Patents by Inventor Kazuto Ashiwara

Kazuto Ashiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6509568
    Abstract: An electron beam radiation apparatus having an electrostatic deflector capable of deflecting the electron beam with high accuracy and with a reduced displacement of the deflection position, is disclosed. The electrostatic deflector comprises a cylindrical holding member made of an insulating material and a plurality of electrodes separately fixed from each other inside of the holding member with at least a part of the surface thereof covered with a metal film. The holding member has a plurality of wedge-shaped fixing holes corresponding to the portions of the electrodes where they are fixed, respectively, the holes having a larger diameter on the outer peripheral surface than on the inner peripheral surface of the holding member. The electrodes are fixed on the holding member in such a manner that a molten joining metal is injected in the fixing holes with the electrodes arranged on the holding member and the joining metal is hardened in close contact with the metal film of the electrodes.
    Type: Grant
    Filed: November 1, 1999
    Date of Patent: January 21, 2003
    Assignee: Advantest Corporation
    Inventors: Yoshihisa Ooae, Hitoshi Tanaka, Takeshi Haraguchi, Kazuto Ashiwara, Tomohiko Abe, Ryoji Kato
  • Publication number: 20020020354
    Abstract: An electron beam radiation apparatus having an electrostatic deflector capable of deflecting the electron beam with high accuracy and with a reduced displacement of the deflection position, is disclosed. The electrostatic deflector comprises a cylindrical holding member made of an insulating material and a plurality of electrodes separately fixed from each other inside of the holding member with at least a part of the surface thereof covered with a metal film. The holding member has a plurality of wedge-shaped fixing holes corresponding to the portions of the electrodes where they are fixed, respectively, the holes having a larger diameter on the outer peripheral surface than on the inner peripheral surface of the holding member. The electrodes are fixed on the holding member in such a manner that a molten joining metal is injected in the fixing holes with the electrodes arranged on the holding member and the joining metal is hardened in close contact with the metal film of the electrodes.
    Type: Application
    Filed: June 21, 2001
    Publication date: February 21, 2002
    Inventors: Yoshihisa Ooae, Hitoshi Tanaka, Takeshi Haraguchi, Kazuto Ashiwara, Tomohiko Abe, Ryoji Kato
  • Publication number: 20010045528
    Abstract: An electron beam radiation apparatus having an electrostatic deflector capable of deflecting the electron beam with high accuracy and with a reduced displacement of the deflection position, is disclosed. The electrostatic deflector comprises a cylindrical holding member made of an insulating material and a plurality of electrodes separately fixed from each other inside of the holding member with at least a part of the surface thereof covered with a metal film. The holding member has a plurality of wedge-shaped fixing holes corresponding to the portions of the electrodes where they are fixed, respectively, the holes having a larger diameter on the outer peripheral surface than on the inner peripheral surface of the holding member. The electrodes are fixed on the holding member in such a manner that a molten joining metal is injected in the fixing holes with the electrodes arranged on the holding member and the joining metal is hardened in close contact with the metal film of the electrodes.
    Type: Application
    Filed: June 21, 2001
    Publication date: November 29, 2001
    Inventors: Yoshihisa Ooae, Hitoshi Tanaka, Takeshi Haraguchi, Kazuto Ashiwara, Tomohiko Abe, Ryoji Kato