: November 6, 2012
    Assignee: Central Glass Company, Limited
    Inventors: Satoru Narizuka, Yuji Hagiwara, Masashi Nagamori, Kazuhiro Yamanaka
  • Publication number: 20120226070
    Abstract: A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
    Type: Application
    Filed: May 17, 2012
    Publication date: September 6, 2012
    Applicant: Central Glass Company, Limited
    Inventors: Yoshimi ISONO, Jonathan Joachim JODRY, Satoru NARIZUKA, Kazuhiro YAMANAKA
  • Patent number: 8187787
    Abstract: Disclosed is a fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.
    Type: Grant
    Filed: June 26, 2008
    Date of Patent: May 29, 2012
    Assignee: Central Glass Company, Limited
    Inventors: Yoshimi Isono, Jonathan Joachim Jodry, Satoru Narizuka, Kazuhiro Yamanaka
  • Publication number: 20110301305
    Abstract: According to the present invention, a polymer is obtained by polycondensation of a fluorinated dicarboxylic acid derivative of the general formula (M-1) or an acid anhydride of the fluorinated dicarboxylic acid with a polyfunctional compound having two to four reactive groups corresponding in reactivity to carbonyl moieties of the fluorinated dicarboxylic acid derivative or acid anhydride. [Chem. 134] AOCF2C-Q-CF2COA???(M-1) In the above formula, Q represents a divalent organic group having a substituted or unsubstituted aromatic ring; and A and A? each independently represent an organic group. This polymer exhibits a sufficiently low dielectric constant for use as a semiconductor protection film and has the capability of forming a film at a relatively low temperature of 250° C. or lower.
    Type: Application
    Filed: February 18, 2010
    Publication date: December 8, 2011
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Yoshimi Isono, Satoru Narizuka, Hidehisa Nanai, Kazuhiro Yamanaka
  • Publication number: 20110282026
    Abstract: A fluorine-containing dicarboxylic acid represented by formula (1), wherein n represents an integer of 1-4, and the two carboxylic groups are not adjacent to each other on the aromatic ring. It is possible to obtain a linear polymer compound by reacting the fluorine-containing dicarboxylic acid with a comonomer (e.g., diaminodiol). By thermal cyclization, this linear polymer compound can be converted into another polymer compound having superior characteristics.
    Type: Application
    Filed: August 1, 2011
    Publication date: November 17, 2011
    Applicant: CENTRAL GLASS COMPANY, LIMITED
    Inventors: Satoru NARIZUKA, Yuji Hagiwara, Masashi Nagamori, Kazuhiro Yamanaka