Abstract: A production method of a mold includes: preparing a plate precursor having a protruding pattern formed of protrusions in a pattern presence region on a base, and a thermoplastic resin sheet; determining a position at which the plate precursor is to be pressed against the thermoplastic resin sheet by moving the plate precursor and the thermoplastic resin sheet relative to each other; and forming a recessed pattern on the thermoplastic resin sheet by pressing the protrusions of the plate precursor which is heated against the thermoplastic resin sheet at a position where a part of the pattern presence region of the plate precursor excluding the protrusions is separated from a surface of the thermoplastic resin sheet, cooling the plate precursor in a state in where the pressed protrusions and the thermoplastic resin sheet are in contact with each other, and separating the plate precursor from the thermoplastic resin sheet.

Abstract: A production method of a mold includes: preparing a plate precursor having a protruding pattern formed of protrusions in a pattern presence region on a base, and a thermoplastic resin sheet; determining a position at which the plate precursor is to be pressed against the thermoplastic resin sheet by moving the plate precursor and the thermoplastic resin sheet relative to each other; and forming a recessed pattern on the thermoplastic resin sheet by pressing the protrusions of the plate precursor which is heated against the thermoplastic resin sheet at a position where a part of the pattern presence region of the plate precursor excluding the protrusions is separated from a surface of the thermoplastic resin sheet, cooling the plate precursor in a state in where the pressed protrusions and the thermoplastic resin sheet are in contact with each other, and separating the plate precursor from the thermoplastic resin sheet.

Abstract: A tilt-up mechanism for tilting up an upper column of a steering column from a drive position to a tilt-up position is configured independently from a tilt angle adjusting mechanism and a column length adjusting mechanism. When an operator who is to get on/off an operator's seat steps on and operates a pedal of the tilt-up mechanism, an engaged state of a lock pin with respect to a tilt-up member is disengaged. The tilt-up member is rotated around a support shaft, by a spring force of a tilt-up spring, whereby the upper column is tilted up together with a steering wheel in a direction (A) away from the operator's seat. At this time, the tilt angle and the column length can be held at positions adjusted in advance.

Abstract: A tilt-up mechanism for tilting up an upper column of a steering column from a drive position to a tilt-up position is configured independently from a tilt angle adjusting mechanism and a column length adjusting mechanism. When an operator who is to get on/off an operator's seat steps on and operates a pedal of the tilt-up mechanism, an engaged state of a lock pin with respect to a tilt-up member is disengaged. The tilt-up member is rotated around a support shaft, by a spring force of a tilt-up spring, whereby the upper column is tilted up together with a steering wheel in a direction (A) away from the operator's seat. At this time, the tilt angle and the column length can be held at positions adjusted in advance.

Abstract: When writing the shapes of elements of a fine pattern on a substrate by microscopically vibrating the electron beam back and forth in a radial direction of the substrate or in a direction orthogonal to the radial direction and deflecting the electron beam in a direction orthogonal to the vibration direction to scan the electron beam so as to completely fill the shapes of the elements, a proximity-effect correction is performed according to the arrangement density of the elements in which the amount of dose is adjusted by setting the deflection speed faster for the writing of an element in a densely arranged region than for the writing of an identical element in a sparsely arranged region.

Abstract: When writing element shapes of a fine pattern on a substrate applied with a resist by scanning an electron beam thereon, ON/OFF control is performed for emitting the electron beam at a predetermined rotational position of the substrate by a blanking-OFF signal, performing writing in a rotational direction of the substrate along with the rotation of the substrate, and terminating the writing by a blanking-ON signal based on write data to perform writing for one round, and repeating the writing based on the ON/OFF control by moving the electron beam or substrate in a radial direction of the substrate and rotation control is performed for controlling the rotation speed of the rotation stage so as to be increased for inner track writing and decreased for outer track writing inversely proportional to the radius of the writing position.

