Patents by Inventor Kazunori KUSABIRAKI
Kazunori KUSABIRAKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9926462Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).Type: GrantFiled: November 22, 2016Date of Patent: March 27, 2018Assignee: JSR CORPORATIONInventors: Kiyoshi Tanaka, Kazunori Kusabiraki, Takahiro Hayama, Motoyuki Shima
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Publication number: 20170160637Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.Type: ApplicationFiled: December 22, 2015Publication date: June 8, 2017Applicant: JSR CorporationInventors: Takahiro Hayama, Kazunori Kusabiraki, Yukio Nishimura, Ken Maruyama, Kiyoshi Tanaka
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Publication number: 20170073541Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).Type: ApplicationFiled: November 22, 2016Publication date: March 16, 2017Applicant: JSR CORPORATIONInventors: Kiyoshi TANAKA, Kazunori Kusabiraki, Takahiro Hayama, Motoyuki Shima
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Patent number: 9540535Abstract: An immersion upper layer film-forming composition includes [A] a polymer component that includes a polymer (A1), and [B] a solvent, the polymer (A1) including a structural unit (I) that includes a group represented by the following formula (i). The structural unit (I) is preferably a structural unit (I-1) represented by the following formula (1). The polymer component [A] preferably further includes a structural unit (II-1) represented by the following formula (2), the structural unit (II-1) being included in the polymer (A1) or a polymer other than the polymer (A1). The polymer component [A] preferably further includes a structural unit (III) that includes a carboxyl group, the structural unit (III) being included in the polymer (A1) or a polymer other than the polymer (A1).Type: GrantFiled: March 28, 2013Date of Patent: January 10, 2017Assignee: JSR CORPORATIONInventors: Kiyoshi Tanaka, Kazunori Kusabiraki, Takahiro Hayama, Motoyuki Shima
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Publication number: 20160109801Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.Type: ApplicationFiled: December 22, 2015Publication date: April 21, 2016Applicant: JSR CorporationInventors: Takahiro Hayama, Kazunori Kusabiraki, Yukio Nishimura, Ken Maruyama, Kiyoshi Tanaka
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Composition, resist pattern-forming method, compound, method for production of compound, and polymer
Patent number: 9268225Abstract: A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R2 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. RQ represents a perfluoroalkyl group having 1 to 5 carbon atoms. RX represents a hydrogen atom or a monovalent base-labile group.Type: GrantFiled: May 9, 2014Date of Patent: February 23, 2016Assignee: JSR CORPORATIONInventors: Kiyoshi Tanaka, Shinya Minegishi, Kazunori Kusabiraki, Takahiro Hayama -
Patent number: 9261789Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.Type: GrantFiled: May 18, 2011Date of Patent: February 16, 2016Assignee: JSR CORPORATIONInventors: Takahiro Hayama, Kazunori Kusabiraki, Yukio Nishimura, Ken Maruyama, Kiyoshi Tanaka
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Patent number: 9046775Abstract: A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR?—, —CS—, —S—, —SO—, —SO2— or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.Type: GrantFiled: September 20, 2013Date of Patent: June 2, 2015Assignee: JSR CORPORATIONInventors: Shinya Minegishi, Kiyoshi Tanaka, Kazunori Kusabiraki
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Publication number: 20140377707Abstract: A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR?—, —CS—, —S—, —SO—, —SO2— or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.Type: ApplicationFiled: September 20, 2013Publication date: December 25, 2014Applicant: JSR CORPORATIONInventors: Shinya MINEGISHI, Kiyoshi TANAKA, Kazunori KUSABIRAKI
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COMPOSITION, RESIST PATTERN-FORMING METHOD, COMPOUND, METHOD FOR PRODUCTION OF COMPOUND, AND POLYMER
Publication number: 20140248563Abstract: A composition includes a polymer component including a first polymer having a first structural unit represented by a following formula (1), and a solvent. In the formula (1), R1 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R2 represents a single bond or a divalent organic group having 1 to 20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. RQ represents a perfluoroalkyl group having 1 to 5 carbon atoms. RX represents a hydrogen atom or a monovalent base-labile group.Type: ApplicationFiled: May 9, 2014Publication date: September 4, 2014Applicant: JSR CORPORATIONInventors: Kiyoshi TANAKA, Shinya MINEGISHI, Kazunori KUSABIRAKI, Takahiro HAYAMA -
