Patents by Inventor Kazuhisa Ono
Kazuhisa Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10861990Abstract: A method of manufacturing an epitaxial silicon wafer that includes growing a silicon single crystal ingot doped with a boron concentration of 2.7×1017 atoms/cm3 or more and 1.3×1019 atoms/cm3 or less by the CZ method; producing a silicon substrate by processing the silicon single crystal ingot; and forming an epitaxial layer on a surface of the silicon substrate. During growing of the silicon single crystal ingot, the pull-up conditions of the silicon single crystal ingot are controlled so that the boron concentration Y (atoms/cm3) and an initial oxygen concentration X (×1017 atoms/cm3) satisfy the expression X??4.3×10?19Y+16.3.Type: GrantFiled: September 26, 2019Date of Patent: December 8, 2020Assignee: SUMCO CORPORATIONInventors: Kazuhisa Torigoe, Toshiaki Ono
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Publication number: 20200183257Abstract: A printer-equipped imaging apparatus capable of giving new pleasure to a user and clearly recording an imaged scene, an operation method of a printer-equipped imaging apparatus, and a program are provided. The printer-equipped imaging apparatus includes an imaging unit 2 that acquires a captured image of a subject, a text generation unit that generates a text based on a sound emitted by the subject or a sound around the subject, a print unit that prints the captured image acquired by the imaging unit and the text generated by the text generation unit, the print unit printing a combined photograph of the captured image and the text, and a print control unit that causes the print unit to print the combined photograph.Type: ApplicationFiled: December 6, 2019Publication date: June 11, 2020Applicant: FUJIFILM CorporationInventors: Keita KAMEI, Kazuhisa HORIKIRI, Hirotoshi ONO, Rena KAMODA
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Publication number: 20200112661Abstract: An imaging apparatus and a text display method capable of checking an imageable range of a subject without displaying a live view image and also capable of displaying a text corresponding to audio around the subject or an ambient sound on the apparatus main body are provided. The imaging apparatus includes a transparent casing, an imaging unit that is arranged in the casing and acquires a captured image of a subject, a transparent display unit that is arranged in the casing and includes a display screen orthogonal to an imaging direction of the imaging unit, a sound collection unit that includes a microphone and acquires audio or an ambient sound, a text generation unit that generates a text based on the audio or the ambient sound acquired by the sound collection unit, and a display control unit that displays the text generated by the text generation unit on the display unit.Type: ApplicationFiled: December 6, 2019Publication date: April 9, 2020Applicant: FUJIFILM CorporationInventors: Keita KAMEI, Kazuhisa HORIKIRI, Hirotoshi ONO, Rena KAMODA
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Publication number: 20200105542Abstract: Provided is a method of accurately predicting the thermal donor formation behavior in a silicon wafer, a method of evaluating a silicon wafer using the prediction method, and a method of producing a silicon wafer using the evaluation method. The method of predicting the formation behavior of thermal donors, includes: a first step of setting an initial oxygen concentration condition before performing heat treatment on the silicon wafer for reaction rate equations based on both a bond-dissociation model of oxygen clusters associated with the diffusion of interstitial oxygen and a bonding model of oxygen clusters associated with the diffusion of oxygen dimers; a second step of calculating the formation rate of oxygen clusters formed through the heat treatment using the reaction rate equations; and a third step of calculating the formation rate of thermal donors formed through the heat treatment based on the formation rate of the oxygen clusters.Type: ApplicationFiled: June 12, 2018Publication date: April 2, 2020Applicant: SUMCO CorporationInventors: Kazuhisa Torigoe, Shigeru Umeno, Toshiaki Ono
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Publication number: 20200051817Abstract: A manufacturing method of an epitaxial silicon wafer includes: an epitaxial-film formation step for forming an epitaxial film made of silicon on a surface of a silicon wafer in a trichlorosilane gas atmosphere; and a nitrogen-concentration setting step for setting the nitrogen concentration of the surface of the epitaxial film through inward diffusion from a nitride film on the epitaxial film, the nitride film being formed by subjecting the silicon wafer provided with the epitaxial film through the epitaxial-film formation step to a heat treatment in a nitrogen atmosphere.Type: ApplicationFiled: September 12, 2017Publication date: February 13, 2020Applicant: SUMCO CORPORATIONInventors: Kazuya KODANI, Toshiaki ONO, Kazuhisa TORIGOE
