Abstract: A method for manufacturing a cleaning device of the image forming apparatus, the method includes: applying a liquid material to an area outside of an edge located at an end portion of a toner accommodating portion in the longitudinal direction of a toner removing member, wherein the liquid material is applied so as to seal the toner accommodating portion.

Abstract: A method for manufacturing a cleaning device of the image forming apparatus, the method includes: applying a liquid material to an area outer than an edge located at an end portion of a toner accommodating portion in the longitudinal direction of a toner removing member, wherein the liquid material is applied so as to satisfy one of the predetermined conditions.

Abstract: A moving mechanism includes a first structural member having a first guide surface, a moving member being movable along the first guide surface, a second structural member having a second guide surface, and an actuator having a movable element provided on the moving member and a stator which is movable along the second guide surface. The first structural member is supported by the second structural member at three positions.

Abstract: A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.

Abstract: Disclosed is a moving mechanism which includes a first structural member having a first guide surface, a moving member being movable along the first guide surface, a second structural member having a second guide surface, and an actuator having a movable element provided on the moving member and a stator being movable along the second guide surface, wherein the first and second structural members are isolated from each other with respect to vibration, such that displacement of the stator due to a reaction force as the moving member is driven does not have an influence to the moving member guide surface.

Abstract: A moving mechanism includes a first structural member having a first guide surface, a moving member being movable along the first guide surface, a second structural member having a second guide surface, and an actuator having a movable element provided on the moving member and a stator which is movable along the second guide surface. The first structural member is supported by the second structural member at three positions.

Abstract: A stage apparatus has a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted. A fixing member fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.

Abstract: A stage apparatus comprising includes a stage that is movable in a direction, a multiphase actuator for generating a driving force when the stage is accelerated and decelerated in the direction, and a single-phase actuator for generating a driving force in the direction when the stage moves at a constant speed.

Abstract: A stage apparatus includes a stage movable along at least one axis, a laser head for generating a laser beam, an optical unit which is mounted on the stage and splits the laser beam into reference and measurement beams, a mirror which is arranged outside the stage and reflects the measurement beam, and a detector which is arranged outside the stage and detects an interference beam of the reference and measurement beams.

Abstract: A scan type exposure for transferring a pattern onto a substrate by scan exposure. The apparatus includes a stage for moving the substrate in a Y direction corresponding to a scan direction, and in an X direction intersecting the scan direction, an alignment scope for performing measurement for alignment of the substrate, at a position spaced, in the Y direction, from a position where the exposure of the substrate is to be carried out, an X measuring device for performing yaw measurement of said stage by use of an X reflection surface provided on said stage along the Y direction, a Y measuring device for performing yaw measurement of the stage by use of a Y reflection surface provided on the stage along the X direction, and a controller being operable to select yaw measurement information of the X measuring device for an alignment operation including the alignment measurement using the alignment scope, and being operable to select yaw measurement information of the Y measuring device for the scan exposure.

Abstract: To accurately measure the position and posture of a stage apparatus used in an exposure apparatus or the like, the Z position and displacement of a top stage (27) are measured using as a reference a lens barrel support (35) independently of the top stage in terms of vibrations by an interferometer system which includes a projection optical system (34) for projecting a pattern formed on a master onto a substrate, stages (27, 31, 40) capable of moving with respect to the projection optical system (34) while holding the substrate or master, and a lens barrel support (35) that supports the projection optical system (34), and which uses a Z measuring mirror (30) that is arranged on a Y stage (31) and has a reflecting surface almost parallel to the XY plane, and a Z interferometer (25) arranged on the Y stage (31).

Abstract: A stage apparatus is a stage apparatus having a substrate holding unit which chucks and holds a substrate, and includes a flat surface having a recess where the substrate holding unit is to be mounted, and a fixing member which fixes a projection support provided to the substrate holding unit onto the flat surface. The substrate holding unit is supported by the fixing member while a distal end of the projection support is in contact with the recess of the flat surface and the remaining portion of the substrate holding unit is not in contact with the flat surface.

Abstract: A moving mechanism includes a reference structure having a guide surface, a movable portion being movable along the guide surface, and an actuator having movable elements, provided at opposite end portions of the stage, and at least two stators. The stators are separated from each other and each is movable in two-dimensional directions by a reaction force produced as the movable portion is driven.

Abstract: A scan type exposure apparatus in which a pattern formed on an original is transferred a substrate while relatively moving the original and the substrate relative to a projection optical system, wherein a stage is servo controlled on the basis of measurement of X and Y coordinates (x,y) and yawing component &thgr;, and wherein yawing measuring systems provided in relation to X and Y directions are selectively used in accordance with the state of operation of the apparatus so that the yawing component measurement direction is laid on preferable one of the X and Y directions.

Abstract: In order to increase the imaging performance and overlay accuracy of a scanning exposure apparatus, two stages, a main stage and a substage that move in a certain direction, are provided. These stages are driven by a multiphase linear motor serving as an electromagnetic actuator, in which a plurality of moving parts that are independently movable in that direction are provided corresponding to one stator. Hard mounted parts are connected to the main stage through the substage.

Abstract: Disclosed is a moving mechanism which includes a first structural member having a first guide surface, a moving member being movable along the first guide surface, a second structural member having a second guide surface, and an actuator having a movable element provided on the moving member and a stator being movable along the second guide surface, wherein the first and second structural members are isolated from each other with respect to vibration, such that displacement of the stator due to a reaction force as the moving member is driven does not have an influence to the moving member guide surface.

Abstract: A stage apparatus includes a stage moving in a prescribed direction while holding a substrate and a mechanism for generating a force that changes in accordance with an acceleration when the stage moves, and for applying the force to the substrate from the direction of the acceleration so that a force applied between the stage and the substrate by the acceleration is canceled.

Abstract: To accurately measure the position and posture of a stage apparatus used in an exposure apparatus or the like, the Z position and displacement of a top stage (27) are measured using as a reference a lens barrel support (35) independently of the top stage in terms of vibrations by an interferometer system which includes a projection optical system (34) for projecting a pattern formed on a master onto a substrate, stages (27, 31, 40) capable of moving with respect to the projection optical system (34) while holding the substrate or master, and a lens barrel support (35) that supports the projection optical system (34), and which uses a Z measuring mirror (30) that is arranged on a Y stage (31) and has a reflecting surface almost parallel to the XY plane, and a Z interferometer (25) arranged on the Y stage (31).

Abstract: Disclosed is a moving mechanism which includes a reference structure having a guide surface, a movable portion being movable along the guide surface, and an actuator having a movable element disposed at the movable portion side and at least two stators, the stators being separated from each other and being moved by a reaction force produced as the movable portion is driven.

Abstract: A stage apparatus on which a laser interferometer is mounted includes a reticle stage (1) movable in three, X-, Y-, and &thgr;-axes, laser heads (8a-8d) each for generating a laser beam, interferometers (9a-9d) each of which is mounted on the stage (1) and splits the laser beam into reference and measurement beams, bar mirrors (11a-11c) each of which is arranged outside the stage (1) and reflects the measurement beam, and detectors (10a-10c) each for detecting the interference beam of the reference and measurement beams.