Abstract: A substrate processing apparatus includes a chamber in which a first processing space, a second processing space, a connecting space connecting the first processing space and the second processing space, a first hole connecting with the connecting space and a second hole connecting with the connecting space are formed, a first gate valve having a first valve element and closing the first hole, the first valve element sliding in the first hole, opening and closing the connecting space, and a second gate valve having a second valve element and closing the second hole, the second valve element sliding in the second hole, opening and closing the connecting space, wherein a region in which the first hole and the connecting space connect with each other and a region in which the second hole and the connecting space connect with each other are one common region.

Abstract: A pre-baking apparatus for heating a substrate upstream of a process tool is adapted to be connected to an EFEM (equipment front end module) and includes: a chamber which has a front face with multiple slots arranged in a height direction of the chamber, and which is divided into multiple compartments extending from the multiple slots, respectively, toward a rear end of the chamber for loading and unloading substrates; and a connecting frame for connecting the chamber to the process tool. The multiple compartments are separated from each other by a divider plate and provided with heaters for heating the multiple compartments, and each compartment has a gas injection port for blowing a hot inert gas over the substrate placed therein toward the slot.

Abstract: A pre-baking apparatus for heating a substrate upstream of a process tool is adapted to be connected to an EFEM (equipment front end module) and includes: a chamber which has a front face with multiple slots arranged in a height direction of the chamber, and which is divided into multiple compartments extending from the multiple slots, respectively, toward a rear end of the chamber for loading and unloading substrates; and a connecting frame for connecting the chamber to the process tool. The multiple compartments are separated from each other by a divider plate and provided with heaters for heating the multiple compartments, and each compartment has a gas injection port for blowing a hot inert gas over the substrate placed therein toward the slot.

Abstract: A liquid material vaporization apparatus for a semiconductor processing apparatus includes: a vaporization tank; an inner partition wall disposed in the tank for dividing the interior of the tank into a charging compartment and a vaporization compartment which are liquid-communicatable with each other over an upper edge of the inner partition wall. A liquid material charged in the charging compartment overflows over the upper edge of the inner partition wall toward the vaporization compartment to store and vaporize the liquid material in the vaporization compartment.

Abstract: Sticking of a substrate occurs in a reaction chamber for processing the substrate placed on a surface of a substrate-supporting device provided with lift pins for moving the substrate up and down with respect to the surface of the substrate-supporting device. A method of detecting the occurrence of the sticking of the substrate includes: monitoring a vibration propagating in or through the reaction chamber by a sensor, which vibration is indicative of or specific to sticking of the substrate on the surface of the substrate-supporting device when being moved up from the surface of the substrate-supporting device with the lift pins; and initiating a pre-designated sequence if the vibration is detected while processing the substrate in the reaction chamber.

Abstract: An exhaust gas trap for semiconductor processes includes: a trap body having an inlet port and an outlet port; an inlet shut-off valve provided at the inlet port; and an outlet shut-off valve provided at the outlet port. The trap body, inlet and outlet valves are integrated and can be removed together for replacement on refreshing of the trap.

Abstract: A liquid material vaporization apparatus for a semiconductor processing apparatus includes: a vaporization tank; an inner partition wall disposed in the tank for dividing the interior of the tank into a charging compartment and a vaporization compartment which are liquid-communicatable with each other over an upper edge of the inner partition wall. A liquid material charged in the charging compartment overflows over the upper edge of the inner partition wall toward the vaporization compartment to store and vaporize the liquid material in the vaporization compartment.

Abstract: Sticking of a substrate occurs in a reaction chamber for processing the substrate placed on a surface of a substrate-supporting device provided with lift pins for moving the substrate up and down with respect to the surface of the substrate-supporting device. A method of detecting the occurrence of the sticking of the substrate includes: monitoring a vibration propagating in or through the reaction chamber by a sensor, which vibration is indicative of or specific to sticking of the substrate on the surface of the substrate-supporting device when being moved up from the surface of the substrate-supporting device with the lift pins; and initiating a pre-designated sequence if the vibration is detected while processing the substrate in the reaction chamber.