Abstract: A failure diagnostic apparatus includes a path calculation unit which calculates, for each input pattern to a diagnosis target cell, a path affecting an output value of the diagnosis target cell when a failure is assumed as an activation path, a path classification unit which classifies the activation path associated with the input pattern for which the diagnosis target cell has passed a test and the activation path associated with the input pattern for which the diagnosis target cell has failed the test, a path narrowing unit which calculates a first failure candidate path, a second failure candidate path and a normal path of the diagnosis target cell based on classified activation paths, and a result output unit which outputs information on the first failure candidate path, the second failure candidate path and the normal path.

Abstract: A failure diagnostic apparatus includes a path calculation unit which calculates, for each input pattern to a diagnosis target cell, a path affecting an output value of the diagnosis target cell when a failure is assumed as an activation path, a path classification unit which classifies the activation path associated with the input pattern for which the diagnosis target cell has passed a test and the activation path associated with the input pattern for which the diagnosis target cell has failed the test, a path narrowing unit which calculates a first failure candidate path, a second failure candidate path and a normal path of the diagnosis target cell based on classified activation paths, and a result output unit which outputs information on the first failure candidate path, the second failure candidate path and the normal path.

Abstract: Provided are a scintillator panel and an X-ray detector which have high sensitivity and sharpness. The scintillator panel includes a substrate and a scintillator layer containing a binder resin and a phosphor, wherein the scintillator panel further contains an organic compound having the maximum peak wavelength of light emission in the wavelength region of from 450 to 600 nm.

Abstract: The present invention provides a scintillator panel which is capable of utilizing light emitted by a phosphor at a high efficiency due to particles having a high refractive index being dispersed within a scintillator layer in a favorable state, which thus allows for a marked reduction in the amount of radiation exposure to a subject or the like, and which has a high luminance. The present invention also provides a scintillator panel including a substrate, and a scintillator layer containing metal compound particles and a phosphor, wherein the phosphor is covered by the metal compound at a coverage ratio of 5% or more.

Abstract: The present invention provides a scintillator panel which is capable of utilizing light emitted by a phosphor at a high efficiency due to particles having a high refractive index being dispersed within a scintillator layer in a favorable state, which thus allows for a marked reduction in the amount of radiation exposure to a subject or the like, and which has a high luminance. The present invention also provides a scintillator panel including a substrate, and a scintillator layer containing metal compound particles and a phosphor, wherein the phosphor is covered by the metal compound at a coverage ratio of 5% or more.

Abstract: Disclosed are: a paste for an electron emission source, which enables omission of an activation process and is capable of emitting electrons at a low voltage, while exhibiting excellent adhesion to a cathode substrate; and an electron emission source which uses the paste for an electron emission source. Specifically disclosed is an electron emission source which is produced by subjecting a paste for an electron emission source containing the components (A)-(C) described below to a heat treatment. The electron emission source has cracks and carbon nanotubes project from the surfaces of the cracks. (A) carbon nanotubes (B) glass powder (C) at least one substance selected from the group consisting of metal salts, metal hydroxides, organic metal compounds, metal complexes, silane coupling agents and titanium coupling agents.

Abstract: The present invention provides a producing method of powder particles having an average particle diameter on the order of submicrons. Specifically, the producing method is a producing method of powder particles obtained by grinding a product to be ground by using plural grinding media, wherein the grinding media including at least one kind (grinding medium A) having an average particle diameter of 0.01 to 5 times and at least one kind (grinding medium B) having an average particle diameter of 10 to 450 times, with respect to the average particle diameter of the product to be ground before being ground, are used.

Abstract: The present invention provides a producing method of powder particles having an average particle diameter on the order of submicrons. Specifically, the producing method is a producing method of powder particles obtained by grinding a product to be ground by using plural grinding media, wherein the grinding media including at least one kind (grinding medium A) having an average particle diameter of 0.01 to 5 times and at least one kind (grinding medium B) having an average particle diameter of 10 to 450 times, with respect to the average particle diameter of the product to be ground before being ground, are used.

Abstract: Disclosed are: a paste for an electron emission source, which enables omission of an activation process and is capable of emitting electrons at a low voltage, while exhibiting excellent adhesion to a cathode substrate; and an electron emission source which uses the paste for an electron emission source. Specifically disclosed is an electron emission source which is produced by subjecting a paste for an electron emission source containing the components (A)-(C) described below to a heat treatment. The electron emission source has cracks and carbon nanotubes project from the surfaces of the cracks. (A) carbon nanotubes (B) glass powder (C) at least one substance selected from the group consisting of metal salts, metal hydroxides, organic metal compounds, metal complexes, silane coupling agents and titanium coupling agents.

