Abstract: A semiconductor image sensor includes: a semiconductor substrate having a number of pixels disposed in a matrix shape, the semiconductor substrate comprising a first region including a charge accumulation region of a photodiode and a floating diffusion and a second region including transistors, each having a gate electrode and source/drain regions; a first silicon oxide film formed above the semiconductor substrate, covering the surface of the charge accumulation region in the first region and formed as side wall spacers on side of the gate electrode walls of at lease some transistors in the second region; and a silicon nitride film formed above the first silicon oxide film, covering the source/drain regions in the second region and having an opening at least in an area above the charge accumulation region in the first region. The semiconductor image sensor is provided which has a high sensitivity and can supply an output with small noises.

Abstract: An apparatus and a process for recovering an abrasive from a waste fluid of a chemical mechanical polishing (CMP) process. The apparatus comprises a pre-filter into which a waste fluid of a CMP process is introduced, a membrane separation apparatus into which filtered waste fluid obtained from the pre-filter is introduced, a washing unit wherein a concentrated slurry obtained from the membrane separation apparatus is washed with water and a post-filter wherein the concentrated slurry obtained from the washing unit is filtered. Particles of the abrasive are thereby efficiently recovered from a waste fluid discharged from a CMP process in semiconductor manufacturing factories and are reused.

Abstract: A screw injecting apparatus includes a check valve mounted on the tip end portion of a screw and adapted to be opened and closed in response to rotation of the screw, and a control for controlling operation of the screw such that in a metering phase of molding process, the screw rotates in one direction to feed a melt of molding material toward the nozzle while the check valve is in an open state, when a metered amount of melt is accumulated forward of the tip end portion, the screw moves backward by a predetermined distance to reduce a reaction from the melt accumulated around the tip end portion, thereafter, the screw rotates in the reverse direction to close the check valve and cause the screw to advance until the amount of forward movement of the screw becomes substantially equal to the predetermined distance of backward movement achieved previously.

Abstract: An apparatus and a process for recovering abrasive from a waste fluid of a CMP process. The apparatus comprises a means of pre-filtration into which a waste fluid of a CMP process is introduced, a means of membrane separation into which a filtered waste fluid obtained from the means of pre-filtration is introduced, a means of washing by which a concentrated slurry obtained from the means of membrane separation is washed with water and a means of post-filtration by which the concentrated slurry obtained from the means of washing is filtered. Particles of the abrasive are efficiently recovered from a waste fluid discharged from the CMP process in semiconductor manufacturing factories and reused.

Abstract: A screw injecting apparatus includes a check valve mounted on the tip end portion of a screw and adapted to be opened and closed in response to rotation of the screw, and a control for controlling operation of the screw such that in a metering phase of molding process, the screw rotates in one direction to feed a melt of molding material toward the nozzle while the check valve is in an open state, when a metered amount of melt is accumulated forward of the tip end portion, the screw moves backward by a predetermined distance to reduce a reaction from the melt accumulated around the tip end portion, thereafter, the screw rotates in the reverse direction to close the check valve and cause the screw to advance until the amount of forward movement of the screw becomes substantially equal to the predetermined distance of backward movement achieved previously,