Patents by Inventor Kazuhito Miyata

Kazuhito Miyata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11784054
    Abstract: An etching method for performing side-etching of silicon germanium layers of a substrate having alternating silicon layers and the silicon germanium layers formed thereon is provided. The method includes modifying surfaces of residuals by supplying a plasmarized gas containing hydrogen to the residuals on exposed end surfaces of the silicon germanium layers, and performing side-etching on the silicon germanium layers by supplying a fluorine-containing gas to the silicon germanium layers.
    Type: Grant
    Filed: September 16, 2020
    Date of Patent: October 10, 2023
    Assignee: Tokyo Electron Limited
    Inventors: Nobuhiro Takahashi, Kazuhito Miyata, Yasuo Asada
  • Patent number: 11594417
    Abstract: A technique of etching Si on a substrate having Si and another material with a high selectivity using a simple gas system is provided. In an etching method, the substrate having the Si and another material is provided, and the Si is selectively etched over the above-described another material by supplying a germanium-containing gas as an etching gas to the substrate.
    Type: Grant
    Filed: June 12, 2020
    Date of Patent: February 28, 2023
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Kazuhito Miyata, Nobuhiro Takahashi, Takehiko Orii, Shunta Furutani, Shoi Suzuki
  • Publication number: 20210082710
    Abstract: An etching method for performing side-etching of silicon germanium layers of a substrate having alternating silicon layers and the silicon germanium layers formed thereon is provided. The method includes modifying surfaces of residuals by supplying a plasmarized gas containing hydrogen to the residuals on exposed end surfaces of the silicon germanium layers, and performing side-etching on the silicon germanium layers by supplying a fluorine-containing gas to the silicon germanium layers.
    Type: Application
    Filed: September 16, 2020
    Publication date: March 18, 2021
    Inventors: Nobuhiro TAKAHASHI, Kazuhito MIYATA, Yasuo ASADA
  • Publication number: 20200395219
    Abstract: A technique of etching Si on a substrate having Si and another material with a high selectivity using a simple gas system is provided. In an etching method, the substrate having the Si and another material is provided, and the Si is selectively etched over the above-described another material by supplying a germanium-containing gas as an etching gas to the substrate.
    Type: Application
    Filed: June 12, 2020
    Publication date: December 17, 2020
    Inventors: Kazuhito MIYATA, Nobuhiro TAKAHASHI, Takehiko ORII, Shunta FURUTANI, Shoi SUZUKI
  • Publication number: 20180137881
    Abstract: In one embodiment, a method includes forming a structure having a first region including a ceramic material, a second region including a plurality of particles disposed in a ceramic matrix material, and a magnetic head assembly disposed in the first region. The method also includes directing a first ion beam at a side of the first and second regions of the structure, the first ion beam including an oxidizing species to oxidize one or more portions of the particles located near the side of the second region, where the one or more oxidized portions of the particles protrude from the side of the ceramic matrix material of the second region. The method further includes directing a second ion beam at the side of the first and second regions of the structure, the second ion beam including an inert species to recess the first and second regions.
    Type: Application
    Filed: December 28, 2017
    Publication date: May 17, 2018
    Inventors: Kazuhito Miyata, Cherngye Hwang, Takefumi Kubota, Mineaki Kodama, Dorcas Gazelle Lagasca Flavier, Mary Agnes G. Perez, Eduardo Torres Mireles, Marlon Estrella Tecson
  • Patent number: 9886973
    Abstract: In one embodiment, a method includes forming a structure having a first region including a ceramic material, a second region including a plurality of particles disposed in a ceramic matrix material, and a magnetic head assembly disposed in the first region. The method also includes directing a first ion beam at a side of the first and second regions of the structure, the first ion beam including an oxidizing species to oxidize one or more portions of the particles located near the side of the second region, where the one or more oxidized portions of the particles protrude from the side of the ceramic matrix material of the second region. The method further includes directing a second ion beam at the side of the first and second regions of the structure, the second ion beam including an inert species to recess the first and second regions.
    Type: Grant
    Filed: June 30, 2016
    Date of Patent: February 6, 2018
    Assignee: Western Digital Technologies, Inc.
