Patents by Inventor Kazuhisa Ono

Kazuhisa Ono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10861990
    Abstract: A method of manufacturing an epitaxial silicon wafer that includes growing a silicon single crystal ingot doped with a boron concentration of 2.7×1017 atoms/cm3 or more and 1.3×1019 atoms/cm3 or less by the CZ method; producing a silicon substrate by processing the silicon single crystal ingot; and forming an epitaxial layer on a surface of the silicon substrate. During growing of the silicon single crystal ingot, the pull-up conditions of the silicon single crystal ingot are controlled so that the boron concentration Y (atoms/cm3) and an initial oxygen concentration X (×1017 atoms/cm3) satisfy the expression X??4.3×10?19Y+16.3.
    Type: Grant
    Filed: September 26, 2019
    Date of Patent: December 8, 2020
    Assignee: SUMCO CORPORATION
    Inventors: Kazuhisa Torigoe, Toshiaki Ono
  • Publication number: 20200183257
    Abstract: A printer-equipped imaging apparatus capable of giving new pleasure to a user and clearly recording an imaged scene, an operation method of a printer-equipped imaging apparatus, and a program are provided. The printer-equipped imaging apparatus includes an imaging unit 2 that acquires a captured image of a subject, a text generation unit that generates a text based on a sound emitted by the subject or a sound around the subject, a print unit that prints the captured image acquired by the imaging unit and the text generated by the text generation unit, the print unit printing a combined photograph of the captured image and the text, and a print control unit that causes the print unit to print the combined photograph.
    Type: Application
    Filed: December 6, 2019
    Publication date: June 11, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Keita KAMEI, Kazuhisa HORIKIRI, Hirotoshi ONO, Rena KAMODA
  • Publication number: 20200112661
    Abstract: An imaging apparatus and a text display method capable of checking an imageable range of a subject without displaying a live view image and also capable of displaying a text corresponding to audio around the subject or an ambient sound on the apparatus main body are provided. The imaging apparatus includes a transparent casing, an imaging unit that is arranged in the casing and acquires a captured image of a subject, a transparent display unit that is arranged in the casing and includes a display screen orthogonal to an imaging direction of the imaging unit, a sound collection unit that includes a microphone and acquires audio or an ambient sound, a text generation unit that generates a text based on the audio or the ambient sound acquired by the sound collection unit, and a display control unit that displays the text generated by the text generation unit on the display unit.
    Type: Application
    Filed: December 6, 2019
    Publication date: April 9, 2020
    Applicant: FUJIFILM Corporation
    Inventors: Keita KAMEI, Kazuhisa HORIKIRI, Hirotoshi ONO, Rena KAMODA
  • Publication number: 20200105542
    Abstract: Provided is a method of accurately predicting the thermal donor formation behavior in a silicon wafer, a method of evaluating a silicon wafer using the prediction method, and a method of producing a silicon wafer using the evaluation method. The method of predicting the formation behavior of thermal donors, includes: a first step of setting an initial oxygen concentration condition before performing heat treatment on the silicon wafer for reaction rate equations based on both a bond-dissociation model of oxygen clusters associated with the diffusion of interstitial oxygen and a bonding model of oxygen clusters associated with the diffusion of oxygen dimers; a second step of calculating the formation rate of oxygen clusters formed through the heat treatment using the reaction rate equations; and a third step of calculating the formation rate of thermal donors formed through the heat treatment based on the formation rate of the oxygen clusters.
    Type: Application
    Filed: June 12, 2018
    Publication date: April 2, 2020
    Applicant: SUMCO Corporation
    Inventors: Kazuhisa Torigoe, Shigeru Umeno, Toshiaki Ono
  • Publication number: 20200051817
    Abstract: A manufacturing method of an epitaxial silicon wafer includes: an epitaxial-film formation step for forming an epitaxial film made of silicon on a surface of a silicon wafer in a trichlorosilane gas atmosphere; and a nitrogen-concentration setting step for setting the nitrogen concentration of the surface of the epitaxial film through inward diffusion from a nitride film on the epitaxial film, the nitride film being formed by subjecting the silicon wafer provided with the epitaxial film through the epitaxial-film formation step to a heat treatment in a nitrogen atmosphere.
