Patents by Inventor Kazuteru Takahashi
Kazuteru Takahashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230258544Abstract: A sample purification apparatus includes a container for separating a mixed sample based on a specific gravity difference with the use of a heavy solution, a heavy solution introduction portion for introduction of the heavy solution into the container, a flow-out portion provided vertically above the heavy solution introduction portion in the container, the flow-out portion arranged so that a supernatant of a solution in the container due to the introduction of the heavy solution is flowed out to the outside of the container, and a collector provided vertically below the discharge portion in the container, the collector collecting a component in the mixed sample, the component being lighter in specific gravity than the heavy solution from the supernatant flowed out from the flow-out portion.Type: ApplicationFiled: October 28, 2020Publication date: August 17, 2023Inventors: Kazuteru TAKAHASHI, Masahito UEDA, Hidefumi YAMAGATA, Shinsuke INOUE, Shinji HAMASAKI
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Publication number: 20230221225Abstract: A sample purification apparatus includes a container for separating, with a heavy solution, a mixed sample based on a specific gravity difference and a collector that collects a component in the mixed sample lighter in specific gravity than the heavy solution by receiving a supernatant flowed out from the container. The container includes a flow-out port provided in an uppermost portion of the container and a flow-out path that guides the supernatant flowed out through the flow-out port to the collector. the container has a horizontal cross-sectional area which gradually decreases upward starting from a prescribed height of the container to a height where the flow-out port is located.Type: ApplicationFiled: March 9, 2021Publication date: July 13, 2023Inventors: Kazuteru TAKAHASHI, Masahito UEDA, Hidefumi YAMAGATA, Shinsuke INOUE, Shinji HAMASAKI
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Patent number: 11607701Abstract: Provided is a sample pretreatment device configured to apply, to the surface of a sample, a solution in which a predetermined substance is dissolved or dispersed. In order to properly and efficiently unclog a nozzle due to the deposition of the crystal of a matrix substance, the device includes a spray unit (3) including a solution tube (32) for the solution to pass through, a gas tube (33) for a spray gas to pass through, and a nozzle part (30) configured to spray the solution arriving at the terminal end of the solution tube by ejection of the spray gas through the gas tube, as well as a cleaning liquid supplier (4, 41) configured to put a cleaning liquid on an opening of the nozzle part from outside the spray unit.Type: GrantFiled: July 13, 2020Date of Patent: March 21, 2023Assignee: SHIMADZU CORPORATIONInventors: Kazuteru Takahashi, Kenta Terashima
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Patent number: 11543394Abstract: A combined analyzer includes a thermal analyzer, a trap, a gas chromatograph, a mass spectrometer, a first flow path to which a gas generated in the thermal analyzer is supplied, a second flow path that branches from the first flow path and is connected to the mass spectrometer, a third flow path that branches from the first flow path and is connected to the trap, a fourth flow path that connects the trap and a column included in the gas chromatograph, and a fifth flow path that connects the column and the mass spectrometer.Type: GrantFiled: February 26, 2021Date of Patent: January 3, 2023Assignee: SHIMADZU CORPORATIONInventors: Ryuta Shibutani, Kazuteru Takahashi
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Publication number: 20210278379Abstract: A combined analyzer includes a thermal analyzer, a trap, a gas chromatograph, a mass spectrometer, a first flow path to which a gas generated in the thermal analyzer is supplied, a second flow path that branches from the first flow path and is connected to the mass spectrometer, a third flow path that branches from the first flow path and is connected to the trap, a fourth flow path that connects the trap and a column included in the gas chromatograph, and a fifth flow path that connects the column and the mass spectrometer.Type: ApplicationFiled: February 26, 2021Publication date: September 9, 2021Applicant: SHIMADZU CORPORATIONInventors: Ryuta SHIBUTANI, Kazuteru TAKAHASHI
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Publication number: 20210101153Abstract: A first container for housing a reagent and a second container for housing the first container inside are provided. The pressurization mechanism pressurizes a pressurization space formed outside the first container in the second container to pressurize the inside of the first container communicating with the pressurization space. The reagent is drawn out from the pressurized inside of the first container through a pipe.Type: ApplicationFiled: August 11, 2020Publication date: April 8, 2021Applicant: SHIMADZU CORPORATIONInventors: Kenta TERASHIMA, Kazuteru TAKAHASHI
