Patents by Inventor Kazuhiro Yamazaki
Kazuhiro Yamazaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240109326Abstract: A liquid ejection head includes a print element substrate including multiple ejection openings, pressure chambers, a common flow path, and pumps, the pumps being configured to circulate liquid between the common flow path and the pressure chamber; and a flow path member laminated to the print element substrate. The flow path member includes a supply flow path and a collection flow path, the supply flow path being configured to supply liquid to the print element substrate, and the collection flow path being configured to collect liquid that is not ejected. The supply flow path and the collection flow path have liquid connection with the same common flow path. A circulating pump generates a flow of liquid flowing in an order of the supply flow path, the common flow path, and the collection flow path, the circulating pump being provided at a position different from the print element substrate.Type: ApplicationFiled: December 8, 2023Publication date: April 4, 2024Inventors: Kazuhiro Yamada, Yoshiyuki Nakagawa, Toru Nakakubo, Ryo Kasai, Takuro Yamazaki
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Publication number: 20240093756Abstract: An anti-vibration device is secured to a vibration source and a vibration transmission portion to inhibit transmission of vibration, and includes a first elastically deformed portion, a second elastically deformed portion and a third elastically deformed portion. The first elastically deformed portion is a plate having a thickness in a first thickness direction and vibrates in the first thickness direction to configure a path for the vibration to be transmitted from the vibration source to the vibration transmission portion. The second elastically deformed portion is a plate having a thickness in a second thickness direction intersecting the first thickness direction and vibrates in the second thickness direction to configure the path. The third elastically deformed portion is a plate having a thickness in a third thickness direction intersecting the first thickness direction and the second thickness direction and vibrates in the third thickness direction to configure the path.Type: ApplicationFiled: May 31, 2023Publication date: March 21, 2024Applicant: DENSO CORPORATIONInventors: Kazuhiro HAYASHI, Yasumasa YAMAZAKI, Motohiko UEDA, Yoshikatsu SAWADA, Takaya MORISHITA
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Publication number: 20240089619Abstract: The present technology relates to a light detection device and an electronic apparatus capable of increasing sensitivity of a specific pixel. The light detection device includes a pixel array unit in which a plurality of pixels is regularly arranged, the plurality of pixels including a first pixel and a second pixel, the first pixel including at least a photodiode and one or more pixel transistors, the second pixel including at least a photodiode larger in size than the photodiode of the first pixel, in which the pixel transistor in the first pixel is shared by the first pixel and the second pixel. The present technology may be applied to image sensors and the like, for example.Type: ApplicationFiled: December 24, 2021Publication date: March 14, 2024Inventors: KAZUYOSHI YAMASHITA, KAZUHIRO GOI, SHINICHIRO NOUDO, TOMOHIRO YAMAZAKI, ATSUSHI TODA, TAKAYUKI OGASAHARA, KOJI MIYATA
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Publication number: 20210407799Abstract: In one general aspect, an apparatus can include a wide bandgap wafer having a backside and a frontside. The apparatus can include a detection facilitating layer capped on the backside of the wide bandgap wafer, the detection facilitating layer having a thickness less than a thickness of the wide bandgap wafer.Type: ApplicationFiled: September 28, 2020Publication date: December 30, 2021Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLCInventors: Tetsuya YOSHIDA, Takumi HOSOYA, Hideto SHIMOYOSHI, Kazuhiro YAMAZAKI
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Patent number: 11155704Abstract: A methacrylic resin composition is provided which contains at least one methacrylic resin and satisfies conditions (I), (II), and (III) in a differential molecular weight distribution curve. (I) When a proportion (%) of a peak area from a starting point to a molecular weight of 30000 with respect to a peak area from the starting point to an end point is represented by W1, W1 satisfies 18?W1?27. (II) When a proportion (%) of a peak area from the starting point to a molecular weight of 80000 with respect to the peak area from the starting point to the end point is represented by W2, W2 satisfies 41?W2?52. (III) When a proportion (%) of a peak area from a molecular weight of 300000 to the end point with respect to the peak area from the starting point to the end point is represented by W3, W3 satisfies 10?W3?14.Type: GrantFiled: September 25, 2017Date of Patent: October 26, 2021Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Ryosuke Okazaki, Hidenori Kadoya, Kazuhiro Yamazaki