    Type: Application
    Filed: September 12, 2017
    Publication date: February 13, 2020
    Applicant: SUMCO CORPORATION
    Inventors: Kazuya KODANI, Toshiaki ONO, Kazuhisa TORIGOE
  • Publication number: 20200020817
    Abstract: A method of manufacturing an epitaxial silicon wafer that includes growing a silicon single crystal ingot doped with a boron concentration of 2.7×1017 atoms/cm3 or more and 1.3×1019 atoms/cm3 or less by the CZ method; producing a silicon substrate by processing the silicon single crystal ingot; and forming an epitaxial layer on a surface of the silicon substrate. During growing of the silicon single crystal ingot, the pull-up conditions of the silicon single crystal ingot are controlled so that the boron concentration Y (atoms/cm3) and an initial oxygen concentration X (×1017 atoms/cm3) satisfy the expression X??4.3×10?19Y+16.3.
    Type: Application
    Filed: September 26, 2019
    Publication date: January 16, 2020
    Applicant: SUMCO CORPORATION
    Inventors: Kazuhisa TORIGOE, Toshiaki ONO
  • Patent number: 10351702
    Abstract: A resin composition which includes: (A) a polyorganosiloxane that contains a mercaptoalkyl group bonded to a silicon atom and has a viscosity at 23° C. of 20 to 3,000 cP; (B) a polyorganosiloxane containing an aliphatic unsaturated group; (C) a photoreaction initiator; (D) a chemically surface-treated silica having a BET specific surface area of 50 to 250 m2/g and a pH of 5.0 to 9.0; and (E) a polyoxyalkylene glycol, and/or a derivative of the polyoxyalkylene glycol. (B) includes: a linear polyorganosiloxane; and optionally a branched polyorganosiloxane. The ratio of mercaptoalkyl groups in (A) to the total aliphatic unsaturated groups in (B) is 0.45 to 2.00, the content of (D) is 0.5 to 26 parts relative to 100 parts by mass of (B), the content of (E) is 0.001 to 1.0 mass % relative to the total mass of (A) to (E), and the viscosity at 23° C. is 500 to 100,000 cP.
    Type: Grant
    Filed: April 4, 2016
    Date of Patent: July 16, 2019
    Assignee: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLC
    Inventor: Kazuhisa Ono
  • Publication number: 20180079904
    Abstract: A resin composition which includes: (A) a polyorganosiloxane that contains a mercaptoalkyl group bonded to a silicon atom and has a viscosity at 23° C. of 20 to 3,000 cP; (B) a polyorganosiloxane containing an aliphatic unsaturated group; (C) a photoreaction initiator; (D) a chemically surface-treated silica having a BET specific surface area of 50 to 250 m2/g and a pH of 5.0 to 9.0; and (E) a polyoxyalkylene glycol, and/or a derivative of the polyoxyalkylene glycol. (B) includes: a linear polyorganosiloxane; and optionally a branched polyorganosiloxane. The ratio of mercaptoalkyl groups in (A) to the total aliphatic unsaturated groups in (B) is 0.45 to 2.00, the content of (D) is 0.5 to 26 parts relative to 100 parts by mass of (B), the content of (E) is 0.001 to 1.0 mass % relative to the total mass of (A) to (E), and the viscosity at 23° C. is 500 to 100,000 cP.
    Type: Application
    Filed: April 4, 2016
    Publication date: March 22, 2018
    Applicant: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLC
    Inventor: Kazuhisa ONO
  • Patent number: 9595768
    Abstract: A glazing is disclosed comprising at least one ply of glass having an electrically conductive component on at least one surface, and an electrical connector electrically connected to the electrically conductive component through a soldered joint, the solder of the joint having a composition comprising 0.5 wt % or more indium, wherein the electrical connector comprises a nickel plated contact for contacting the solder. Also disclosed are solders having a composition comprising 14 to 75 wt % In, 14 to 75 wt % Sn, to 5 wt % Ag, to 5 wt % Ni, and less than 0.1 wt % Pb. Also disclosed is use of a solder having a composition comprising 0.5 wt % or more indium to solder a nickel plated electrical connector to an electrically conductive component on the surface of a ply of glass. The aspects of the invention improve the durability of electrical connections on glazing.
    Type: Grant
    Filed: May 2, 2012
    Date of Patent: March 14, 2017
    Assignees: Pilkington Group Limited, Nippon Sheet Glass Co. Ltd., Nishinihon Shoko Co., Ltd.
