Patents by Inventor Kazunari Ishizuka
Kazunari Ishizuka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10363746Abstract: A method for producing a liquid ejection head includes a step of providing a positive photosensitive resin layer on a substrate, a step of heat-treating the positive photosensitive resin layer on the substrate, and a step of forming a mold material having a pattern of the flow path by subjecting the heat-treated positive photosensitive resin layer on the substrate to exposure and development. In the method, the positive photosensitive resin layer includes a light absorbing agent that is nonvolatile at a temperature of the heat treatment of the positive photosensitive resin layer, the light absorbing agent has a light absorbance (a1) at a wavelength of 365 nm and an average light absorbance (a2) in a wavelength range of 280 nm or more to 330 nm or less, and an absorbance ratio A is 1.0 or less where the absorbance ratio A is the ratio a2/a1.Type: GrantFiled: December 5, 2017Date of Patent: July 30, 2019Assignee: CANON KABUSHIKI KAISHAInventor: Kazunari Ishizuka
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Publication number: 20190039376Abstract: A liquid ejection head includes an ejection opening member having an ejection opening through which a liquid is ejected. The ejection opening member is provided with a cured layer of a composition over the surface thereof. The composition contains (a) a condensate of a hydrolyzable silane compound having a fluorine-containing group and a hydrolyzable silane compound having a cationically polymerizable group, and (b) a compound having a cationically polymerizable group and an ethylene oxide chain.Type: ApplicationFiled: July 31, 2018Publication date: February 7, 2019Inventor: Kazunari Ishizuka
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Publication number: 20180170055Abstract: A method for producing a liquid ejection head includes a step of providing a positive photosensitive resin layer on a substrate, a step of heat-treating the positive photosensitive resin layer on the substrate, and a step of forming a mold material having a pattern of the flow path by subjecting the heat-treated positive photosensitive resin layer on the substrate to exposure and development. In the method, the positive photosensitive resin layer includes a light absorbing agent that is nonvolatile at a temperature of the heat treatment of the positive photosensitive resin layer, the light absorbing agent has a light absorbance (a1) at a wavelength of 365 nm and an average light absorbance (a2) in a wavelength range of 280 nm or more to 330 nm or less, and an absorbance ratio A is 1.0 or less where the absorbance ratio A is the ratio a2/a1.Type: ApplicationFiled: December 5, 2017Publication date: June 21, 2018Inventor: Kazunari Ishizuka
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Patent number: 9707759Abstract: Provided is a liquid-ejecting head, including a member having opened therein an ejection orifice configured to eject a liquid, in which the liquid-ejecting head has, on a side being positioned on the member and having opened therein the ejection orifice, a cured layer of a mixture containing: (a) a condensate of hydrolyzable silane compounds containing a hydrolyzable silane compound having 20 or more fluorine atoms and a hydrolyzable silane compound having a cationically polymerizable group; (b) a fluorine atom-containing nonionic surfactant; and (c) an epoxy resin.Type: GrantFiled: January 25, 2016Date of Patent: July 18, 2017Assignee: CANON KABUSHIKI KAISHAInventors: Hyou Takahashi, Kazunari Ishizuka, Yohei Hamade, Ken Ikegame, Satoshi Tsutsui
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Publication number: 20160236467Abstract: Provided is a liquid-ejecting head, including a member having opened therein an ejection orifice configured to eject a liquid, in which the liquid-ejecting head has, on a side being positioned on the member and having opened therein the ejection orifice, a cured layer of a mixture containing: (a) a condensate of hydrolyzable silane compounds containing a hydrolyzable silane compound having 20 or more fluorine atoms and a hydrolyzable silane compound having a cationically polymerizable group; (b) a fluorine atom-containing nonionic surfactant; and (c) an epoxy resin.Type: ApplicationFiled: January 25, 2016Publication date: August 18, 2016Inventors: Hyou Takahashi, Kazunari Ishizuka, Yohei Hamade, Ken Ikegame, Satoshi Tsutsui
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Patent number: 8945818Abstract: A method of manufacturing a liquid ejection head, and the method includes a process of providing a first photosensitive resin layer containing a photodegradable positive photosensitive resin and serving as a mold material of the channel on a substrate, a process of providing a gas barrier layer having a film density of 1 g/cm3 or more on the first photosensitive resin layer, a process of subjecting the first photosensitive resin layer and the gas barrier layer to pattern exposure, and then performing development to thereby form the mold material of a channel and also removing the gas barrier layer before or simultaneously with the development, a process of providing a second photosensitive resin layer on the mold material and the substrate, a process of subjecting the second photosensitive resin layer to pattern exposure, and then performing development, and a process of removing the mold material of the channel.Type: GrantFiled: April 30, 2014Date of Patent: February 3, 2015Assignee: Canon Kabushiki KaishaInventor: Kazunari Ishizuka