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Publication number: 20200020817Abstract: A method of manufacturing an epitaxial silicon wafer that includes growing a silicon single crystal ingot doped with a boron concentration of 2.7×1017 atoms/cm3 or more and 1.3×1019 atoms/cm3 or less by the CZ method; producing a silicon substrate by processing the silicon single crystal ingot; and forming an epitaxial layer on a surface of the silicon substrate. During growing of the silicon single crystal ingot, the pull-up conditions of the silicon single crystal ingot are controlled so that the boron concentration Y (atoms/cm3) and an initial oxygen concentration X (×1017 atoms/cm3) satisfy the expression X??4.3×10?19Y+16.3.Type: ApplicationFiled: September 26, 2019Publication date: January 16, 2020Applicant: SUMCO CORPORATIONInventors: Kazuhisa TORIGOE, Toshiaki ONO
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Patent number: 10351702Abstract: A resin composition which includes: (A) a polyorganosiloxane that contains a mercaptoalkyl group bonded to a silicon atom and has a viscosity at 23° C. of 20 to 3,000 cP; (B) a polyorganosiloxane containing an aliphatic unsaturated group; (C) a photoreaction initiator; (D) a chemically surface-treated silica having a BET specific surface area of 50 to 250 m2/g and a pH of 5.0 to 9.0; and (E) a polyoxyalkylene glycol, and/or a derivative of the polyoxyalkylene glycol. (B) includes: a linear polyorganosiloxane; and optionally a branched polyorganosiloxane. The ratio of mercaptoalkyl groups in (A) to the total aliphatic unsaturated groups in (B) is 0.45 to 2.00, the content of (D) is 0.5 to 26 parts relative to 100 parts by mass of (B), the content of (E) is 0.001 to 1.0 mass % relative to the total mass of (A) to (E), and the viscosity at 23° C. is 500 to 100,000 cP.Type: GrantFiled: April 4, 2016Date of Patent: July 16, 2019Assignee: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLCInventor: Kazuhisa Ono
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Publication number: 20180079904Abstract: A resin composition which includes: (A) a polyorganosiloxane that contains a mercaptoalkyl group bonded to a silicon atom and has a viscosity at 23° C. of 20 to 3,000 cP; (B) a polyorganosiloxane containing an aliphatic unsaturated group; (C) a photoreaction initiator; (D) a chemically surface-treated silica having a BET specific surface area of 50 to 250 m2/g and a pH of 5.0 to 9.0; and (E) a polyoxyalkylene glycol, and/or a derivative of the polyoxyalkylene glycol. (B) includes: a linear polyorganosiloxane; and optionally a branched polyorganosiloxane. The ratio of mercaptoalkyl groups in (A) to the total aliphatic unsaturated groups in (B) is 0.45 to 2.00, the content of (D) is 0.5 to 26 parts relative to 100 parts by mass of (B), the content of (E) is 0.001 to 1.0 mass % relative to the total mass of (A) to (E), and the viscosity at 23° C. is 500 to 100,000 cP.Type: ApplicationFiled: April 4, 2016Publication date: March 22, 2018Applicant: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLCInventor: Kazuhisa ONO
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Patent number: 9595768Abstract: A glazing is disclosed comprising at least one ply of glass having an electrically conductive component on at least one surface, and an electrical connector electrically connected to the electrically conductive component through a soldered joint, the solder of the joint having a composition comprising 0.5 wt % or more indium, wherein the electrical connector comprises a nickel plated contact for contacting the solder. Also disclosed are solders having a composition comprising 14 to 75 wt % In, 14 to 75 wt % Sn, to 5 wt % Ag, to 5 wt % Ni, and less than 0.1 wt % Pb. Also disclosed is use of a solder having a composition comprising 0.5 wt % or more indium to solder a nickel plated electrical connector to an electrically conductive component on the surface of a ply of glass. The aspects of the invention improve the durability of electrical connections on glazing.Type: GrantFiled: May 2, 2012Date of Patent: March 14, 2017Assignees: Pilkington Group Limited, Nippon Sheet Glass Co. Ltd., Nishinihon Shoko Co., Ltd.Inventors: Michael Lyon, Naotaka Ikawa, Kazuo Inada, Mamoru Yoshida, Takashi Muromachi, Kazuhisa Ono, Kozo Okamoto, Takashi Suzuki
