Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a repeating unit having a group in which a phenolic hydroxyl group is protected with an acid-leaving group; a first photoacid generator that generates an acid having a pKa of ?2.00 to 2.00, in which in a case where the acid thus generated is a carboxylic acid, a pKa of the carboxylic acid is ?2.00 or more and less than 1.00; and a second photoacid generator that generates a carboxylic acid having a pKa of 1.00 or more.

Abstract: The present invention provides a pattern forming method with which a pattern having excellent LER performance is obtained. In addition, the present invention provides an actinic ray-sensitive or radiation-sensitive composition and a method for manufacturing an electronic device, which relate to the pattern forming method. The pattern forming method of the present invention includes, in the following order, an exposure step of exposing a resist film, the resist film including an acid-decomposable group a which reacts to generate a polar group having a pKa of 6.0 or more, an acid-decomposable group b which reacts to generate a polar group having a pKa of less than 6.0, and a photoacid-generating component, a first heating step for reacting at least a part of the acid-decomposable group a with an acid to generate the polar group having a pKa of 6.0 or more, a second heating step for reacting at least a part of the acid-decomposable group b to generate the polar group having a pKa of less than 6.

Abstract: A method for producing a resist composition includes setting parameter, acquiring a pattern size for a regression analysis, analyzing performing a regression analysis, calculating a pattern size of a target resist composition based on the regression analysis, comparing the pattern size of the target resist composition and the target pattern size, determining a formulating amount of the resist composition in a case where a difference between the pattern size of the target resist composition and the target pattern size is within an allowable range, and producing a resist composition based on the determined formulating amount, in which, in a case where the difference is out of the allowable range, the method further includes changing at least the content of components in the target resist composition, and the formulating amount of the resist composition is determined based on the changed physical quantity to produce the resist composition.

Abstract: The present invention provides a positive tone resist composition containing (A) an ionic compound and (B) a resin that has a repeating unit (b1) having an interactive group which interacts with an ionic group in the ionic compound and of which a main chain is decomposed by an irradiation with X-rays, electron beam, or extreme ultraviolet rays; a resist film formed of the positive tone resist composition; a pattern forming method; and a method for manufacturing an electronic device.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid upon irradiation with actinic rays or radiation and a resin whose polarity increases by the action of an acid, in which the compound is represented by a specific General Formula (X).

Abstract: According to the present invention, there is provided a method of producing a salt, including reacting M+X? with YH to generate XH and M+Y? and subsequently removing the generated XH to obtain the M+Y?. In the method of producing a salt, M+X? is a salt of a cation represented by M+ and an anion represented by X?, M+Y? is a salt of the cation represented by M+ and an anion represented by Y?, XH is a conjugate acid of X?, YH is a conjugate acid of Y?, M+Y? is a compound that generates an acid upon irradiation with an active ray or a radioactive ray, a pKa of XH is larger than a pKa of YH, and a ClogP value of XH is larger than 2.

Abstract: The present invention provides a synthetic resin microporous film which has excellent permeability of lithium ions, can constitute high performance power storage devices, and is less likely to cause a short circuit between a positive electrode and a negative electrode as well as rapid decrease in discharge capacity due to a dendrite even when used in high power applications.

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes an acid-decomposable resin having a repeating unit represented by General Formula (I), and a compound that generates an add upon irradiation with actinic rays or radiation.

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in the sensitivity of a resist film to be formed to EUV and excellent in the LER of a positive tone pattern to be formed upon EUV exposure. In addition, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device, each of which uses the actinic ray-sensitive or radiation-sensitive resin composition. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a compound that generates an acid upon irradiation with actinic rays or radiation, and a resin having a polarity that increases by an action of an acid, in which the resin includes a repeating unit represented by General Formula (B-1).

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition which is excellent in LER performance and a collapse suppressing ability. Furthermore, the present invention provides a resist film, a pattern forming method, and a method for manufacturing an electronic device. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a polarity that increases by the action of an acid; and a compound that generates an acid upon irradiation with actinic rays or radiation, in which the resin has a repeating unit represented by General Formula (B-1).

Abstract: The present invention provides an actinic ray-sensitive or radiation-sensitive resin composition in which fewer defects are generated in any development treatment of alkali development and organic solvent development, a pattern forming method, a method for manufacturing an electronic device, and a resin. The actinic ray-sensitive or radiation-sensitive resin composition of an embodiment of the present invention includes a resin having a repeating unit represented by Formula (1) and a repeating unit having an acid-decomposable group, and a photoacid generator.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition contains a compound that generates an acid upon irradiation with actinic rays or radiation and a resin whose polarity increases by the action of an acid, in which the compound is represented by a specific General Formula (X).

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes a resin having a repeating unit having a group in which a phenolic hydroxyl group is protected with an acid-leaving group; a first photoacid generator that generates an acid having a pKa of ?2.00 to 2.00, in which in a case where the acid thus generated is a carboxylic acid, a pKa of the carboxylic acid is ?2.00 or more and less than 1.00; and a second photoacid generator that generates a carboxylic acid having a pKa of 1.00 or more.

Abstract: Provided are a compound represented by any one of Formulae (1) to (3) described in the specification, a coloring composition for dyeing or textile printing including the compound, an ink for ink jet textile printing, a method of printing on fabric, and a dyed or printed fabric.

Abstract: The present invention provides a synthetic resin microporous film which has excellent permeability of lithium ions, can constitute high performance power storage devices, and is less likely to cause a short circuit between a positive electrode and a negative electrode as well as rapid decrease in discharge capacity due to a dendrite even when used in high power applications.

Abstract: Provided are: a coloring composition for dyeing including a compound represented by Formula (1) shown in this specification or a salt thereof; a coloring composition for textile printing in which the coloring composition for dyeing is used for textile printing; a compound which is preferable as a material of the coloring compositions; a textile printing method in which the above-described coloring composition for textile printing is used; an ink for ink jet textile printing including the above-described coloring composition for textile printing; and a dyed fabric.

Abstract: The present invention provides a colored curable resin composition that exhibits good heat resistance and durability in a sputtering process, a cured film, a color filter, a method for manufacturing a color filter, a solid-state image device, an image display device, a compound, and a cation. The colored curable resin composition contains a colorant represented by Formula (1), Formula (2), or Formula (3), a resin, a polymerizable compound, and a polymerization initiator. In Formula (1), R101 and R102 each independently represent a hydrogen atom or a substituent, R103 to R106 each independently represent a hydrogen atom, an alkyl group, an aryl group, or a heteroaryl group, R107 to R111 each independently represent a hydrogen atom or a substituent, n1 to n4 each independently represent an integer of 0 to 4, n5 represents an integer of 0 to 6, X represents an anion or is not present, and at least one of R101, . . .

Abstract: Provided are a coloring composition including a compound represented by any one of Formulae (1) to (3) shown in the specification, an ink jet ink including the coloring composition, and a textile printing method.

Abstract: Provided are a compound represented by any one of Formulae (1) to (3) described in the specification, a coloring composition for dyeing or textile printing including the compound, an ink for ink jet textile printing, a method of printing on fabric, and a dyed or printed fabric.

Abstract: Provided are a compound represented by any one of Formulae (1) to (3) described in the specification, a coloring composition for dyeing or textile printing including the compound, an ink for ink jet textile printing, a method of printing on fabric, and a dyed or printed fabric.