Abstract: A wide angle lens consists essentially of a front group and a rear group in this order from an object side. The front group consists essentially of two negative lenses and a positive lens in this order from the object side, and all of the three lenses are made of an identical material. The rear group includes at least one positive lens and at least one negative lens, and a lens closest to an image side in the rear group is a negative lens. When a refractive index for d-line of the material of the lenses in the front group is NF, conditional expression (1): 1.48<NF<1.6 is satisfied.

Abstract: A position of a target ship alongside is displayed in animation on a display unit 17 by the computer 11 based on any one of the positional information on the target ship alongside, which is transmitted from an automatic identification system (AIS) of a target ship alongside and is obtained by an AIS communication unit 13, positional information on the target ship alongside, which is obtained by the GNSS communication unit 14 from a global navigation satellite system, and positional information on the target ship alongside, which is manually inputted via an operation unit 18. Therefore, the latest position of the target ship alongside can be always displayed in animation.

Abstract: A computer 11 of a ship monitoring device 1 arranges one kind of transmission data between, two consecutive start control codes and two consecutive termination control codes. The computer 11 also arranges information indicating a type of the transmission data between the transmission data and the start control codes and between the termination control codes and the transmission data. In this way, the transmission data is transmitted in form of packet data. Therefore, transmission data in information communication between ships and sensed information in information, communication of fenders can be easily distinguished from each other. In addition, a type of information transmitted as the transmission data can be easily identified.

Abstract: In a variable magnification optical system, including a first lens group having a positive refractive power, a second lens group having a negative refractive power, a third lens group having a positive refractive power, and a fourth lens group having a positive refractive power, arranged in order from the object side, in which magnification is changed by moving the second lens group and focusing is performed by moving the fourth lens group, the first lens group includes a positive lens and a positive cemented lens, arranged in order from the object side, the third lens group includes an aperture stop on the most object side, the fourth lens group includes a positive lens, a negative lens, and a positive lens, arranged in order from the object side, with at least one surface being an aspherical surface, and the system satisfies given conditional expressions.

Abstract: The imaging lens substantially consists of a front group having positive refractive power, an aperture stop, a rear group having positive refractive power in this order from the object side. The front group substantially consists of a lens having a negative meniscus shape with a convex surface toward the object side, a negative lens, and a positive lens in this order from the object side. The rear group substantially consists of a positive lens, a negative lens, a positive lens, and a positive lens in this order from the object side. In the case that the Abbe numbers with respect to the d-line of the first lens and the second lens from the object side in the front group are respectively ?1 and ?2, conditional expressions (1) and (2) below are satisfied: 10.0<?2??1??(1) 40<?2??(2).

Abstract: The imaging lens substantially consists of a first lens group, an aperture stop, a positive second lens group which is a focusing group, and a third lens group in this order from the object side. The first lens group substantially consists of a positive first sub lens group composed of a negative meniscus lens, a positive meniscus lens, and a positive lens; and a second sub lens group including a negative lens and a cemented lens, in this order from the object side. The second lens group substantially consists of a positive single lens or a cemented lens. The third lens group substantially consists of a cemented lens, a positive lens, and a negative lens in this order from the object side.

Abstract: This super-wide lens substantially consists of a positive first lens group, a positive second lens group, and a negative third lens group, in this order from the object side. The first lens group and the third lens group are fixed and the second lens group moves toward the object side while focusing from an object at infinity to an object at the closest distance. The first lens group substantially consists of a negative first sub lens group, a positive second sub lens group, an aperture stop, and a positive third sub lens group in this order from the object side. Conditional expressions (1) and (2) are satisfied: 0.15<f1/f2<0.60??(1) 2.5<f2/f<7.0??(2), where f1: the focal length of the first lens group, f2: the focal length of the second lens group, and f: the focal length of the entire system when focusing on an object at infinity.

Abstract: To solve a problem of reduction in accumulated energy due to backward scattering, leading to degradation in CD linearity, which is caused when a generally used high-contrast resist is used in the manufacture of a reflective mask. A reflective mask blank for manufacturing a reflective mask includes a substrate, a multilayer reflective film which is formed on the substrate and adapted to reflect exposure light, and an absorber film which is formed on the multilayer reflective film and adapted to absorb the exposure light. A resist film for electron beam writing is formed on the absorber film and the contrast value ? of the resist film for electron beam writing is 30 or less.

Abstract: A variable magnification optical system includes a positive first lens group, a negative second lens group, a stop, a positive third lens group and a positive fourth lens group, which are in this order from an object side. The first lens group, the stop and the third lens group are fixed, but the second lens group and the fourth lens group move in an optical axis direction during magnification change. The fourth lens group has a focusing function. The third lens group includes at least an aspherical surface, and consists of, in the following order from the object side, a positive lens and a cemented lens of a positive lens and a double-concave lens cemented together. The variable magnification optical system satisfies a predetermined formula.

Abstract: Provided is a transfer mask which has a transfer pattern formed in a pattern-forming thin film provided on a transparent substrate and is adapted to be applied with exposure light having a wavelength of 200 nm or less. The pattern-forming thin film is made of a material containing silicon an a transition metal other than chromium and the chromium content in the film is less than 1.0×1018 atoms/cm3.

