Patents by Inventor Kazushi Hanakawa
Kazushi Hanakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20180353773Abstract: A treatment planning apparatus of the present invention comprises a processor configured to predict a degree of sharpness of an X-ray image which is acquired with assumed X-ray intensity and calculate position uncertainty of an affected area, calculate irradiation parameters of a therapeutic radiation based on the calculated position uncertainty of the affected area, calculate an X-ray irradiation amount with which a patient is irradiated by an X-ray imaging device with the assumed X-ray intensity and calculate a dose distribution of the therapeutic radiation which is irradiated to the patient using the calculated irradiation parameters of the therapeutic radiation and a display that displays the calculated X-ray irradiation amount and the calculated therapeutic radiation dose distribution.Type: ApplicationFiled: November 17, 2015Publication date: December 13, 2018Applicant: HITACHI, LTD.Inventors: Yusuke SAKAMOTO, Kazushi HANAKAWA
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Patent number: 9881711Abstract: A beam shaping device included in a beam transport system is provided with: a pre-stage quadrupole electromagnet that reduces a distribution width of x-angle components that are inclinations in the x-direction of the charged particles in the beam with respect to the traveling direction; a penumbra expander that moderates an end profile of a particle-number distribution of the x-angle components in the beam having passed through the pre-stage quadrupole electromagnet; and a post-stage quadrupole electromagnet that adjusts a betatron phase in a phase-space distribution in the x-direction, of the beam having passed through the penumbra expander; wherein the post-stage quadrupole electromagnet adjusts a phase advance angle of the betatron phase from the penumbra expander to the isocenter, to be in a range of an odd multiple of 90 degreesĀ±45 degrees.Type: GrantFiled: September 12, 2014Date of Patent: January 30, 2018Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Shuhei Odawara, Kazushi Hanakawa
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Publication number: 20170213613Abstract: A beam shaping device included in a beam transport system is provided with: a pre-stage quadrupole electromagnet that reduces a distribution width of x-angle components that are inclinations in the x-direction of the charged particles in the beam with respect to the traveling direction; a penumbra expander that moderates an end profile of a particle-number distribution of the x-angle components in the beam having passed through the pre-stage quadrupole electromagnet; and a post-stage quadrupole electromagnet that adjusts a betatron phase in a phase-space distribution in the x-direction, of the beam having passed through the penumbra expander; wherein the post-stage quadrupole electromagnet adjusts a phase advance angle of the betatron phase from the penumbra expander to the isocenter, to be in a range of an odd multiple of 90 degreesĀ±45 degrees.Type: ApplicationFiled: September 12, 2014Publication date: July 27, 2017Applicant: Mitsubishi Electric CorporationInventors: Shuhei ODAWARA, Kazushi HANAKAWA
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Patent number: 9630027Abstract: In a beam transport system, based on a beam temporal-variation related amount that has been calculated by a beam analyzer and that is a beam-position temporal variation amount or a beam diameter at a beam profile monitor, an optical parameter calculator calculates a start-point momentum dispersion function that is a momentum dispersion function (?, ??) of a charged particle beam at a start point in design of the beam transport system that is set on a beam trajectory of the accelerator; and calculates optical parameters using, as an initial condition, the start-point momentum dispersion function and a beginning condition at an irradiation position at the time of detecting profile data.Type: GrantFiled: July 11, 2013Date of Patent: April 25, 2017Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Kazushi Hanakawa, Kengo Sugahara, Shuhei Odawara
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Patent number: 9402298Abstract: A method of manufacturing a radio frequency accelerator that accelerates charged particles injected into a second-stage linear accelerator from a first-stage linear accelerator includes a step of setting a value of a power distribution factor R for the power distributor to supply radio frequency power to the second-stage linear accelerator and a value of a ratio L/? of a length L of the matching section between the outlet of the first-stage linear accelerator and the inlet of the second-stage linear accelerator to the angular frequency ? of the radio frequency power, so that a charged particle beam is extracted from the second-stage linear accelerator over a range of the total radio frequency power wider than a widest allowable range among allowable total radio frequency power ranges determined for each phase of charged particles on the basis of phase acceptance of the second-stage accelerator.Type: GrantFiled: February 28, 2013Date of Patent: July 26, 2016Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Kengo Sugahara, Kazushi Hanakawa, Yasuto Kishii, Kazuo Yamamoto
