Abstract: A semiconductor device includes a first semiconductor element, a first object, a sealing resin and a covering part. The first semiconductor element includes a first electrode. The first object includes a first surface facing the first electrode. The sealing resin covers the first semiconductor element and the first object. The covering part is interposed between the first electrode and the first surface and contains a material having a higher thermal conductivity than the sealing resin.

Abstract: According to one embodiment, a cleaning device comprises a suction port portion, a guide portion, and an urging member. The suction port portion is configured to face a nozzle plate of a liquid discharge head at a predetermined gap distance between the suction port and the nozzle plate. The guide portion is configured to face a cover mask of the liquid discharge head and is moveable in a direction away from the cover mask. The cover mask covers a periphery of a surface of the nozzle plate. The urging member is configured to urge the guide portion toward the cover mask.

Abstract: According to one embodiment, a liquid discharge head includes an actuator with a plurality of pressure chambers. A cover covers one side of the actuator and includes a common liquid chamber that connects to the plurality of pressure chambers and an air bubble venting flow path connected to the common liquid chamber. A nozzle plate is on a side of the actuator opposite the common liquid chamber and includes a plurality of first nozzles that faces the plurality of pressure chambers and a second nozzle that faces an outlet of the air bubble venting flow path. A mask plate covers the nozzle plate on a side opposite of the actuator and has a first window exposing the plurality of first nozzles and a second window exposing the second nozzle.

Abstract: According to one embodiment, a maintenance apparatus includes a first suction nozzle having a first suction port facing a first nozzle row through which a first liquid can be ejected, the first nozzle row including nozzles aligned in a first direction on a nozzle plate, and a second suction nozzle having a second suction port facing a second nozzle row through which a second liquid can be ejected, the second nozzle row including nozzles aligned in the first direction on the nozzle plate and parallel to the first nozzle row.

Abstract: According to one embodiment, a cleaning device comprises a suction port portion, a guide portion, and an urging member. The suction port portion is configured to face a nozzle plate of a liquid discharge head at a predetermined gap distance between the suction port and the nozzle plate. The guide portion is configured to face a cover mask of the liquid discharge head and is moveable in a direction away from the cover mask. The cover mask covers a periphery of a surface of the nozzle plate. The urging member is configured to urge the guide portion toward the cover mask.

Abstract: According to one embodiment, a maintenance apparatus includes a first suction nozzle having a first suction port facing a first nozzle row through which a first liquid can be ejected, the first nozzle row including nozzles aligned in a first direction on a nozzle plate, and a second suction nozzle having a second suction port facing a second nozzle row through which a second liquid can be ejected, the second nozzle row including nozzles aligned in the first direction on the nozzle plate and parallel to the first nozzle row.

Abstract: According to one embodiment, a maintenance apparatus includes a first suction nozzle having a first suction port facing a first nozzle row through which a first liquid can be ejected, the first nozzle row including nozzles aligned in a first direction on a nozzle plate, and a second suction nozzle having a second suction port facing a second nozzle row through which a second liquid can be ejected, the second nozzle row including nozzles aligned in the first direction on the nozzle plate and parallel to the first nozzle row.

Abstract: According to one embodiment, a maintenance apparatus includes a first suction nozzle having a first suction port facing a first nozzle row through which a first liquid can be ejected, the first nozzle row including nozzles aligned in a first direction on a nozzle plate, and a second suction nozzle having a second suction port facing a second nozzle row through which a second liquid can be ejected, the second nozzle row including nozzles aligned in the first direction on the nozzle plate and parallel to the first nozzle row.

Abstract: According to one embodiment, an inkjet head includes a mask part which covers a periphery of an actuator part in a state where a nozzle hole is exposed to outside and a peripheral edge part of which is opposite to an opening peripheral edge part of a frame part at other end while a gap is kept, and the gap between the peripheral edge part of the mask part and the opening peripheral edge part of the frame part at the other end is sealed with a seal agent having thermal insulation properties.