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Patent number: 10759916Abstract: The present invention provides a lamp cover comprising (1) a thermoplastic resin having a visible light transmissivity of 50% or higher measured in a form of a plate-like molded body having a thickness of 2 mm according to JIS R 3106, (2) a composite tungsten oxide, (3) at least one material selected from the group consisting of a metal soap, an antioxidant, and a first selective wavelength absorbing material having a maximum absorption wavelength within a range of 200 to 350 nm, whose content is 0.03% by mass or more based on a total content (100% by mass) of the components (1) to (4), and (4) a second selective wavelength absorbing material having a maximum absorption wavelength within a range of 450 to 550 nm.Type: GrantFiled: February 21, 2018Date of Patent: September 1, 2020Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Hidenori Kadoya, Kazuhiro Yamazaki
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Publication number: 20200172646Abstract: A methacrylic resin composition is provided which contains at least one methacrylic resin and satisfies conditions (I), (II), and (III) in a differential molecular weight distribution curve. (I) When a proportion (%) of a peak area from a starting point to a molecular weight of 30000 with respect to a peak area from the starting point to an end point is represented by W1, W1 satisfies 18?W1?27. (II) When a proportion (%) of a peak area from the starting point to a molecular weight of 80000 with respect to the peak area from the starting point to the end point is represented by W2, W2 satisfies 41?W2?52. (III) When a proportion (%) of a peak area from a molecular weight of 300000 to the end point with respect to the peak area from the starting point to the end point is represented by W3, W3 satisfies 10?W3?14.Type: ApplicationFiled: September 25, 2017Publication date: June 4, 2020Inventors: Ryosuke OKAZAKI, Hidenori KADOYA, Kazuhiro YAMAZAKI
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Publication number: 20200002486Abstract: The present invention provides a lamp cover comprising (1) a thermoplastic resin having a visible light transmissivity of 50% or higher measured in a form of a plate-like molded body having a thickness of 2 mm according to JIS R 3106, (2) a composite tungsten oxide, (3) at least one material selected from the group consisting of a metal soap, an antioxidant, and a first selective wavelength absorbing material having a maximum absorption wavelength within a range of 200 to 350 nm, whose content is 0.03% by mass or more based on a total content (100% by mass) of the components (1) to (4), and (4) a second selective wavelength absorbing material having a maximum absorption wavelength within a range of 450 to 550 nm.Type: ApplicationFiled: February 21, 2018Publication date: January 2, 2020Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Hidenori KADOYA, Kazuhiro YAMAZAKI
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Publication number: 20170190896Abstract: In order to provide a methacrylic resin composition that maintains all of physical properties such as excellent solvent resistance, heat resistance, mechanical strength, and stringing resistance, and has particularly excellent fluidity and also heat stability, the present invention provides a methacrylic resin composition that satisfies conditions (I) through (IV) and includes two types of methacrylic resins having mutually different peak molecular weights. (I) The weight ratio of methyl methacrylate units in the methacrylic resin is greater than 98.5 wt % with respect to 100 wt % of all monomer units. (II) The HP value indicating the higher peak molecular weight satisfies the expression 180,000?HP?220,000. (III) The LP value indicating the lower peak molecular weight satisfies the expression 24,000?LP?35,000.Type: ApplicationFiled: June 22, 2015Publication date: July 6, 2017Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Akihiro YAMAMORI, Hidenori KADOYA, Kazuhiro YAMAZAKI
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Patent number: 9522969Abstract: A method for producing a methacrylic polymer composition, which comprises a first polymerization step wherein a raw material composition A comprising a raw material monomer A containing no less than 50% by weight of methyl methacrylate, a polymerization initiator A, and a chain transfer agent A is supplied into a first complete mixing type reactor through a supply port of the reactor; and a second polymerization step wherein a raw material composition B comprising a raw material monomer B containing no less than 50% by weight of methyl methacrylate, a polymerization initiator B, and a chain transfer agent B, and the intermediate composition withdrawn in the first polymerization step are supplied into a second complete mixing type reactor through a supply port of the reactor.Type: GrantFiled: November 29, 2013Date of Patent: December 20, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Akihiro Yamamori, Takao Wake, Kazuhiro Yamazaki