    Inventors: Kazuhito Miyata, Cherngye Hwang, Takefumi Kubota, Mineaki Kodama, Dorcas Gazelle Lagasca Flavier, Mary Agnes G. Perez, Eduardo Torres Mireles, Marlon Estrella Tecson
  • Publication number: 20180005649
    Abstract: In one embodiment, a method includes forming a structure having a first region including a ceramic material, a second region including a plurality of particles disposed in a ceramic matrix material, and a magnetic head assembly disposed in the first region. The method also includes directing a first ion beam at a side of the first and second regions of the structure, the first ion beam including an oxidizing species to oxidize one or more portions of the particles located near the side of the second region, where the one or more oxidized portions of the particles protrude from the side of the ceramic matrix material of the second region. The method further includes directing a second ion beam at the side of the first and second regions of the structure, the second ion beam including an inert species to recess the first and second regions.
    Type: Application
    Filed: June 30, 2016
    Publication date: January 4, 2018
    Inventors: Kazuhito Miyata, Cherngye Hwang, Takefumi Kubota, Mineaki Kodama, Dorcas Gazelle Lagasca Flavier, Mary Agnes G. Perez, Eduardo Torres Mireles, Marlon Estrella Tecson
  • Patent number: 9036307
    Abstract: A heat-assisted magnetic recording (HAMR) air-bearing slider has an optically-transparent protective film over the near-field transducer (NFT) to protect the NFT from excessive heat caused by the accumulation of carbonaceous material on the slider's overcoat. The NFT is thus separated from the overcoat by the protective film. The protective film does not cover the write pole end, which is covered only by the overcoat, so there is no spacing loss between the write pole end and the recording layer on the disk. In one embodiment the protective film is coplanar with the recording-layer-facing surface of the slider and the overcoat covers both the protective film and the write pole end. In another embodiment the overcoat has a window that surrounds the protective film, with the protective film being substantially coplanar with the air-bearing surface (ABS) of the slider. In both embodiments the smooth topography of the slider's ABS is maintained.
    Type: Grant
    Filed: October 9, 2014
    Date of Patent: May 19, 2015
    Assignee: HGST Netherlands B.V.
    Inventors: Hiroyuki Hoshiya, Tomomitsu Inoue, Tetsuya Matsusaki, Harukazu Miyamoto, Kazuhito Miyata, Kentaro Namikawa, Atsuko Okawa
  • Patent number: 8877122
    Abstract: A Ni-based single crystal superalloy which has the following composition: Co: 0.0 wt % or more to 15.0 wt % or less, Cr: 4.1 to 8.0 wt %, Mo: 2.1 to 4.5 wt %, W: 0.0 to 3.9 wt %, Ta: 4.0 to 10.0 wt %, Al: 4.5 to 6.5 wt %, Ti: 0.0 to 1.0 wt %, Hf: 0.00 to 0.5 wt %, Nb: 0.0 to 3.0 wt %, Re: 8.1 to 9.9 wt % and Ru: 0.5 to 6.5 wt % with the remainder including Ni and unavoidable impurities. As a result, the Ni-based single crystal superalloy which includes more than 8 wt % of Re in the composition ratio and has excellent specific creep strength and the turbine blade incorporating the Ni-based single crystal superalloy may be made.
    Type: Grant
    Filed: April 16, 2010
    Date of Patent: November 4, 2014
    Assignee: IHI Corporation
    Inventors: Yasuhiro Aoki, Nobuhito Sekine, Akihiro Sato, Kazuhito Miyata, Kazuyoshi Chikugo
  • Publication number: 20130070366
    Abstract: According to one embodiment, a method for manufacturing a magnetic device includes forming a protective film above a structure, wherein at least one of hydrogen and water vapor are introduced into a formation chamber during formation of the protective film. In-another embodiment, a magnetic head includes at least one of: a read element, a write element, a heater element, and a resistance detector element above a substrate, conductive terminals for each of the at least one of: the read element, the write element, and the heater element, and a protective film above the at least one of: the read element, the write element, and the heater element, wherein the protective film comprises at least one of hydrogen and water vapor.