Abstract: According to one embodiment, a printing apparatus includes an ink-jet head including a nozzle plate with a nozzle string in which a plurality of nozzle holes for discharging ink are arranged, and a cleaning device including an ink-repellent surface with ink repellency which is configured to come in contact with the nozzle plate in a state in which the ink-repellent surface is opposed to the ink-jet head, an ink-affinitive surface with ink affinity which is configured to create a gap between the ink-affinitive surface and the nozzle plate in a state in which the ink-repellent surface is in contact with the nozzle plate, and to have a smaller ink contact angle than the ink-repellent surface, and a plurality of suction ports formed in the ink-affinitive surface.

Abstract: According to one embodiment, an inkjet head includes a mask part which covers a periphery of an actuator part in a state where a nozzle hole is exposed to outside and a peripheral edge part of which is opposite to an opening peripheral edge part of a frame part at other end while a gap is kept, and the gap between the peripheral edge part of the mask part and the opening peripheral edge part of the frame part at the other end is sealed with a seal agent having thermal insulation properties.

Abstract: A cleaning device that cleans a nozzle surface of an inkjet head in which plural nozzles for ejecting ink are opened includes: a cleaning head that includes a supply port opposed to the nozzle surface and is movable along the nozzle surface; and a supplying section configured to supply liquid for cleaning the nozzle surface to the supply port of the cleaning head, the supplying section bulging the liquid from the supply port to the nozzle surface to form, in the supply port, a liquid wipe section that can be contact with the nozzle surface.

Abstract: According to one embodiment, a printing apparatus includes an ink-jet head including a nozzle plate with a nozzle string in which a plurality of nozzle holes for discharging ink are arranged, and a cleaning device including an ink-repellent surface with ink repellency which is configured to come in contact with the nozzle plate in a state in which the ink-repellent surface is opposed to the ink-jet head, an ink-affinitive surface with ink affinity which is configured to create a gap between the ink-affinitive surface and the nozzle plate in a state in which the ink-repellent surface is in contact with the nozzle plate, and to have a smaller ink contact angle than the ink-repellent surface, and a plurality of suction ports formed in the ink-affinitive surface.

Abstract: The present invention provides a blue-violet light blocking glass containing copper (I) halide fine particles that satisfactorily transmits light having a wavelength of 450 nm to 600 nm and sharply blocks light having a wavelength shorter than 450 nm. Specifically, the present invention provides a blue-violet light blocking glass containing a copper (I) halide and silver; for example, 20 to 85% by weight of SiO2; 2 to 75% by weight of B2O3; not more than 10% by weight of Al2O3; 2 to 30% by weight of at least one member selected from the group consisting of Li2O, Na2O, K2O, Rb2O and Cs2O; 1 to 15% by weight of at least one member selected from the group consisting of MgO, CaO, SrO, BaO and ZnO; not more than 10% by weight of at least one member selected from the group consisting of PbO, Nb2O5, ZrO2, La2O3, Y2O3, Ta2O3 and Gd2O3; not more than 5% by weight of at least one member selected from the group consisting of Sb2O3 and As2O3; not more than 5% by weight of SnO2; 0.

Abstract: A method of readily producing a gradient optical element having infrared absorbing ability by easily forming a refractive index distribution in a desired portion of a glass substrate having infrared absorbing ability without requiring a specific treatment atmosphere nor using a molten salt. More specifically, the present invention provides a method for producing a gradient-index optical element having infrared absorbing ability, the method comprising applying a paste containing an organic resin, an organic solvent, and at least one compound selected from the group consisting of lithium compounds, potassium compounds, rubidium compounds, cesium compounds, silver compounds, copper compounds, and thallium compounds onto a glass substrate containing an alkali metal component, at least one member selected from the group consisting of iron, copper, cobalt and vanadium, and over 3 wt.

