Abstract: There are provided a prediction apparatus, a prediction system, and a prediction method, which predict, by an easy method, whether there is a possibility of an animal contracting a disease in a near future.

Abstract: Provided is a sputtering target for a magnetic recording film, in which film formation efficiency and film characteristics can be improved by suppressing growth of crystal grains, reducing magnetic permeability, and increasing density. A method for manufacturing such a sputtering target is also provided. The sputtering target is composed of a matrix phase which includes Co and Pt and a metal oxide phase for example. The sputtering target has a magnetic permeability in the range of 6 to 15 and a relative density of 90% or more.

Abstract: An object of the present invention is to provide a CoCrPt base sputtering target in which high chromium-containing particles containing a chromium atom at a high concentration unevenly distributed in the above sputtering target are reduced in a size and a production amount to thereby enhance a uniformity of the target and inhibit nodules or acing from being caused and which has the targeted composition ratio. The CoCrPt base sputtering target of the present invention is a sputtering target containing cobalt, chromium, ceramics and platinum, and it is characterized by that high chromium-containing particles containing a chromium atom at a high concentration which are unevenly distributed in the above sputtering target have a maximum full diameter of 40 ?m or less.

Abstract: Sputtering target materials have improved film-sputtering properties by containing finer metal oxide particles. A process for producing a sputtering target material including a cobalt/chromium/platinum matrix phase and an oxide phase that includes two or more metal oxides including at least chromium oxide wherein the oxide phase is in the form of particles, includes sintering material powder to form the sputtering target material wherein the material powder contains chromium oxide at not less than 1.0 mol % based on the material powder.

Abstract: A magnetic film of an oxide-containing cobalt base alloy has a smaller coercivity difference than conventional magnetic films. A target material and a sputtering target of the invention are capable of forming the magnetic film. A manufacturing method of the target material is also disclosed. The magnetic film of an oxide-containing cobalt base alloy and the oxide-containing cobalt base alloy target material each have a Fe content of 100 ppm or less. The sputtering target includes the target material bonded to a backing plate. The manufacturing method of the oxide-containing cobalt base alloy target material includes preparing a Co—Cr alloy by melting Cr ingot and at least one Co source selected from Co ingot and Co powder, preparing Co—Cr alloy powder by atomizing the Co—Cr alloy, preparing a mixed powder by mixing the Co—Cr alloy powder, Pt powder and oxide powder, and sintering the mixed powder after forming or simultaneously with forming.

Abstract: The provided is a sputtering target material that is made not to cause an arcing phenomenon and splash phenomenon at the time of sputtering as completely as possible. A portion to be used for sputtering of the sputtering target material is subjected to a friction stir processing. Even with a sputtering target material made of a carbon-containing aluminum alloy or a large-sized sputtering target material, the arcing phenomenon and the splash phenomenon at the time of sputtering can be certainly suppressed.

Abstract: An object of the present invention is to provide an aluminum-based target having a large area which has internal defects such as blow holes reduced to a minimum and has no warp. The aluminum-based target consisting of a plurality of aluminum alloy target members has a joint in which the aluminum alloy target members are joined with a friction stir welding method. The joint contains precipitates of an intermetallic compound with diameters of 10 ?m or smaller dispersed in an aluminum matrix, and blow holes with diameters of 500 ?m or less in an amount of 0.01 to 0.1/cm2.

Abstract: The provided is a producing technology for an Mn alloy sputtering target having low contents of impurity components such as oxygen, carbon and nitrogen and controlled crystal conformation. The present invention is characterized by the production steps of: adding deoxidant comprising elements having stronger affinity for oxygen than that of Mn to Mn; subjecting the Mn to a deoxidization-melting treatment in a fire-resistant crucible to prepare low-oxygen Mn, in which Mn is melted until oxide of the added deoxidant floats in the Mn molten metal; mixing the low-oxygen Mn with constituent metals of a sputtering target by respective predetermined amounts; adding further the deoxidant to the mixture; vacuum melting the mixture; and subjecting the mixture to a casting treatment.