Abstract: A plasma processing apparatus includes a stage disposed in a processing chamber for mounting a wafer, a plasma generation chamber disposed above the processing chamber for plasma generation using process gas, a plate member having multiple introduction holes, made of a dielectric material, disposed above the stage and between the processing chamber and the plasma generation chamber, and a lamp disposed around the plate member for heating the wafer. The plasma processing apparatus further includes an external IR light source, an emission fiber arranged in the stage, that outputs IR light from the external IR light source toward a wafer bottom, and a light collection fiber for collecting IR light from the wafer. Data obtained using only IR light from the lamp is subtracted from data obtained also using IR light from the external IR light source during heating of the wafer. Thus, a wafer temperature is determined.

Abstract: A ceramic capacitor which is low in ESL and suitable for being built into a substrate has a dimension in a length direction of a lowermost surface of a third external electrode which is in contact with a capacitor main body denoted by e1 and a dimension in the length direction of the uppermost surface of the third external electrode denoted by e2, and a relationship of e1<e2 is satisfied.

Abstract: In a planar view of a ceramic capacitor that has low ESL and is embeddable into a substrate, lengths of first and second external electrodes are L1, lengths from portions of the first and second external electrodes farthest from a capacitor main body to portions closer to the capacitor main body by about 40% of a thickness of the first or second external electrode in a laminating direction are L2, a ratio L2/L1 is about 80% or more and about 90% or less. In the planar view, a length of a third external electrode is L3, a length from a portion of the third external electrode farthest from the capacitor main body to a portion closer to the capacitor main body by about 40% of a thickness of the third external electrode in the laminating direction is L4, a ratio L4/L3 is about 80% or more.

Abstract: A ceramic capacitor which is low in ESL and suitable for being built into a substrate has a dimension in a length direction of a lowermost surface of a third external electrode which is in contact with a capacitor main body denoted by e1 and a dimension in the length direction of the uppermost surface of the third external electrode denoted by e2, and a relationship of e1<e2 is satisfied.

Abstract: In a planar view of a ceramic capacitor that has low ESL and is embeddable into a substrate, lengths of first and second external electrodes are L1, lengths from portions of the first and second external electrodes farthest from a capacitor main body to portions closer to the capacitor main body by about 40% of a thickness of the first or second external electrode in a laminating direction are L2, a ratio L2/L1 is about 80% or more and about 90% or less. In the planar view, a length of a third external electrode is L3, a length from a portion of the third external electrode farthest from the capacitor main body to a portion closer to the capacitor main body by about 40% of a thickness of the third external electrode in the laminating direction is L4, a ratio L4/L3 is about 80% or more.

Abstract: In a motor, a stationary portion includes a shaft portion and an upper thrust portion arranged to define a single continuous monolithic member together with the shaft portion, and arranged to extend radially outward from an upper portion of the shaft portion. The shaft portion includes a female screw portion recessed axially downward from an upper end thereof. An upper end of the single continuous monolithic member defined by the shaft portion and the upper thrust portion includes an upper end annular surface arranged to extend radially outward from the female screw portion perpendicularly or substantially perpendicularly to the central axis. An outside diameter of the upper end annular surface is greater than a diameter of an outer circumferential surface of the shaft portion.

Abstract: In a motor, a stationary portion includes a shaft portion and an upper thrust portion arranged to define a single continuous monolithic member together with the shaft portion, and arranged to extend radially outward from an upper portion of the shaft portion. The shaft portion includes a female screw portion recessed axially downward from an upper end thereof. An upper end of the single continuous monolithic member defined by the shaft portion and the upper thrust portion includes an upper end annular surface arranged to extend radially outward from the female screw portion perpendicularly or substantially perpendicularly to the central axis. An outside diameter of the upper end annular surface is greater than a diameter of an outer circumferential surface of the shaft portion.