Abstract: The present invention provides a method for producing a distributed refractive index-type optical element which can be optically designed readily, enables to provide a desired optical element in a simple manner and has an ultraviolet ray-absorbing ability. The present invention provides a method for producing a distributed refractive index-type optical element having an ultraviolet ray-absorbing ability, which comprises of the steps of: applying a paste comprising at least one compound selected from the group consisting of a lithium compound, a potassium compound, a rubidium compound, a cesium compound, a silver compound, a copper compound and a thallium compound, an organic resin and an organic solvent onto a glass substrate comprising an alkali metal component and an ultraviolet ray-absorbing component as glass constituent components; and heat-treating the resulting substrate at a temperature lower than the softening point of the glass substrate.

Abstract: The present invention provides a blue-violet light blocking glass containing copper (I) halide fine particles that satisfactorily transmits light having a wavelength of 450 nm to 600 nm and sharply blocks light having a wavelength shorter than 450 nm. Specifically, the present invention provides a blue-violet light blocking glass containing a copper (I) halide and silver; for example, 20 to 85% by weight of SiO2; 2 to 75% by weight of B2O3; not more than 10% by weight of Al2O3; 2 to 30% by weight of at least one member selected from the group consisting of Li2O, Na2O, K2O, Rb2O and Cs2O; 1 to 15% by weight of at least one member selected from the group consisting of MgO, CaO, SrO, BaO and ZnO; not more than 10% by weight of at least one member selected from the group consisting of PbO, Nb2O5, ZrO2, La2O3, Y2O3, Ta2O3 and Gd2O3; not more than 5% by weight of at least one member selected from the group consisting of Sb2O3 and As2O3; not more than 5% by weight of SnO2; 0.

Abstract: The present invention provides a novel glass material that allows the production of a glass product having both excellent chemical durability and high precision by a press molding method. Specifically, the present invention provides a glass for press molding, comprising 38% to 45% by weight of SiO2, 18% to 27% by weight of B2O3, 16% to 25% by weight of Al2O3, 2% to 12% by weight of ZnO, no more than 3% by weight of MgO, no more than 3% by weight of CaO, no more than 3% by weight of BaO, 13% to 18% by weight of Li2O, no more than 3% by weight of K2O, and no more than 2% by weight of Na2O; wherein the glass has a deformation temperature of 520° C. or lower; and the glass has a water resistance of grade 2 or higher as measured according to the Japanese Optical Glass Industrial Standard method for measuring the chemical durability of an optical glass.

Abstract: The present invention provides a novel glass material that allows the production of a glass product having both excellent chemical durability and high precision by a press molding method. Specifically, the present invention provides a glass for press molding, comprising 38% to 45% by weight of SiO2, 18% to 27% by weight of B2O3, 16% to 25% by weight of Al2O3, 2% to 12% by weight of ZnO, no more than 3% by weight of MgO, no more than 3% by weight of CaO, no more than 3% by weight of BaO, 13% to 18% by weight of Li2O, no more than 3% by weight of K2O, and no more than 2% by weight of Na2O; wherein the glass has a deformation temperature of 520° C. or lower; and the glass has a water resistance of grade 2 or higher as measured according to the Japanese Optical Glass Industrial Standard method for measuring the chemical durability of an optical glass.

Abstract: In such a manner that ink in each of a plurality of pressure chambers for holding the ink therein is brought to a positive pressure state of being ejected from respective nozzles respectively communicating with the respective chambers to the outside of each of the pressure chambers, a cleaning member abutted against a nozzle plate formed with a plurality of nozzles is moved along the nozzles in a state in which pressure is applied to all of the pressure chambers, to thereby extrude foreign particles outside the pressure chambers by the ink ejected from the respective nozzles to the outside of the pressure chambers, thereby making it possible to recover the ink, whereby the occurrence of a delivery failure due to the foreign particles around the nozzles being absorbed into the pressure chambers, can be prevented, and the foreign particles contained in the ink can be purged without consuming much ink needlessly.