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Publication number: 20140329181Abstract: A method of manufacturing a liquid ejection head, and the method includes a process of providing a first photosensitive resin layer containing a photodegradable positive photosensitive resin and serving as a mold material of the channel on a substrate, a process of providing a gas barrier layer having a film density of 1 g/cm3 or more on the first photosensitive resin layer, a process of subjecting the first photosensitive resin layer and the gas barrier layer to pattern exposure, and then performing development to thereby form the mold material of a channel and also removing the gas barrier layer before or simultaneously with the development, a process of providing a second photosensitive resin layer on the mold material and the substrate, a process of subjecting the second photosensitive resin layer to pattern exposure, and then performing development, and a process of removing the mold material of the channel.Type: ApplicationFiled: April 30, 2014Publication date: November 6, 2014Applicant: CANON KABUSHIKI KAISHAInventor: Kazunari Ishizuka
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Patent number: 8753798Abstract: A process for forming a hydrophilic coating and a hydrophilic coating, the process including the steps of: (1) forming, on a substrate, a first coating resin layer including a first cationic polymerization resin and a first photoacid generator; (2) laminating, on the first coating resin layer, a second coating resin layer including a second cationic polymerization resin which includes an acid-cleavable linkage in its main chain, and a second photoacid generator which generates methide acid by irradiation with an active energy ray including ultraviolet light; (3) forming a coating by curing the first coating resin layer and the second coating resin layer through exposure of the first coating resin layer and the second coating resin layer to the active energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the coating through heat treatment of the coating.Type: GrantFiled: October 25, 2011Date of Patent: June 17, 2014Assignee: Canon Kabushiki KaishaInventors: Kazunari Ishizuka, Ken Ikegame
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Patent number: 8741549Abstract: Provided is a method of manufacturing a liquid ejection head, including: forming a covering resin layer including a photocationic polymerization initiator and a cationically polymerizable resin on a substrate having provided thereon an energy generating element for generating energy for ejecting liquid and a solid layer which is formed of a positive resist and serves as a pattern for a liquid flow path which communicates with a liquid ejection orifice for ejecting the liquid; exposing the covering resin layer to development to form the liquid ejection orifice; and removing the solid layer to form the liquid flow path, in which the covering resin layer includes, as a cationic polymerization inhibitor, an amine compound having a perfluoroalkyl group. Also provided is a liquid ejection head obtained by the method.Type: GrantFiled: August 20, 2012Date of Patent: June 3, 2014Assignee: Canon Kabushiki KaishaInventor: Kazunari Ishizuka
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Patent number: 8728718Abstract: There is provided a method for manufacturing a liquid ejection head having a substrate and a channel-forming member having an ejection port from which a liquid is ejected, the method including forming a negative photosensitive resin layer on or above the substrate; forming a lens layer on the negative photosensitive resin layer, the lens layer having a lens; exposing the negative photosensitive resin layer through the lens to form an ejection port in the negative photosensitive resin layer; and removing the lens layer.Type: GrantFiled: May 20, 2013Date of Patent: May 20, 2014Assignee: Canon Kabushiki KaishaInventors: Isamu Horiuchi, Hiroaki Mihara, Kazunari Ishizuka, Ken Ikegame
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Patent number: 8673546Abstract: A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof.Type: GrantFiled: October 25, 2011Date of Patent: March 18, 2014Assignee: Canon Kabushiki KaishaInventors: Kazunari Ishizuka, Ken Ikegame, Shoji Shiba
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Publication number: 20130323650Abstract: There is provided a method for manufacturing a liquid ejection head having a substrate and a channel-forming member having an ejection port from which a liquid is ejected, the method including forming a negative photosensitive resin layer on or above the substrate; forming a lens layer on the negative photosensitive resin layer, the lens layer having a lens; exposing the negative photosensitive resin layer through the lens to form an ejection port in the negative photosensitive resin layer; and removing the lens layer.Type: ApplicationFiled: May 20, 2013Publication date: December 5, 2013Applicant: CANON KABUSHIKI KAISHAInventors: Isamu Horiuchi, Hiroaki Mihara, Kazunari Ishizuka, Ken Ikegame
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Publication number: 20130057618Abstract: Provided is a method of manufacturing a liquid ejection head, including: forming a covering resin layer including a photocationic polymerization initiator and a cationically polymerizable resin on a substrate having provided thereon an energy generating element for generating energy for ejecting liquid and a solid layer which is formed of a positive resist and serves as a pattern for a liquid flow path which communicates with a liquid ejection orifice for ejecting the liquid; exposing the covering resin layer to development to form the liquid ejection orifice; and removing the solid layer to form the liquid flow path, in which the covering resin layer includes, as a cationic polymerization inhibitor, an amine compound having a perfluoroalkyl group. Also provided is a liquid ejection head obtained by the method.Type: ApplicationFiled: August 20, 2012Publication date: March 7, 2013Applicant: CANON KABUSHIKI KAISHAInventor: Kazunari Ishizuka