Abstract: When performing writing on a substrate applied with a resist by rapidly vibrating electron beam in a direction orthogonal to a radial direction of the substrate and X-Y deflecting the electron beam while rotating the substrate in one direction, a long element is written by scanning the electron beam with the middle position of a 2-bit signal length as the center position of the electron beam so as to completely fill the area of the writing length reduced by a predetermined ratio and an unwritten portion of predetermined width remaining on each side of the long element with respect to a final 2-bit signal length on a magnetic disk medium.

Abstract: When writing elements of a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate, the electron beam is scan controlled so as to completely fill the shape of each of the elements by vibrating the electron beam rapidly in a radius direction of the rotation stage and at the same time deflecting in a direction orthogonal to the radius direction of the rotation stage faster than a rotational speed thereof, thereby sequentially writing the elements.

Abstract: When writing a hard disk pattern on a substrate applied with a resist by scanning an electron beam on the substrate while rotating a rotation stage, writing is started with respect to each radial direction position of each area based on a predetermined encoder pulse for each radial direction position among those generated according to the rotational angle of the rotation stage that occurs after a predefined encoder pulse that occurs ahead in a rotational direction of a radial direction position whose write start position in a circumferential direction in each area arrives first at the writing position as the rotation stage rotates and ahead of the write start position in the circumferential direction with respect to each radial direction position, and after a predetermined time from the predetermined encoder pulse.

Abstract: A fine pattern which includes servo patterns, each constituted by servo elements, and groove patterns, each for separating adjacent data tracks, is formed on a substrate applied with a resist and placed on a rotation stage by scanning an electron beam on the substrate. While rotating the substrate in one direction, the electron beam is scanned so as to completely fill servo elements corresponding to a plurality of tracks one by one during one rotation of the substrate by X-Y deflecting the electron beam and vibrating back and forth in the radius direction. Each groove pattern is set as a line-up of a plurality of groove elements divided at a predetermined angle, and groove elements corresponding to the plurality of tracks following the writing of the servo elements are sequentially written by deflection scanning the electron beam largely in a circumferential direction during the same rotation.

Abstract: There is provided a mold structure containing a substrate, and a plurality of convex portions formed in the shape of concentric circles at predetermined intervals on one surface of the substrate, wherein a cross-sectional shape of the convex portions with respect to a radial direction of the concentric circles is such that a middle width M of each of the convex portions with respect to a heightwise direction is greater than a width T of a top portion of each of the convex portions with respect to the radial direction of the concentric circles.

Abstract: Linear movement direction of the stage and the actual deflection direction of the electron beam deflected by the first command signal for deflecting the electron beam in the linear movement direction of the stage do not necessarily align with each other for reasons such as the disposition precision of the stage driving device, a lens system, and the deflecting device. Therefore, the first command signal output from the first command device is processed based on the angle between the linear movement direction of the stage driven by the stage driving device and the deflection direction of the electron beam deflected by the first command signal so that the deflection direction of the electron beam aligns with the linear movement direction of the stage. With this processed first command signal, the deflection direction of the electron beam can be changed (rotated) to align with the linear movement direction of the stage.

Abstract: A method of producing a master information carrier by scanning a track a number of times. The method produces a master information carrier has a pattern of a magnetic layer representing information to be transferred to a high-density recording slave medium where the track width is not larger than 0.3 ?m. The pattern is drawn by scanning a given track a plurality of times with an electron beam whose drawing diameter is smaller than the track width.

Abstract: When writing the shapes of elements of a fine pattern on a substrate by microscopically vibrating the electron beam back and forth in a radial direction of the substrate or in a direction orthogonal to the radial direction and deflecting the electron beam in a direction orthogonal to the vibration direction to scan the electron beam so as to completely fill the shapes of the elements, a proximity-effect correction is performed according to the arrangement density of the elements in which the amount of dose is adjusted by setting the deflection speed faster for the writing of an element in a densely arranged region than for the writing of an identical element in a sparsely arranged region.