Patents by Inventor Kazuo Nishihagi

Kazuo Nishihagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5568531
    Abstract: A surface defect evaluating apparatus comprises an X-ray generator having a non-winding type cathode, a first slit device for shaping the X-ray flux from the X-ray generator, a diffraction crystal for obliquely receiving a slit-form X-ray flux passing through the slit device and diffracting the X-ray flux on a specific crystal plane, a second slit device for shaping the X-ray flux from the diffraction crystal, a photographic plate for detecting the intensity distribution of the flux diffracted on the specific crystal plane of a sample such as a semiconductor wafer after a slit-form X-ray flux passing through the second slit device obliquely irradiates the sample, a slit device, and a scintillator, installed at the back side of the photographic plate for detecting the intensity of the X-ray flux.
    Type: Grant
    Filed: April 25, 1995
    Date of Patent: October 22, 1996
    Assignee: Technos Co., Ltd.
    Inventors: Kazuo Nishihagi, Atsushi Kawabata
  • Patent number: 5249216
    Abstract: A total reflection X-ray fluorescence apparatus comprises a base material having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector such as an SSD for detecting fluorescent X-rays emerging from a specimen located near the optically flat surface of the base material and a second detector such as a scintillation counter for detecting an intensity of an X-rays coming from the base material.
    Type: Grant
    Filed: October 15, 1990
    Date of Patent: September 28, 1993
    Assignees: Sumitomo Electric Industries, Ltd., Technos Co., Ltd.
    Inventors: Tetsuya Ohsugi, Michihisa Kyoto, Kazuo Nishihagi
  • Patent number: 5220591
    Abstract: A total reflection X-ray fluorescence apparatus comprises a base material having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector such as an SSD for detecting fluorescent X-rays emerging from a specimen located near the optically flat surface of the base material and a second detector such as a scintillation counter for detecting intensity of X-rays coming from the base material.
    Type: Grant
    Filed: December 27, 1991
    Date of Patent: June 15, 1993
    Assignees: Sumitomo Electric Industries, Ltd., Technos Co. Ltd.
    Inventors: Tetsuya Ohsugi, Michihisa Kyoto, Kazuo Nishihagi
  • Patent number: 5109396
    Abstract: A total reflection X-ray fluorescence apparatus comprises a base material having an optically flat surface for totally reflecting X-rays radiated at a small glancing angle, a first detector such as an SSD for detecting fluorescent X-rays emerging from a specimen located near the optically flat surface of the base material and a second detector such as a scintillation counter for detecting an intensity of an X-rays coming from the base material.
    Type: Grant
    Filed: October 15, 1990
    Date of Patent: April 28, 1992
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Tetsuya Ohsugi, Michihisa Kyoto, Kazuo Nishihagi