Patents by Inventor Kazui Mizuno

Kazui Mizuno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electron beam lithography apparatus and lithography method
    Publication number: 20060169926
    Abstract: An electron beam lithography apparatus includes a control device in which, for each column stripe in each drawing time of multiple drawing, optional conditions of dividing a pattern to be drawn on the sample can be set; and a time obtained by dividing a total irradiation time by the number of total drawing times is set to an electron beam-irradiation time. Further, the control device controls a deflection device so as to deflect the electron beam in accordance with the set conditions of pattern-division and the set electron beam-irradiation time.
    Type: Application
    Filed: March 30, 2006
    Publication date: August 3, 2006
    Inventor: Kazui Mizuno
  • Electron beam lithography apparatus and lithography method
    Publication number: 20010017355
    Abstract: An electron beam lithography apparatus includes a control device in which, for each column stripe in each drawing time of multiple drawing, optional conditions of dividing a pattern to be drawn on the sample can be set; and a time obtained by dividing a total irradiation time by the number of total drawing times is set to an electron beam-irradiation time. Further, the control device controls a deflection device so as to deflect the electron beam in accordance with the set conditions of pattern-division and the set electron beam-irradiation time.
    Type: Application
    Filed: February 23, 2001
    Publication date: August 30, 2001
    Inventor: Kazui Mizuno