    Type: Application
    Filed: September 21, 2011
    Publication date: March 21, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Mineaki Kodama, Kazuhito Miyata, Hiroshi Ishizaki, Atsuko Okawa
  • Patent number: 8354034
    Abstract: A magnetic head suitable for high-density recording is provided at a high yield by a method that suppresses a reduction in reproducing output signal due to ion-beam irradiation. After an air-bearing surface of a read element, a magnetic-head element, or a row bar is mechanically polished, the air-bearing surface is irradiated with an ion beam, such that an orthographic projection of an ion-beam incidence direction onto the air-bearing surface forms an in-plane incidence angle of 30 degrees to 150 degrees or of 210 degrees to 330 degrees with respect to a track-width direction. Thereby, the formation of a short circuit due to ion-beam irradiation may be hindered.
    Type: Grant
    Filed: June 25, 2009
    Date of Patent: January 15, 2013
    Assignee: Hitachi Global Storage Technologies Netherlands BV
    Inventors: Nobuto Yasui, Shinji Sasaki, Kazuhito Miyata, Mineaki Kodama
  • Publication number: 20120034098
    Abstract: A Ni-based single crystal superalloy which has the following composition: Co: 0.0 wt % or more to 15.0 wt % or less, Cr: 4.1 to 8.0 wt %, Mo: 2.1 to 4.5 wt %, W: 0.0 to 3.9 wt %, Ta: 4.0 to 10.0 wt %, Al: 4.5 to 6.5 wt %, Ti: 0.0 to 1.0 wt %, Hf: 0.00 to 0.5 wt %, Nb: 0.0 to 3.0 wt %, Re: 8.1 to 9.9 wt % and Ru: 0.5 to 6.5 wt % with the remainder including Ni and unavoidable impurities. As a result, the Ni-based single crystal superalloy which includes more than 8 wt % of Re in the composition ratio and has excellent specific creep strength and the turbine blade incorporating the Ni-based single crystal superalloy may be made.
    Type: Application
    Filed: April 16, 2010
    Publication date: February 9, 2012
    Inventors: Yasuhiro Aoki, Nobuhito Sekine, Akihiro Sato, Kazuhito Miyata, Kazuyoshi Chikugo
  • Patent number: 7805827
    Abstract: In one embodiment of the present invention, a method of producing a magnetic head slider comprises the steps of forming, on the air bearing surface of the slider, an air bearing surface overcoat, removing the surface region from a hard amorphous carbon film by the irradiation with an ion beam which is tilted with respect to a normal to the air bearing surface, and forming a rail in the air bearing surface on which the air bearing surface overcoat has been formed. A high density and covering performance are obtained when the angle of irradiating the ion beam is not smaller than about 60 degrees from a normal to the air bearing surface of the magnetic head slider and when the acceleration voltage for the ion beam is not higher than about 300 V in the step of removing part of the air bearing surface overcoat.
    Type: Grant
    Filed: July 12, 2006
    Date of Patent: October 5, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Nobuto Yasui, Hiroshi Inaba, Shinji Sasaki, Kazuhito Miyata
  • Patent number: 7735213
    Abstract: Embodiments of the present invention provide a method of fabricating a magnetic head slider realizing high-recording density at high-yields by preventing formation of a short circuit on the air-bearing surface of a magnetic head slider and preventing formation of an oxidized layer with significant film thickness which increases the effective magnetic spacing, on the air-bearing surface of the magnetic head slider. According to one embodiment, after air-bearing surface mechanical lapping of a row bar or a magnetic head slider, cleaning is performed by ion beam bombardment to remove a conductive smear. Oxygen exposure is performed to recover a damaged region which was formed by ion beam bombardment at the end face of an intermediate layer of a magnetoresistive film 5. Thereafter, air-bearing surface protection films are formed and followed by rail formation. If the processes are performed on the row bar, the row bar is cut into individual separated magnetic head sliders.
