Abstract: An apparatus for plasma processing is configured to generate plasma in a chamber and periodically apply a pulsed negative DC voltage to an upper electrode from a DC power supply in the plasma processing on a substrate and in plasma cleaning. A duty ratio of the pulsed negative DC voltage used for the plasma processing is smaller than a duty ratio of the pulsed negative DC voltage used for the plasma cleaning. An absolute value of an average value of an output voltage of the DC power supply used for the plasma processing is smaller than an absolute value of an average value of the output voltage of the DC power supply used for the plasma cleaning.

Abstract: A plasma processing method according to an exemplary embodiment includes generating plasma from a film formation gas in a chamber of a plasma processing apparatus by supplying radio frequency power from a radio frequency power source. The plasma processing method further includes forming a protective film on an inner wall surface of a side wall of the chamber by depositing a chemical species from the plasma on the inner wall surface. In the forming a protective film, a pulsed negative direct-current voltage is periodically applied from a direct-current power source device to an upper electrode of the plasma processing apparatus.

Abstract: A decrease of an etching rate of a substrate can be suppressed, and energy of ions irradiated to an inner wall of a chamber main body can be reduced. A plasma processing apparatus includes a DC power supply configured to generate a negative DC voltage to be applied to a lower electrode of a stage. In a plasma processing performed by using the plasma processing apparatus, a radio frequency power is supplied to generate plasma by exciting a gas within a chamber. Further, the negative DC voltage from the DC power supply is periodically applied to the lower electrode to attract ions in the plasma onto the substrate placed on the stage. A ratio occupied, within each of cycles, by a period during which the DC voltage is applied to the lower electrode is set to be equal to or less than 40%.

Abstract: A decrease of an etching rate of a substrate can be suppressed, and energy of ions irradiated to an inner wall of a chamber main body can be reduced. A plasma processing apparatus includes a DC power supply configured to generate a negative DC voltage to be applied to a lower electrode of a stage. In a plasma processing performed by using the plasma processing apparatus, a radio frequency power is supplied to generate plasma by exciting a gas within a chamber. Further, the negative DC voltage from the DC power supply is periodically applied to the lower electrode to attract ions in the plasma onto the substrate placed on the stage. A ratio occupied, within each of cycles, by a period during which the DC voltage is applied to the lower electrode is set to be equal to or less than 40%.

Abstract: A plasma processing method according to an exemplary embodiment includes generating plasma from a film formation gas in a chamber of a plasma processing apparatus by supplying radio frequency power from a radio frequency power source. The plasma processing method further includes forming a protective film on an inner wall surface of a side wall of the chamber by depositing a chemical species from the plasma on the inner wall surface. In the forming a protective film, a pulsed negative direct-current voltage is periodically applied from a direct-current power source device to an upper electrode of the plasma processing apparatus.

Abstract: An apparatus for plasma processing is configured to generate plasma in a chamber and periodically apply a pulsed negative DC voltage to an upper electrode from a DC power supply in the plasma processing on a substrate and in plasma cleaning. A duty ratio of the pulsed negative DC voltage used for the plasma processing is smaller than a duty ratio of the pulsed negative DC voltage used for the plasma cleaning. An absolute value of an average value of an output voltage of the DC power supply used for the plasma processing is smaller than an absolute value of an average value of the output voltage of the DC power supply used for the plasma cleaning.

Abstract: A decrease of an etching rate of a substrate can be suppressed, and energy of ions irradiated to an inner wall of a chamber main body can be reduced. A plasma processing apparatus includes a DC power supply configured to generate a negative DC voltage to be applied to a lower electrode of a stage. In a plasma processing performed by using the plasma processing apparatus, a radio frequency power is supplied to generate plasma by exciting a gas within a chamber. Further, the negative DC voltage from the DC power supply is periodically applied to the lower electrode to attract ions in the plasma onto the substrate placed on the stage. A ratio occupied, within each of cycles, by a period during which the DC voltage is applied to the lower electrode is set to be equal to or less than 40%.

Abstract: In a method of an embodiment, radio-frequency power is supplied to an electrode via a matching device from a radio-frequency power supply in order to generate plasma within a chamber. During the supply of the radio-frequency power, it is determined whether or not plasma is generated within the chamber from one or more parameters reflecting plasma generation within the chamber. When it is determined that plasma is not generated, a frequency of the radio-frequency power output from the radio-frequency power supply is adjusted to set the load side reactance of the radio-frequency power supply to zero or to bring the load side reactance close to zero.

Abstract: A decrease of an etching rate of a substrate can be suppressed, and energy of ions irradiated to an inner wall of a chamber main body can be reduced. A plasma processing apparatus includes a DC power supply configured to generate a negative DC voltage to be applied to a lower electrode of a stage. In a plasma processing performed by using the plasma processing apparatus, a radio frequency power is supplied to generate plasma by exciting a gas within a chamber. Further, the negative DC voltage from the DC power supply is periodically applied to the lower electrode to attract ions in the plasma onto the substrate placed on the stage. A ratio occupied, within each of cycles, by a period during which the DC voltage is applied to the lower electrode is set to be equal to or less than 40%.

Abstract: In a method of an embodiment, radio-frequency power is supplied to an electrode via a matching device from a radio-frequency power supply in order to generate plasma within a chamber. During the supply of the radio-frequency power, it is determined whether or not plasma is generated within the chamber from one or more parameters reflecting plasma generation within the chamber. When it is determined that plasma is not generated, a frequency of the radio-frequency power output from the radio-frequency power supply is adjusted to set the load side reactance of the radio-frequency power supply to zero or to bring the load side reactance close to zero.