Publication number: 20140147794Abstract: A method of forming a photoresist pattern includes providing a photoresist film on a substrate. An upper layer film is provided on the photoresist film using an upper layer film-forming composition. Radiation is applied to the upper layer film and the photoresist film through a mask having a given pattern via an immersion medium. The upper layer film and the photoresist film are developed using a developer to form a photoresist pattern. The upper layer film-forming composition includes a resin soluble in the developer and a solvent component. The solvent component includes a first solvent, a second solvent shown by a general formula (2), and a third solvent shown by a general formula (3). The first solvent is diethylene glycol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, diethylene glycol diethyl ether, ?-butyrolactone, methyl propylene diglycol, methyl propylene triglycol or a mixture thereof.Type: ApplicationFiled: February 3, 2014Publication date: May 29, 2014Applicant: JSR CORPORATIONInventors: Norihiko SUGIE, Kazunori KUSABIRAKI, Kiyoshi TANAKA, Motoyuki SHIMA, Yoshikazu YAMAGUCHI
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Publication number: 20140093826Abstract: A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR?—, —CS—, —S—, —SO—, —SO2— or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.Type: ApplicationFiled: September 20, 2013Publication date: April 3, 2014Applicant: JSR CORPORATIONInventors: Shinya MINEGISHI, Kiyoshi TANAKA, Kazunori KUSABIRAKI
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Patent number: 8501389Abstract: An upper-layer film-forming composition includes (A) a resin that is soluble in an alkaline aqueous solution, and includes a fluorine atom, and (B) a solvent component that includes (B1) a solvent having a boiling point at 101.3 kPa of 150° C. or more and a static surface tension of 23.0 mN/m or less, the upper-layer film-forming composition being used to form an upper-layer film on a photoresist film.Type: GrantFiled: March 23, 2011Date of Patent: August 6, 2013Assignee: JSR CorporationInventors: Kazunori Kusabiraki, Takahiro Hayama, Norihiko Sugie, Motoyuki Shima, Kiyoshi Tanaka
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Publication number: 20120171613Abstract: An upper layer film-forming composition includes a resin and a solvent component. The resin is soluble in a developer. The solvent component includes first solvent which has a boiling point of 180 to 280° C. at 101.3 kPa and a vapor pressure of 0.001 to 0.1 kPa at 20° C. The upper layer film-forming composition is used to form an upper layer film on a photoresist film.Type: ApplicationFiled: March 14, 2012Publication date: July 5, 2012Applicant: JSR CorporationInventors: Norihiko SUGIE, Kazunori KUSABIRAKI, Kiyoshi TANAKA, Motoyuki SHIMA, Yoshikazu YAMAGUCHI
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Publication number: 20120021359Abstract: A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R1 in the formula (1) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. The polymer (A) preferably further includes a structural unit (II) that includes a sulfo group. The polymer (A) preferably further includes a structural unit (III) shown by the following formula (3). R2 in the formula (3) represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R3 represents a linear or branched monovalent hydrocarbon group having 1 to 12 carbon atoms or a monovalent alicyclic group having 3 to 20 carbon atoms, provided that at least one hydrogen atom of the hydrocarbon group or the alicyclic group is substituted with a fluorine atom.Type: ApplicationFiled: May 18, 2011Publication date: January 26, 2012Applicant: JSR CorporationInventors: Takahiro HAYAMA, Kazunori Kusabiraki, Yukio Nishimura, Ken Maruyama, Kiyoshi Tanaka
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Publication number: 20110262859Abstract: An upper-layer film-forming composition includes (A) a resin that is soluble in an alkaline aqueous solution, and includes a fluorine atom, and (B) a solvent component that includes (B1) a solvent having a boiling point at 101.3 kPa of 150° C. or more and a static surface tension of 23.0 mN/m or less, the upper-layer film-forming composition being used to form an upper-layer film on a photoresist film.Type: ApplicationFiled: March 23, 2011Publication date: October 27, 2011Applicant: JSR CorporationInventors: Kazunori KUSABIRAKI, Takahiro Hayama, Norihiko Sugie, Motoyuki Shima, Kiyoshi Tanaka