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Publication number: 20210078030Abstract: Provided is a sample pretreatment device configured to apply, to the surface of a sample, a solution in which a predetermined substance is dissolved or dispersed. In order to properly and efficiently unclog a nozzle due to the deposition of the crystal of a matrix substance, the device includes a spray unit (3) including a solution tube (32) for the solution to pass through, a gas tube (33) for a spray gas to pass through, and a nozzle part (30) configured to spray the solution arriving at the terminal end of the solution tube by ejection of the spray gas through the gas tube, as well as a cleaning liquid supplier (4, 41) configured to put a cleaning liquid on an opening of the nozzle part from outside the spray unit.Type: ApplicationFiled: July 13, 2020Publication date: March 18, 2021Applicant: SHIMADZU CORPORATIONInventors: Kazuteru TAKAHASHI, Kenta TERASHIMA
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Publication number: 20170294297Abstract: After a sample such as a biomedical tissue section is attached to an electrically-conductive slide glass (S1), the film layer of a matrix substance is appropriately formed by vapor deposition so as to cover the sample (S2). The crystal of the matrix substance in the film layer is very fine and uniform. Subsequently, the slide glass on which the matrix film layer is formed is placed in a vaporized solvent atmosphere, and the solvent infiltrates into the matrix film layer (S3). When the solvent sufficiently infiltrated is vaporized, a substance to be measured in the sample takes in the matrix and re-crystallized. Furthermore, the matrix film layer is formed again on the surface by the vapor deposition (S4). The added matrix film layer absorbs excessive energy of a laser beam during MALDI, which suppresses the denaturation of the substance to be measured and the like, so that high detection sensitivity can be achieved while high spatial resolution is maintained.Type: ApplicationFiled: June 23, 2017Publication date: October 12, 2017Applicants: SHIMADZU CORPORATIONInventors: Koretsugu OGATA, Kazuteru TAKAHASHI, Akiko KUBO, Makoto SUEMATSU, Takushi YAMAMOTO
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Patent number: 9757745Abstract: A system capable of depositing a matrix film containing a low amount of impurities (e.g. neutral particles) is provided. The system includes: a first plate electrode 120 having an attachment surface on which a sample plate P is to be attached; a second plate electrode 130 arranged so as to face the attachment surface; a nozzle 110 for spraying a liquid containing a matrix substance into the space between the two electrodes 120 and 130 by an electrospray method, the nozzle 110 arranged so that none of the electrodes 120 and 130 lies on the central axis A of a spray flow of the liquid; and an electric field creator 140 for creating, between the two electrodes 120 and 130, an electric field for forcing electrically charged droplets contained in the spray flow of the liquid containing the matrix substance to move toward the attachment surface.Type: GrantFiled: July 14, 2015Date of Patent: September 12, 2017Assignee: SHIMADZU CORPORATIONInventor: Kazuteru Takahashi
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Patent number: 9721776Abstract: After a sample such as a biomedical tissue section is attached to an electrically-conductive slide glass (S1), the film layer of a matrix substance is appropriately formed by vapor deposition so as to cover the sample (S2). The crystal of the matrix substance in the film layer is very fine and uniform. Subsequently, the slide glass on which the matrix film layer is formed is placed in a vaporized solvent atmosphere, and the solvent infiltrates into the matrix film layer (S3). When the solvent sufficiently infiltrated is vaporized, a substance to be measured in the sample takes in the matrix and re-crystallized. Furthermore, the matrix film layer is formed again on the surface by the vapor deposition (S4). The added matrix film layer absorbs excessive energy of a laser beam during MALDI, which suppresses the denaturation of the substance to be measured and the like, so that high detection sensitivity can be achieved while high spatial resolution is maintained.Type: GrantFiled: April 4, 2014Date of Patent: August 1, 2017Assignees: SHIMADZU CORPORATION, KEIO UNIVERSITYInventors: Koretsugu Ogata, Kazuteru Takahashi, Akiko Kubo, Makoto Suematsu, Takushi Yamamoto
