Abstract: The present invention provides a gas-phase growth apparatus in which an upper part of a circular susceptor 13 on the upper surface of which a substrate 17 is arranged is provided into a circular opening 12a formed at a bottom wall of the flow channel 12, while rotating the susceptor, the substrate is heated by a heater 14 provided under the susceptor through the susceptor, a reaction gas is supplied into the flow channel, and a thin film is produced on the substrate, wherein a rotation driving device 18 for rotating the susceptor is arranged in a state of surrounding the heater, and includes a cylindrical rotation member 19 for supporting the circumferential edge of the susceptor by the top end.

Abstract: The present invention provides a gas-phase growth apparatus in which an upper part of a circular susceptor 13 on the upper surface of which a substrate 17 is arranged is provided into a circular opening 12a formed at a bottom wall of the flow channel 12, while rotating the susceptor, the substrate is heated by a heater 14 provided under the susceptor through the susceptor, a reaction gas is supplied into the flow channel, and a thin film is produced on the substrate, wherein a rotation driving device 18 for rotating the susceptor is arranged in a state of surrounding the heater, and includes a cylindrical rotation member 19 for supporting the circumferential edge of the susceptor by the top end.

Abstract: Provided is a vapor phase growth apparatus having a rotation/revolution mechanism by which a rolling member is prevented from riding onto an adjacent rolling member. In a vapor phase growth apparatus having a rotation/revolution structure in which a plurality of substrate retaining members 21 are rotatably provided in the circumferential direction of the susceptor via a rolling member(ball 22,23) on a susceptor 11, heated by a heating unit as well as is rotated by a driving unit, the substrate retaining member is rotated accompanied by the rotation of the susceptor and a substrate 12 retained by the substrate retaining member is rotated while being revolved with respect to the rotation axis of the susceptor. As for the rolling members, rolling members different diameters (a large diameter ball 22 and a small diameter ball 23) are alternately arranged.