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Patent number: 9422374Abstract: A continuous polymerization apparatus uses at least a first reactor and a second reactor (10, 20). Each of the reactors (10, 20) includes at least one supply port (11a, 21a, and 21b), an effluent port (11b, 21d), and a temperature detecting means (T1, T2), each of which detects the temperature in the reactor. The supply port (11a) of the first reactor (10) is connected to supply sources (1, 3) of a raw material monomer and a polymerization initiator, and the effluent port (11b) is connected to the first supply port (21a) of the second reactor (20) through a connection line (15a). The second supply port (21b) of the second reactor (20) is connected to a replenishing line (15b) that supplies a new raw material monomer to the second reactor.Type: GrantFiled: January 15, 2014Date of Patent: August 23, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masakazu Sumida, Kazuhiro Yamazaki
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Patent number: 9403922Abstract: A continuous polymerization apparatus uses at least a first reactor and a second reactor (10, 20). Each of the reactors (10, 20) comprises a supply port (11a, 21a) and an effluent port (11b, 21b). The supply port (11a) of the first reactor (10) is connected to supply sources (1, 3) of a raw material monomer and a polymerization initiator, and the effluent port (11b) thereof is connected to the supply port (21a) of the second reactor (20) by a connection line (15a). The connection line (15a) is combined with a replenishing line (15b) through an injection valve (50) at a combining part. The injection valve (50) comprises, in a full closure state thereof, a clearance that may cause a fluid comprising at least the raw material monomer to flow from the replenishing line (15b) to the connection line (15a).Type: GrantFiled: January 15, 2014Date of Patent: August 2, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masakazu Sumida, Kazuhiro Yamazaki, Akira Nishitani
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Publication number: 20160185884Abstract: A method for producing a methacrylic polymer composition, which comprises a first polymerization step wherein a raw material composition A comprising a raw material monomer A containing no less than 50% by weight of methyl methacrylate, a polymerization initiator A, and a chain transfer agent A is supplied into a first complete mixing type reactor through a supply port of the reactor, and the raw material composition A is subjected to a continuous bulk polymerization in the first complete mixing type reactor, and a resulting intermediate composition is withdrawn through an effluent port of the first complete mixing type reactor; and a second polymerization step wherein a raw material composition B comprising a raw material monomer B containing no less than 50% by weight of methyl methacrylate, a polymerization initiator B, and a chain transfer agent B, and the intermediate composition withdrawn in the first polymerization step are supplied into a second complete mixing type reactor through a supply port ofType: ApplicationFiled: November 29, 2013Publication date: June 30, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Akihiro YAMAMORI, Takao WAKE, Kazuhiro YAMAZAKI
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Patent number: 9266975Abstract: The present invention provides a novel continuous polymerization apparatus which is able to efficiently produce a polymer composition suitable for obtaining a resin composition with high quality. In a continuous polymerization apparatus, at least, a first reactor of a complete mixing type and a second reactor of a complete mixing type (10, 20) are used. Each of the reactors (10, 20) is provided with a supply port (11a, 21a), an effluent port (11b, 21b), and a temperature detecting means (T) for detecting a temperature in the reactor, wherein the supply port (11a) of the first reactor (10) is connected to the supply sources (1, 3) of a raw material monomer and a polymerization initiator, and the effluent port (11b) of the first reactor is connected through a connection line (15) provided with a cooling means (16) to the supply port (21a) of the second reactor (20).Type: GrantFiled: November 8, 2012Date of Patent: February 23, 2016Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yoshinori Sato, Kazuhiro Yamazaki
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Publication number: 20160009831Abstract: A continuous polymerization apparatus uses at least a first reactor and a second reactor (10, 20). Each of the reactors (10, 20) comprises a supply port (11a, 21a) and an effluent port (11b, 21b). The supply port (11a) of the first reactor (10) is connected to supply sources (1, 3) of a raw material monomer and a polymerization initiator, and the effluent port (11b) thereof is connected to the supply port (21a) of the second reactor (20) by a connection line (15a). The connection line (15a) is combined with a replenishing line (15b) through an injection valve (50) at a combining part. The injection valve (50) comprises, in a full closure state thereof, a clearance that may cause a fluid comprising at least the raw material monomer to flow from the replenishing line (15b) to the connection line (15a).Type: ApplicationFiled: January 15, 2014Publication date: January 14, 2016Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masakazu SUMIDA, Kazuhiro YAMAZAKI, Akira NISHITANI