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Patent number: 9679755Abstract: In an ion source 3 in which a repeller electrode 32 for forming a repelling electric field that repels ions toward an ion emission port 311 is provided inside of an ionization chamber 31, ion focusing electrodes 36 and 37 are respectively arranged between an electron introduction port 312 and a filament 34 and between an electron discharge port 313 and a counter filament 35. An electric field formed by applying a predetermined voltage to each of the ion focusing electrodes 36 and 37 intrudes into the ionization chamber 31 through the electron introduction port 312 and the electron discharge port 313, and becomes a focusing electric field that pushes the ions in an ion optical axis C direction. Ions at positions off a central part of the ionization chamber 31 receive the combined force of the force of the repelling electric field and the force of the focusing electric field, and move toward the ion emission port 311 while approaching the ion optical axis C.Type: GrantFiled: February 22, 2016Date of Patent: June 13, 2017Assignee: SHIMADZU CORPORATIONInventors: Yusuke Tateishi, Kazuteru Takahashi, Hideki Sato
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Publication number: 20160247669Abstract: In an ion source 3 in which a repeller electrode 32 for forming a repelling electric field that repels ions toward an ion emission port 311 is provided inside of an ionization chamber 31, ion focusing electrodes 36 and 37 are respectively arranged between an electron introduction port 312 and a filament 34 and between an electron discharge port 313 and a counter filament 35. An electric field formed by applying a predetermined voltage to each of the ion focusing electrodes 36 and 37 intrudes into the ionization chamber 31 through the electron introduction port 312 and the electron discharge port 313, and becomes a focusing electric field that pushes the ions in an ion optical axis C direction. Ions at positions off a central part of the ionization chamber 31 receive the combined force of the force of the repelling electric field and the force of the focusing electric field, and move toward the ion emission port 311 while approaching the ion optical axis C.Type: ApplicationFiled: February 22, 2016Publication date: August 25, 2016Applicant: SHIMADZU CORPORATIONInventors: Yusuke TATEISHI, Kazuteru TAKAHASHI, Hideki SATO
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Publication number: 20160172174Abstract: A matrix film forming device including a first electrode plate including a mounting surface on which a sample plate P is mounted; a second electrode plate arranged facing said mounting surface; a nozzle which sprays a liquid containing a matrix substance by an electrospray process into the space between the first electrode plate and the second electrode plate and is arranged such that the first electrode plate and second electrode plate are not present over the central axis of the spray stream; and an electric field forming device which forms, between the first electrode plate and the second electrode plate, an electric field causes liquid drops containing charged matrix substance contained in the spray stream to move toward said mounting surface.Type: ApplicationFiled: August 7, 2015Publication date: June 16, 2016Applicant: SHIMADZU CORPORATIONInventor: Kazuteru TAKAHASHI
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Publication number: 20160167065Abstract: A system capable of depositing a matrix film containing a low amount of impurities (e.g. neutral particles) is provided. The system includes: a first plate electrode 120 having an attachment surface on which a sample plate P is to be attached; a second plate electrode 130 arranged so as to face the attachment surface; a nozzle 110 for spraying a liquid containing a matrix substance into the space between the two electrodes 120 and 130 by an electrospray method, the nozzle 110 arranged so that none of the electrodes 120 and 130 lies on the central axis A of a spray flow of the liquid; and an electric field creator 140 for creating, between the two electrodes 120 and 130, an electric field for forcing electrically charged droplets contained in the spray flow of the liquid containing the matrix substance to move toward the attachment surface.Type: ApplicationFiled: July 14, 2015Publication date: June 16, 2016Applicant: SHIMADZU CORPORATIONInventor: Kazuteru Takahashi
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Patent number: 9334569Abstract: To provide a sample preparation device that is appropriate for the formation of a matrix film for MALDI through vacuum vapor deposition. A sample preparation device is provided with: a sample substrate support unit 23 for supporting a substance to be analyzed on a substrate S so that the substance faces a vapor deposition source 21 for a matrix substance J; a light amount measurement unit for irradiating a matrix film vapor deposited on the substrate S with measurement light diagonally and detecting the amount of measurement light that has transmitted through or has been reflected from the above-described matrix film diagonally; and an adhesion prevention means 23a for preventing the matrix substance that has flown off from the above-described vapor deposition source 21 from adhering to the above-described light amount measurement unit.Type: GrantFiled: November 12, 2012Date of Patent: May 10, 2016Assignee: SHIMADZU CORPORATIONInventors: Kazuteru Takahashi, Kiyoshi Ogawa
