Patents by Inventor Kazuhisa Hasebe

Kazuhisa Hasebe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Developing treatment method, program, computer storage medium and developing treatment system
    Patent number: 8518480
    Abstract: The present invention is a method of developing a resist film on a substrate using a developing solution at a predetermined temperature lower than room temperature, including a first cooling step of mounting and cooling the substrate on a cooling plate at a temperature lower than room temperature and higher than the predetermined temperature in a cooling apparatus; a second cooling step of then carrying the substrate into a developing apparatus and supplying a rinse solution at the predetermined temperature or lower onto the substrate to cool the substrate in the developing apparatus; a developing step of then supplying the developing solution onto the substrate and developing the resist film on the substrate to form a resist pattern in the resist film; and a cleaning step of then supplying a rinse solution at the predetermined temperature onto the substrate to clean a front surface of the substrate.
    Type: Grant
    Filed: January 11, 2011
    Date of Patent: August 27, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Norifumi Sato, Yukio Kiba, Tetsushi Miyamoto, Kazuhisa Hasebe
  • DEVELOPING TREATMENT METHOD, PROGRAM, COMPUTER STORAGE MEDIUM AND DEVELOPING TREATMENT SYSTEM
    Publication number: 20110183073
    Abstract: The present invention is a method of developing a resist film on a substrate using a developing solution at a predetermined temperature lower than room temperature, including a first cooling step of mounting and cooling the substrate on a cooling plate at a temperature lower than room temperature and higher than the predetermined temperature in a cooling apparatus; a second cooling step of then carrying the substrate into a developing apparatus and supplying a rinse solution at the predetermined temperature or lower onto the substrate to cool the substrate in the developing apparatus; a developing step of then supplying the developing solution onto the substrate and developing the resist film on the substrate to form a resist pattern in the resist film; and a cleaning step of then supplying a rinse solution at the predetermined temperature onto the substrate to clean a front surface of the substrate.
    Type: Application
    Filed: January 11, 2011
    Publication date: July 28, 2011
    Applicant: Tokyo Electron Limited
    Inventors: Norifumi Sato, Yukio Kiba, Tetsushi Miyamoto, Kazuhisa Hasebe