Abstract: An object of the present invention is to provide a paste for an electron emission source, which can retain good electric contact between CNT and a cathode electrode, by containing an electrically conductive particle having a particle diameter within the optimal range. A paste for an electron emission source containing a carbon nanotube having a diameter of 1 nm or more and less than 10 nm, and an electrically conductive part having an average particle diameter of 0.1 to 1 ?m.

Abstract: The present invention provides a producing method of powder particles having an average particle diameter on the order of submicrons. Specifically, the producing method is a producing method of powder particles obtained by grinding a product to be ground by using plural grinding media, wherein the grinding media including at least one kind (grinding medium A) having an average particle diameter of 0.01 to 5 times and at least one kind (grinding medium B) having an average particle diameter of 10 to 450 times, with respect to the average particle diameter of the product to be ground before being ground, are used.

Abstract: An object of the present invention is to provide a paste for an electron emission source, which can retain good electric contact between CNT and a cathode electrode, by containing an electrically conductive particle having a particle diameter within the optimal range. A paste for an electron emission source containing a carbon nanotube having a diameter of 1 nm or more and less than 10 nm, and an electrically conductive part having an average particle diameter of 0.1 to 1 ?m.

Abstract: The present invention provides a producing method of powder particles having an average particle diameter on the order of submicrons. Specifically, the producing method is a producing method of powder particles obtained by grinding a product to be ground by using plural grinding media, wherein the grinding media including at least one kind (grinding medium A) having an average particle diameter of 0.01 to 5 times and at least one kind (grinding medium B) having an average particle diameter of 10 to 450 times, with respect to the average particle diameter of the product to be ground before being ground, are used.

Abstract: The present invention provides a technique relating to a failure propagation path estimate system which can realize an estimate process by adding the measurement result to the failure location estimate results estimated prior to the measurement, and which can realize high-speed re-calculation of only part of a large-scale circuit relating to the measurement point. As shown in FIG. 1, the failure propagation path estimate system according to the present embodiment is generally provided with an input device 1 such as a keyboard or an interface for external devices, a failure propagation path estimate processor (failure propagation path estimate device, error propagation path estimate processor) 2 operated under the control of a program, a storage device 4 for storing information necessary for the failure propagation path estimate process, and an output device 5 such as a display device, a printer or an interface for external devices.

Abstract: A fault analyzing system presumes fault propagation paths for specifying nodes related to fault terminals once on plural time planes, and merges pieces of related fault terminal information representative of the fault terminals related to the nodes on different time planes in different manners so that plural list of plural kinds of fault are drawn up without repeating the time-consuming presumption.

Abstract: Disclosed is a system for inferring faulty locations in a combinational logic circuit by tracing a fault propagation path from a faulty terminal through repetition of logic decisions and implications. The system infers a logic state by repeating logic state decisions and implications and comparing the logic state with an expected value, which corresponds to a normally operating logic state, thereby inferring a fault propagation path in the logic circuit.

Abstract: In evaluating the location of a failure in a logic circuit including gates defined in a hierarchical manner, the present invention discloses a system capable of evaluating the location of a failure by referring to the circuitry of a gate described by a basic gate without creating any special databases that are dedicated to evaluating the location of a failure. In this system, expected value setting device obtains an expected value of a target gate inside the logic circuit by an IF-THEN operation in an output direction, logical state evaluating device obtains a logical state of the target gate inside the logic circuit by an IF-THEN operation in an input/output direction, and a failure propagation path inside the target gate is obtained by comparing the expected value with the logical state.

Abstract: A gate connected to an input side of a normal signal line estimated-as in a logical state equal to an expected value with an implication operation is detected as a newly implication-capable gate, and a signal line on an output side of a gate estimated as in a logical state equal to the expected value with an implication operation for the implication-capable gate is initialized to a logical state before the implication operation. A signal line in which a logical contradiction occurs in the logical state estimated with the implication operation is registered, and the number of occurrences thereof is recorded. Additionally, the result of the implication operation is stored as history information, and when the number of occurrences of logical contradictions exceeds an allowable number, the history information is traced to initialize a logical state of a signal line causing the logical contradiction to a state before the implication operation until the number falls within the allowable number.

Abstract: The present invention provides a technique relating to a failure propagation path estimate system which can realize an estimate process by adding the measurement result to the failure location estimate results estimated prior to the measurement, and which can realize high-speed re-calculation of only part of a large-scale circuit relating to the measurement point.

Abstract: Disclosed is a system for inferring faulty locations in a combinational logic circuit by tracing a fault propagation path from a faulty terminal through repetition of logic decisions and implications. The system infers a logic state in a combinational logic circuit by repeating logic state decisions and implications and comparing the logic state with an expected value, which corresponds to a logic state that prevails when the combinational logic circuit operates normally, thereby inferring a fault propagation path in the combinational logic circuit.