Abstract: A decrease of an etching rate of a substrate can be suppressed, and energy of ions irradiated to an inner wall of a chamber main body can be reduced. A plasma processing apparatus includes a DC power supply configured to generate a negative DC voltage to be applied to a lower electrode of a stage. In a plasma processing performed by using the plasma processing apparatus, a radio frequency power is supplied to generate plasma by exciting a gas within a chamber. Further, the negative DC voltage from the DC power supply is periodically applied to the lower electrode to attract ions in the plasma onto the substrate placed on the stage. A ratio occupied, within each of cycles, by a period during which the DC voltage is applied to the lower electrode is set to be equal to or less than 40%.

Abstract: An audio device (e.g. an AV amplifier), with a plurality of audio output terminals according to the HDMI standard, converts audio data of a source device into audio signals suited to audio reproduction abilities (e.g. channel counts) of sink devices. The audio device stores a plurality of audio reproduction ability information describing the predetermined channel count thereof and the channel counts of sink devices, wherein arbitrary audio reproduction ability information precluding audio reproduction ability information of a sink device with the smallest channel count is provided to a source device. The audio device performs down-mixing on audio signals with respect to a sink device whose channel count is smaller than the predetermined channel count, while the audio device performs signal processing on audio signals with respect to a sink device whose channel count is larger than the predetermined channel count.

Abstract: An audio device (e.g. an AV amplifier), with a plurality of audio output terminals according to the HDMI standard, converts audio data of a source device into audio signals suited to audio reproduction abilities (e.g. channel counts) of sink devices. The audio device stores a plurality of audio reproduction ability information describing the predetermined channel count thereof and the channel counts of sink devices, wherein arbitrary audio reproduction ability information precluding audio reproduction ability information of a sink device with the smallest channel count is provided to a source device. The audio device performs down-mixing on audio signals with respect to a sink device whose channel count is smaller than the predetermined channel count, whilst the audio device performs signal processing on audio signals with respect to a sink device whose channel count is larger than the predetermined channel count.

Abstract: The present invention provides an audio data recording medium reproducer, wherein CPU 10 which writes audio data read by reader 11 into buffer memory 13 and buffer memory controller 21 which transfers the data to buffer memory 22 and inputs it into DAC 23 at a predetermined data rate are connected by a bus, and furthermore, CPU 20 for controlling a user interface is separately provided. Provision of a plurality of such simple controllers reduces costs to be lower than in the case of providing one high-performance controller. Furthermore, it also becomes possible to separately construct the respective functional parts as units.

Abstract: A digital information copying management apparatus includes a data storage unit that is arranged to store data, a data processing unit that controls writing and reading of the data to and from the data storage unit, a bus that connects the data storage unit and the data processing unit for transmitting data having plural bits in parallel, and a logic circuit unit that is provided between the data storage unit and the data processing unit, and that inverts at least one bit data of the data that is transferred in the bus in parallel.

Abstract: Push-pull signal is created on the basis of reflected-light detection signals output from four divided light receiving elements that receive a reflection of a recording laser light beam off an optical disk. The push-pull signal is sent to a gain variation circuit. The push-pull signal is normalized by setting the gain of the gain variation circuit to a low level in response to a mark forming section of a recording signal, but to a high level in response to a blank forming section of the recording signal. Wobble detection and pre-pit detection are performed on the basis of the normalized push-pull signal.

Abstract: For each sync frame, an AND circuit detects whether a pre-pit synchronization signal can be obtained within a window set by a timing generator. Detection result of the AND circuit is held by a shift register, where it is shifted in response to each sync frame. On the basis of a parallel output from the shift register, a decoder determines whether the detection of the pre-pit synchronization signal is accurate or erroneous. Count value of a counter is incremented by one each time the decoder determines that the detection of the pre-pit synchronization signal is accurate, but is decremented by one each time the decoder determines that the detection of the pre-pit synchronization signal is erroneous. Identification section identifies stability/instability of the pre-pit synchronization signal detection.

Abstract: The present invention provides an audio data recording medium reproducer, wherein CPU 10 which writes audio data read by reader 11 into buffer memory 13 and buffer memory controller 21 which transfers the data to buffer memory 22 and inputs it into DAC 23 at a predetermined data rate are connected by a bus, and furthermore, CPU 20 for controlling a user interface is separately provided. Provision of a plurality of such simple controllers reduces costs to be lower than in the case of providing one high-performance controller. Furthermore, it also becomes possible to separately construct the respective functional parts as units.

Abstract: For each sync frame, an AND circuit detects whether a pre-pit synchronization signal can be obtained within a window set by a timing generator. Detection result of the AND circuit is held by a shift register, where it is shifted in response to each sync frame. On the basis of a parallel output from the shift register, a decoder determines whether the detection of the pre-pit synchronization signal is accurate or erroneous. Count value of a counter is incremented by one each time the decoder determines that the detection of the pre-pit synchronization signal is accurate, but is decremented by one each time the decoder determines that the detection of the pre-pit synchronization signal is erroneous. Identification section identifies stability/instability of the pre-pit synchronization signal detection.

Abstract: There is generated a rhythm corresponding to a designated tempo and meter of a music piece to be recorded. Performance of a musical instrument is started at specific timing according to the generated rhythm, and the musical information resulting from the performance is recorded onto an MD (Mini Disk). The address on the MD read out when the performance of the music piece is started is retrieved as a start address of the music piece. After the recording, the retrieved start address is recorded onto the UTOC (User's-table-of-contents) area of the disk along with the designated tempo and meter. By reading out the start address, tempo and meter to calculate a measure number and start address of a desired measure on the basis of the read out information, display of a measure number being currently reproduced and quick access to the starting point of any desired measure can be achieved.