Patents by Inventor Kazutaka Takahashi

Kazutaka Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11592604
    Abstract: Provided is a composition with which a film that allows transmission of infrared light in a state where noise generated from visible light is small can be formed. In addition, provided are a film, a laminate, an infrared transmitting filter, a solid image pickup element, and an infrared sensor. This composition includes: a coloring material that allows transmission of infrared light and shields visible light; an infrared absorber; and a curable compound, in which the infrared absorber includes a material that shields light in a wavelength range of longer than 1000 nm and 1200 nm or shorter. In the composition, a ratio A/B of a minimum value A of an absorbance of the composition in a wavelength range of 400 to 1100 nm to a maximum value B of an absorbance of the composition in a wavelength range of 1400 to 1500 nm is 4.5 or higher.
    Type: Grant
    Filed: March 11, 2020
    Date of Patent: February 28, 2023
    Assignee: FUJIFILM Corporation
    Inventors: Kazutaka Takahashi, Shunsuke Kitajima, Tokihiko Matsumura
  • Publication number: 20230048767
    Abstract: This disclosure relates to methods and compositions for treating a semiconductor substrate having a pattern disposed on a surface of the substrate.
    Type: Application
    Filed: October 19, 2022
    Publication date: February 16, 2023
    Inventors: William A. Wojtczak, Kazutaka Takahashi, Atsushi Mizutani, Thomas Dory, Keeyoung Park
  • Patent number: 11508569
    Abstract: This disclosure relates to methods and compositions for treating a semiconductor substrate having a pattern disposed on a surface of the substrate. The methods can include a) supplying a sublimating material to a substrate having a pattern disposed on a surface thereof; b) maintaining the sublimating material on the surface for a time sufficient to modify the surface; c) solidifying the sublimating material on the surface; and d) removing by sublimation the sublimating material disposed on the surface.
    Type: Grant
    Filed: August 3, 2020
    Date of Patent: November 22, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: William A. Wojtczak, Kazutaka Takahashi, Atsushi Mizutani, Thomas Dory, Keeyoung Park
  • Patent number: 11499099
    Abstract: This disclosure relates to etching compositions containing 1) at least one oxidizing agent; 2) at least one chelating agent; 3) at least one organic solvent; 4) at least one amine compound; and 5) water.
    Type: Grant
    Filed: September 2, 2020
    Date of Patent: November 15, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Kazutaka Takahashi, Tomonori Takahashi, William A. Wojtczak
  • Publication number: 20220306971
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine, 2) an amino alcohol, 3) hexylene glycol, and 4) water.
    Type: Application
    Filed: June 2, 2022
    Publication date: September 29, 2022
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Patent number: 11407966
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine, 2) an amino alcohol, 3) hexylene glycol, and 4) water.
    Type: Grant
    Filed: January 26, 2022
    Date of Patent: August 9, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Publication number: 20220145221
    Abstract: This disclosure relates to a cleaning composition that contains 1) hydroxylamine, 2) an amino alcohol, 3) hexylene glycol, and 4) water.
    Type: Application
    Filed: January 26, 2022
    Publication date: May 12, 2022
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Patent number: 11296135
    Abstract: Provided are a filter capable of detecting light with less noise, an optical sensor, a solid-state imaging element, and an image display device. This filter is provided with a plurality of different pixels that are two-dimensionally arranged, and at least one of the plurality of pixels is a pixel 11 of a near-infrared cut filter that shields at least a part of light having a wavelength in the near-infrared region and transmits light having a wavelength in the visible region.
    Type: Grant
    Filed: August 20, 2019
    Date of Patent: April 5, 2022
    Assignee: FUJIFILM Corporation
    Inventors: Kazutaka Takahashi, Kazuya Oota
  • Patent number: 11279903
    Abstract: This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one alkylsulfonic acid or a salt thereof, the alkylsulfonic acid containing an alkyl group substituted by OH or NH2; and 3) at least one aminoalcohol.
    Type: Grant
    Filed: July 8, 2020
    Date of Patent: March 22, 2022
    Assignee: Fujifilm Electronic Materials U.S.A., Inc.
