Patents by Inventor Kazuhito Sasaki

Kazuhito Sasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230179083
    Abstract: A control unit is provided with a step-down unit which causes a system voltage of each phase of a system to step down, a voltage pulse signal generation unit which generates a voltage pulse signal of each phase that was stepped down by the step-down unit, a current pulse signal generation unit which generates a current pulse signal of each phase of the system, a zero crossing point detection unit which outputs time information of a zero crossing point of the system voltage and the system current of each phase based on the voltage pulse signal and the current pulse signal of each phase of the system, and an arithmetic unit which calculates, respectively, a value of active power and a value of reactive power of AC power output by the power conditioner to the system based on the time information of the zero crossing point of the system voltage and the system current of each phase of the system provided from the zero crossing point detection unit, and thereby controls the power conditioner.
    Type: Application
    Filed: March 17, 2020
    Publication date: June 8, 2023
    Inventors: Takamasa YAMAZAKI, Kouichi HIRAOKA, Kazuhito SASAKI, Makoto MIYATA, Takashi IMAI, Hideaki ABUMI, Takao GOTO
  • Patent number: 8077234
    Abstract: An image pickup device has a signal processing part configured to perform signal process for the first to third color signals. The signal processing part includes a first color generator configured to generate a fourth color signal corresponding to a reference pixel based on a ratio between a second color signal at a pixel located in vicinity of the reference pixel and a first color signal at a pixel located in vicinity of the reference pixel, a second color generator configured to generate a fifth color signal corresponding to the reference pixel based on a ratio between a third color signal at a pixel located in vicinity of the reference pixel and the first color signal at a pixel located in vicinity of the reference pixel, and a image quality converter configured to generate color signals by performing a predetermined image process based on the first to fifth color signals.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: December 13, 2011
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yasuo Takemura, Hiroto Honda, Kazuhito Sasaki, Tatsuya Shimoike
  • Patent number: 7968269
    Abstract: A positive resist composition for immersion exposure including a resin component (A) which has acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a cyclic principal chain polymer (A1) and a non-cyclic principal chain polymer (A2) having a structural unit (a) derived from acrylic acid as a principal chain, and the non-cyclic principal chain polymer (A2) having a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group (p1) represented by general formula (p1) shown below: wherein R1? and R2? each independently represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms; n represents an integer of 0 to 3; and Y represents an alkyl group of 1 to 5 carbon atoms or an aliphatic cyclic group of 5 to 16 carbon atoms.
    Type: Grant
    Filed: December 8, 2006
    Date of Patent: June 28, 2011
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventor: Kazuhito Sasaki
  • Publication number: 20100196823
    Abstract: A positive resist composition for immersion exposure including a resin component (A) which has acid dissociable, dissolution inhibiting groups and exhibits increased alkali solubility under action of acid and an acid-generator component (B) which generates acid upon exposure, the resin component (A) including a cyclic principal chain polymer (A1) and a non-cyclic principal chain polymer (A2) having a structural unit (a) derived from acrylic acid as a principal chain, and the non-cyclic principal chain polymer (A2) having a structural unit (a1) derived from an acrylate ester having an acid dissociable, dissolution inhibiting group (p1) represented by general formula (p1) shown below: wherein R1? and R2? each independently represents a hydrogen atom or an alkyl group of 1 to 5 carbon atoms; n represents an integer of 0 to 3; and Y represents an alkyl group of 1 to 5 carbon atoms or an aliphatic cyclic group of 5 to 16 carbon atoms.
    Type: Application
    Filed: December 8, 2006
    Publication date: August 5, 2010
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventor: Kazuhito Sasaki
  • Patent number: 7598017
    Abstract: A negative resist composition including: a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1.
    Type: Grant
    Filed: October 24, 2008
    Date of Patent: October 6, 2009
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Jun Iwashita, Kazuhito Sasaki, Sho Abe
  • Patent number: 7544460
    Abstract: A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist pattern that use such a resist composition. This resist composition includes a resin component (A) that displays changed alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure. The component (A) contains structural units derived from a (meth)acrylate ester, and exhibits a glass transition temperature that falls within a range from 120 to 170° C.
    Type: Grant
    Filed: July 7, 2004
    Date of Patent: June 9, 2009
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo Hada, Kazuhito Sasaki, Satoshi Fujimura, Takeshi Iwai
  • Publication number: 20090111054
    Abstract: A negative resist composition including: a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1.
    Type: Application
    Filed: October 24, 2008
    Publication date: April 30, 2009
    Applicant: Tokyo Ohka Kogyo Co., ltd.