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Publication number: 20150368374Abstract: A continuous polymerization apparatus uses at least a first reactor and a second reactor (10, 20). Each of the reactors (10, 20) includes at least one supply port (11a, 21a, and 21b), an effluent port (11b, 21d), and a temperature detecting means (T1, T2), each of which detects the temperature in the reactor. The supply port (11a) of the first reactor (10) is connected to supply sources (1, 3) of a raw material monomer and a polymerization initiator, and the effluent port (11b) is connected to the first supply port (21a) of the second reactor (20) through a connection line (15a). The second supply port (21b) of the second reactor (20) is connected to a replenishing line (15b) that supplies a new raw material monomer to the second reactor.Type: ApplicationFiled: January 15, 2014Publication date: December 24, 2015Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masakazu SUMIDA, Kazuhiro YAMAZAKI
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Patent number: 9189679Abstract: Disclosed are novel techniques for high-precision sex determination and age estimation using facial images. The disclosed age estimation method includes: a step in which facial image data of a subject is acquired; a step in which spatial frequency intensities are calculated from the acquired facial image data; and a step in which the estimated age of the subject is calculated by applying the calculated spatial frequency intensities obtained from the facial image data.Type: GrantFiled: May 18, 2011Date of Patent: November 17, 2015Assignee: POLA CHEMICAL INDUSTRIES, INC.Inventors: Kazuhiro Yamazaki, Akihiro Tada, Mariko Hayashi, Miho Ohata, Sakura Torii
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Patent number: 9114374Abstract: Continuous polymerization apparatus including a first reactor of a complete mixing type and a second reactor of a complete mixing type (10, 20). Each of the reactors (10, 20) is provided with a supply port (11a, 21a), an effluent port (11b, 21b), and a temperature detecting means (T) for detecting a temperature in the reactor, wherein the supply port (11a) of the first reactor (10) is connected to the supply sources (1, 3) of a raw material monomer and a polymerization initiator, and the effluent port (11b) of the first reactor is connected through a connection line (15) to the supply port (21a) of the second reactor (20). Connection line (15) is combined with a secondary line (15?) for supplying a raw material monomer at a combining part (M) located between the effluent port (11b) of the first reactor (10) and the supply port (21a) of the second reactor (20).Type: GrantFiled: February 28, 2013Date of Patent: August 25, 2015Assignee: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masakazu Sumida, Kazuhiro Yamazaki
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Publication number: 20150051359Abstract: Continuous polymerization apparatus including a first reactor of a complete mixing type and a second reactor of a complete mixing type (10, 20). Each of the reactors (10, 20) is provided with a supply port (11a, 21a), an effluent port (11b, 21b), and a temperature detecting means (T) for detecting a temperature in the reactor, wherein the supply port (11a) of the first reactor (10) is connected to the supply sources (1, 3) of a raw material monomer and a polymerization initiator, and the effluent port (11b) of the first reactor is connected through a connection line (15) to the supply port (21a) of the second reactor (20). Connection line (15) is combined with a secondary line (15?) for supplying a raw material monomer at a combining part (M) located between the effluent port (11b) of the first reactor (10) and the supply port (21a) of the second reactor (20).Type: ApplicationFiled: February 28, 2013Publication date: February 19, 2015Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Masakazu Sumida, Kazuhiro Yamazaki
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Publication number: 20140329981Abstract: The present invention provides a novel continuous polymerization apparatus which is able to efficiently produce a polymer composition suitable for obtaining a resin composition with high quality. In a continuous polymerization apparatus, at least, a first reactor of a complete mixing type and a second reactor of a complete mixing type (10, 20) are used. Each of the reactors (10, 20) is provided with a supply port (11a, 21a), an effluent port (11b, 21b), and a temperature detecting means (T) for detecting a temperature in the reactor, wherein the supply port (11a) of the first reactor (10) is connected to the supply sources (1, 3) of a raw material monomer and a polymerization initiator, and the effluent port (11b) of the first reactor is connected through a connection line (15) provided with a cooling means (16) to the supply port (21a) of the second reactor (20).Type: ApplicationFiled: November 8, 2012Publication date: November 6, 2014Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Yoshinori Sato, Kazuhiro Yamazaki