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Patent number: 9540551Abstract: A heat-curable polyorganosiloxane composition which includes (A) an alkenyl group-containing linear polyorganosiloxane of the formula (I) below, wherein Ra represents a C2-C6 alkenyl and Rb represents a C1-C6 alkyl or a phenyl; (B1) a linear polyorganohydrogensiloxane of the formula (II) below, wherein Rc is hydrogen and Rd represents a C1-C6 alkyl or a phenyl; (B2) a cyclic polyorganohydrogensiloxane including Re2HSiO1/2, wherein Re represents a hydrogen atom or C1-C6 alkyl group, and SiO4/2, and having three or more hydrogen atoms bonded to a silicon atom in one molecule; (C) a platinum series catalyst; and (D) an adhesion promoter, wherein the formula (I) and the formula (II) are as follows:Type: GrantFiled: December 6, 2011Date of Patent: January 10, 2017Assignee: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLCInventors: Koji Okawa, Kazuhisa Ono
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Patent number: 9353265Abstract: The invention provides dam compositions which can give cured products serving as dam materials exhibiting appropriate hardness and adhesion with respect to adherends and which are preferably such that the dam materials also have inconspicuous joints with fillers. The invention also provides image displays manufactured with the compositions. An image display sealant dam composition includes (A) a polyorganosiloxane having a mercaptoalkyl group bonded to a silicon atom, and having a viscosity at 23° C.Type: GrantFiled: March 28, 2014Date of Patent: May 31, 2016Assignee: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLCInventors: Kazuhisa Ono, Koji Okawa
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Patent number: 9340711Abstract: An image display sealant dam composition including (A) a polyorganosiloxane having a mercaptoalkyl bonded to a silicon; (B) an aliphatic unsaturated group-containing polyorganosiloxane including an aliphatic unsaturated group-containing linear polyorganosiloxane (B1), and a branched polyorganosiloxane (B2) having SiO4/2 units, R?3SiO1/2 units and R?2SiO2/2 units, and optionally having R?SiO3/2 units, at least three R? groups per molecule of the branched polyorganosiloxane (B2) are aliphatic unsaturated groups, the proportion of the number of the aliphatic unsaturated groups in (B2) to the total number of the aliphatic unsaturated groups in (B) is more than 50% and not more than 95%; (C) a photoreaction initiator; (D) a silane compound; and (E) an MQ resin having a weight average molecular weight of 2,000 to 2,500,000 and/or an MDQ resin having a weight average molecular weight of 2,000 to 1,000,000.Type: GrantFiled: March 28, 2014Date of Patent: May 17, 2016Assignee: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLCInventors: Kazuhisa Ono, Koji Okawa
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Publication number: 20150337188Abstract: The invention provides a two-pack curable polyorganosiloxane composition having an excellent rapid curing property, and methods for producing an adhered article using the compositions. The two-pack curable polyorganosiloxane composition consisting of a first component and a second component, the composition comprising: (A) an alkenyl group-containing polyorganosiloxane that contains two or more alkenyl groups in the molecule; (B) a polyorganohydrogensiloxane that has two or more hydrogen atoms bonded to a silicon atom in the molecule; and (C) a platinum group catalyst, wherein the ratio of the number of the hydrogen atoms bonded to silicon atoms in (B), HB, to the number of the alkenyl groups in (A), ViA, is 0.5 to 10.0; the content of (C) is 0.5 to 2000 ppm in terms of a platinum group metal; the first component comprises (A) and (C); and the second component comprises (B).Type: ApplicationFiled: June 21, 2013Publication date: November 26, 2015Applicant: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLCInventors: Makoto SAKAKIBARA, Kazuhisa ONO, Shigeki MATSUSHITA, Koji OKAWA
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Publication number: 20150232666Abstract: An image display sealant dam composition including (A) a polyorganosiloxane having a mercaptoalkyl group bonded to a silicon atom; (B) an aliphatic unsaturated group-containing polyorganosiloxane including an aliphatic unsaturated group-containing linear polyorganosiloxane (B1) and optionally including a branched polyorganosiloxane (B2) having SiO4/2 units, R?3SiO1/2 units and R?2SiO2/2 units, and optionally further having. R?SiO3/2 units, at least three R? groups per molecule of the branched polyorganosiloxane (B2) are aliphatic unsaturated groups; (C) a photoreaction initiator; (D) an aliphatic unsaturated group-containing silane compound; and (E) a fumed silica having a BET specific surface area of 180 to 500 m2/g.Type: ApplicationFiled: March 28, 2014Publication date: August 20, 2015Applicant: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLCInventors: Kazuhisa Ono, Koji Okawa
