Abstract: An apparatus for controlling a throttle valve comprises a motor for rotating a throttle valve so as to adjust the valve opening degree, a gearing disposed between the motor and the throttle valve for transmitting driving force of the motor to the throttle valve, and a return device serving to return the throttle valve to a regular set position thereof. The return device includes a tension spring.

Abstract: An apparatus for detecting foreign particles on a surface of a reticle or pellicle comprises an optical system through which a light beam forms a light spot on the surface. The surface and the light spot are shifted relatively so that the light spot scans the surface. Light detectors receive light scattered by a foreign particle and directed in different directions, respectively, and generated photoelectric outputs by which the presence of the foreign particle is discriminated. Beam diameter and scanning speed are varied to provide the most effective operation for particles of different sizes.

Abstract: A defect inspecting apparatus for determining the presence of a defect element adhering to either of the front and back surfaces of a thin film-like object to be inspected (the object having a light-transmitting property) applies two light beams of different wavelengths to a surface of the object and varies the incident angle of the light beams. A first photoelectric detector receives light of the two light beams reflected by or transmitted by the object, and a second photoelectric detector receives light of the two light beams scattered by the defect element. A discriminator determines the surface of the object to which the defect element adheres based on detection outputs of the photoelectric detectors.

Abstract: An apparatus for examining the surface of a substrate comprises irradiating means for supplying a light beam which scans the surface of the substrate, first and second light-receiving means for individually receiving scattered lights travelling in different first and second directions from the surface of the substrate and individually producing first and second output signals conforming to the intensities of the received lights, and means for discriminating the directional characteristics of the scattered lights on the basis of the time phase shift between the first and second output signals.

Abstract: An apparatus for detecting foreign particles on a transparent pellicle comprises a first illuminating device having a first optical axis crossing a surface of the pellicle at a predetermined angle for supplying a light beam onto said transparent pellicle along said first optical axis and a second illuminating device having a second optical axis crossing the surface of said pellicle at an angle different from said predetermined angle for supplying a light beam to said transparent pellicle along said second optical axis. The apparatus further includes a detector for comparing quantity of light of a light beam scattered by a foreign particle and directed to a predetermined direction from said first illuminating device with quantity of light of a light beam scattered by the foreign particle and directed to a predetermined direction from said second illuminating device and for determining a surface of the transparent pellicle on which said foreign particle exists.

Abstract: A protective device for photographic masks or reticles used in the photolithographic operation for fabricating semiconductor devices. The protective device includes a frame having a protective pellicle attached thereover and the frame includes temporary fastening means for detachably fastening the frame to a mask substrate. The temporary fastening is effected by using for example vacuum chucking, magnetic attractive force or spring force. The frame may be formed with vent holes each having a filter so that the internal pressure of the space enclosed by the pellicle and the frame on the mask is made equal to the outside air pressure.

Abstract: A conveyor arm apparatus unloads one by one a plurality of wafers which are stored in a holding chamber such that a surface of one wafer faces a back surface of another wafer at a predetermined distance. Two beams parallel to a semiconductor wafer mounting surface of a conveyor arm are projected into the holding chamber and the two beams passing through a gap between adjacent wafers are detected. Thus, the relative position of the conveyor arm and the wafers in the holding chamber can be confirmed.

Abstract: A system for placing thereron an object to be inspected, scanning the surface of the object to be inspected by a light spot and inspecting a foreign substance on the basis of light information produced by the foreign substance on the surface of the object to be inspected includes light information producing means including a member for producing light information substantially similar to the light information produced by the foreign substance, and means for disposing the member on a surface substantially identical to the surface of the object to be inspected placed on the system.

Abstract: Automatic photomask or reticle washing and cleaning system comprises a foreign particle inspecting unit for inspecting whether or not foreign particles are attached to the surfaces of substrates; a washing and cleaning unit for washing and cleaning the surfaces of substrates with a cleaning liquid, thereby removing foreign particles and transfer means for withdrawing a substrate from a case, transferring the withdrawn substrate to the washing and cleaning unit, thereafter transferring the washed and cleaned substrate to the foreign particle inspecting unit and finally inserting the inspected substrate into the case again.

Abstract: A projection exposure apparatus used to project a minute pattern formed on a photomask or reticle onto a semiconductive wafer has a stabilized image-forming performance. The apparatus comprises a projection lens system including a plurality number of lens elements spaced apart from each other, means for supplying a gas flow to at least one of spaces through which the gas passes, means for isolating the space(s) supplied with gas from atmosphere and means for changing the refractive index of the isolated space(s).

Abstract: A projection optical apparatus used for projecting a pattern in the photolithographic operation for semiconductor device fabrication and a photographic mask used with the apparatus. In the projection optical apparatus, the reflected light from the pattern of a mask is utilized in place of the transmitted light through the pattern of the mask for the purpose of projecting the pattern. For this purpose, the projection optical apparatus includes illuminating optical means for projecting an illuminating light to the pattern of the mask and light guide means for directing the illuminating light reflected by the pattern of the mask to a projection optical system. A mask adapted for use with the apparatus contains a pattern composed of two opaque areas which are different in reflectance from each other.

Abstract: An inspecting apparatus for precisely detecting foreign substances or scars present on a translucent planar article such as a photomask at a high speed with a laser beam entering from face of the article, comprises first photoelectric means for receiving the scattered light generated in a space on a face of the photomask, second photoelectric means for receiving the scattered light generated in a space on the other face of the photomask, comparator means for comparing the photoelectrically converted signals from the first and second photoelectric means to identify one of predetermined plural magnitude relationships to which the magnitudes of the signals belong, and inspecting means for generating, in response to the detection output signal of the comparator means, a detection signal allowing to identify the approximate difference in the shape of the foreign substance, for example either a tall foreign substance or a short one.

Abstract: An apparatus for detecting foreign matter present on a planar substrate comprises apparatus for scanning the surface of the substrate with an oblique incident light beam, apparatus for photo-electrically detecting the scattered light generator in the trajectory of the light beam scanning on the substrate, and apparatus for eliminating stray light unnecessary for the foreign matter detection.

Abstract: An apparatus for detecting the presence of a foreign substance adhering to a planar substrate comprises irradiating means capable of emitting a light beam incident on one surface of the substrate obliquely relative to the surface, means for displacing the irradiating means and the substrate relative to each other so that the position of incidence of the light beam onto the substrate is scanned on said one surface, metering means capable of receiving a plurality of irregular reflected light beams of the light beam which have been irregularly reflected on said surface toward different directions and producing a plurality of electrical outputs corresponding to the intensity of light of the plurality of irregular reflected light beams, and means for deciding the presence of the foreign substance on the basis of the plurality of electrical outputs.