Patents by Inventor Kazuomi Azuma

Kazuomi Azuma has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8029655
    Abstract: Provided is a sputtering target which can give a high water barrier property and a high flexibility to a sputtering film, can keep a high film forming rate certainly in sputtering, and can make damages to an objective substance wherein a film is to be formed as small as possible. In order to realize this, a mixed powder which contains 20 to 80% by weight of a SiO powder, the balance of the powder being made of a TiO2 powder and/or a Ti powder, is pressed and sintered. The sintered body has a composition of Si?Ti?O? wherein ?, ? and ? are mole ratios of Si, Ti and O, respectively, and the ratio of ?/? ranges from 0.45 to 7.25 and the ratio of ?/(?+?) ranges from 0.80 to 1.70.
    Type: Grant
    Filed: July 3, 2006
    Date of Patent: October 4, 2011
    Assignees: OSAKA Titanium technologies Co., Ltd., ROHM Co., Ltd.
    Inventors: Jyunji Kido, Yoshitake Natsume, Tadashi Ogasawara, Kazuomi Azuma, Koichi Mori
  • Patent number: 7951284
    Abstract: A water electrolysis apparatus includes a plurality of unit cells. A membrane electrode assembly of the unit cell includes an anode side power feeding element and a cathode side power feeding element stacked on an anode catalyst layer and a cathode catalyst layer on both surfaces of a solid polymer electrolyte membrane. A surface of the anode side power feeding element is subjected to a grinding process, and then, subjected to an etching process to form a smooth surface.
    Type: Grant
    Filed: February 24, 2006
    Date of Patent: May 31, 2011
    Assignees: Honda Motor Co., Ltd., OSAKA Titanium Technologies Co., Ltd.
    Inventors: Koji Nakazawa, Masanori Okabe, Masato Kita, Kenji Taruya, Tadashi Ogasawara, Kazuomi Azuma, Takashi Onishi
  • Publication number: 20100226850
    Abstract: An even titanium oxide film is economically formed on the surface of a substrate. To actualize the film formation, an aqueous titanium tetrachloride solution containing 0.1 to 17% by weight of Ti is applied in a film-like state on the surface of a heat resistant substrate. While the liquid film state is kept as it is, the aqueous titanium tetrachloride solution is heated to 300° C. or more and H2O and HCl in the liquid film are accordingly evaporated to form a titanium oxide film. In the case where the substrate is of aluminum inferior in acid resistance, an acid-resistant film such as an oxide film is previously formed on the surface of the metal substrate.
    Type: Application
    Filed: January 19, 2007
    Publication date: September 9, 2010
    Applicant: Osaka Titanium Technologies C., Ltd
    Inventors: Tadashi Ogasawara, Shinji Shimosaki, Kazuomi Azuma, Masahiro Yoshihara
  • Publication number: 20090291029
    Abstract: A full spectrum light emitting lamp and one or more translucent base bodies surrounding the lamp are disposed in the lighting apparatus, the one or more translucent bas bodies having a photocatalytic reaction layer which bears a photocatalyst made of a titanium dioxide thin film therein, or the one or more translucent base bodies having the photocatalytic reaction layer which bears the photocatalyst made of the titanium dioxide thin film therein and having infrared light-absorbing functions, and a space through which air can flow is formed between the lamp and the translucent base body. Therefore, an ultraviolet light, a visible light and an infrared light can effectively be utilized according to characteristics such as an air purifying function of the ultraviolet light, a lighting function of the visible light, and a heating function of the infrared light to thereby save optical energy emitted from the lamp.
    Type: Application
    Filed: June 12, 2007
    Publication date: November 26, 2009
    Inventors: Tadashi Ogasawara, Toshiaki Matsuo, Shinji Shimosaki, Kazuomi Azuma, Yoji Mitani
  • Publication number: 20090127108
    Abstract: Provided is a sputtering target which can give a high water barrier property and a high flexibility to a sputtering film, can keep a high film forming rate certainly in sputtering, and can make damages to an objective substance wherein a film is to be formed as small as possible. In order to realize this, a mixed powder which contains 20 to 80% by weight of a SiO powder, the balance of the powder being made of a TiO2 powder and/or a Ti powder, is pressed and sintered. The sintered body has a composition of Si?Ti?O? wherein ?, ? and ? are mole ratios of Si, Ti and O, respectively, and the ratio of ?/? ranges from 0.45 to 7.25 and the ratio of ?/(?+?) ranges from 0.80 to 1.70.