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Publication number: 20150218427Abstract: An image display sealant dam composition including (A) a polyorganosiloxane having a mercaptoalkyl bonded to a silicon; (B) an aliphatic unsaturated group-containing polyorganosiloxane including an aliphatic unsaturated group-containing linear polyorganosiloxane (B1), and a branched polyorganosiloxane (B2) having SiO4/2 units, R?3SiO1/2 units and R?2SiO2/2 units, and optionally having R?SiO3/2 units, at least three R? groups per molecule of the branched polyorganosiloxane (B2) are aliphatic unsaturated groups, the proportion of the number of the aliphatic unsaturated groups in (B2) to the total number of the aliphatic unsaturated groups in (B) is more than 50% and not more than 95%; (C) a photoreaction initiator; (D) a silane compound; and (E) an MQ resin having a weight average molecular weight of 2,000 to 2,500,000 and/or an MDQ resin having a weight average molecular weight of 2,000 to 1,000,000.Type: ApplicationFiled: March 28, 2014Publication date: August 6, 2015Applicant: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLCInventors: Kazuhisa Ono, Koji Okawa
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Patent number: 8741436Abstract: A window glass with a conductive ceramic fired body includes at least one glass plate having main surfaces, and the conductive ceramic fired body including a feeding point and a linear portion which is disposed on either one of the main surfaces of the glass plate, at least a part of the linear portion being placed in a visible region of the window glass and formed by successively laminating a first colored layer, a conductor layer and a second colored layer on the main surface, wherein the first colored layer and the second colored layer each include a pigment and a glass component, and the conductor layer includes silver and the glass component.Type: GrantFiled: February 9, 2009Date of Patent: June 3, 2014Assignee: Nippon Sheet Glass Company, LimitedInventors: Kazuhisa Ono, Yota Yano
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Publication number: 20140138155Abstract: A glazing is disclosed comprising at least one ply of glass having an electrically conductive component on at least one surface, and an electrical connector electrically connected to the electrically conductive component through a soldered joint, the solder of the joint having a composition comprising 0.5 wt % or more indium, wherein the electrical connector comprises a nickel plated contact for contacting the solder. Also disclosed are solders having a composition comprising 14 to 75 wt % In, 14 to 75 wt % Sn, to 5 wt % Ag, to 5 wt % Ni, and less than 0.1 wt % Pb. Also disclosed is use of a solder having a composition comprising 0.5 wt % or more indium to solder a nickel plated electrical connector to an electrically conductive component on the surface of a ply of glass. The aspects of the invention improve the durability of electrical connections on glazing.Type: ApplicationFiled: May 2, 2012Publication date: May 22, 2014Applicants: PILKINGTON GROUP LIMITED, NIPPON SHEET GLASS CO., LTD., UCHIHASHI ESTEC CO., LTD., NISHINIHON SHOKO CO., LTDInventors: Michael Lyon, Naotaka Ikawa, Kazuo Inada, Mamoru Yoshida, Takashi Muromachi, Kazuhisa Ono, Kozo Okamoto, Takashi Suzuki
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Patent number: 8716362Abstract: An ultraviolet-curable silicone resin composition including (A) a polyorganosiloxane having a mercaptoalkyl bonded to a silicon atom and having a viscosity at 23° C. of 20 to 25000 cP; (B) an organopolysiloxane having aliphatic unsaturated groups which includes (B1) a linear polyorganosiloxane having aliphatic unsaturated, and (B2) a branched organopolysiloxane which includes an SiO4/2 unit, an R?3SiO1/2 unit and an R?2SiO2/2 unit, and at least three of R? per one molecule are aliphatic unsaturated groups, provided that an amount of (B2) is an amount where a number of the aliphatic unsaturated groups in (B2) based on a total number of the aliphatic unsaturated groups in (B) is 50% or less; (C) a photoinitiator; and (D) a silane compound having an aliphatic unsaturated group.Type: GrantFiled: December 6, 2011Date of Patent: May 6, 2014Assignee: Momentive Performance Materials Japan LLCInventors: Kazuhisa Ono, Koji Okawa
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Patent number: 8476380Abstract: Room temperature curable silicon group-containing polymer compositions comprising (A) a reactive silicon group-containing polymer obtained through a reaction between a polyoxypropylene polyol and a y-isocyanate propyltrialkoxysilane, (B) a curing catalyst, and (C) amino group-substituted alkoxysilane or a hydrolyzed and condensed product of an amino group-substituted alkoxysilane.Type: GrantFiled: September 22, 2011Date of Patent: July 2, 2013Assignee: Momentive Performance Materials Japan LLCInventor: Kazuhisa Ono
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Patent number: D863413Type: GrantFiled: November 27, 2017Date of Patent: October 15, 2019Assignee: FUJIFILM CorporationInventors: Keita Kamei, Kazuhisa Horikiri, Hirotoshi Ono, Rena Kamoda