    Inventors: Michael Lyon, Naotaka Ikawa, Kazuo Inada, Mamoru Yoshida, Takashi Muromachi, Kazuhisa Ono, Kozo Okamoto, Takashi Suzuki
  • Patent number: 9540551
    Abstract: A heat-curable polyorganosiloxane composition which includes (A) an alkenyl group-containing linear polyorganosiloxane of the formula (I) below, wherein Ra represents a C2-C6 alkenyl and Rb represents a C1-C6 alkyl or a phenyl; (B1) a linear polyorganohydrogensiloxane of the formula (II) below, wherein Rc is hydrogen and Rd represents a C1-C6 alkyl or a phenyl; (B2) a cyclic polyorganohydrogensiloxane including Re2HSiO1/2, wherein Re represents a hydrogen atom or C1-C6 alkyl group, and SiO4/2, and having three or more hydrogen atoms bonded to a silicon atom in one molecule; (C) a platinum series catalyst; and (D) an adhesion promoter, wherein the formula (I) and the formula (II) are as follows:
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: January 10, 2017
    Assignee: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLC
    Inventors: Koji Okawa, Kazuhisa Ono
  • Patent number: 9353265
    Abstract: The invention provides dam compositions which can give cured products serving as dam materials exhibiting appropriate hardness and adhesion with respect to adherends and which are preferably such that the dam materials also have inconspicuous joints with fillers. The invention also provides image displays manufactured with the compositions. An image display sealant dam composition includes (A) a polyorganosiloxane having a mercaptoalkyl group bonded to a silicon atom, and having a viscosity at 23° C.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: May 31, 2016
    Assignee: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLC
    Inventors: Kazuhisa Ono, Koji Okawa
  • Patent number: 9340711
    Abstract: An image display sealant dam composition including (A) a polyorganosiloxane having a mercaptoalkyl bonded to a silicon; (B) an aliphatic unsaturated group-containing polyorganosiloxane including an aliphatic unsaturated group-containing linear polyorganosiloxane (B1), and a branched polyorganosiloxane (B2) having SiO4/2 units, R?3SiO1/2 units and R?2SiO2/2 units, and optionally having R?SiO3/2 units, at least three R? groups per molecule of the branched polyorganosiloxane (B2) are aliphatic unsaturated groups, the proportion of the number of the aliphatic unsaturated groups in (B2) to the total number of the aliphatic unsaturated groups in (B) is more than 50% and not more than 95%; (C) a photoreaction initiator; (D) a silane compound; and (E) an MQ resin having a weight average molecular weight of 2,000 to 2,500,000 and/or an MDQ resin having a weight average molecular weight of 2,000 to 1,000,000.
    Type: Grant
    Filed: March 28, 2014
    Date of Patent: May 17, 2016
    Assignee: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLC
    Inventors: Kazuhisa Ono, Koji Okawa
  • Publication number: 20150337188
    Abstract: The invention provides a two-pack curable polyorganosiloxane composition having an excellent rapid curing property, and methods for producing an adhered article using the compositions. The two-pack curable polyorganosiloxane composition consisting of a first component and a second component, the composition comprising: (A) an alkenyl group-containing polyorganosiloxane that contains two or more alkenyl groups in the molecule; (B) a polyorganohydrogensiloxane that has two or more hydrogen atoms bonded to a silicon atom in the molecule; and (C) a platinum group catalyst, wherein the ratio of the number of the hydrogen atoms bonded to silicon atoms in (B), HB, to the number of the alkenyl groups in (A), ViA, is 0.5 to 10.0; the content of (C) is 0.5 to 2000 ppm in terms of a platinum group metal; the first component comprises (A) and (C); and the second component comprises (B).
    Type: Application
    Filed: June 21, 2013
    Publication date: November 26, 2015
    Applicant: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLC
    Inventors: Makoto SAKAKIBARA, Kazuhisa ONO, Shigeki MATSUSHITA, Koji OKAWA
  • Publication number: 20150232666
    Abstract: An image display sealant dam composition including (A) a polyorganosiloxane having a mercaptoalkyl group bonded to a silicon atom; (B) an aliphatic unsaturated group-containing polyorganosiloxane including an aliphatic unsaturated group-containing linear polyorganosiloxane (B1) and optionally including a branched polyorganosiloxane (B2) having SiO4/2 units, R?3SiO1/2 units and R?2SiO2/2 units, and optionally further having. R?SiO3/2 units, at least three R? groups per molecule of the branched polyorganosiloxane (B2) are aliphatic unsaturated groups; (C) a photoreaction initiator; (D) an aliphatic unsaturated group-containing silane compound; and (E) a fumed silica having a BET specific surface area of 180 to 500 m2/g.
