Patents by Inventor Kazuhisa Ohno

Kazuhisa Ohno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Synthetic mica powder, manufacturing method thereof and cosmetics having the synthetic mica powder blended therein
    Patent number: 5023065
    Abstract: The present invention concerns synthetic mica powder containing from 75 to 99% of the stoichiometrical composition of fluorine and/or having a shape in which the end face of particle is laminated, process for producing such synthetic mica powder, as well as cosmetics having synthetic mica powder blended therewith, in which the synthetic mica powder shows no leaching of fluorine ions and/or improved hold of oils due to lamination at the surface of powder. Accordingly, in this invention, cosmetics excellent in extensibility, gloss, adherence and modability, having appearance of high chroma and of high stability and safety can be obtained.
    Type: Grant
    Filed: September 26, 1988
    Date of Patent: June 11, 1991
    Assignees: Shiseido Co., Ltd., Topy Kogyo K.K.
    Inventors: Kazuhisa Ohno, Tetsushi Kosugi, Kenichiro Sugimori, Akitsugu Ando, Masaru Yamamoto, Fukuji Suzuki, Masahiro Nakamura, Nobuhisa Tsujita
  • Modified powder or particulate material
    Patent number: 4882225
    Abstract: A modified powder or particulate material having a silicone polymer film coated on substantially the entire surface thereof, this powder or particulate material being produced by bringing at least one silicone compound, in the form of a vapor, having the general formula (I):(R.sup.1 HSiO).sub.a (R.sup.2 R.sup.3 SiO).sub.b (R.sup.4 R.sup.5 R.sup.6 SiO.sub.1/2).sub.c (I)Wherein R.sup.1, R.sup.2, and R.sup.3 represent, independently, hydrogen or a hydrocarbon residue having 1 to 10 carbon atoms, which may be substituted with at least one halogen atom, provided that R.sup.1, R.sup.2, and R.sup.3 are not hydrogen at the same time, R.sup.4, R.sup.5, and R.sup.
    Type: Grant
    Filed: April 26, 1988
    Date of Patent: November 21, 1989
    Assignee: Shiseido Company Ltd.
    Inventors: Hiroshi Fukui, Ryujiro Namba, Tsutomu Saito, Yutaka Ohtsu, Asa Kimura, Motokiyo Nakano, Okitsugu Nakata, Kenichi Tommita, Kazuo Tokubo, Kazuhisa Ohno, Toshio Yoneyama, Takashi Ogawa, Hideo Morohoshi, Junichi Koyama, Taketoshi Kanda, Kunihiro Kawaguchi, Yuzo Shimizu
  • Modified powder
    Patent number: 4818614
    Abstract: A modified powder or particulate material coated on substantially the entire surface thereof with a film of a silicone polymer carrying a pendant group thereon, this powder or particulate material being produced by a process comprising the steps of(a) coating the powder or particulate material with a film of a silicone polymer having at least one Si-H moiety, and(b) carrying out an addition reaction of a compound capable of reacting with an Si--H moiety to the Si--H moiety in the silicone polymer of step (a), whereby the pendant group derived from said compound is bonded to the silicone polymer.
    Type: Grant
    Filed: July 25, 1986
    Date of Patent: April 4, 1989
    Assignee: Shiseido Company Ltd.
    Inventors: Hiroshi Fukui, Ryujiro Namba, Tsutomu Saito, Yutaka Ohtsu, Asa Kimura, Motokiyo Nakano, Okitsugu Nakata, Kenichi Tomita, Kazuo Tokubo, Kazuhisa Ohno, Toshio Yoneyama, Takashi Ogawa, Hideo Morohoshi, Junichi Koyama, Taketoshi Kanda, Kunihiro Kawaguchi, Yuzo Shimizu
  • Cosmetic compositions containing modified powder or particulate material
    Patent number: 4801445
    Abstract: A modified powder or particulate material having a silicone polymer film coated on substantially the entire surface thereof, this powder or particulate material being produced by bringing at least one silicone compound, in the form of a vapor, having the general formula (I):(R.sup.1 HSiO).sub.a (R.sup.2 R.sup.3 SiO).sub.b (R.sup.4 R.sup.5 R.sup.6 SiO.sub.1/2).sub.c (I)wherein R.sup.1, R.sup.2, and R.sup.3 represent, independently, hydrogen or a hydrocarbon residue having 1 to 10 carbon atoms, which may be substituted with at least one halogen atom, provided that R.sup.1, R.sup.2, and R.sup.3 are not hydrogen at the same time, R.sup.4, R.sup.5, and R.sup.
    Type: Grant
    Filed: June 17, 1986
    Date of Patent: January 31, 1989
    Assignee: Shiseido Company Ltd.
    Inventors: Hiroshi Fukui, Ryujiro Namba, Tsutomu Saito, Yutaka Ohtsu, Asa Kimura, Motokiyo Nakano, Okitsugu Nakata, Kenichi Tomita, Kazuo Tokubo, Kazuhisa Ohno, Toshio Yoneyama, Takashi Ogawa, Hideo Morohoshi, Junichi Koyama, Taketoshi Kanda, Kunihiro Kawaguchi, Yuzo Shimizu