Abstract: A variable magnification optical system includes a positive first lens group, a negative second lens group, a stop, a positive third lens group and a positive fourth lens group, which are in this order from an object side. The first lens group, the stop and the third lens group are fixed, but the second lens group and the fourth lens group move in an optical axis direction during magnification change. The fourth lens group has a focusing function. The third lens group includes at least an aspherical surface, and consists of, in the following order from the object side, a positive lens and a cemented lens of a positive lens and a double-concave lens cemented together. The variable magnification optical system satisfies a predetermined formula.

Abstract: A variable magnification optical system consists of a negative first lens group, a stop that is fixed relative to an image plane during magnification change, and a positive second lens group, which are in this order from an object side. A distance between the first lens group and the second lens group in an optical axis direction becomes shorter when magnification is changed from a wide-angle end to a telephoto end. The first lens group consists of a positive lens having a convex object-side surface and two negative lenses, in this order from the object side. The variable magnification optical system satisfies the following formula (1) about Abbe number ?d1 of the positive lens in the first lens group for d-line: 25.5<?d1<50??(1).

Abstract: To solve a problem of reduction in accumulated energy due to backward scattering, leading to degradation in CD linearity, which is caused when a generally used high-contrast resist is used in the manufacture of a reflective mask. A reflective mask blank for manufacturing a reflective mask includes a substrate, a multilayer reflective film which is formed on the substrate and adapted to reflect exposure light, and an absorber film which is formed on the multilayer reflective film and adapted to absorb the exposure light. A resist film for electron beam writing is formed on the absorber film and the contrast value ? of the resist film for electron beam writing is 30 or less.

Abstract: Provided is a transfer mask which has a transfer pattern formed in a pattern-forming thin film provided on a transparent substrate and is adapted to be applied with exposure light having a wavelength of 200 nm or less. The pattern-forming thin film is made of a material containing silicon an a transition metal other than chromium and the chromium content in the film is less than 1.0×1018 atoms/cm3.

Abstract: A thin film made of a material containing a metal and silicon is formed on a light-transmissive substrate. Then, a treatment is performed to modify a main surface of the thin film in advance so that when exposure light having a wavelength of 200 nm or less is accumulatively irradiated on a thin film pattern of a photomask to be produced by patterning the thin film, the transfer characteristic of the thin film pattern does not change more than a predetermined degree. This treatment is performed by carrying out, for example, a heat treatment in an atmosphere containing oxygen at 450° C. to 900° C.

Abstract: The present invention is a method of manufacturing a transfer mask with use of a mask blank in which a thin film for pattern formation and a chromium-based thin film made of a material containing chromium are stacked on a transparent substrate in this order. The thin film for pattern formation is made of material containing silicon and a transition metal other than chromium. The chromium-based thin film is made of a material containing chromium. Exposure light having a wavelength of 200 nm or less is applied to the transfer mask.

Abstract: A frequency shift keying digital signal receiving apparatus includes a detecting portion detecting a new signal on the basis of a signal, from which a correlated ambient noise is filtered out by an adaptive filter, a holding portion holding a first electric power for the signal received before a new signal is detected, a calculating portion calculating a second electric power for the signal received after the new signal is detected, a comparing portion comparing levels of the first and second electric powers, a selector selecting the signal, from which the correlated ambient noise is filtered out, when the first electric power is higher than the second electric power and selecting the signal bypassing the adaptive filter when the first electric power is lower than the second electric power, and a demodulating portion demodulating a desired signal on the basis of the signal selected by the selecting portion.

Abstract: A digital signal receiving apparatus includes: detection-judging portion judging a possible presence of a desired signal when a signal level of a smoothed signal is greater than a reference level; wherein said first smoothed signal and said second smoothed signal are compared in order to generate a detection signal representing a judgment of a possible presence of a desired signal, said second smoothed signal having a convergence speed slower than that of the first smoothing filter, a filter controlling portion switching an adaptive filter from an adaptive mode to a non-adaptive mode when the detection-judging portion judges the possible presence of the desired signal and switching from the non-adaptive mode to the adaptive mode when the detection-judging portion judges the absence of the desired signal; a limiting portion limiting a signal level of an auto-correlation signal to the signal level of the smoothed signal; and a demodulating portion demodulating the auto-correlation signal having the signal level

Abstract: A digital signal receiving apparatus includes a detection-judging portion having a first smoothing filter generating a first smoothed signal by smoothing an auto-correlation signal and judging a possible presence of a desired signal when a signal level of the first smoothed signal is greater than a reference level and an absence of the desired signal when being smaller than the reference level. The smoothing filter includes a limiting portion limiting a fluctuation width of the first smoothed signal; and an adjusting portion configured to adjust the fluctuation width of the first smoothed signal limited by the limiting portion to be reduced while an elapsing time after the detection-judging means judges the possible presence of the desired signal is increasing.

Abstract: The present invention is a method of manufacturing a transfer mask with use of a mask blank in which a thin film for pattern formation and a chromium-based thin film made of a material containing chromium are stacked on a transparent substrate in this order. The thin film for pattern formation is made of material containing silicon and a transition metal other than chromium. The chromium-based thin film is made of a material containing chromium. Exposure light having a wavelength of 200 nm or less is applied to the transfer mask.