Abstract: In the method of the present invention, xylylenediamine is produced by a two-stage hydrogenation of a dicyanobenzene compound. In a first stage (a), the hydrogenation is performed until a conversion of nitrile groups reaches 90 mol % or higher and less than 99.9 mol %. In a second stage (b), the hydrogenation is further continued at temperatures 10° C. or more higher than in the step (a) until the conversion of nitrile groups reaches a level which is higher than that attained in the step (a) and equal to 99.5 mol % or more. In the present invention, a highly pure xylylenediamine containing a minimized amount of cyanobenzylamine is efficiently produced in a simple manner without needing a specific purification, and also without deteriorating the use efficiency of the catalyst while reducing the amount of the dicyanobenzene compound remaining not reacted and the generation of the intermediate cyanobenzylamine.

Abstract: In the method of the present invention, xylylenediamine is produced by a two-stage hydrogenation of a dicyanobenzene compound. In a first stage (a), the hydrogenation is performed until a conversion of nitrile groups reaches 90 mol % or higher and less than 99.9 mol %. In a second stage (b), the hydrogenation is further continued at temperatures 10° C. or more higher than in the step (a) until the conversion of nitrile groups reaches a level which is higher than that attained in the step (a) and equal to 99.5 mol % or more. In the present invention, a highly pure xylylenediamine containing a minimized amount of cyanobenzylamine is efficiently produced in a simple manner without needing a specific purification, and also without deteriorating the use efficiency of the catalyst while reducing the amount of the dicyanobenzene compound remaining not reacted and the generation of the intermediate cyanobenzylamine.

Abstract: Developing solution for a photoresist comprising an alicyclic amine compound and a non-metallic alkali compound is described. The developing solution exhibits excellent wettability and dissolution selectivity to alicyclic compound-based resists. Also, the developing solution does not produce dissolution residues, and it makes it possible to reliably form ultra fine patterns.

Abstract: Developing solution for a photoresist comprising an alicyclic amine compound and a non-metallic alkali compound is described. The developing solution exhibits excellent wettability and dissolution selectivity to alicyclic compound-based resists. Also, the developing solution does not produce dissolution residues, and it makes it possible to reliably form ultra fine patterns.