    Type: Application
    Filed: March 28, 2014
    Publication date: August 20, 2015
    Applicant: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLC
    Inventors: Kazuhisa Ono, Koji Okawa
  • Publication number: 20150218427
    Abstract: An image display sealant dam composition including (A) a polyorganosiloxane having a mercaptoalkyl bonded to a silicon; (B) an aliphatic unsaturated group-containing polyorganosiloxane including an aliphatic unsaturated group-containing linear polyorganosiloxane (B1), and a branched polyorganosiloxane (B2) having SiO4/2 units, R?3SiO1/2 units and R?2SiO2/2 units, and optionally having R?SiO3/2 units, at least three R? groups per molecule of the branched polyorganosiloxane (B2) are aliphatic unsaturated groups, the proportion of the number of the aliphatic unsaturated groups in (B2) to the total number of the aliphatic unsaturated groups in (B) is more than 50% and not more than 95%; (C) a photoreaction initiator; (D) a silane compound; and (E) an MQ resin having a weight average molecular weight of 2,000 to 2,500,000 and/or an MDQ resin having a weight average molecular weight of 2,000 to 1,000,000.
    Type: Application
    Filed: March 28, 2014
    Publication date: August 6, 2015
    Applicant: MOMENTIVE PERFORMANCE MATERIALS JAPAN LLC
    Inventors: Kazuhisa Ono, Koji Okawa
  • Patent number: 8741436
    Abstract: A window glass with a conductive ceramic fired body includes at least one glass plate having main surfaces, and the conductive ceramic fired body including a feeding point and a linear portion which is disposed on either one of the main surfaces of the glass plate, at least a part of the linear portion being placed in a visible region of the window glass and formed by successively laminating a first colored layer, a conductor layer and a second colored layer on the main surface, wherein the first colored layer and the second colored layer each include a pigment and a glass component, and the conductor layer includes silver and the glass component.
    Type: Grant
    Filed: February 9, 2009
    Date of Patent: June 3, 2014
    Assignee: Nippon Sheet Glass Company, Limited
    Inventors: Kazuhisa Ono, Yota Yano
  • Publication number: 20140138155
    Abstract: A glazing is disclosed comprising at least one ply of glass having an electrically conductive component on at least one surface, and an electrical connector electrically connected to the electrically conductive component through a soldered joint, the solder of the joint having a composition comprising 0.5 wt % or more indium, wherein the electrical connector comprises a nickel plated contact for contacting the solder. Also disclosed are solders having a composition comprising 14 to 75 wt % In, 14 to 75 wt % Sn, to 5 wt % Ag, to 5 wt % Ni, and less than 0.1 wt % Pb. Also disclosed is use of a solder having a composition comprising 0.5 wt % or more indium to solder a nickel plated electrical connector to an electrically conductive component on the surface of a ply of glass. The aspects of the invention improve the durability of electrical connections on glazing.
    Type: Application
    Filed: May 2, 2012
    Publication date: May 22, 2014
    Applicants: PILKINGTON GROUP LIMITED, NIPPON SHEET GLASS CO., LTD., UCHIHASHI ESTEC CO., LTD., NISHINIHON SHOKO CO., LTD
    Inventors: Michael Lyon, Naotaka Ikawa, Kazuo Inada, Mamoru Yoshida, Takashi Muromachi, Kazuhisa Ono, Kozo Okamoto, Takashi Suzuki
  • Patent number: 8716362
    Abstract: An ultraviolet-curable silicone resin composition including (A) a polyorganosiloxane having a mercaptoalkyl bonded to a silicon atom and having a viscosity at 23° C. of 20 to 25000 cP; (B) an organopolysiloxane having aliphatic unsaturated groups which includes (B1) a linear polyorganosiloxane having aliphatic unsaturated, and (B2) a branched organopolysiloxane which includes an SiO4/2 unit, an R?3SiO1/2 unit and an R?2SiO2/2 unit, and at least three of R? per one molecule are aliphatic unsaturated groups, provided that an amount of (B2) is an amount where a number of the aliphatic unsaturated groups in (B2) based on a total number of the aliphatic unsaturated groups in (B) is 50% or less; (C) a photoinitiator; and (D) a silane compound having an aliphatic unsaturated group.
    Type: Grant
    Filed: December 6, 2011
    Date of Patent: May 6, 2014
    Assignee: Momentive Performance Materials Japan LLC
    Inventors: Kazuhisa Ono, Koji Okawa
  • Patent number: 8476380
    Abstract: Room temperature curable silicon group-containing polymer compositions comprising (A) a reactive silicon group-containing polymer obtained through a reaction between a polyoxypropylene polyol and a y-isocyanate propyltrialkoxysilane, (B) a curing catalyst, and (C) amino group-substituted alkoxysilane or a hydrolyzed and condensed product of an amino group-substituted alkoxysilane.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: July 2, 2013
    Assignee: Momentive Performance Materials Japan LLC
    Inventor: Kazuhisa Ono
  • Patent number: D863413
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: October 15, 2019
    Assignee: FUJIFILM Corporation
    Inventors: Keita Kamei, Kazuhisa Horikiri, Hirotoshi Ono, Rena Kamoda