Abstract: Provided is a phosphor for a dispersion-type EL that may be manufactured in a simple process and may provide stable, high brightness and light emission efficiency. The phosphor for a dispersion-type EL according to the present invention includes a mixture of an electron-accepting phosphor particle (4A) and an electron-donating phosphor particle (4B). The electron-accepting phosphor particle (4A) includes a base particle and an acceptor element added thereto, and the electron-donating phosphor particle (4B) includes a base particle and a donor element added thereto. For example, the base particle is a ZnS particle, the acceptor element is Cu, and the donor element is Cl or Al.

Abstract: Provided is a phosphor for a dispersion-type EL that may be manufactured in a simple process and may provide stable, high brightness and light emission efficiency. The phosphor for a dispersion-type EL according to the present invention includes a mixture of an electron-accepting phosphor particle (4A) and an electron-donating phosphor particle (4B). The electron-accepting phosphor particle (4A) includes a base particle and an acceptor element added thereto, and the electron-donating phosphor particle (4B) includes a base particle and a donor element added thereto. For example, the base particle is a ZnS particle, the acceptor element is Cu, and the donor element is Cl or Al.

Abstract: In a nozzle system for feeding treatment liquid, a storage tank is equipped with a nozzle comprising an opening and a stopcock which opens and closes said opening. When the stopcock opens the opening, a predetermined amount of liquid developer is dropped from the tank onto a wafer through a narrow gap between the outer surface of the stopcock and the inner edge of the opening. Thereby, the large amount of the liquid developer can be discharged and diffused on the entire wafer surface for a short time. Besides, the liquid amount is controlled with ease, and damage to the wafer is reduced, which enables a high quality of the development.

Abstract: This invention relates to a coating equipment to be used for coating a coating solution (coating diffusion agent, photo-resist agent, etc.) on a film which forms patterns of photo mask substrates (hereinafter merely called "substrates") used for production of reticle and photo masks or of glass substrates used for liquid crystal display.

Abstract: This invention relates to a coating equipment to be used for coating a coating solution (coating diffusion agent, photo-resist agent, etc.) on a film which forms patterns of photo mask substrates (hereinafter merely called "substrates") used for production of reticle and photo masks or of glass substrates used for liquid crystal display.