    Type: Application
    Filed: July 3, 2006
    Publication date: May 21, 2009
    Applicants: OSAKA TITANIUM TECHNOLOGIES CO., LTD, INT'L MANUFACTURING & ENGINEERING SRVCS CO., LTD
    Inventors: Jyunji Kido, Yoshitake Natsume, Tadashi Ogasawara, Kazuomi Azuma, Koichi Mori
  • Publication number: 20090123769
    Abstract: A titanium oxide photocatalyst responsive to visible light which can exhibit a high photocatalytic activity in response to visible light is produced by subjecting titanium oxide and/or titanium hydroxide obtained by neutralizing an acidic titanium compound with a nitrogen-containing base to heat treatment in an atmosphere containing a hydrolyzable metal compound (e.g., a titanium halide) and then to additional heat treatment in a gas having a moisture content of 0.5-4.0 volume % at a temperature of 350° C. or above. The photocatalyst which is a nitrogen-containing titanium oxide has no substantial peak at a temperature of 600° C. or above in a mass fragment spectrum obtained by thermal desorption spectroscopy in which the ratio m/e of the mass number m to the electric charged e of ions is 28, and the peak having the smallest half band width is in the range of 400-600° C. in the spectrum. The nitrogen content calculated from the peak appearing at 400 eV±1.
    Type: Application
    Filed: March 22, 2007
    Publication date: May 14, 2009
    Applicant: SUMITOMO TITANIUM CORPORATION
    Inventors: Yasuhiro Masaki, Katsuhiro Nishihara, Tadashi Fukuda, Katsumi Okada, Masahito Tasaka, Shinji Shimosaki, Hideaki Kanno, Sadanobu Nagaoka, Kazuomi Azuma, Tadashi Ogasawara
  • Publication number: 20080296170
    Abstract: Hypochlorous acid is produced economically without the supply of electricity energy from outside. To actualize the production, a photoelectric cell having a titanium oxide electrode 1 and a counter electrode 2 is placed in an electrolyte solution 3 containing a metal chloride. Under the environment that oxygen can be supplied to the counter electrode 2 of the photoelectric cell in the electrolyte solution 3, the titanium oxide electrode 1 is irradiated with light.
    Type: Application
    Filed: January 26, 2007
    Publication date: December 4, 2008
    Applicant: OSAKA Titanium Technologies Co., Ltd.
    Inventors: Kazuomi Azuma, Tadashi Ogasawara, Shinji Shimosaki, Katsumi Katakura
  • Publication number: 20080095930
    Abstract: The lowness of the initial efficiency which is a drawback of lithium secondary batteries wherein a SiO negative electrode is used is largely made better without hindering a large initial charge capacity peculiar to the lithium secondary batteries. A fall in the cycle characteristic when the thickness of the SiO layer is made large is prevented. To realize these matters, a thin film of SiO is formed, as a negative electrode active material layer, on the surface of a current collector by vacuum evaporation or sputtering. The film is preferably formed by an ion plating process. The thickness of the SiO thin film is set to 5 ?m or more. The surface roughness of the current collector is set to follows: the maximum height roughness Rz=5.0 or more. After the formation of the thin film, the film is thermally treated in a nonoxidative atmosphere.
    Type: Application
    Filed: September 5, 2005
    Publication date: April 24, 2008
    Applicant: Sumitomo Titanium Corporation
    Inventors: Yoshitake Natsume, Tadashi Ogasawara, Kazuomi Azuma
  • Publication number: 20070248831
    Abstract: A highly active titanium oxide photocatalyst of the type responsive to visible light is prepared by subjecting a titanium (hydr)oxide raw material obtained by neutralizing an acidic titanium compound in ammonia or an amine under conditions such that the final pH is 7 or below to heat treatment in an atmosphere containing a hydrolyzable compound followed by contact with water and additional heat treatment at a temperature of at least 350° C. The resulting titanium oxide photocatalyst comprises titanium oxide with a specific surface area of at most 120 m2/g and with the amount of surface hydroxyl groups being at least 600 ?eq/g. Preferably the density of surface hydroxyl groups is at least 8 ?eq/m2, and the ratio of the amount of terminal type hydroxyl groups (T) to the amount of bridge type hydroxyl groups (B) in the surface hydroxyl groups satisfies T/B?0.20. This titanium oxide photocatalyst has an ESR spectrum having two types of triplet signal for which the g values of the main spectra are 1.993-2.
