Patents by Inventor Kazuhito Honma

Kazuhito Honma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20080242104
    Abstract: A method of manufacturing a semiconductor device has a first exposure to the photoresist by using a first mask having a first portion of a monitor pattern, a second exposure to the photoresist by using a second mask having a second portion of the monitor pattern so that a first image of the first portion and a second image of the second portion are connected.
    Type: Application
    Filed: March 26, 2008
    Publication date: October 2, 2008
    Applicant: FUITSU LIMITED
    Inventors: Kazuhito HONMA, Masaru MIYAZAKI, Masanori ONODERA
  • Patent number: 7331025
    Abstract: In a data storage method and device, input data having a pattern are divided into a plurality of fields. A first number of rectangles contained in each field of an original image of the pattern is calculated by dividing the field of the original image into one or plurality of rectangles. A second number of rectangles contained in each field of an inverted image of the pattern is calculated by dividing the field of the inverted image into one or plurality of rectangles. One of pattern data of the original image and pattern data of the inverted image which has a smaller number of rectangles is selected by comparing the first number of the rectangles in the original image with the second number of the rectangles in the inverted image. The pattern data selected for each field are stored in a recording medium.
    Type: Grant
    Filed: June 10, 2005
    Date of Patent: February 12, 2008
    Assignee: Fujitsu Limited
    Inventors: Kazuhiko Takahashi, Taketoshi Omata, Kazuhito Honma
  • Publication number: 20050229146
    Abstract: In a data storage method and device, input data having a pattern are divided into a plurality of fields. A first number of rectangles contained in each field of an original image of the pattern is calculated by dividing the field of the original image into one or plurality of rectangles. A second number of rectangles contained in each field of an inverted image of the pattern is calculated by dividing the field of the inverted image into one or plurality of rectangles. One of pattern data of the original image and pattern data of the inverted image which has a smaller number of rectangles is selected by comparing the first number of the rectangles in the original image with the second number of the rectangles in the inverted image. The pattern data selected for each field are stored in a recording medium.
    Type: Application
    Filed: June 10, 2005
    Publication date: October 13, 2005
    Applicant: FUJITSU LIMITED
    Inventors: Kazuhiko Takahashi, Taketoshi Omata, Kazuhito Honma