Patents by Inventor Kazuo Shii

Kazuo Shii has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5081354
    Abstract: A method of positioning electron-beam irradiation and a device used in such method comprising the steps of irradiating a desired portion of a specimen with an electron beam, forming an image of the electron beam which penetrates the specimen on a fluorescent screen, and positioning the electron beam irradiation to the above-mentioned specimen on the basis of the image of the specimen on the fluorescent screen obtained by scanning an electron beam over a range wider than the spot size of the electron beam on the surface of the specimen.
    Type: Grant
    Filed: December 12, 1989
    Date of Patent: January 14, 1992
    Assignee: Hitachi, Ltd.
    Inventors: Toshiyuki Ohhashi, Kazuo Shii, Hiroyuki Kobayashi
  • Patent number: 4945237
    Abstract: Provided is an electron microscope having an electron gun emitting an electron beam onto a specimen to be observed, so as to produce transmitted main electron rays, inelastic scattering electron rays and diffractive scattering rays, an objective lens converging the electron rays so as to form an image, an objective aperture for normally cutting off the diffractive scattering electron rays while allowing the transmitted main electron rays and the inelastic scattering electron rays to pass therethrough, a magnifying means for magnifying the image, an observing screen from which the magnified image is visible, a mechanism for deflecting the electron beam emitted from the electron gun before the specimen, and a means for controlling the mechanism to deflect the electron beam to a large deflecting angle so as to cut off the main transmitted electron rays and the inelastic scattering electron rays at the objective aperture while allowing the diffractive scattering electron rays to enter into the magnifying lens thr
    Type: Grant
    Filed: April 27, 1989
    Date of Patent: July 31, 1990
    Assignee: Hitachi, Ltd.
    Inventors: Kazuo Shii, Toshiyuki Ohashi, Hiroyuki Kobayashi
  • Patent number: 4494000
    Abstract: A transmission electron microscope comprises an imaging electron lens system constituted in at least five stages by an objective lens, a group of intermediate lenses and a group of projector lenses to which excitation currents are applied with alternately different polarities. Lens current control means is provided for controlling the excitation currents in such a manner that the lenses belonging to the intermediate lens group and the projector lens group, respectively, serve as reduction lens when the microscope is operated in a predetermined range of low magnifications, while all the electron lenses serve as magnifying lenses in a predetermined range of high magnitudes. When the magnification is changed over, the lens current control means regulates the excitation currents in such a manner that the difference between the excitation currents supplied to the intermediate lens group and the projector lens group, respectively, is maintained substantially constant.
    Type: Grant
    Filed: June 29, 1982
    Date of Patent: January 15, 1985
    Assignee: Hitachi, Ltd.
    Inventors: Kazuo Shii, Hiroyuki Kobayashi, Morioki Kubozoe, Shigeto Isakozawa
  • Patent number: 4379231
    Abstract: An electron microscope is disclosed in which an electron beam impinges upon a specimen at a predetermined angle of incidence, the incident azimuth of the electron beam incident upon the specimen is continuously changed, and the electron beam having passed through the specimen is made large in angular spread by a magnifying lens system and then projected onto a viewing screen to form a visual enlarged image of the specimen on the viewing screen; and in which the astigmatism of the magnifying lens system is shown on the viewing screen as the blur of the image.
    Type: Grant
    Filed: March 12, 1980
    Date of Patent: April 5, 1983
    Assignee: Hitachi, Ltd.
    Inventors: Kazuo Shii, Toshiyuki Ohashi
  • Patent number: 4283627
    Abstract: The electron beam having penetrated a sample is projected on a field limiting plate having an opening by means of an objective lens. That part of the electron beam which has passed through the opening of the field limiting plate, is projected upon a viewing screen by means of an image forming lens system. An electron beam deflection system is disposed between the hind focal point of the objective lens and the field limiting plate, the system having its deflection center at the hind focal point of the objective lens.
    Type: Grant
    Filed: November 29, 1979
    Date of Patent: August 11, 1981
    Assignee: Hitachi, Ltd.
    Inventors: Shigeto Isakozawa, Kazuo Shii