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Patent number: 9387346Abstract: A particle beam treatment system includes an accelerator system that accelerates a charged particle beam and a beam transport system that transports a high-energy beam emitted from the accelerator to an irradiation location, wherein the beam transport system is provided with at least one steering electromagnet and at least one beam position monitor corresponding to the at least one steering electromagnet, and wherein the at least one beam position monitor supplies an excitation current for correcting a beam position, which periodically varies, to the at least one steering electromagnet.Type: GrantFiled: September 21, 2012Date of Patent: July 12, 2016Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Kazushi Hanakawa, Kengo Sugahara, Shuhei Odawara, Hisashi Harada, Masahiro Ikeda, Toshihiro Otani, Taizo Honda, Katsuhisa Yoshida
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Publication number: 20160144202Abstract: In a beam transport system, based on a beam temporal-variation related amount that has been calculated by a beam analyzer and that is a beam-position temporal variation amount or a beam diameter at a beam profile monitor, an optical parameter calculator calculates a start-point momentum dispersion function that is a momentum dispersion function (?, ??) of a charged particle beam at a start point in design of the beam transport system that is set on a beam trajectory of the accelerator; and calculates optical parameters using, as an initial condition, the start-point momentum dispersion function and a beginning condition at an irradiation position at the time of detecting profile data.Type: ApplicationFiled: July 11, 2013Publication date: May 26, 2016Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Kazushi HANAKAWA, Kengo SUGAHARA, Shuhei ODAWARA
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Patent number: 9312100Abstract: In a particle beam therapy system which scans a particle beam and irradiates the particle beam to an irradiation position of an irradiation subject and has a dose monitoring device for measuring a dose of the particle beam and an ionization chamber smaller than the dose monitoring device, the ionization chamber measuring a dose of a particle beam passing through the dose monitoring device, the dose of the particle beam irradiated by the dose monitoring device is measured; the dose of the particle beam passing through the dose monitoring device is measured by the small ionization chamber; and a correction coefficient of the dose measured by the dose monitoring device corresponding to the irradiation position is found based on the dose of the particle beam measured by the small ionization chamber.Type: GrantFiled: September 5, 2014Date of Patent: April 12, 2016Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Toshihiro Otani, Hisashi Harada, Masahiro Ikeda, Kazushi Hanakawa, Taizo Honda
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Publication number: 20160014877Abstract: A method of manufacturing a radio frequency accelerator that accelerates charged particles injected into a second-stage linear accelerator from a first-stage linear accelerator includes a step of setting a value of a power distribution factor R for the power distributor to supply radio frequency power to the second-stage linear accelerator and a value of a ratio L/? of a length L of the matching section between the outlet of the first-stage linear accelerator and the inlet of the second-stage linear accelerator to the angular frequency ? of the radio frequency power, so that a charged particle beam is extracted from the second-stage linear accelerator over a range of the total radio frequency power wider than a widest allowable range among allowable total radio frequency power ranges determined for each phase of charged particles on the basis of phase acceptance of the second-stage accelerator.Type: ApplicationFiled: February 28, 2013Publication date: January 14, 2016Applicant: Mitsubishi Electric CorporationInventors: Kengo SUGAHARA, Kazushi HANAKAWA, Yasuto KISHII, Kazuo YAMAMOTO
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Patent number: 9101763Abstract: A particle beam irradiation apparatus according to the present invention is provided with a vacuum duct that forms a vacuum region through which the charged particle beam passes, a vacuum window through which the charged particle beam is launched from the vacuum region, a scanning electromagnet that scans the charged particle beam; a monitoring apparatus including a position monitor that detects the passing position of a charged particle beam and the beam size thereof, a low-scattering gas filling chamber including the monitoring apparatus, and an irradiation management apparatus that controls irradiation of the charged particle beam; the particle beam irradiation apparatus is characterized in that the low-scattering gas filling chamber is changeably disposed in such a manner that the beam-axis-direction positional relationship between the monitoring apparatus and the vacuum window is a desired one and in that the low-scattering gas filling chamber is filled with a low-scattering gas.Type: GrantFiled: November 3, 2011Date of Patent: August 11, 2015Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Masahiro Ikeda, Hisashi Harada, Kazushi Hanakawa, Toshihiro Otani, Tadashi Katayose, Taizo Honda, Yukiko Yamada, Yuehu Pu