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Patent number: 8273524Abstract: A producing method of a liquid discharging head includes a discharge port discharging a liquid and a flow path communicating with the discharge port, the method comprising the steps of forming a pattern of a shape of the flow path on a substrate, forming a layer of a negative type photosensitive resin composition including a photo-initiated polymerization initiator on the substrate so as to coat the pattern, at least a region of the layer in a vicinity of the substrate including a sensitizing agent of the photo-initiated polymerization initiator, a density of the sensitizing agent in the layer formed to be higher in the region than in a part where the discharge port is formed, forming the discharge port by exposing the layer to pattern the layer, and removing a pattern to form the flow path.Type: GrantFiled: May 29, 2008Date of Patent: September 25, 2012Assignee: Canon Kabushiki KaishaInventors: Isamu Horiuchi, Kazunari Ishizuka
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Patent number: 8210650Abstract: A liquid discharge head comprises a discharge port forming member having formed therein a discharge port arranged corresponding to an energy generating element which generates energy to eject a liquid and a flow path forming member for forming a flow path to supply ink to the discharge port. At least one of the discharge port forming member and the flow path forming member is made of a cured material of a composition containing an epoxy resin and a phenol resin having a higher oxygen equivalent than that of the epoxy resin.Type: GrantFiled: May 28, 2008Date of Patent: July 3, 2012Assignee: Canon Kabushiki KaishaInventors: Kazunari Ishizuka, Shimpei Otaka, Isao Imamura
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Publication number: 20120115985Abstract: A process for forming a hydrophilic coating, including (1) forming, on a substrate, coating resin layer including a cationic polymerization resin having an acid-cleavable linkage in its main chain, and a photoacid generator which generates antimonic acid or an acid having a weaker acid strength than that of antimonic acid by irradiation with active energy ray including ultraviolet light; (2) laminating, on the resin layer, a photoacid generator holding layer including a photoacid generator which generates an acid having a stronger acid strength than that of antimonic acid by irradiation with the energy ray, and a holder which holds the photoacid generator and can be removed in step (3); (3) removing the holding layer and curing the resin layer through exposure of those layers to the energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the resin layer through heat treatment thereof.Type: ApplicationFiled: October 25, 2011Publication date: May 10, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Kazunari Ishizuka, Ken Ikegame, Shoji Shiba
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Publication number: 20120115089Abstract: A process for forming a hydrophilic coating and a hydrophilic coating, the process including the steps of: (1) forming, on a substrate, a first coating resin layer including a first cationic polymerization resin and a first photoacid generator; (2) laminating, on the first coating resin layer, a second coating resin layer including a second cationic polymerization resin which includes an acid-cleavable linkage in its main chain, and a second photoacid generator which generates methide acid by irradiation with an active energy ray including ultraviolet light; (3) forming a coating by curing the first coating resin layer and the second coating resin layer through exposure of the first coating resin layer and the second coating resin layer to the active energy ray to conduct development; and (4) forming a hydrophilic coating by hydrophilizing a surface of the coating through heat treatment of the coating.Type: ApplicationFiled: October 25, 2011Publication date: May 10, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Kazunari Ishizuka, Ken Ikegame
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Patent number: 8034399Abstract: An ink jet head has a head substrate including discharge elements for discharging ink, with an electric wiring board being electrically connected to the head substrate, in which the periphery of the head substrate is sealed with a first sealant, and an electric splice between the head substrate and the electric wiring board is sealed with a second sealant. The first and second sealants contain the same base resin and curing agent, and the second sealant shows higher hardness than the first sealant after curing. This ink jet head is free from problems such as cavities and fissures at the boundary of the two sealants caused by a difference in linear expansion coefficients.Type: GrantFiled: April 12, 2010Date of Patent: October 11, 2011Assignee: Canon Kabushiki KaishaInventors: Masako Shimomura, Tadayoshi Inamoto, Kazunari Ishizuka, Ryoichiro Kurobe, Yohei Sato, Akihiko Shimomura, Isao Imamura
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Patent number: 7947336Abstract: An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): where: R represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a t-butyl group; n represents an integer of 0 or more and 4 or less; and m represents an integer of 1 or more and 3 or less.Type: GrantFiled: June 4, 2010Date of Patent: May 24, 2011Assignee: Canon Kabushiki KaishaInventors: Shimpei Otaka, Kazunari Ishizuka, Isamu Horiuchi, Isao Imamura
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Patent number: 7887162Abstract: An epoxy resin composition, including: an epoxy resin (A) represented by Formula (1); an epoxy resin (B) having an epoxy equivalent of 220 or less and having twice or more epoxy groups in a molecule than epoxy groups of the epoxy resin (A); and a photocationic polymerization initiator (C), in which: the epoxy resins (A) and (B) constitute main components; and a weight of the epoxy resin (A) is 40% or more and a weight of the epoxy resin (B) is 30% or more with respect to a total weight of the epoxy resins (A) and (B): where: R represents a hydrogen atom, a methyl group, an ethyl group, a propyl group, or a t-butyl group; n represents an integer of 0 or more and 4 or less; and m represents an integer of 1 or more and 3 or less.Type: GrantFiled: January 29, 2010Date of Patent: February 15, 2011Assignee: Canon Kabushiki KaishaInventors: Shimpei Otaka, Kazunari Ishizuka, Isamu Horiuchi, Isao Imamura