    Inventors: Jun Iwashita, Kazuhito Sasaki, Sho Abe
  • Publication number: 20090027534
    Abstract: An image pickup device has a signal processing part configured to perform signal process for the first to third color signals. The signal processing part includes a first color generator configured to generate a fourth color signal corresponding to a reference pixel based on a ratio between a second color signal at a pixel located in vicinity of the reference pixel and a first color signal at a pixel located in vicinity of the reference pixel, a second color generator configured to generate a fifth color signal corresponding to the reference pixel based on a ratio between a third color signal at a pixel located in vicinity of the reference pixel and the first color signal at a pixel located in vicinity of the reference pixel, and a image quality converter configured to generate color signals by performing a predetermined image process based on the first to fifth color signals.
    Type: Application
    Filed: July 25, 2008
    Publication date: January 29, 2009
    Applicant: KABUSHIKI KAISHA TOSHIBA
    Inventors: Takemura YASUO, Hiroto HONDA, Kazuhito SASAKI, Tatsuya SHIMOIKE
  • Publication number: 20060154174
    Abstract: A resist composition is disclosed that enables formation of a favorable resist pattern using a shrink process in which, following formation of the resist pattern, a treatment such as heating is used to narrow the resist pattern, and also disclosed are a laminate and a method for forming a resist pattern that use such a resist composition. This resist composition includes a resin component (A) that displays changed alkali solubility under the action of acid, and an acid generator component (B) that generates acid on exposure. The component (A) contains structural units derived from a (meth)acrylate ester, and exhibits a glass transition temperature that falls within a range from 120 to 170° C.
    Type: Application
    Filed: July 7, 2004
    Publication date: July 13, 2006
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo Hada, Kazuhito Sasaki, Satoshi Fujimura, Takeshi Iwai
  • Patent number: 6749989
    Abstract: The invention discloses a positive-working photoresist composition suitable for patterning light-exposure with light having a wavelength of 200 nm or shorter. The photoresist composition comprises a resinous compound capable of being imparted with increased solubility in an aqueous alkaline solution by interaction with an acid, a radiation-sensitive acid generating compound capable of generating an acid by irradiation with a radiation and an organic solvent, in which the resinous compound is a copolymer consisting of a combination of three types of specific (meth)acrylate units as the monomeric units. The patterned resist layer formed from the photoresist composition has an advantage in respect of decreased line slimming caused by electron beam irradiation in SEM inspection.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: June 15, 2004
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo Hada, Satoshi Fujimura, Kazuhito Sasaki, Takeshi Iwai
  • Publication number: 20020068238
    Abstract: The invention discloses a positive-working photoresist composition suitable for patterning light-exposure with light having a wavelength of 200 nm or shorter. The photoresist composition comprises a resinous compound capable of being imparted with increased solubility in an aqueous alkaline solution by interaction with an acid, a radiation-sensitive acid generating compound capable of generating an acid by irradiation with a radiation and an organic solvent, in which the resinous compound is a copolymer consisting of a combination of three types of specific (meth)acrylate units as the monomeric units. The patterned resist layer formed from the photoresist composition has an advantage in respect of decreased line slimming caused by electron beam irradiation in SEM inspection.
    Type: Application
    Filed: November 30, 2001
    Publication date: June 6, 2002
    Inventors: Hideo Hada, Satoshi Fujimura, Kazuhito Sasaki, Takeshi Iwai
  • Patent number: 5468941
    Abstract: A memory processing apparatus according to the present invention includes a function for feeding money one by one, a function for discriminating denominations of the money received from the feeding function, a function for storing the money for each of the denominations discriminated by the discriminating function, a function for producing present time and date, setting predetermined time and date, and outputting a signal when the present time and date coincide with the predetermined time and date respectively, and a function for removing the money from the storing function in response to the signal output from the producing function and forming a bundle of a predetermined number of money.
    Type: Grant
    Filed: July 14, 1994
    Date of Patent: November 21, 1995
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Kazuhito Sasaki
  • Patent number: 4905840
    Abstract: A banknote account and arrangement apparatus includes a supply portion for supplying a bundle of banknotes in the apparatus one after another, a discrimination circuit for discriminating denomination, face, fitness, authenticity, and the like of the supplied banknotes, temporary stackers in which the banknote is stacked in an account mode, closed cassettes coupled to the temporary stackers, open pockets in which the banknote is stacked in an arrangement mode, a RAM for collecting data of the banknote stacked in the temporary stackers, a CPU for verifying the collected data of the banknote stacked in the temporary stackers with known data of the bundle of the banknotes, pushers and shutters for, only when a verification result is correct, stacking the banknote stacked in the temporary stackers in the closed cassettes, and a display portion for displaying the collected data. Sensors detect if the temporary stackers are full.
    Type: Grant
    Filed: January 19, 1988
    Date of Patent: March 6, 1990
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Akio Yuge, Kazuhito Sasaki, Minoru Hirose, Masatsugu Mukuge