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Patent number: 9079025Abstract: In gantry type particle beam irradiation system comprising a gantry and being configured to irradiate a particle beam, which has small emittance in X direction and large emittance in Y direction at an extraction position of a circular accelerator, from an irradiation nozzle installed in the gantry to an irradiation target, the irradiation nozzle has a ridge filter which is installed so as for a direction in which emittance in X direction is maintained to tilt to a direction which is perpendicular to a ridge of the ridge filter by a predetermined angle in the state where the gantry is a reference angle.Type: GrantFiled: April 19, 2012Date of Patent: July 14, 2015Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Kengo Sugahara, Kazushi Hanakawa, Taizo Honda
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Patent number: 9067066Abstract: A control unit is provided with, a retaining section that retains a plurality of operation patterns each being a pattern of operation to be periodically repeated by an accelerator, the operation patterns having respective operation conditions adjusted for different emission times of an particle beam, to cause a deflection electromagnet in the accelerator to have an intended magnetic field intensity even under a presence of a hysteresis; a reading section for a plurality of slices of an irradiation target in a depth direction, which reads an irradiation condition for each of the slices; a selection section that selects the operation pattern suitable for each of the slices, on the basis of the read irradiation condition; and a main control section that controls, for each of the slices, the accelerator on the basis of the selected operation pattern and an irradiation device on the basis of the irradiation condition.Type: GrantFiled: March 27, 2012Date of Patent: June 30, 2015Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Yukiko Yamada, Hisashi Harada, Taizo Honda, Masahiro Ikeda, Kazushi Hanakawa, Toshihiro Otani, Tadashi Katayose
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Patent number: 9067065Abstract: The particle beam irradiation apparatus comprises: a position monitor that detects a passing position of a charged particle beam; and an irradiation control apparatus that calculates a distance from a predetermined reference point to the position monitor, calculates a beam irradiation position on an irradiation subject, and controls irradiation of the beam; wherein the irradiation control apparatus includes a position calculation apparatus that calculates the beam irradiation position, based on a beam position detected by the position monitor, a scanning starting point distance information on a distance from a irradiation plane of the irradiation subject to a scanning starting point, of the beam, in a scanning electromagnet, and a position monitor distance information on a distance, from the irradiation plane to the position monitor, that is calculated based on the calculated distance.Type: GrantFiled: March 7, 2011Date of Patent: June 30, 2015Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Yukiko Yamada, Hisashi Harada, Takaaki Iwata, Toshihiro Otani, Masahiro Ikeda, Kazushi Hanakawa, Taizo Honda
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Publication number: 20150031934Abstract: In gantry type particle beam irradiation system comprising a gantry and being configured to irradiate a particle beam, which has small emittance in X direction and large emittance in Y direction at an extraction position of a circular accelerator, from an irradiation nozzle installed in the gantry to an irradiation target, the irradiation nozzle has a ridge filter which is installed so as for a direction in which emittance in X direction is maintained to tilt to a direction which is perpendicular to a ridge of the ridge filter by a predetermined angle in the state where the gantry is a reference angle.Type: ApplicationFiled: April 19, 2012Publication date: January 29, 2015Applicant: Mitsubishi Electric CorporationInventors: Kengo Sugahara, Kazushi Hanakawa, Taizo Honda
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Patent number: 8933420Abstract: A particle beam therapy system comprising a treatment table, a treatment table control unit and an irradiation control unit configured to output an instruction for controlling the treatment table control unit, an accelerator and a scanning electromagnet, wherein after the treatment table control unit controls the treatment table so as for a patient isocenter which is reference position of an affected area of a patient to move to a position of an irradiation isocenter which is set at a position which is closer to an irradiation nozzle than an equipment isocenter which is reference of positional relation of the irradiation nozzle and the treatment table, the irradiation control unit outputs an instruction for irradiating the patient with a particle beam.Type: GrantFiled: November 2, 2011Date of Patent: January 13, 2015Assignee: Mitsubishi Electric CorporationInventors: Masahiro Ikeda, Hisashi Harada, Kazushi Hanakawa, Toshihiro Otani, Tadashi Katayose, Taizo Honda, Yukiko Yamada, Yuehu Pu