    Type: Grant
    Filed: August 24, 2007
    Date of Patent: June 15, 2010
    Assignee: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Nobuto Yasui, Katsuro Watanabe, Takateru Seki, Kazuhito Miyata, Tetsuya Matsusaki
  • Publication number: 20090321389
    Abstract: A magnetic head suitable for high-density recording is provided at a high yield by a method that suppresses a reduction in reproducing output signal due to ion-beam irradiation. After an air-bearing surface of a read element, a magnetic-head element, or a row bar is mechanically polished, the air-bearing surface is irradiated with an ion beam, such that an orthographic projection of an ion-beam incidence direction onto the air-bearing surface forms an in-plane incidence angle of 30 degrees to 150 degrees or of 210 degrees to 330 degrees with respect to a track-width direction. Thereby, the formation of a short circuit due to ion-beam irradiation may be hindered.
    Type: Application
    Filed: June 25, 2009
    Publication date: December 31, 2009
    Inventors: Nobuto Yasui, Shinji Sasaki, Kazuhito Miyata, Mineaki Kodama
  • Publication number: 20080316656
    Abstract: Embodiments of the present invention provide a magnetic head suitable for high density recording at a high yield by reducing the thickness of an air-bearing surface protection layer of a magnetic head and suppressing reduction in the signal-to-noise (S/N) ratio of a read element. According to one embodiment, a read element of a magnetic head has a magnetoresistive effect film (TMR film) between a lower magnetic shield layer and an upper magnetic shield layer, and has a refill film and a magnetic domain control film in both sides of the TMR film. The TMR film is configured by a lower metal layer, an antiferromagnetic layer, a ferromagnetic pinned layer, an intermediate layer, a ferromagnetic free layer, and an upper metal layer. An air-bearing surface protection layer, including a silicon nitride film about 2.0 nm in thickness, is formed on a recording medium facing surface of the TMR film. Since silicon in the silicon nitride film is inactivated by nitrogen, the silicon does not damage the TMR film.
    Type: Application
    Filed: June 20, 2008
    Publication date: December 25, 2008
    Inventors: Kazuhito Miyata, Kentarou Namiki, Nobuto Yasui, Hideaki Tanaka, ATsuko Okawa, Akihiro Namba, Yoshiki Yonamoto
  • Publication number: 20080062579
    Abstract: Embodiments of the present invention provide a method of fabricating a magnetic head slider realizing high-recording density at high-yields by preventing formation of a short circuit on the air-bearing surface of a magnetic head slider and preventing formation of an oxidized layer with significant film thickness which increases the effective magnetic spacing, on the air-bearing surface of the magnetic head slider. According to one embodiment, after air-bearing surface mechanical lapping of a row bar or a magnetic head slider, cleaning is performed by ion beam bombardment to remove a conductive smear. Oxygen exposure is performed to recover a damaged region which was formed by ion beam bombardment at the end face of an intermediate layer of a magnetoresistive film 5. Thereafter, air-bearing surface protection films are formed and followed by rail formation. If the processes are performed on the row bar, the row bar is cut into individual separated magnetic head sliders.
    Type: Application
    Filed: August 24, 2007
    Publication date: March 13, 2008
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Nobuto Yasui, Katsuro Watanabe, Takateru Seki, Kazuhito Miyata, Tetsuya Matsusaki
  • Publication number: 20070014050
    Abstract: A magnetic head slider having an air bearing surface overcoat that has excellent corrosion resistance and wear resistance despite its very small thickness is provided. In one embodiment, a method of producing a magnetic head slider comprises the steps of forming, on the air bearing surface of the slider, an air bearing surface overcoat which is a film stack of an amorphous silicon film and a hard amorphous carbon film, removing the surface region from the hard amorphous carbon film by the irradiation with an ion beam which is tilted with respect to a normal to the air bearing surface, and forming a rail in the air bearing surface on which the air bearing surface overcoat has been formed. The amount of the diamond component in the hard amorphous carbon film must not be smaller than about 45% and, desirably, in a range of about 60% to 85%.
    Type: Application
    Filed: July 12, 2006
    Publication date: January 18, 2007
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Nobuto Yasui, Hiroshi Inaba, Shinji Sasaki, Kazuhito Miyata