    Inventors: Thomas Dory, Mick Bjelopavlic, Joshua Guske, Kazutaka Takahashi
  • Patent number: 11209582
    Abstract: Provided are a composition that has excellent pigment dispersibility without affecting the color of a pigment in a visible range, a curable composition, a cured film, a near infrared cut filter, an infrared transmitting filter; a solid image pickup element, an infrared sensor, and a camera module. The composition includes: a pigment; a pigment derivative that includes a compound represented by Formula (1); and a solvent, in which R1 and R2 represent an aryl group or the like, R3 to R6 represent a cyano group, a heteroaryl group, or the like, R7 and R8 each independently represent —BR9R10 or the like, R9 and R10 each independently represent a hydrogen atom, a halogen atom, an alkyl group, an aryl group, a heteroaryl group, an alkoxy group, an aryloxy group, or a heteroaryloxy group, L represents a single bond or a linking group, X represents an acidic group or the like, m represents an integer of 1 to 10, and n represents an integer of 1 to 10.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: December 28, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Kyohei Arayama, Takuya Tsuruta, Yuki Hirai, Kazutaka Takahashi, Tokihiko Matsumura, Suguru Samejima
  • Patent number: 11105965
    Abstract: Provided is a radiation-sensitive composition with which a pattern having excellent infrared shielding properties and excellent rectangularity can be formed. In addition, provided are an optical filter, a laminate, a pattern forming method, a solid image pickup element, an image display device, and an infrared sensor. This radiation-sensitive composition includes: a near infrared absorber; a resin; a radically polymerizable compound; and a photoradical polymerization initiator, in which the radiation-sensitive composition has an absorption maximum in a wavelength range of 700 to 1000 nm, a ratio absorbance Amax/absorbance A550 of an absorbance Amax at the absorption maximum to an absorbance A550 at a wavelength of 550 nm is 50 to 500, the resin includes a resin having an acid group, and a mass ratio radically polymerizable compound/resin having an acid group of the radically polymerizable compound to the resin having an acid group is 0.3 to 0.7.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: August 31, 2021
    Assignee: FUJIFILM Corporation
    Inventor: Kazutaka Takahashi
  • Patent number: 11066537
    Abstract: A composition includes: a compound represented by Formula (1); and at least one selected from the group consisting of a curable compound and a resin. Provided are a film that is formed using the composition, an infrared cut filter, a solid image pickup element, an infrared sensor, and a camera module. Further, provided is a compound represented by Formula (1). R1 and R2 each independently represent a group represented by the following Formula (2) and having a SP value of 12.2 (cal/cm3)1/2 or higher as a whole.
    Type: Grant
    Filed: August 28, 2019
    Date of Patent: July 20, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Tokihiko Matsumura, Suguru Samejima, Shunsuke Kitajima, Kazutaka Takahashi
  • Patent number: 11028251
    Abstract: Provided is a resin composition including: an infrared absorbing pigment; and a resin having an infrared absorbing group. In addition, provided are a film that is formed using the resin composition, an infrared cut filter, a method of manufacturing an infrared cut filter, a solid image pickup element, an infrared sensor, and a camera module.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: June 8, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Suguru Samejima, Kyohei Arayama, Kazutaka Takahashi
  • Patent number: 11015077
    Abstract: Provided is a pigment dispersion liquid used in a curable composition capable of manufacturing a film having fewer foreign matters. Provided are a curable composition capable of manufacturing a film having fewer foreign matters, a film, a near infrared cut filter, a solid-state imaging element, an image display device, and an infrared sensor. The pigment dispersion liquid includes a near infrared absorbing organic pigment having an maximum absorption wavelength in a wavelength range of 600 to 1,200 nm; two or more kinds of pigment derivatives having different structures; and a solvent.
    Type: Grant
    Filed: May 15, 2019
    Date of Patent: May 25, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Kazutaka Takahashi, Kyohei Arayama, Takuya Tsuruta, Tetsushi Miyata
  • Patent number: 10988608
    Abstract: A resin composition includes an organic pigment, a resin, and a solvent, in which a content of a Na atom is 0.01 to 50 mass ppm with respect to a total solid content of a resin composition.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: April 27, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Kazutaka Takahashi, Tetsushi Miyata, Hiromu Koizumi
  • Publication number: 20210109445
    Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.
    Type: Application
    Filed: December 21, 2020
    Publication date: April 15, 2021
    Applicant: FUJIFILM Corporation
    Inventors: Kazutaka TAKAHASHI, Daisuke HAMADA, Shunsuke KITAJIMA, Hirokazu KYOTA, Kaoru AOYAGI, Mitsuji YOSHIBAYASHI
  • Patent number: 10954374
    Abstract: A resin composition includes an organic pigment, a resin, and a solvent, in which a content of a Na atom is 0.01 to 50 mass ppm with respect to a total solid content of a resin composition.
    Type: Grant
    Filed: June 17, 2019
    Date of Patent: March 23, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Kazutaka Takahashi, Tetsushi Miyata, Hiromu Koizumi
  • Publication number: 20210071078
    Abstract: This disclosure relates to etching compositions containing 1) at least one oxidizing agent; 2) at least one chelating agent; 3) at least one organic solvent; 4) at least one amine compound; and 5) water.
    Type: Application
    Filed: September 2, 2020
    Publication date: March 11, 2021
    Inventors: Kazutaka Takahashi, Tomonori Takahashi, William A. Wojtczak
  • Patent number: 10942451
    Abstract: A coloring photosensitive composition includes an oxime ester-based photopolymerization initiator containing a fluorine atom, a polymerizable compound having an ethylenically unsaturated double bond, an alkali-soluble resin, and a colorant, in which in a case where a film having a film thickness after drying of 2.0 ?m is formed using the coloring photosensitive composition, the optical density of the film at a wavelength of 365 nm is 1.5 or more.
    Type: Grant
    Filed: January 8, 2020
    Date of Patent: March 9, 2021
    Assignee: FUJIFILM Corporation
    Inventors: Kazutaka Takahashi, Daisuke Hamada, Shunsuke Kitajima, Hirokazu Kyota, Kaoru Aoyagi, Mitsuji Yoshibayashi
  • Publication number: 20210057210
    Abstract: This disclosure relates to methods and compositions for treating a semiconductor substrate having a pattern disposed on a surface of the substrate.
    Type: Application
    Filed: August 3, 2020
    Publication date: February 25, 2021
    Inventors: William A. Wojtczak, Kazutaka Takahashi, Atsushi Mizutani, Thomas Dory, Keeyoung Park