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Publication number: 20160035553Abstract: After a sample such as a biomedical tissue section is attached to an electrically-conductive slide glass (S1), the film layer of a matrix substance is appropriately formed by vapor deposition so as to cover the sample (S2). The crystal of the matrix substance in the film layer is very fine and uniform. Subsequently, the slide glass on which the matrix film layer is formed is placed in a vaporized solvent atmosphere, and the solvent infiltrates into the matrix film layer (S3). When the solvent sufficiently infiltrated is vaporized, a substance to be measured in the sample takes in the matrix and re-crystallized. Furthermore, the matrix film layer is formed again on the surface by the vapor deposition (S4). The added matrix film layer absorbs excessive energy of a laser beam during MALDI, which suppresses the denaturation of the substance to be measured and the like, so that high detection sensitivity can be achieved while high spatial resolution is maintained.Type: ApplicationFiled: April 4, 2014Publication date: February 4, 2016Applicants: KEIO UNIVERSITY, SHIMADZU CORPORATIONInventors: Koretsugu OGATA, Kazuteru TAKAHASHI, Akiko KUBO, Makoto SUEMATSU, Takuji YAMAMOTO
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Publication number: 20120132799Abstract: A samples stage (2) on which a sample (4) is placed can reciprocally move along a guide (5) by a driving mechanism. An image taken by an imaging unit (7) when the sample stage (2) is at an observation position (A) is processed by an image processor (34) and is displayed on a window of a display unit (38). When an analysis operator specifies a measurement area by an operation unit (37), a controller (3) moves, through a stage driver (33), the stage (2) to a sample operation position (B) and a matrix is applied to the specified measurement area by an ejector (9). After that, the stage (2) is moved to an analysis position (C) and a laser light is delivered onto the measurement area on the sample (4) to which the matrix was applied, and the ionization by the MALDI method is performed. This eliminates the need to take out the sample from the apparatus to apply the matrix after the measurement point or measurement area is determined based on a microscopic observation of the sample.Type: ApplicationFiled: March 31, 2009Publication date: May 31, 2012Applicant: SHIMADZU CORPORATIONInventors: Kazuteru Takahashi, Kiyoshi Ogawa, Mitsutoshi Setou
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Patent number: 5191136Abstract: A process for production of sec-butylbenzene is disclosed, comprising reacting benzene and n-butene in the presence of a liquid aluminum chloride complex catalyst is disclosed, wherein the reaction is carried out under conditions satisfying formulae (1) to (4):40>C.times.T.times.2.sup.(K-20)/10 > (1)C.ltoreq.0.9 (2)T.ltoreq.0.7 (3)K.gtoreq.80 (4)wherein C is a concentration (% by weight) of a complex catalyst in the reaction mixture; T is a reaction time (hr); and K is a reaction temperature (.degree.C). sec-Butylbenzene is produced in high yield while suppressing the amount of isobutylbenzene formed as a by-product.Type: GrantFiled: September 9, 1991Date of Patent: March 2, 1993Assignee: Sumitomo Chemical Co., Ltd.Inventors: Kazuteru Takahashi, Yasuhiko Higashio
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Patent number: 5059736Abstract: A process for production of sec-butylbenzene from benzene and n-butene in the presence of a liquid aluminum chloride complex catalyst is disclosed, wherein the amount of aluminum chloride used as a component of the complex catalyst is from 0.3 to 5 wt % of the benzene used, the reaction temperature is from 20.degree. to 90.degree. C., and the weight ratio of isobutylbenzene formed as a by-product to sec-butylbenzene formed is not more than 0.01:1.Type: GrantFiled: April 24, 1990Date of Patent: October 22, 1991Assignee: Sumitomo Chemical Co., Ltd.Inventors: Mitsuhisa Tamura, Kazuhiro Yamauchi, Yasuhiko Higashio, Kazuteru Takahashi
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Patent number: 4684758Abstract: 2,5-Dimethyl-2,4-hexadiene which is an intermediate for preparing agricultural chemicals, insecticides or medicines, is prepared by bringing isobutylene and/or tert.-butyl alcohol into contact with isobutyl aldehyde in a gaseous phase at a temperature of 150.degree.-350.degree. C. in the presence of a niobic acid catalyst.Type: GrantFiled: July 31, 1986Date of Patent: August 4, 1987Assignee: Sumitomo Chemical Company, Ltd.Inventors: Yasuhiko Higashio, Kazuteru Takahashi