Patents by Inventor Kazumi Osamura

Kazumi Osamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10287200
    Abstract: Provided are a novel method and device for treating a liquid that can be utilized for treating ballast water used in ships, etc. The method and device for treating a liquid provided herein allow aquatic organisms contained in a liquid to be sufficiently inactivated or separated by being configured in such a manner as to, in supplying the liquid containing aquatic organisms, carry out at least one of an aquatic organism-inactivating treatment and a physical treatment using a centrifugal force and then store the liquid in a storage means, and in discharging the liquid thus stored, determine whether or not the aquatic organism-inactivating treatment is required, carry out the treatment based on the determination, and carry out the physical treatment using a centrifugal force.
    Type: Grant
    Filed: October 24, 2013
    Date of Patent: May 14, 2019
    Assignee: PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.
    Inventors: Hiroshi Yamamoto, Akiyoshi Edagawa, Takashi Sakakibara, Kazumi Osamura, Hideki Nagaoka, Takuya Kotanagi, Hidenori Funakoshi
  • Publication number: 20150274563
    Abstract: Provided are a novel method and device for treating a liquid that can be utilized for treating ballast water used in ships, etc. The method and device for treating a liquid provided herein allow aquatic organisms contained in a liquid to be sufficiently inactivated or separated by being configured in such a manner as to, in supplying the liquid containing aquatic organisms, carry out at least one of an aquatic organism-inactivating treatment and a physical treatment using a centrifugal force and then store the liquid in a storage means, and in discharging the liquid thus stored, determine whether or not the aquatic organism-inactivating treatment is required, carry out the treatment based on the determination, and carry out the physical treatment using a centrifugal force.
    Type: Application
    Filed: October 24, 2013
    Publication date: October 1, 2015
    Inventors: Hiroshi Yamamoto, Akiyoshi Edagawa, Takashi Sakakibara, Kazumi Osamura, Hideki Nagaoka, Takuya Kotanagi, Hidenori Funakoshi
  • Patent number: 7291185
    Abstract: A method of manufacturing a both-side metallized insulation film comprises steps of: depositing zinc or a blend of zinc and aluminum onto both sides of an insulation film; and winding this metallized film into a product roll. The method is characterized in spraying an oxidizing gas onto a deposited layer on an inner side of the insulation film to be wound, during the winding step. During a vacuum deposition step, an oil layer is formed on at least one side of the metallized film. In addition, an oxide layer is formed by exposing a deposited layer on at least one side to oxygen, or by spraying an oxygen-containing gas onto the deposited layer on at least one side during the winding of the metallized film into the product roll.
    Type: Grant
    Filed: June 6, 2002
    Date of Patent: November 6, 2007
    Assignee: Matsushita Electric Industrial Co., Ltd.
    Inventors: Kohei Shiota, Toshiharu Saito, Kazumi Osamura, Hiroki Takeoka, Kazuhiro Nakatsubo, Toshiyuki Nishimori, Masatoshi Shibuya, Toshihiro Sasaki, Shigeo Okabe
  • Publication number: 20040207970
    Abstract: The method of manufacturing double surface metallized insulating film of the present invention comprises vacuum depositing zinc or zinc-aluminum mixture on both sides of insulating film and winding the film to a product roll, wherein oxidizing gas is sprayed to an inner side deposited film when it is wound up. Also, during the deposition, oil layer is formed on at least one side of the film, and the deposited film on at least on one side is exposed to an oxygen-contained atmosphere, or oxygen-contained gas is sprayed to at least one side of the vacuum deposited film in the step of winding the film to a product roll, to form an oxide layer. According to the method of manufacturing of the present invention, the problem of a blocking that occurs as a sticking together and peeling off of the deposited films inside the product roll is avoided.
    Type: Application
    Filed: May 24, 2004
    Publication date: October 21, 2004
    Inventors: Kohei Shiota, Toshiharu Saito, Kazumi Osamura, Hiroki Takeoka, Kazuhiro Nakatsubo, Toshiyuki Nishimori, Masatoshi Shibuya, Toshihiro Sasaki, Shigeo Okabe
  • Patent number: 5219500
    Abstract: Disclosed is a silicon nitride sintered body comprising 85 to 99 mole % of .beta.-Si.sub.3 N.sub.4, 1 to 5 mole % as the oxide (M.sub.2 O.sub.3) of at least one compound of an element (M) selected from the group consisting of Sc, Vb, Er, Ho and Dy and less than 10 mole % of excessive oxygen (O.sub.2) based on the three components, wherein the excessive oxygen/M.sub.2 O.sub.3 molar ratio is lower than 2.
    Type: Grant
    Filed: December 6, 1989
    Date of Patent: June 15, 1993
    Assignee: Kyocera Corporation
    Inventors: Makoto Yoshida, Masahiro Sato, Kazunori Koga, Kazumi Osamura, Shoji Kousaka, Tatsumi Maeda, Kiyoshi Yokoyama, Masafumi Matsunaka
  • Patent number: 5114889
    Abstract: Disclosed is a silicon nitride sintered body comprising 70 to 99 mole % of silicon nitride, 0.1 to 5 moles % of a rare earth element oxide and up to 25 moles % of silicon oxide and having a silicon oxide-to-rare earth element oxide molar ratio of from 2 to 25, wherein silicon nitride crystal grains have a fine acicular structure having an average particle major axis of up to 7 .mu.m and an average aspect ratio of at least 3.
    Type: Grant
    Filed: November 27, 1990
    Date of Patent: May 19, 1992
    Assignee: Kyocera Corporation
    Inventors: Kazumi Osamura, Masaki Terazono, Shoji Kohsaka, Kazunori Koga, Akira Saito, Masahiro Sato, Hideki Uchimura
  • Patent number: 4920085
    Abstract: Disclosed is a silicon nitride sintered body comprising 85 to 99 mol % of .beta.-Si.sub.3 N.sub.4, 1 to 5 mol % as the oxide (M.sub.2 O.sub.3) of at least one compound of an element (M) selected from the group consisting of Sc, Vb, Er, Ho and Dy and less than 10 mol % of excessive oxygen (O.sub.2) based on the three components, wherein the excessive oxygen/M.sub.2 O.sub.3 molar ratio is lower than 2.
    Type: Grant
    Filed: April 1, 1988
    Date of Patent: April 24, 1990
    Assignee: Kyocera Corporation
    Inventors: Makoto Yoshida, Masahiro Sato, Kazunori Koga, Kazumi Osamura, Shoji Kousaka, Tatsumi Maeda, Kiyoshi Yokoyama, Masafumi Matsunaka