    Type: Application
    Filed: April 19, 2005
    Publication date: October 25, 2007
    Applicant: Sumitomo Titanium Corporation
    Inventors: Katsuhiro Nishihara, Yasuhiro Masaki, Tadashi Fukuda, Katsumi Okada, Shinji Shimosaki, Sadanobu Nagaoka, Hideaki Kanno, Kazuomi Azuma, Tadashi Ogasawara
  • Publication number: 20070059601
    Abstract: Greatly improved is an initial efficiency, which would be otherwise low as a fault, without reducing a magnitude of an initial charge capacity, which is a feature of a lithium secondary battery using an SiO as an negative electrode. A cycle characteristic is improved. In order to realize the improvements, a thin film of silicon oxide formed by vacuum vapor deposition or sputtering as an negative electrode active material layer 32 on a surface of a collector 31. The thin film is formed preferably by means of an ion plating method. The silicon oxide is SiOx (0.5?x<1.0) and a film thickness is in the range of from 0.1 to 50 ?m. A vacuum vapor deposition source that is used is an SiO deposit having a weight decrease percent (a rattler value) in a rattler test of 1.0% or less.
    Type: Application
    Filed: April 16, 2004
    Publication date: March 15, 2007
    Inventors: Yoshitake Natsume, Tadashi Ogasawara, Kazuomi Azuma
  • Patent number: 7151068
    Abstract: A sintered object of silicon monoxide for use as a material for forming silicon oxide thin films is provided of which the evaporation residue as determined by subjecting a sample thereof to thermogravimetry at a heating temperature of 1,300° C. and in a vacuum atmosphere, namely at a pressure of not higher than 10 Pa, is not more than 4% by mass relative to the sample before measurement. This sintered object can be produced by sintering SiO particles having a particle diameter of not smaller than 250 ?m, either after press forming thereof or during press forming thereof, in a non-oxygen atmosphere. This sintered object is high in evaporation rate and, when it is used as a material for film formation, an improvement in productivity in producing silicon oxide thin films can be expected. Thus, it can be widely applied in forming silicon oxide thin films useful as electric insulating films, mechanical protection films, optical films, barrier films of food packaging materials, etc.
    Type: Grant
    Filed: November 29, 2002
    Date of Patent: December 19, 2006
    Assignee: Sumitomo Titanium Corporation
    Inventors: Yoshitake Natsume, Tadashi Ogasawara, Munetoshi Watanabe, Kazuomi Azuma, Toshiharu Iwase
  • Publication number: 20060201800
    Abstract: A water electrolysis apparatus includes a plurality of unit cells. A membrane electrode assembly of the unit cell includes an anode side power feeding element and a cathode side power feeding element stacked on an anode catalyst layer and a cathode catalyst layer on both surfaces of a solid polymer electrolyte membrane. A surface of the anode side power feeding element is subjected to a grinding process, and then, subjected to an etching process to form a smooth surface.
    Type: Application
    Filed: February 24, 2006
    Publication date: September 14, 2006
    Applicants: Honda Motor Co., Ltd., Sumitomo Titanium Corporation
    Inventors: Koji Nakazawa, Masanori Okabe, Masato Kita, Kenji Taruya, Tadashi Ogasawara, Kazuomi Azuma, Takashi Onishi
  • Publication number: 20050085095
    Abstract: A sintered object of silicon monoxide for use as a material for forming silicon oxide thin films is provided of which the evaporation residue as determined by subjecting a sample thereof to thermogravimetry at a heating temperature of 1,300° C. and in a vacuum atmosphere, namely at a pressure of not higher than 10 Pa, is not more than 4% by mass relative to the sample before measurement. This sintered object can be produced by sintering SiO particles having a particle diameter of not smaller than 250 ?m, either after press forming thereof or during press forming thereof, in a non-oxygen atmosphere. This sintered object is high in evaporation rate and, when it is used as a material for film formation, an improvement in productivity in producing silicon oxide thin films can be expected. Thus, it can be widely applied in forming silicon oxide thin films useful as electric insulating films, mechanical protection films, optical films, barrier films of food packaging materials, etc.
    Type: Application
    Filed: November 29, 2002
    Publication date: April 21, 2005
    Inventors: Yoshitake Natsume, Tadashi Ogasawara, Munetoshi Watanabe, Kazuomi Azuma, Toshiharu Iwase