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Publication number: 20140374624Abstract: In a particle beam therapy system which scans a particle beam and irradiates the particle beam to an irradiation position of an irradiation subject and has a dose monitoring device for measuring a dose of the particle beam and an ionization chamber smaller than the dose monitoring device, the ionization chamber measuring a dose of a particle beam passing through the dose monitoring device, the dose of the particle beam irradiated by the dose monitoring device is measured; the dose of the particle beam passing through the dose monitoring device is measured by the small ionization chamber; and a correction coefficient of the dose measured by the dose monitoring device corresponding to the irradiation position is found based on the dose of the particle beam measured by the small ionization chamber.Type: ApplicationFiled: September 5, 2014Publication date: December 25, 2014Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Toshihiro OTANI, Hisashi HARADA, Masahiro IKEDA, Kazushi HANAKAWA, Taizo HONDA
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Publication number: 20140323793Abstract: A control unit is provided with, a retaining section that retains a plurality of operation patterns each being a pattern of operation to be periodically repeated by an accelerator, the operation patterns having respective operation conditions adjusted for different emission times of an particle beam, to cause a deflection electromagnet in the accelerator to have an intended magnetic field intensity even under a presence of a hysteresis; a reading section for a plurality of slices of an irradiation target in a depth direction, which reads an irradiation condition for each of the slices; a selection section that selects the operation pattern suitable for each of the slices, on the basis of the read irradiation condition; and a main control section that controls, for each of the slices, the accelerator on the basis of the selected operation pattern and an irradiation device on the basis of the irradiation condition.Type: ApplicationFiled: March 27, 2012Publication date: October 30, 2014Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Yukiko Yamada, Hisashi Harada, Taizo Honda, Masahiro Ikeda, Kazushi Hanakawa, Toshihiro Otani, Tadashi Katayose
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Patent number: 8854048Abstract: In a particle beam therapy system which scans a particle beam and irradiates the particle beam to an irradiation position of an irradiation subject and has a dose monitoring device for measuring a dose of the particle beam and an ionization chamber smaller than the dose monitoring device, the ionization chamber measuring a dose of a particle beam passing through the dose monitoring device, the dose of the particle beam irradiated by the dose monitoring device is measured; the dose of the particle beam passing through the dose monitoring device is measured by the small ionization chamber; and a correction coefficient of the dose measured by the dose monitoring device corresponding to the irradiation position is found based on the dose of the particle beam measured by the small ionization chamber.Type: GrantFiled: March 10, 2011Date of Patent: October 7, 2014Assignee: Mitsubishi Electric CorporationInventors: Toshihiro Otani, Hisashi Harada, Masahiro Ikeda, Kazushi Hanakawa, Taizo Honda
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Publication number: 20140235922Abstract: A particle beam treatment system includes an accelerator system that accelerates a charged particle beam and a beam transport system that transports a high-energy beam emitted from the accelerator to an irradiation location, wherein the beam transport system is provided with at least one steering electromagnet and at least one beam position monitor corresponding to the at least one steering electromagnet, and wherein the at least one beam position monitor supplies an excitation current for correcting a beam position, which periodically varies, to the at least one steering electromagnet.Type: ApplicationFiled: September 21, 2012Publication date: August 21, 2014Applicant: Mitsubishi Electric CorporationInventors: Kazushi Hanakawa, Kengo Sugahara, Shuhei Odawara, Hisashi Harada, Masahiro Ikeda, Toshihiro Otani, Taizo Honda, Katsuhisa Yoshida
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Publication number: 20140228615Abstract: A particle beam irradiation apparatus according to the present invention is provided with a vacuum duct that forms a vacuum region through which the charged particle beam passes, a vacuum window through which the charged particle beam is launched from the vacuum region, a scanning electromagnet that scans the charged particle beam; a monitoring apparatus including a position monitor that detects the passing position of a charged particle beam and the beam size thereof, a low-scattering gas filling chamber including the monitoring apparatus, and an irradiation management apparatus that controls irradiation of the charged particle beam; the particle beam irradiation apparatus is characterized in that the low-scattering gas filling chamber is changeably disposed in such a manner that the beam-axis-direction positional relationship between the monitoring apparatus and the vacuum window is a desired one and in that the low-scattering gas filling chamber is filled with a low-scattering gas.Type: ApplicationFiled: November 3, 2011Publication date: August 14, 2014Applicant: Mitsubishi Electric CorporationInventors: Masahiro Ikeda, Hisashi Harada, Kazushi Hanakawa, Toshihiro Otani, Tadashi Katayose, Taizo Honda, Yukiko Yamada, Yuehu Pu